Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
12/2003
12/30/2003US6669823 Process for preparing nanostructured materials of controlled surface chemistry
12/30/2003US6669812 Apparatus and method for fabricating semiconductor device
12/30/2003US6669811 Linear drive system for use in a plasma processing system
12/30/2003US6669810 Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
12/30/2003US6669106 Axial feedstock injector with single splitting arm
12/25/2003WO2003107382A2 Plasma method and apparatus for processing a substrate
12/25/2003US20030235694 Method for the excitation of a plasma and a use of the method
12/25/2003US20030234618 Method of and apparatus for electrostatic fluid acceleration control of a fluid flow
12/25/2003US20030234617 Controlled fusion in a field reversed configuration and direct energy conversion
12/24/2003WO2003107384A1 Stabilization of electronegative plasmas with feedback control of rf generator systems
12/24/2003WO2003106729A2 Method of making automotive trim with chromium inclusive coating thereon, and corresponding automotive trim product
12/24/2003WO2003106094A1 Radial pulsed arc discharge gun for synthesizing nanopowders
12/24/2003WO2003106016A1 Process for preparing nanostructured materials of controlled surface chemistry
12/24/2003WO2003096765A3 Apparatus and methods for minimizing arcing in a plasma processing chamber
12/24/2003WO2003079404A3 An improved substrate holder for plasma processing
12/24/2003WO2003071577A3 Channel spark source for generating a stable, focussed electron beam
12/24/2003WO2003012821A3 Method and apparatus for producing uniform process rates
12/24/2003CN1132233C Plasma processing method and appts.
12/24/2003CN1131892C 静电屏蔽的射频室冷却系统和方法 RF chamber cooling system and method for electrostatic shielding
12/23/2003US6667484 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
12/23/2003US6667460 Inner torch
12/23/2003US6667459 Configurable nozzle baffle apparatus and method
12/23/2003US6667240 Method and apparatus for forming deposited film
12/23/2003CA2116821C Improvements in plasma mass spectrometry
12/18/2003WO2003105544A1 Plasma processing device
12/18/2003WO2003087867A3 Extreme ultraviolet light source
12/18/2003WO2003063914A3 Sterilization and decontamination system using a plasma discharge and a filter
12/18/2003US20030232214 Vaporizing chromium hexacaronyl then introducing chromium formed into vapor deposition apparatus; comprises chromium metal-/oxide-/nitride-/ and/or carbide- layer
12/18/2003US20030232151 Supplying high density gases in semiconductor wafer apparatus while maintaining low intensity magnetism at substrates; power sources
12/18/2003US20030232136 Layer formation method, and substrate with a layer formed by the method
12/18/2003US20030231992 Process for preparing nanostructured materials of controlled surface chemistry
12/18/2003US20030231731 Method of controlling temperature of nonthermal nuclear fusion fuel in nonthermal nuclear fusion reaction generating method
12/18/2003US20030230961 Closed drift ion source
12/18/2003US20030230554 Radial pulsed arc discharge gun for synthesizing nanopowders
12/18/2003US20030230479 Process for preparing nanostructured materials of controlled surface chemistry
12/18/2003US20030230386 Magnetic neutral line discharge plasma processing system
12/18/2003US20030230241 carbon nano tube is used for cathode electrode of plasma producing apparatus, typically, a doping apparatus, etching apparatus, and film forming apparatus; for producing stable plasma of high density
12/18/2003US20030230240 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field
12/17/2003EP1371905A1 Assembled cathode and plasma igniter with such cathode
12/17/2003EP1371752A2 Layer formation method, and substrate with a layer formed by the method
12/17/2003EP1371271A1 Plasma installation and method for producing a functional coating
12/17/2003EP1371270A2 Controlled fusion in a field reversed configuration and direct energy conversion
12/17/2003EP0894332B8 Use of a connecting process and connecting process
12/17/2003CN1462500A Electrodynamic field generator
12/17/2003CN1131661C Arc transfer circuit
12/16/2003US6665371 Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method
12/16/2003US6664741 Method of and apparatus for electrostatic fluid acceleration control of a fluid flow
12/16/2003US6664740 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
12/16/2003US6664737 Dielectric barrier discharge apparatus and process for treating a substrate
12/16/2003US6664497 Plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding for dissociation gases
12/16/2003US6664496 Plasma processing system
12/16/2003US6663973 Polysiloxane with a fluoroaromatic silanediol monomer
12/16/2003US6663748 Method of forming a thin film
12/16/2003US6663715 Plasma CVD apparatus for large area CVD film
12/11/2003WO2003103017A2 Method and system of determining chamber seasoning condition by optical emission
12/11/2003WO2003103004A2 A cathode pedestal for a plasma etch reactor
12/11/2003WO2003103003A1 Device for production of a plasma sheet
12/11/2003WO2003102724A2 Method and system for data handling, storage and manipulation
12/11/2003WO2003102397A1 Low current plasmatron fuel converter having enlarged volume discharges
12/11/2003WO2003025971A3 Plasma processing apparatus with coil magnet system
12/11/2003WO2003007326A3 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
12/11/2003US20030228425 Electric arc heating; evaporation; collision of particle against substrate; suction transfer tubes
12/11/2003US20030228416 Plasma vapor deposition; supplying gas; high frequency voltage
12/11/2003US20030228413 Surface treatment method and optical part
12/11/2003US20030227283 Non-intrusive plasma probe
12/11/2003US20030227259 Simultaneous discharge apparatus
12/11/2003US20030226827 Method and apparatus for automatically re-igniting vacuum arc plasma source
12/10/2003EP1369898A2 Magnetic field generator for magnetron plasma
12/10/2003EP1369191A1 Plasma torch for heating molten steel
12/10/2003EP1369001A1 Method for plasma welding
12/10/2003EP1369000A2 Composite electrode for a plasma arc torch
12/10/2003EP1368506A1 Method for the production of a functional coating by means of a high-frequency icp plasma beam source
12/10/2003CN1461494A 等离子体处理装置及排气环 Plasma processing apparatus, and an exhaust ring
12/10/2003CN1461036A Ion source, operating method of ion source, and ion source system
12/10/2003CN1130441C Tunable, self-powered integrated arc plasma-melter vitrification system for waste treatment and resource recovery
12/09/2003US6661018 Shroud nozzle for gas jet control in an extreme ultraviolet light source
12/09/2003US6661012 X-ray detector
12/09/2003US6660177 Apparatus and method for reactive atom plasma processing for material deposition
12/09/2003US6660134 Feedthrough overlap coil
12/09/2003US6660127 Apparatus for plasma etching at a constant etch rate
12/04/2003WO2003101160A2 Method and apparatus for vhf plasma processing
12/04/2003WO2003100818A1 Capacitively coupled plasma reactor with magnetic plasma control
12/04/2003WO2003100817A1 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode
12/04/2003WO2003100125A1 Method and device for plasma treating workpieces
12/04/2003WO2003100124A1 Method and device for plasma treating workpieces
12/04/2003WO2003026364B1 Plasma processor coil
12/04/2003WO2003008323A3 Lifting and supporting device
12/04/2003WO2002078043A3 Beam processing apparatus
12/04/2003US20030223546 Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
12/04/2003US20030223543 Linear filament array sheet for EUV production
12/04/2003US20030223542 Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
12/04/2003US20030223541 Target steering system for EUV droplet generators
12/04/2003US20030222742 Magnetic field generator for magnetron plasma
12/04/2003US20030222586 Apparatus and method for forming a high pressure plasma discharge column
12/04/2003US20030221951 Two-electrode corona apparatus for plastic throttle body surface treatment
12/04/2003US20030221950 A plasma polymerizing system including at least one chamber is disclosed. After polymerizing a surface of a sheet by generating plasma of reactive gas in the chamber, mixed gas of oxygen and nitrogen is provided into the chamber for
12/04/2003US20030221949 Plasmatron fuel converter ("plasmatron") that efficiently uses electrical energy to produce hydrogen rich gas. The volume and shape of the plasma discharge is controlled by a fluid flow established in a plasma discharge volume. A plasmatron
12/04/2003US20030221781 Milling apparatus
12/04/2003US20030221622 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
12/04/2003DE19932630C2 Einheit für eine Plasma-Atomisierungsvorrichtung mit Plasma-Gaszuführeinrichtung, Probenzerstäubereinrichtung und Probeninjektionseinrichtung Unit for a plasma with plasma atomizing gas feeder Probenzerstäubereinrichtung and sample injection device