Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
---|
08/18/1998 | US5796166 Tasin oxygen diffusion barrier in multilayer structures |
08/18/1998 | US5796157 High-frequency lateral PNP transistor |
08/18/1998 | US5796156 High-voltage semiconductor device with integrated edge structure and associated manufacturing process |
08/18/1998 | US5796151 Prevents deterioration of sheet resistance of tungsten layer |
08/18/1998 | US5796149 Semiconductor memory using different concentration impurity diffused layers |
08/18/1998 | US5796146 Semiconductor device having a lateral insulated gate biopolar transistor |
08/18/1998 | US5796145 Semiconductor device composed of MOSFET having threshold voltage control section |
08/18/1998 | US5796143 Trench transistor in combination with trench array |
08/18/1998 | US5796142 SOI compact contactless flash memory cell |
08/18/1998 | US5796140 Nonvolatile semiconductor memory device and a method of making the same |
08/18/1998 | US5796139 Semiconductor device |
08/18/1998 | US5796133 Semiconductor device capacitor having lower electrodes separated by low dielectric spacer material |
08/18/1998 | US5796132 Semiconductor device |
08/18/1998 | US5796131 Metal semiconductor field effect transistor (MESFET) device with single layer integrated metal |
08/18/1998 | US5796127 High electron mobility transistor |
08/18/1998 | US5796126 Hybrid schottky injection field effect transistor |
08/18/1998 | US5796125 High breakdown voltage semiconductor device using trench grooves |
08/18/1998 | US5796124 MOS gate controlled thyristor |
08/18/1998 | US5796123 Semiconductor component mounted by brazing |
08/18/1998 | US5796121 Thin film transistors fabricated on plastic substrates |
08/18/1998 | US5796119 Silicon resonant tunneling |
08/18/1998 | US5796116 Thin-film semiconductor device including a semiconductor film with high field-effect mobility |
08/18/1998 | US5795821 Process for improving the interface union among dielectric materials in an integrated circuit manufacture |
08/18/1998 | US5795817 MOS transistor adopting titanium-carbon-nitride gate electrode and manufacturing method thereof |
08/18/1998 | US5795816 Method of fabricating semiconductor device |
08/18/1998 | US5795808 Method for forming shallow junction for semiconductor device |
08/18/1998 | US5795801 MethodS of fabricating profiled device wells for improved device isolation |
08/18/1998 | US5795800 Integrated circuit fabrication method with buried oxide isolation |
08/18/1998 | US5795795 Method of processing semiconductor device with laser |
08/18/1998 | US5795793 Process for manufacture of MOS gated device with reduced mask count |
08/18/1998 | US5795792 Method of manufacturing a semiconductor device having a trench structure |
08/18/1998 | US5795458 Manufacturing method of thin film diode for liquid crystal display device |
08/18/1998 | CA2116382C Micromechanical accelerometer and method for the production thereof |
08/13/1998 | WO1998035390A1 Structure for increasing the maximum voltage of silicon carbide power transistors |
08/13/1998 | WO1998035389A1 Silicon carbide power mesfet |
08/13/1998 | WO1998035388A1 Aluminium gallium nitride (algan) based heterojunction bipolar transistor |
08/13/1998 | WO1998035384A1 Oxide layer for a horizontal semiconductor part |
08/13/1998 | WO1998035380A1 A method of fabricating cmos devices with ultra-shallow junctions and reduced drain area |
08/13/1998 | WO1998035378A1 Manufacturing a heterobipolar transistor and a laser diode on the same substrate |
08/13/1998 | WO1998035344A2 A nonvolatile memory structure |
08/13/1998 | CA2280024A1 Manufacturing a heterobipolar transistor and a laser diode on the same substrate |
08/12/1998 | EP0858113A1 Semiconductor device |
08/12/1998 | EP0857943A2 Method for measuring epitaxial film thickness of multilayer epitaxial wafer |
08/12/1998 | EP0857358A1 A wide bandgap semiconductor device having a heterojunction |
08/12/1998 | EP0857354A1 A process for fabricating semiconductor devices with shallowly doped regions using dopant compounds containing elements of high solid solubility |
08/12/1998 | EP0737365B1 Three-terminal gate-controlled semiconductor switching device with rectifying-gate |
08/12/1998 | CN1190266A Transistor with composite structure and its manufacture |
08/12/1998 | CN1190264A 半导体集成电路器件 The semiconductor integrated circuit device |
08/11/1998 | US5793678 Parellel type nonvolatile semiconductor memory device method of using the same |
08/11/1998 | US5793675 Method of evaluating the gate oxide of non-volatile EPROM, EEPROM and flash-EEPROM memories |
08/11/1998 | US5793673 Double polysilicon EEPROM cell and corresponding manufacturing process and programming method |
08/11/1998 | US5793452 Display device with jig and cooling means |
08/11/1998 | US5793117 Semiconductor device and method of fabricating the same |
08/11/1998 | US5793114 Self-aligned method for forming contact with zero offset to gate |
08/11/1998 | US5793110 Semiconductor device |
08/11/1998 | US5793109 Structure of ohmic electrode for semiconductor by atomic layer doping |
08/11/1998 | US5793099 Semiconductor device |
08/11/1998 | US5793090 Integrated circuit having multiple LDD and/or source/drain implant steps to enhance circuit performance |
08/11/1998 | US5793089 Integrated circuit |
08/11/1998 | US5793088 Structure for controlling threshold voltage of MOSFET |
08/11/1998 | US5793084 Transistor for providing protection from electrostatic discharge |
08/11/1998 | US5793083 Method for designing shallow junction, salicided NMOS transistors with decreased electrostatic discharge sensitivity |
08/11/1998 | US5793082 Self-aligned gate sidewall spacer in a corrugated FET |
08/11/1998 | US5793080 Nonvolatile memory device |
08/11/1998 | US5793078 Non-volatile semiconductor memory device and method of fabricating thereof |
08/11/1998 | US5793074 Metal oxide semiconductor capacitors having uniform C-V characteristics over an operating range and reduced susceptibility to insulator breakdown |
08/11/1998 | US5793072 Non-photosensitive, vertically redundant 2-channel α-Si:H thin film transistor |
08/11/1998 | US5793070 Reduction of trapping effects in charge transfer devices |
08/11/1998 | US5793066 Base resistance controlled thyristor structure with high-density layout for increased current capacity |
08/11/1998 | US5793065 Insulated-gate thyristor |
08/11/1998 | US5793064 Bidirectional lateral insulated gate bipolar transistor |
08/11/1998 | US5793063 High voltage, vertical-trench semiconductor device |
08/11/1998 | US5793058 Multi-gate offset source and drain field effect transistors and methods of operating same |
08/11/1998 | US5793057 Conductive amorphous-nitride barrier layer for high dielectric-constant material electrodes |
08/11/1998 | US5793055 Hybrid electronic devices, particularly Josephson transistors |
08/11/1998 | US5792699 Method for reduction of reverse short channel effect in MOSFET |
08/11/1998 | US5792696 Nonvolatile memory device and manufacturing method thereof |
08/11/1998 | US5792695 Connecting two-layer electrode wiring film containing silicide and polysilicon(thick) films with impurity diffusing area while keeping contact resistance uniformly low, for electrically programmable read only memory computers |
08/11/1998 | US5792694 Method for fabricating a semiconductor memory cell structure |
08/11/1998 | US5792679 Implanting mobility enhancing species into first region of low mobility semiconductor material, selectively oxidizing |
08/11/1998 | US5792671 Method of manufacturing semiconductor device |
08/11/1998 | US5792670 Method of manufacturing double polysilicon EEPROM cell and access transistor |
08/11/1998 | CA2090096C Semiconductor device having polysilicon thin-film |
08/06/1998 | WO1998034283A1 Silicon carbide static induction transistor and method for manufacturing same |
08/06/1998 | WO1998034282A1 Asymmetrical thyristor |
08/06/1998 | WO1998034280A1 Charge dissipation field emission device |
08/06/1998 | WO1998034274A1 Self-aligned process for fabricating a passivating ledge in a heterojunction bipolar transistor |
08/06/1998 | WO1998034268A2 Fabrication method for reduced-dimension integrated circuits |
08/06/1998 | WO1998034233A1 A scalable flash eeprom memory cell, method of manufacturing and operation thereof |
08/06/1998 | WO1998034089A1 Pressure sensor component with tubing connection |
08/06/1998 | CA2228605A1 Method for measuring epitaxial film thickness of multilayer epitaxial wafer |
08/05/1998 | EP0856893A2 Structure and device for selecting design options in an integrated circuit |
08/05/1998 | EP0856892A2 MOSFET and manufacturing method thereof |
08/05/1998 | EP0856891A2 Semiconductor integrated circuit device |
08/05/1998 | EP0856886A1 Process for forming an edge structure to seal integrated electronic devices, and corresponding device |
08/05/1998 | EP0856877A1 Process for forming integrated circuits using multistep plasma etching |
08/05/1998 | EP0856200A1 Field controlled dipole transistor |
08/05/1998 | EP0856143A2 Process for producing a speed of rotation coriolis sensor |
08/05/1998 | EP0677207B1 Single crystal silicon on quartz |
08/05/1998 | CN1189922A Photodetector involving a mosfet having a floating gate |