Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
10/2003
10/22/2003EP0792517B1 Electrical contact structures from flexible wire
10/22/2003CN2582330Y High power micro-wave plasma torch
10/22/2003CN2582329Y Jetting type micro-wave plasma generator
10/22/2003CN1451172A Use of pulsed votage in a plasma reactor
10/22/2003CN1450847A Plasma process apparatus and method
10/22/2003CN1450846A Method and device for producing single particle nano beam
10/22/2003CN1124871C Method and apparatus for purifying harmful gas by laser and electronic beam irradiation
10/21/2003US6635997 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
10/21/2003US6635996 Plasma generating apparatus, plasma generating method and gas processing method by plasma reaction
10/21/2003US6635578 Method of operating a dual chamber reactor with neutral density decoupled from ion density
10/21/2003US6635307 Anti-reflection layer, light- absorbing and charge-generating active layer, window or buffer layer, and/or electrode layer in a thin-film solar cell.
10/21/2003US6635228 Reactor including inner electrode having outer surface, outer electrode having inner surface, liquid dielectric configured to flow as film over outer surface of inner electrode and inner surface of outer electrode, preventing arcing
10/21/2003US6635117 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system
10/21/2003CA2277394C Plasma jet chemical vapor deposition system having a plurality of distribution heads
10/16/2003WO2003086032A1 Ecr plasma source and ecr plasma device
10/16/2003WO2003086031A1 An atmospheric pressure plasma assembly
10/16/2003WO2003086030A1 Protective coating composition
10/16/2003WO2003086029A1 Gel and powder making
10/16/2003WO2003085718A1 Plasma processing system
10/16/2003WO2003085715A1 Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system
10/16/2003WO2003085693A1 An atmospheric pressure plasma assembly
10/16/2003WO2003084883A1 Vitrification furnace and method with dual heating means
10/16/2003WO2003084688A2 Method and system for providing a thin film
10/16/2003WO2003049139A9 Electron source
10/16/2003US20030194055 Laser plasma generation method and structure thereof
10/16/2003US20030193319 Ion powered platform
10/16/2003US20030192864 Plasma processing apparatus and method
10/16/2003US20030192857 Method of etching and apparatus for doing same
10/16/2003US20030192644 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
10/16/2003DE20220514U1 Power supply device for plasma burner has smoothing stage with at least two power circuits with clocked power switches and associated smoothing devices
10/16/2003DE10231037C1 Making synthetic quartz glass blank by plasma-assisted deposition, for optical fiber manufacture, employs burner to focus flow towards plasma zone
10/16/2003CA2481715A1 An atmospheric pressure plasma assembly
10/15/2003EP1352417A2 Device for the plasma-mediated working of surfaces on planar substrates
10/15/2003EP1036214B1 Mixed frequency cvd process and apparatus
10/15/2003EP0829184B1 Microwave-driven plasma spraying apparatus and method for spraying
10/15/2003CN1449572A 转换的均匀性控制 Conversion of uniformity control
10/14/2003USRE38273 Baseband RF voltage-current probe
10/14/2003US6633132 Plasma gereration apparatus and method
10/14/2003US6633017 System for plasma ignition by fast voltage rise
10/14/2003US6632726 Film formation method and film formation apparatus
10/14/2003US6632369 Molten salt collector for plasma separations
10/14/2003US6632324 System for the plasma treatment of large area substrates
10/14/2003US6632322 Switched uniformity control
10/09/2003WO2003084294A1 Atmospheric plasma surface treatment method and device for same
10/09/2003WO2003083923A1 Plasma processing device and baffle plate thereof
10/09/2003WO2003083893A1 Device for confinement of a plasma within a volume
10/09/2003WO2003083163A1 Surface treatment system and method thereof
10/09/2003WO2003083160A2 Evaluation of chamber components having textured coatings chamber components
10/09/2003WO2003043134A3 Tamper resistant pin connection
10/09/2003WO2003031931A3 Method and apparatus to produce ions and nanodrops from taylor cones of volatile liquids at reduced pressures
10/08/2003EP1351273A1 Band gap plasma mass filter
10/08/2003EP1350260A1 Plasma processing apparatus
10/08/2003EP0781618B1 Highly efficient processing method based on high density radical reaction and using rotary electrode, apparatus therefor and rotating electrode used therefor
10/08/2003CN1447398A Phasma processing appts. able to evaluating artificial performance
10/08/2003CN1447346A Earthing cable and semiconductor mfg. equipment using such cable
10/07/2003US6630792 High frequency power source, plasma processing apparatus, inspection method for plasma processing apparatus, and plasma processing method
10/07/2003US6630113 Methods and apparatus for treating waste
10/02/2003WO2003081965A1 Plasma electron-emitting source
10/02/2003WO2003081656A1 Method of plasma etching
10/02/2003WO2003081654A1 On-wafer monitoring system
10/02/2003WO2003081650A1 Plasma processing device and production method of thin-film forming substrate
10/02/2003WO2003080255A1 Nozzle for thermal spray of low oxide content coatings
10/02/2003US20030185983 Particles are exposed in location-selective manner to external adjustment forces and/or plasma conditions are subjected to location-selective change to apply particles onto a substrate surface mask-free and/ or subject it to plasma treatment
10/02/2003US20030185982 Method and device for treating surfaces using a glow discharge plasma
10/02/2003US20030185965 Evaluating textured coating on structure by: directing a beam of electrons onto surface grains of textured coating causing electrons to be backscattered, detecting backscattered electrons and generating a signal image, evaluating signal
10/02/2003US20030185729 Electrode assembly for processing a semiconductor substrate and processing apparatus having the same
10/02/2003US20030184235 Plasma producing apparatus and doping apparatus
10/02/2003US20030183906 Grounding cable and semiconductor manufacturing apparatus using the same
10/02/2003US20030183787 EUV radiation source
10/02/2003US20030183599 High selective ratio and high and uniform plasma processing method and system
10/02/2003US20030183567 For tuning an a.c. voltage component of the electric field, in crossed electric and magnetic fields
10/02/2003US20030183170 Plasma processing apparatus
10/02/2003US20030183169 Internal electrode type plasma processing apparatus and plasma processing method
10/02/2003CA2479811A1 Nozzle for thermal spray of low oxide content coatings
10/01/2003EP1349439A1 Method and device for glass lamp sealing
10/01/2003EP1349196A2 Plasma etching method and apparatus for manufacturing a semiconductor device
10/01/2003EP1348228A1 Ion source
10/01/2003EP1348041A1 Plasma electroplating
10/01/2003EP0914292B1 Conversion of hydrocarbons assisted by gliding electric arcs
10/01/2003EP0892983B1 Gas discharge device
10/01/2003EP0724652B1 Method and apparatus for sputtering magnetic target materials
10/01/2003CN1446121A Over-unity production of clean new energies by recycling contaminated liquid waste
10/01/2003CN1445827A Electric liquid processing device
09/2003
09/30/2003US6628740 Controlled fusion in a field reversed configuration and direct energy conversion
09/30/2003US6628084 Method and apparatus for the excitation of a plasma
09/30/2003US6627464 Adaptive plasma characterization system
09/30/2003US6627039 Plasma processing methods and apparatus
09/25/2003WO2003079404A2 An improved substrate holder for plasma processing
09/25/2003WO2003079397A1 Vacuum plasma generator
09/25/2003WO2003078692A1 Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method
09/25/2003US20030180421 Applying plasma to liquid; destroying microorganisms with electricity
09/25/2003US20030180199 Plasma reactor, production method thereof, and emission control apparatus of a vehicle
09/25/2003US20030178511 High efficiency nozzle for thermal spray of high quality, low oxide content coatings
09/25/2003US20030178390 System and method for enhanced monitoring of an etch process
09/25/2003US20030178140 Plasma processing apparatus capable of evaluating process performance
09/25/2003DE10219197C1 Assembly to prepare metal wire surface for coating has electrode within dielectric shrouding, connected to AC HV generator to produce discharge for removing any grease residue
09/25/2003DE10163475C1 Verfahren und Vorrichtung zur Behandlung oder Umwandlung von gasförmigen Brennstoffen Method and device for the treatment or conversion of gaseous fuels
09/24/2003EP1347673A1 Plasma generating apparatus using microwave
09/24/2003EP1347476A2 Ceramic electronic device and method of production of same
09/24/2003EP1346394A1 Electrode for plasma processes and method for manufacture and use thereof