| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 01/28/2004 | EP1384395A1 Production of nanocrystal beams |
| 01/28/2004 | EP1384394A1 Method and device for the generation of far ultraviolet or soft x-ray radiation |
| 01/28/2004 | CN1471800A Atmospheric plasma method for treating electricity conducting materials and device therefor |
| 01/27/2004 | US6683272 Plasma source for spectrometry |
| 01/27/2004 | US6682630 Uniform gas distribution in large area plasma source |
| 01/27/2004 | US6682343 Substrate processing apparatus |
| 01/22/2004 | WO2004008816A2 Method and device for substrate etching with very high power inductively coupled plasma |
| 01/22/2004 | WO2004008502A2 Multirate processing for metrology of plasma rf source |
| 01/22/2004 | WO2004008478A2 Cathode for vacuum sputtering treatment machine |
| 01/22/2004 | WO2004008477A2 Heating jacket for plasma etching reactor, and etching method using same |
| 01/22/2004 | WO2004007066A1 Non-thermal disinfection of biological fluids using non-thermal plasma |
| 01/22/2004 | US20040012320 Process for structural modification of surfaces by treatment with an atomic or molecular gaseous medium excited to metastable level |
| 01/22/2004 | US20040012319 Rf loaded line type capacitive plasma source for broad range of operating gas pressure |
| 01/22/2004 | US20040011771 Tip for a plasma arc torch |
| 01/22/2004 | US20040011764 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/22/2004 | US20040011466 Plasma processing apparatus |
| 01/22/2004 | US20040011465 Plasma Processing apparatus |
| 01/22/2004 | US20040011291 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained |
| 01/22/2004 | DE10228506A1 Verfahren und Vorrichtung zum Modifizieren von Oberflächen durch dielektrisch behinderte Entladung unter Atmosphärendruck Method and apparatus for modifying surfaces by dielectric barrier discharge at atmospheric pressure |
| 01/21/2004 | EP1383359A2 Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
| 01/21/2004 | EP1257376B1 Plasma arc reactor for the production of fine powders |
| 01/21/2004 | EP0692138B1 Reactive dc sputtering system |
| 01/21/2004 | CN1470152A Device for producing a plasma, ionisation method, use of said method and production processes using said device |
| 01/21/2004 | CN1468892A Dielectric coated pole, plasma discharge processing apparatus and thin-film forming method |
| 01/21/2004 | CN1135910C Method and apparatus for trigger-igniting CVD plasma |
| 01/20/2004 | US6680480 Laser accelerator produced colliding ion beams fusion device |
| 01/20/2004 | CA2311088C Plasma spraying apparatus |
| 01/15/2004 | WO2004006320A1 Plasma processing apparatus |
| 01/15/2004 | WO2004006319A1 Plasma processing equipment |
| 01/15/2004 | WO2004006298A2 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 01/15/2004 | WO2004006285A1 Method and apparatus for non-invasive measurement and analysis of plasma parameters |
| 01/15/2004 | WO2004006284A1 Method and apparatus for non-invasive measurement and analys of semiconductor plasma parameters |
| 01/15/2004 | WO2004005206A1 Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method |
| 01/15/2004 | WO2003056601A3 Apparatus and method for treating a workpiece using plasma generated from microwave radiation |
| 01/15/2004 | WO2003026364A8 Plasma processor coil |
| 01/15/2004 | US20040008336 Method and system of determining chamber seasoning condition by optical emission |
| 01/15/2004 | US20040007985 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/15/2004 | US20040007984 Multirate processing for metrology of plasma rf source |
| 01/15/2004 | US20040007983 Stabilized oscillator circuit for plasma density measurement |
| 01/15/2004 | US20040007182 Plasma processing apparatus |
| 01/14/2004 | EP1381257A2 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| 01/14/2004 | CN1468441A Gas distribution apparatus for semiconductor processing |
| 01/14/2004 | CN1468440A System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 01/14/2004 | CN1468154A Method and apparatus for forming a coating |
| 01/14/2004 | CN1468044A Normal atmosphere plasma producer |
| 01/14/2004 | CN1467302A Layer formation method, and substrate with a layer formed by the method |
| 01/14/2004 | CN1135061C Electron current speeding up method and equipment |
| 01/13/2004 | US6677828 Method of hot switching a plasma tuner |
| 01/13/2004 | US6677711 Plasma processor method and apparatus |
| 01/13/2004 | US6677648 Device having a silicon oxide film containing krypton |
| 01/13/2004 | US6677600 EUV radiation source |
| 01/13/2004 | US6677551 Process for operating a plasma arc torch |
| 01/13/2004 | US6677550 Plasma nozzle |
| 01/13/2004 | US6676804 Method and apparatus for plasma processing |
| 01/13/2004 | US6676802 Remote exposure of workpieces using a plasma |
| 01/13/2004 | US6675737 Plasma processing apparatus |
| 01/08/2004 | WO2004003964A2 Discharge radiation source, in particular uv radiation |
| 01/08/2004 | WO2004003963A2 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/08/2004 | WO2004003962A2 Thermal sprayed yttria-containing coating for plasma reactor |
| 01/08/2004 | WO2004002882A1 Device and method for the production of chlorotrifluoride and system for etching semiconductor substrates using said device |
| 01/08/2004 | US20040004797 Spark management method and device |
| 01/08/2004 | US20040004708 Method and system for data handling, storage and manipulation |
| 01/08/2004 | US20040004440 Electrostatic fluid accelerator for and a method of controlling fluid flow |
| 01/08/2004 | US20040004062 Plasma-assisted joining |
| 01/08/2004 | US20040003897 Plasma stabilization method and plasma apparatus |
| 01/08/2004 | US20040003896 Controller for plasma processing apparatus performing good etching process |
| 01/08/2004 | DE20316631U1 Plasma generation arrangement has hollow conductor into which microwaves are supplied and has tube with ring groove provided in conductor through which gas for plasma generation is conducted |
| 01/07/2004 | EP1378000A2 Conductive collar surrounding semiconductor workpiece in plasma chamber |
| 01/07/2004 | EP1377999A1 Inductively coupled plasma source with controllable power distribution |
| 01/07/2004 | EP1326718B1 Method and apparatus for forming a coating |
| 01/07/2004 | CN1466771A An atmospheric pressure plasma assembly |
| 01/07/2004 | CN1465737A Integrated melting-spraying equipment and technology |
| 01/06/2004 | US6673322 Apparatus flows liquid over electric arc produced by nonconsumable tungsten and consumable carbon electrodes; atomic constituents of liquid and carbon electrode become magentically polarized clusters |
| 01/06/2004 | US6673197 Chemical plasma cathode |
| 01/06/2004 | US6673196 Plasma processing apparatus |
| 01/02/2004 | EP1377138A1 Device and control method for micro wave plasma processing |
| 01/02/2004 | EP1376670A1 Plasma processing device |
| 01/02/2004 | EP1376669A1 Plasma processing device |
| 01/02/2004 | EP1376668A1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 01/02/2004 | EP1375851A1 Plasma reactor, method for manufacturing the same and installation for treating exhaust gas of combustion engines |
| 01/02/2004 | EP1375628A2 Methods and apparatus for treating waste |
| 01/02/2004 | EP1374650A1 Method and device for producing extreme ultraviolet radiation and soft x-radiation |
| 01/02/2004 | EP1374277A1 Inductive plasma processor including current sensor for plasma excitation coil |
| 01/02/2004 | EP1374276A2 Plasma surface treatment method and device for carrying out said method |
| 01/02/2004 | EP1372897A2 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
| 01/01/2004 | US20040002221 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 01/01/2004 | US20040001295 Plasma generation and processing with multiple radiation sources |
| 01/01/2004 | US20040000875 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/01/2004 | US20040000538 Plasma arc torch tip |
| 01/01/2004 | US20040000476 Catalytic exhaust system for automobile; denitrification |
| 01/01/2004 | US20040000475 Plasma reactor having regions of active and passive electric field |
| 12/31/2003 | WO2004002201A1 A plasma beam generator |
| 12/31/2003 | WO2004001831A1 Magnetron plasma processing apparatus |
| 12/31/2003 | WO2004001822A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 12/31/2003 | WO2004001790A1 Dielectric barrier discharge apparatus and process for treating a substrate |
| 12/31/2003 | CN1132962C Deposited film forming system and method thereof |
| 12/30/2003 | US6670766 Plasma treatment apparatus and plasma treatment method |
| 12/30/2003 | US6670741 Plasma processing apparatus with annular waveguide |
| 12/30/2003 | US6670726 Method and apparatus for cleaning harmful gas by irradiation with gas laser and electron beams |
| 12/30/2003 | US6670572 Solenoid control and safety circuit system and method |