Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
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11/11/1987 | EP0244477A1 Fill and spill for charge input to a ccd |
11/11/1987 | CN87100967A Deep-zone pn-junction diode |
11/11/1987 | CN86101937A Resistor-oxide-semiconductor field-effect transistor |
11/10/1987 | US4706102 Memory device with interconnected polysilicon layers and method for making |
11/10/1987 | US4705759 High power MOSFET with low on-resistance and high breakdown voltage |
11/10/1987 | US4705599 Method for fabricating bipolar transistor in integrated circuit |
11/10/1987 | US4705358 Substrate for active matrix display |
11/10/1987 | US4705322 Protection of inductive load switching transistors from inductive surge created overvoltage conditions |
11/10/1987 | US4704786 Method of forming a lateral bipolar transistor in a groove |
11/10/1987 | US4704785 Process for making a buried conductor by fusing two wafers |
11/10/1987 | US4704784 Method of making thin film field effect transistors for a liquid crystal display device |
11/10/1987 | US4704783 Method for passivating the back channel of amorphous silicon field effect transistors |
11/05/1987 | WO1987006768A1 Semiconductor component for protection against overvoltages and overcurrents |
11/05/1987 | WO1987006767A1 Surface mountable diode |
11/05/1987 | WO1987006764A1 Process for manufacturing semiconductor devices |
11/04/1987 | EP0244367A2 Mos type integrated semiconductor device with nonuniform thickness of gate oxide and process for fabricating it |
11/04/1987 | EP0244366A2 Self-aligned process for fabricating small size DMOS cells and MOS devices obtained by means of said process |
11/04/1987 | EP0244304A1 Process for the selective dry-etchung of layers of III-V semiconductor materials, and transistor manufactured by this process |
11/04/1987 | EP0244299A1 P-i-n photodiode realized by using an amorphous semiconductor |
11/04/1987 | EP0244171A1 Bipolar transistor having an implanted extrinsic base region |
11/04/1987 | EP0244140A2 A semiconductor device with periodic structure |
11/04/1987 | EP0244081A1 Method for forming crystal and crystal article obtained by said method |
11/04/1987 | EP0243999A2 Fabrication process for EPROM cells with oxide-nitride-oxide dielectric |
11/04/1987 | EP0243988A1 Method of manufacturing a semiconductor device |
11/04/1987 | EP0243953A2 Compound semiconductor device |
11/04/1987 | EP0243684A1 Turn-off power semiconductor device and method of making the same |
11/04/1987 | EP0243622A2 Shallow junction complementary vertical bipolar transistor pair |
11/04/1987 | EP0243609A1 Complementary semiconductor device structure and its production |
11/03/1987 | USH368 Vertical gradient of electrical resistance |
11/03/1987 | US4704625 Capacitor with reduced voltage variability |
11/03/1987 | US4704623 Doping for low capacitance amorphous silicon field effect transistor |
11/03/1987 | US4704622 Negative transconductance device |
11/03/1987 | US4704302 Oxygen or nitrogen |
11/03/1987 | US4703552 Fabricating a CMOS transistor having low threshold voltages using self-aligned silicide polysilicon gates and silicide interconnect regions |
11/03/1987 | US4703551 Process for forming LDD MOS/CMOS structures |
11/03/1987 | CA1228935A1 Semiconductor device with polycrystalline silicon active region and method of fabrication thereof |
10/28/1987 | EP0243070A2 Semiconductor device of III-V compound |
10/28/1987 | EP0243024A2 Metallized semiconductor device including an interface layer |
10/28/1987 | EP0242933A1 Active matrix display without a parasitic transistor and method for its manufacture |
10/28/1987 | EP0242893A1 Method of manufacturing a semiconductor device |
10/28/1987 | EP0242748A1 Bipolar/Mos input circuit for photovoltaic detectors |
10/28/1987 | EP0242746A1 Method of making an integrated circuit |
10/28/1987 | EP0242652A2 Electron tuned quantum well device |
10/28/1987 | EP0242623A2 MOS semiconductor device and method of manufacturing the same |
10/28/1987 | EP0242540A1 Method and structure for reducing resistance in integrated circuits |
10/27/1987 | US4703336 Amorphous semiconductor film containing additive; defect reduction |
10/27/1987 | US4703196 High voltage precharging circuit |
10/27/1987 | US4702797 Forming region of first conductivity type with high concentration of impurity |
10/27/1987 | US4701998 Removal of damaged areas of silicon substrate by forming silicone dioxide; etching |
10/27/1987 | US4701996 Method for fabricating edge channel FET |
10/27/1987 | CA1228681A1 Method for the manufacture of gate electrodes formed of double layers of metal silicides having a high melting point and doped polycrystalline silicon |
10/27/1987 | CA1228680A1 Semiconductor device wiring including tunnelling layer |
10/27/1987 | CA1228679A1 Devices formed utilizing organic materials |
10/22/1987 | DE3710503A1 Semiconductor integrated circuit device |
10/21/1987 | EP0242291A1 Charge transfer shift register provided with a floating diode reading device |
10/21/1987 | EP0241991A2 Field effect transistor having a membrane overlying the gate insulator |
10/21/1987 | EP0241988A2 High mobility semiconductor devices |
10/21/1987 | EP0241948A1 Semiconductor memory and method for fabricating the same |
10/21/1987 | EP0241886A1 Multiplexer cell for photovoltaic detectors |
10/21/1987 | EP0241744A2 Liquid-phase epitaxial process, especially for manufacturing three-dimensional semiconductor structures |
10/21/1987 | EP0241699A2 Semiconductor memory device using junction short type programmable element |
10/21/1987 | EP0241662A2 Turn-off thyristor |
10/21/1987 | CN87102618A 半导体器件 Semiconductor devices |
10/20/1987 | US4701775 Buried n- channel implant for NMOS transistors |
10/20/1987 | US4701572 Amorphous solar cell |
10/20/1987 | US4701422 Method of adjusting threshold voltage subsequent to fabrication of transistor |
10/20/1987 | US4701349 Forming refractory silicide and nitride layers |
10/20/1987 | US4700879 Method for manufacturing semiconductor power modules with an insulated contruction |
10/20/1987 | US4700467 Process for grounding flat devices and integrated circuits |
10/20/1987 | US4700466 Contacting mirror polished surfaces, annealing |
10/20/1987 | US4700464 Method of forming trench isolation in an integrated circuit |
10/20/1987 | US4700462 For use in a semiconductor device |
10/20/1987 | US4700461 Process for making junction field-effect transistors |
10/20/1987 | US4700460 Switching high voltage direct, alternating current sources using a low voltage gate electrode |
10/20/1987 | US4700458 Method of manufacture thin film transistor |
10/20/1987 | US4700455 Doping, etching; self-aligned multiple electrodes |
10/20/1987 | CA1228426A1 Charge transfer device |
10/20/1987 | CA1228424A1 Semiconductor device |
10/15/1987 | DE3711033A1 MOSFET semiconductor device |
10/14/1987 | EP0241084A1 CCD input circuit |
10/14/1987 | EP0241059A2 Method for manufacturing a power mos transistor |
10/14/1987 | EP0240953A2 Compound semiconductor device |
10/14/1987 | EP0240807A1 Circuit arrangement for detecting an excess temperature in semiconductor power devices |
10/14/1987 | EP0240781A2 Method for manufacturing an edge masking of gate electrodes of MOS-transistors having low doped drain connection zones |
10/14/1987 | EP0240690A1 Thyristor having an adjustable base emitter resistor |
10/14/1987 | EP0240683A1 Fabrication of insulated gallium arsenide-gate FET with self-aligned source/drain and submicron channel length |
10/14/1987 | EP0240667A2 Processor |
10/14/1987 | EP0240567A1 Semiconductor device |
10/13/1987 | US4700215 Polycide electrodes for integrated circuits |
10/13/1987 | US4700213 Multi-drain enhancement JFET logic (SITL) with complementary MOSFET load |
10/13/1987 | US4700212 Semiconductor integrated circuit device of high degree of integration |
10/13/1987 | US4699690 Method of producing semiconductor memory device |
10/13/1987 | US4698900 Method of making a non-volatile memory having dielectric filled trenches |
10/13/1987 | US4698899 Field effect transistor |
10/13/1987 | CA1228180A1 Method of making a high performance small area, thin film transistor |
10/13/1987 | CA1228178A1 Cmos integrated circuit technology |
10/13/1987 | CA1228177A1 Integrated semiconductor structure |
10/08/1987 | WO1987006061A1 A process for the manufacture of iii-v semiconductor devices |
10/07/1987 | EP0240436A1 DC voltage multiplier which can be integrated into a semiconductor structure |
10/07/1987 | EP0240435A1 Resistor integrated on a semiconductor substrate |