Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
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04/12/2006 | CN1250372C Polishing pad with built-in optical sensor |
04/11/2006 | US7025664 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece |
04/11/2006 | US7025658 Platen and head rotation rates for monitoring chemical mechanical polishing |
04/11/2006 | US7024785 Method for the in-process dimensional checking of orbitally rotating crankpins |
04/06/2006 | WO2006036412A1 Endpoint adjustment in electroprocessing |
04/06/2006 | WO2006035337A1 Flexible rinsing step in a cmp process |
04/06/2006 | US20060073770 Vapor deposition crucible |
04/06/2006 | US20060073769 Polishing method |
04/06/2006 | US20060073765 Grinding process and apparatus with arrangement for grinding with constant grinding load |
04/05/2006 | EP1642678A1 Eyeglass lens processing apparatus |
04/05/2006 | EP1641597A1 Substrate polishing apparatus |
04/04/2006 | US7024063 In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization |
04/04/2006 | US7021992 Tire face grinder assembly |
04/04/2006 | US7021991 Polishing apparatus |
04/04/2006 | US7021990 Method and apparatus for circular grinding |
04/04/2006 | US7020974 Apparatus for checking the dimensional and geometric features of pins |
03/30/2006 | US20060068684 Polishing method and polishing system |
03/29/2006 | EP1639630A1 Polishing apparatus and polishing method |
03/29/2006 | EP0809798B1 Method for polishing a wafer and method for manufacturing an integrated circuit |
03/29/2006 | CN1751857A Automatic optimizing design method for constant force griding wave filter |
03/29/2006 | CN1751855A Cmp pad having a streamlined windowpane |
03/28/2006 | US7020306 Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device |
03/28/2006 | US7019519 Thickness estimation using conductively related calibration samples |
03/28/2006 | US7018275 Closed-loop control of wafer polishing in a chemical mechanical polishing system |
03/28/2006 | US7018272 Pressure feed grinding of AMLCD substrate edges |
03/28/2006 | US7018271 Method for monitoring a substrate during chemical mechanical polishing |
03/28/2006 | US7018270 Method and apparatus for cutting semiconductor wafers |
03/28/2006 | US7018269 Pad conditioner control using feedback from a measured polishing pad roughness level |
03/28/2006 | US7018268 Protection of work piece during surface processing |
03/28/2006 | CA2276319C Method and apparatus for ultrasonically testing of the surface of columnar structures, and method for grinding rolls by use of them |
03/23/2006 | US20060063473 Method for inspecting grinding wheels |
03/23/2006 | US20060063469 Advanced chemical mechanical polishing system with smart endpoint detection |
03/23/2006 | DE102004053308A1 Device for simultaneous sharpening of both sides of disc shaped workpiece which is sandwiched between axial guidance devices and left and right grinding wheels |
03/22/2006 | EP1637744A1 Proportional pressure regulator having positive and negative pressure delivery capability |
03/22/2006 | EP1635960A2 Method and apparatus to process substrates with megasonic energy |
03/22/2006 | EP1337380B1 Abrasive article having a window system for polishing wafers, and methods |
03/22/2006 | EP1176631B1 Method and apparatus for monitoring polishing state, polishing device, process wafer, semiconductor device, and method of manufacturing semiconductor device |
03/22/2006 | EP1137515B1 Method and grinding machine for controlling the process during rough grinding of a workpiece |
03/22/2006 | CN1246125C End point detection system for chemical and mechanical polishing |
03/21/2006 | US7016799 Apparatus and method for checking the machining process of a machine tool |
03/21/2006 | US7016795 Signal improvement in eddy current sensing |
03/21/2006 | US7016000 Apparatus and method for rubbing LCD substrate |
03/21/2006 | US7014541 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece |
03/21/2006 | US7014532 Lapping machine, lapping method, and method of manufacturing magnetic head |
03/21/2006 | US7014531 Method and apparatus for inline measurement of material removal during a polishing or grinding process |
03/21/2006 | US7014530 Slider fabrication system for sliders with integrated electrical lapping guides |
03/21/2006 | US7014529 Substrate processing method and substrate processing apparatus |
03/16/2006 | WO2006027885A1 Methods for determining and machining worked surface of plate-like material and apparatus for these methods |
03/16/2006 | WO2005119383A3 Method and apparatus for controlling the machining of mechanical pieces |
03/16/2006 | WO2005072332A3 Chemical mechanical planarization process control utilizing in-situ conditioning process |
03/16/2006 | US20060057939 Grinding method of a workpiece and grinding apparatus |
03/15/2006 | EP1633528A2 Substrate polishing apparatus |
03/15/2006 | EP1633526A2 Systems and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
03/15/2006 | EP1322940A4 In-situ method and apparatus for end point detection in chemical mechanical polishing |
03/15/2006 | CN1747811A Method for calibrating a grinding machine |
03/14/2006 | US7011568 Grinder with adjustable tool rest |
03/14/2006 | US7011566 Methods and systems for conditioning planarizing pads used in planarizing substrates |
03/14/2006 | US7011565 Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
03/09/2006 | WO2006025507A1 Polishing apparatus and polishing method |
03/09/2006 | US20060052040 Method for manufacturing microporous CMP materials having controlled pore size |
03/09/2006 | US20060052037 Vacuum suction holding apparatus and holding method, polishing apparatus using this holding apparatus, and device manufacturing method using this polishing apparatus |
03/08/2006 | CN2763968Y Chemical-mechanical abrading device |
03/08/2006 | CN1744969A Modeling an abrasive process to achieve controlled material removal |
03/08/2006 | CN1744285A 制造系统 Manufacturing System |
03/07/2006 | US7008875 Methods and apparatus for polishing control |
03/07/2006 | US7008309 Back pressure control system for CMP and wafer polishing |
03/07/2006 | US7008298 Machine for machining long workpieces provided with cutting teeth, particularly for grinding endless saw blades |
03/07/2006 | US7008297 Combined eddy current sensing and optical monitoring for chemical mechanical polishing |
03/07/2006 | US7008296 Data processing for monitoring chemical mechanical polishing |
03/07/2006 | US7008295 Substrate monitoring during chemical mechanical polishing |
03/02/2006 | WO2006022452A2 Polishing apparatus and polishing method |
03/02/2006 | WO2006022336A1 Method of evaluating cutting edge profile of re-sharpening pinion cutter |
03/02/2006 | US20060046619 Polishing pad conditioner and monitoring method therefor |
03/02/2006 | US20060046618 Methods and systems for determining physical parameters of features on microfeature workpieces |
03/01/2006 | EP1628803A1 Method and device for machining spectacle lenses |
03/01/2006 | EP1628802A1 Floor sanding machine |
02/28/2006 | US7004821 Process for bevelling an ohthalmic lens including a plotting stage without contact |
02/28/2006 | US7004817 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces |
02/28/2006 | US7004816 Grinding method for vertical type of double disk surface grinding machine |
02/28/2006 | US7004814 CMP process control method |
02/23/2006 | WO2006019840A1 Abrasive article splicing system and methods |
02/23/2006 | US20060040594 Apparatus and method for fabricating liquid crystal display panel |
02/23/2006 | US20060040588 Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same |
02/23/2006 | US20060040586 Method and apparatus for polishing a semiconductor device |
02/23/2006 | US20060037699 Polishing pad and method for manufacturing semiconductor device |
02/23/2006 | DE102004040429A1 Doppelseiten-Poliermaschine Double-side polishing machine |
02/22/2006 | EP1628113A1 Feeler device for workpieces being machined |
02/22/2006 | EP1626839A1 A method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner |
02/21/2006 | US7003148 Detection of an end point of polishing a substrate |
02/21/2006 | US7002689 Optically-based method and apparatus for detecting and characterizing surface pits in a metal film during chemical mechanical polish |
02/21/2006 | US7001260 Carrier head with a compressible film |
02/21/2006 | US7001257 Multi-chamber carrier head with a flexible membrane |
02/21/2006 | US7001249 Methods and systems for finishing edges of glass sheets |
02/21/2006 | US7001246 Method and apparatus for monitoring a metal layer during chemical mechanical polishing |
02/21/2006 | US7001245 Substrate carrier with a textured membrane |
02/21/2006 | US7001244 Polishing apparatus |
02/21/2006 | US7001243 Neural network control of chemical mechanical planarization |
02/21/2006 | US7001242 Method and apparatus of eddy current monitoring for chemical mechanical polishing |
02/16/2006 | US20060035565 Grinding wheel monitoring |
02/16/2006 | US20060035562 System and a method for polishing optical connectors |