| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
|---|
| 05/05/2011 | WO2011017356A3 Abrasive tool having controlled porosity distribution |
| 05/05/2011 | US20110104995 Carrier for a double-side polishing apparatus, double-side polishing apparatus using this carrier, and double-side polishing method |
| 05/05/2011 | US20110104990 Substrate Retainer |
| 05/05/2011 | US20110104989 Dressing bar for embedding abrasive particles into substrates |
| 05/05/2011 | DE102009051008A1 Verfahren zur Herstellung einer Halbleiterscheibe A process for producing a semiconductor wafer |
| 05/04/2011 | EP2316614A1 Polishing pad and method for manufacturing the polishing pad |
| 05/04/2011 | CN201815948U Multi-sample section grinding table and grinding device |
| 05/04/2011 | CN201815947U Silicon chip rotating speed detection device and silicon chip cleaning device provided with silicon chip rotating speed detection device |
| 05/04/2011 | CN1840602B Method for preparing a polishing slurry having high dispersion stability |
| 05/04/2011 | CN102046331A Semiconductor wafer polishing apparatus and method of polishing |
| 05/04/2011 | CN102044409A Method for carrying out chemically mechanical polishing (CMP) on insulating medium |
| 05/04/2011 | CN102039556A Wafer back side grinding process |
| 05/04/2011 | CN102039555A 研磨头装置 Grinding head unit |
| 05/04/2011 | CN102039554A Method for grinding solar silicon rod |
| 05/04/2011 | CN102039553A Synchronous linkage member of clamping mechanism of valve sealing surface grinder |
| 05/04/2011 | CN101590615B Tungsten chemical mechanical polishing method |
| 05/04/2011 | CN101511537B 抛光垫 Polishing pad |
| 05/04/2011 | CN101489722B Carrier for double-sided polishing device, double-sided polishing device using the same and double-sided polishing method |
| 05/04/2011 | CN101219531B Microporous polishing pads |
| 05/03/2011 | US7935216 Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
| 05/03/2011 | US7934979 Retaining ring with tapered inner surface |
| 04/28/2011 | WO2011049216A1 Composition for polishing silicon carbide |
| 04/28/2011 | WO2011048889A1 Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate |
| 04/28/2011 | WO2011016941A3 Abrasive article with preconditioning and persistent indicators |
| 04/28/2011 | WO2011002149A9 Cmp polishing pad with pores formed therein, and method for forming pores |
| 04/28/2011 | US20110097975 Method for producing a semiconductor wafer |
| 04/28/2011 | DE102009044204A1 Wiederaufbereitungsverfahren und Wiederaufbereitungsvorrichtung zur Wiederaufbereitung von Slurry-Abwasser aus einem Halbleiterbearbeitungs-prozess, insbesondere aus einem chemisch-mechanischen Polierprozess Recycling process and recycling apparatus for recycling slurry wastewater from a semiconductor processing process, particularly a chemical mechanical polishing process |
| 04/27/2011 | EP1430520B1 Chemical mechanical polishing pad with micro-holes |
| 04/27/2011 | CN201807965U Device for improving surface grinding quality of copper band |
| 04/27/2011 | CN201807964U Improved eccentric shaft structure of grinder |
| 04/27/2011 | CN102034697A Method for polishing semiconductor wafers |
| 04/27/2011 | CN102030499A Glass setting plate for glass polishing system |
| 04/27/2011 | CN102029573A Method for grinding semiconductor wafer |
| 04/27/2011 | CN102029572A Control method of CMP (chemical mechanical polishing) time |
| 04/27/2011 | CN102029571A Polishing pad and application and manufacturing method thereof |
| 04/27/2011 | CN102029570A Method and device for machining tungsten and titanium alloy target material |
| 04/27/2011 | CN102029569A Valve sealing face grinding assembly |
| 04/27/2011 | CN101186784B 抛光组合物 The polishing composition |
| 04/21/2011 | WO2011046017A1 Polishing pad |
| 04/20/2011 | EP2311074A2 Method of polishing nickel-phosphorous |
| 04/20/2011 | EP1433197B1 Chemical mechanical polishing pad having wave-shaped grooves |
| 04/20/2011 | CN201799928U Grinder for inner holes of thin-wall boring holder |
| 04/20/2011 | CN201799927U Foundation grinding tool |
| 04/20/2011 | CN102026775A Polishing pad |
| 04/20/2011 | CN102026774A Double-head grinding apparatus and wafer manufacturing method |
| 04/20/2011 | CN102019581A Wafer grinding equipment and wafer manufacturing method |
| 04/20/2011 | CN102019580A Apparatus and method for locally polishing glass plate, and apparatus and method for producing glass product |
| 04/20/2011 | CN102019579A Glass substrate manufacturing method, glass substrate polishing method, glass substrate polishing apparatus and glass substrate |
| 04/20/2011 | CN102019578A Method for removing wafer from grinding head of chemical mechanical polishing equipment |
| 04/20/2011 | CN102019577A Optimization method of chemical mechanical polishing process |
| 04/20/2011 | CN102019576A Cambered surface grinding device |
| 04/20/2011 | CN101346805B Abrasive grain-free polishing liquid and CMP polishing method |
| 04/20/2011 | CN101195293B Pre-honed blade with a curved profile lamella and method for producing said blade |
| 04/19/2011 | US7927190 Retaining ring with shaped surface |
| 04/19/2011 | US7927187 Method of polishing a target surface |
| 04/19/2011 | US7927186 Method for producing glass substrate for magnetic disk |
| 04/19/2011 | US7927184 Method and system for endpoint detection |
| 04/19/2011 | US7927183 Polishing pad |
| 04/19/2011 | US7927182 Polishing system with in-line and in-situ metrology |
| 04/19/2011 | CA2467806C Method for polishing a substrate surface |
| 04/14/2011 | WO2011043567A2 Wafer-supporting member, method for manufacturing same, and wafer-polishing unit comprising same |
| 04/14/2011 | WO2011042017A1 Recycling method and device for recycling waste water containing slurry from a semi-conductor treatment process, in particular from a chemico-mechanical polishing process |
| 04/14/2011 | US20110086753 Method and System for Polishing Float Glass |
| 04/14/2011 | US20110086584 Glass Setting Plate For Glass Polishing System |
| 04/14/2011 | US20110086580 Wafer back side grinding process |
| 04/14/2011 | DE102009047926A1 Verfahren zum Polieren von Halbleiterscheiben A method of polishing semiconductor wafers |
| 04/13/2011 | CN1845007B Substrate and a method for polishing a substrate |
| 04/13/2011 | CN102017091A Polishing agent and method for polishing substrate using the polishing agent |
| 04/13/2011 | CN102015812A Polyurethane foam and polishing pad |
| 04/13/2011 | CN102015207A Apparatus and method for polishing semi-conductor dice |
| 04/13/2011 | CN102009385A Chemical mechanical polishing method for semiconductor wafer |
| 04/13/2011 | CN102009384A Grinding head device for chemically mechanical polishing equipment |
| 04/13/2011 | CN102009383A Chemical machinery grinding equipment and grinding method |
| 04/13/2011 | CN102009382A Grinder |
| 04/13/2011 | CN101612719B Polishing apparatus and polishing method |
| 04/13/2011 | CN101410955B Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical poli |
| 04/13/2011 | CN101223006B Double side polishing method for wafer |
| 04/13/2011 | CN101153838B Method of determining the number of active diamonds on a conditioning disk |
| 04/13/2011 | CN101137740B Lubricant composition for bonded-abrasive polishing of magnetic head |
| 04/13/2011 | CN101015907B Grinding device for controlling grinding thickness |
| 04/12/2011 | US7923178 Glass substrate for mask blank and method of polishing for producing the same |
| 04/12/2011 | US7922783 Polishing pad and production method thereof |
| 04/12/2011 | US7922562 Systems and methods for reducing electrostatic charge of semiconductor wafers |
| 04/07/2011 | WO2011040296A1 Method for grinding green ball, method for manufacturing ceramic ball, and grinding device |
| 04/07/2011 | US20110081841 Wafer support member, method for manufacturing the same and wafer polishing unit comprising the same |
| 04/07/2011 | US20110081840 Method for polishing semiconductor wafers |
| 04/07/2011 | US20110081832 Polishing device and polishing method |
| 04/07/2011 | US20110081829 Polishing endpoint detection method and polishing endpoint detection apparatus |
| 04/06/2011 | EP2303506A1 Apparatus and method for polishing semi-conductor dice |
| 04/06/2011 | EP1417703B1 Chemical mechanical polishing pad having holes and/or grooves |
| 04/06/2011 | EP1323187B1 Method for cleaning the surface of a substrate |
| 04/06/2011 | CN201783872U Double-faced grinding and polishing machine |
| 04/06/2011 | CN1986717B Polishing composition for hard disk substrate |
| 04/06/2011 | CN102007577A Polishing liquid for cmp and polishing method |
| 04/06/2011 | CN102001044A System and method for supplying grinding fluid by chemically mechanical polishing (CMP) |
| 04/06/2011 | CN102001036A Polishing apparatus |
| 04/06/2011 | CN102001035A Chemical mechanical polishing system |
| 04/06/2011 | CN101496143B Polishing composition |
| 04/06/2011 | CN101432854B Polishing liquid for CMP and method of polishing |
| 04/06/2011 | CN101402187B Polishing pad |