Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
05/2002
05/16/2002US20020056870 Flash EEPROM cell and method of manufacturing the same
05/16/2002US20020056859 Field effect transistor with reduced gate delay and method of fabricating the same
05/16/2002US20020056839 Method of crystallizing a silicon thin film and semiconductor device fabricated thereby
05/16/2002US20020056838 Thin film transistor array, method of producing the same, and display panel using the same
05/16/2002US20020056837 Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same
05/16/2002US20020056699 Method for eliminating surface roughness in metal lines
05/16/2002DE10129289A1 Halbleitervorrichtung mit einer Diode für eine Eingangschutzschaltung einer MOS-Vorrichtung und Verfahren zu deren Herstellung A semiconductor device comprising a diode for input protection circuit of a MOS device and process for their preparation
05/16/2002DE10124413A1 Halbleiter-Vorrichtung und Verfahren zur Herstellung derselben A semiconductor device and method of manufacturing the same
05/16/2002DE10055081A1 Micro-component used as a sensor element comprises a glass body provided with an electrically conducting coating on its side facing a microstructure
05/16/2002DE10054172A1 Halbleiter-Speicherzelle und Verfahren zu deren Herstellung A semiconductor memory cell and process for their preparation
05/16/2002DE10054109A1 Verfahren zum Bilden eines Substratkontakts in einem Feldeffekttransistor, der über einer vergrabenen Isolierschicht gebildet ist A method for forming a substrate contact in a field effect transistor which is formed over a buried insulating layer
05/16/2002DE10053428A1 Verfahren zur Herstellung eines DMOS-Transistors A process for the preparation of a DMOS transistor
05/16/2002DE10053111A1 Production of field effect structure used in electronic devices comprises preparing substrate with gate region arranged between drain and source, and producing a germanium sacrificial layer
05/16/2002DE10052680A1 Verfahren zum Einstellen einer Form einer auf einem Substrat gebildeten Oxidschicht A method of controlling a molding of an oxide layer formed on a substrate
05/16/2002DE10051909A1 Edge border used for high voltage semiconductor component has the site of the bend and sealing of equipotential lines applied using a voltage in an insulating region
05/16/2002DE10048345A1 Körper aus Halbleitermaterial mit reduzierter mittlerer freier Weglänge Body of semiconductor material with a reduced mean free path length
05/15/2002EP1205981A2 SiC MISFET
05/15/2002EP1205980A1 A method for forming a field effect transistor in a semiconductor substrate
05/15/2002EP1205979A1 Single electron tunneling transistor having multilayer structure
05/15/2002EP1205969A2 Method of manufacturing a MOS field effect transistor with a recombination zone
05/15/2002EP1205966A2 Method for improving the uniformity and reducing the roughness of a silicon surface before dielectric layer formation
05/15/2002EP1204992A1 Method for producing a trench mos power transistor
05/15/2002EP1204989A1 Nand type flash memory device
05/15/2002EP1204853A1 Inorganic permeation layer for micro-electric device
05/15/2002EP1116236B1 Method of making flexibly partitioned metal line segments for a simultaneous operation flash memory device with a flexible bank partition architecture
05/15/2002EP0763259B1 Punch-through field effect transistor
05/15/2002EP0698223B1 Reflective liquid crystal display device and method of making such a device
05/15/2002CN1349664A Pre-equilibrium chemical reation energy converter
05/15/2002CN1349663A 半导体装置 Semiconductor device
05/15/2002CN1349662A Semiconductor device and semiconductor substrate
05/15/2002CN1349661A Semicondcutor device having bipolar transistors
05/15/2002CN1349253A Method for mfg. semiconductor device, and said seconductor device
05/15/2002CN1349249A Method for making semiconductor side wall fin
05/15/2002CN1349247A Method for forming metallic grid
05/15/2002CN1084932C 半导体器件 Semiconductor devices
05/15/2002CN1084931C Method of programming flash memory cell
05/14/2002US6389583 Semiconductor device and method for pattern layout for the same using total size of transistors
05/14/2002US6388936 Static memory cell having independent data holding voltage
05/14/2002US6388922 Semiconductor memory and method of operating semiconductor memory
05/14/2002US6388921 Nonvolatile semiconductor memory device with improved reliability and operation speed
05/14/2002US6388916 Magnetoelectronic memory element with isolation element
05/14/2002US6388851 Electronic discharge protection of integrated circuits
05/14/2002US6388812 Apparatus and method for laser radiation
05/14/2002US6388726 Method of manufacturing liquid crystal display device
05/14/2002US6388725 Liquid crystal display device including counter electrodes formed on the drain lines with insulating layer therebetween
05/14/2002US6388723 Magneto optical recording medium with metal shield layer configured to block light
05/14/2002US6388528 MMIC folded power amplifier
05/14/2002US6388386 Process of crystallizing semiconductor thin film and laser irradiation
05/14/2002US6388327 Capping layer for improved silicide formation in narrow semiconductor structures
05/14/2002US6388308 Semiconductor device and method for driving the same
05/14/2002US6388307 Bipolar transistor
05/14/2002US6388306 Semiconductor device with rapid reverse recovery characteristic
05/14/2002US6388304 Semiconductor device having buried-type element isolation structure and method of manufacturing the same
05/14/2002US6388300 Semiconductor physical quantity sensor and method of manufacturing the same
05/14/2002US6388299 Sensor assembly and method
05/14/2002US6388298 Detached drain MOSFET
05/14/2002US6388293 Nonvolatile memory cell, operating method of the same and nonvolatile memory array
05/14/2002US6388292 Distributed MOSFET structure with enclosed gate for improved transistor size/layout area ratio and uniform ESD triggering
05/14/2002US6388287 Switch mode power supply with reduced switching losses
05/14/2002US6388286 Power semiconductor devices having trench-based gate electrodes and field plates
05/14/2002US6388284 Capacitor structures
05/14/2002US6388280 Semiconductor device
05/14/2002US6388278 Solid state image pickup device and its driving method
05/14/2002US6388276 Reverse conducting thyristor
05/14/2002US6388272 A sic semiconductor device in which the third conductive layer comprises one of an os layer and a tac/wc/w layer.
05/14/2002US6388271 Semiconductor component
05/14/2002US6388270 Semiconductors with germanium silicides layers
05/14/2002US6387828 High-pressure anneal process for integrated circuits
05/14/2002US6387803 Method for forming a silicide region on a silicon body
05/14/2002US6387786 Method of salicide formation by siliciding a gate area prior to siliciding a source and drain area
05/14/2002US6387783 Methods of T-gate fabrication using a hybrid resist
05/14/2002US6387779 Method of crystallizing a silicon film and thin film transistor and fabricating method thereof using the same
05/14/2002US6387772 Method for forming trench capacitors in SOI substrates
05/14/2002US6387769 Method of producing a schottky varicap
05/14/2002US6387766 Method for manufacturing an integrated circuit with low threshold voltage differences of the transistors therein
05/14/2002US6387765 Method for forming an extended metal gate using a damascene process
05/14/2002US6387763 Field-effect transistor and corresponding manufacturing method
05/14/2002US6387762 Method of manufacturing ferroelectric memory device
05/14/2002US6387761 Exposure to nitrogen, hydrogen while heating; forming dielectric; forming barrier electrode, intakes, drains
05/14/2002US6387760 Method for making semiconductor device having bent gate electrode
05/14/2002US6387759 Method of fabricating a semiconductor device
05/14/2002US6387758 Method of making vertical field effect transistor having channel length determined by the thickness of a layer of dummy material
05/14/2002US6387756 Manufacturing method of non-volatile semiconductor device
05/14/2002US6387745 Method of making a semiconductor device having a polydiode element
05/14/2002US6387744 Process for manufacturing semiconductor integrated circuit device
05/14/2002US6387743 Semiconductor device manufacturing method and semiconductor device
05/14/2002US6387742 Thermal conductivity enhanced semiconductor structures and fabrication processes
05/14/2002US6387739 Method and improved SOI body contact structure for transistors
05/14/2002US6387738 Leaving the photoresist layer on the gate electrode after patterning it, then heating to reflow the photoresist to cover the side edges of the gate electrode; three-layer thin film is used as source, drain and pixel electrodes
05/14/2002US6387737 Semiconductor device and manufacturing method thereof
05/14/2002US6387735 Method for manufacturing field effect transistor capable of successfully controlling transistor characteristics relating to the short-channel effect
05/14/2002US6387730 Hybrid S.C. devices and method of manufacture thereof
05/14/2002US6387728 Method for fabricating a stacked chip package
05/14/2002US6387727 Overcoating with aromatic diimide compound
05/14/2002US6387725 Production method for integrated angular speed sensor device
05/14/2002US6387712 Process for preparing ferroelectric thin films
05/10/2002WO2002037575A1 Semiconductor memory cell and method for producing the same
05/10/2002WO2002037574A1 Method of patterning thin film and tft array substrate using it and production method therefor
05/10/2002WO2002037573A1 Semiconductor device and its manufacturing method
05/10/2002WO2002037572A1 Point contact array, not circuit, and electronic circuit comprising the same