| Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
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| 12/29/2005 | US20050286056 Method and apparatus for optical film measurements in a controlled environment |
| 12/29/2005 | US20050284770 A multilayer pad having a ring-shaped upper polish layer and replaceable conductive layer; attaching to exterior power source; controlling the rate of copper material removal from printed circuits, determining each polishing time in each zone; tools for making semiconductors |
| 12/28/2005 | CN2748223Y Outer detecting machine structure for inner diameter |
| 12/28/2005 | CN1233507C Positioning block height difference and grinding quantity measuring machine |
| 12/27/2005 | US6980300 Method and apparatus for generating a polishing process endpoint signal using scatterometry |
| 12/27/2005 | US6979250 Carrier head with flexible membrane to provide controllable pressure and loading area |
| 12/22/2005 | WO2005120776A1 Material removal monitor |
| 12/22/2005 | US20050282469 Method of producing a design on a terracotta container having a glazed surface portion |
| 12/22/2005 | US20050282380 Method and apparatus for chemical mechanical polishing of semiconductor substrates |
| 12/21/2005 | EP1399294B1 End point detection system for chemical mechanical polishing applications |
| 12/20/2005 | US6976903 Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing |
| 12/20/2005 | US6976902 Chemical mechanical polishing apparatus |
| 12/20/2005 | US6976900 Automatic roll data acquisition system |
| 12/15/2005 | WO2005119383A2 Method and apparatus for controlling the machining of mechanical pieces |
| 12/15/2005 | US20050277371 Transparent microporous materials for CMP |
| 12/15/2005 | US20050277365 Real time polishing process monitoring |
| 12/15/2005 | US20050274167 Apparatus and method for measuring ground amounts of liquid crystal display panel |
| 12/14/2005 | EP1604782A1 Grinding tool with integrated micromagnetic sensors |
| 12/14/2005 | CN1708378A Polishing apparatus |
| 12/14/2005 | CN1708377A Transparent microporous materials for CMP |
| 12/13/2005 | US6975107 Eddy current sensing of metal removal for chemical mechanical polishing |
| 12/13/2005 | US6974364 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 12/08/2005 | WO2005115689A1 Substrate peripheral portion measuring device and method, substrate peripheral portion polishing apparatus and method, and substrate rinsing apparatus and method |
| 12/08/2005 | US20050272351 Method and apparatus for cleaning mounting nozzle, and mounting machine |
| 12/08/2005 | US20050272349 Method for conditioning superabrasive tools |
| 12/08/2005 | US20050272348 Polishing pad assembly, apparatus for polishing a wafer including the polishing pad assembly and method for polishing a wafer using the polishing pad assembly |
| 12/08/2005 | US20050272347 Dry ice blasting cleaning apparatus |
| 12/08/2005 | US20050272346 Carrier head of chemical mechanical polishing apparatus having barriers dividing pressure chamber into a plurality of pressure zones |
| 12/08/2005 | US20050268899 Saw singulation |
| 12/08/2005 | US20050268763 Method and apparatus for cutting semiconductor wafers |
| 12/08/2005 | DE102004025231A1 Handwerkzeugmaschine, die ihre Betriebsspannung aus einer Stromversorgungseinheit erhält Hand machine tool, which receives its operating voltage from a power supply unit |
| 12/07/2005 | EP1602444A2 Polishing method |
| 12/07/2005 | EP1491289B1 Rotor-grinding machine comprising a rotary head with two grinding wheels |
| 12/07/2005 | CN1230279C Integrated endpoint detection system with optical and eddy current monitoring |
| 12/06/2005 | US6972817 Apparatus and method for rubbing LCD substrate |
| 12/06/2005 | US6971944 Method and control system for improving CMP process by detecting and reacting to harmonic oscillation |
| 12/01/2005 | WO2005113194A1 Method and apparatus for measuring and controlling solids composition of a magnetorheological fluid |
| 12/01/2005 | WO2005084261A3 Tire uniformity machine grinding assembly |
| 12/01/2005 | US20050266774 Variable rate method of machining gears |
| 12/01/2005 | US20050266773 Apparatuses and methods for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 12/01/2005 | US20050266772 System and method for Ophthalmic lens manufacture |
| 12/01/2005 | US20050266771 Polishing pad with window |
| 11/30/2005 | EP1600236A1 Variable rate method of machining gears |
| 11/30/2005 | CN1701920A Automatic detection equipment and method by response mode between roller detection equipment and grinder |
| 11/30/2005 | CN1701884A Variable rate method of machining gears |
| 11/29/2005 | US6969305 Polishing apparatus |
| 11/29/2005 | US6969297 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 11/24/2005 | US20050260938 Table of wafer polishing apparatus, method for polishing semiconductor wafer, and method for manufacturing semiconductor wafer |
| 11/24/2005 | US20050260933 Polishing apparatus and method |
| 11/24/2005 | US20050260927 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces |
| 11/24/2005 | US20050260925 Polishing apparatus |
| 11/24/2005 | US20050260923 Hand power tool which receives its operating voltage from a power supply unit |
| 11/24/2005 | US20050260922 Torque-based end point detection methods for chemical mechanical polishing tool which uses ceria-based CMP slurry to polish to protective pad layer |
| 11/23/2005 | EP1425135B1 Method and apparatus for polishing a workpiece surface |
| 11/23/2005 | CN1701136A Low-force electrochemical mechanical processing method and apparatus |
| 11/23/2005 | CN1700970A Control of removal profile in electrochemically assisted CMP |
| 11/22/2005 | US6967715 Method and apparatus for optical film measurements in a controlled environment |
| 11/22/2005 | US6967166 Method for monitoring and controlling force applied on workpiece surface during electrochemical mechanical processing |
| 11/22/2005 | US6966822 System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control |
| 11/22/2005 | US6966817 Wafer grinder |
| 11/22/2005 | US6966816 Integrated endpoint detection system with optical and eddy current monitoring |
| 11/17/2005 | US20050255792 Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces |
| 11/17/2005 | US20050254051 Method of polishing thin film formed on substrate |
| 11/16/2005 | EP1594657A2 Grinding machine |
| 11/16/2005 | EP1594654A2 Method and device for mechanically buffing worn-down tires |
| 11/14/2005 | CA2467316A1 Dry ice blasting cleaning apparatus |
| 11/10/2005 | US20050250422 Method and apparatus for grinding of concrete floors |
| 11/10/2005 | US20050250419 High selectivity slurry delivery system |
| 11/10/2005 | DE10220562B4 Verfahren zur Ausrichtung eines in einer Honspindel einspannbaren Honwerkzeugs und einer Bohrung eines Werkstücks zueinander sowie Honmaschine A method for alignment of a honing tool can be clamped in a honing spindle, and a bore of a workpiece to each other and honing machine |
| 11/09/2005 | EP1593148A1 Substrate holding apparatus and polishing apparatus |
| 11/08/2005 | US6963407 Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program |
| 11/08/2005 | US6962524 Conductive polishing article for electrochemical mechanical polishing |
| 11/03/2005 | WO2004112093A3 Method and apparatus to process substrates with megasonic energy |
| 11/03/2005 | WO2004109758A3 Back pressure control system for cmp and wafer polishing |
| 11/03/2005 | US20050245170 Polishing system with in-line and in-situ metrology |
| 11/02/2005 | EP1591749A2 Apparatus for the linear dimension checking of mechanical pieces |
| 11/02/2005 | EP1591748A2 Head for the linear dimension checking of mechanical pieces |
| 11/02/2005 | EP1590759A2 Method for automatic riser gate removal compensating for variance in casting |
| 11/02/2005 | EP1590128A1 Modeling an abrasive process to achieve controlled material removal |
| 11/02/2005 | EP1590126A2 Method for calibrating a grinding machine |
| 11/02/2005 | CN1225724C Film magnetic-head material processing equipment and method |
| 11/02/2005 | CN1225345C Method for processing surface and measuring its parameters simultaneously |
| 11/01/2005 | US6960115 Multiprobe detection system for chemical-mechanical planarization tool |
| 10/27/2005 | WO2005100976A2 System and method for the identification of chemical mechanical planarization defects |
| 10/27/2005 | US20050239377 Portable sharpening system for a dual-knife cutting machine |
| 10/27/2005 | US20050239372 Substrate polishing apparatus |
| 10/27/2005 | US20050239371 Pressure control system and polishing apparatus |
| 10/27/2005 | US20050239222 Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model |
| 10/27/2005 | US20050236917 Power hand tool |
| 10/26/2005 | EP1588801A1 Process and device for treating a through hole with an abrasive fluid |
| 10/26/2005 | EP1587649A1 Method and device for the high-precision machining of the surface of an object, especially for polishing and lapping semiconductor substrates |
| 10/26/2005 | EP1311368B1 Polishing apparatus and methods controlling the polishing pressure as a function of the overlapping area between the polishing head and the semiconductor substrate |
| 10/26/2005 | EP1031166B1 Method and apparatus for chemical mechanical polishing |
| 10/26/2005 | CN1686674A Digitized precise curve grinding integrated control system |
| 10/25/2005 | USRE38854 Apparatus for and method for polishing workpiece |
| 10/25/2005 | US6958001 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces |
| 10/25/2005 | US6957998 Polishing apparatus |
| 10/25/2005 | US6957997 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner |
| 10/20/2005 | WO2005098521A1 Device for installing suction jig for eyeglass lens and method for determining suction jig installation position |
| 10/20/2005 | WO2005097407A1 Method and device for grinding assembled camshafts with a high concentricity accuracy |