Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
09/2002
09/04/2002EP1237196A1 Semiconductor device
09/04/2002EP1237195A2 Semiconductor device and manufacturing method thereof
09/04/2002EP1237193A2 Semiconductor memory device
09/04/2002EP1237192A2 Twin monos memory cell and corresponding fabrication method
09/04/2002EP1237191A2 High-Density Electronic Circuit Modules
09/04/2002EP1237186A2 By-pass rectifier element and terminal housing for solar battery modules using said element
09/04/2002EP1237183A1 Method for stabilizing oxide-semiconductor interface by using group 5 element and stabilized semiconductor
09/04/2002EP1236225A1 Method for establishing ultra-thin gate insulator using anneal in ammonia
09/04/2002EP1236224A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide
09/04/2002EP1012879B1 Fabrication method for reduced-dimension integrated circuits
09/04/2002EP0992069B1 Semiconductor current limiter
09/04/2002EP0795201B1 Method of formation of a capacitor for an integrated circuit and a method of adding on-chip capacitors to an integrated circuit
09/04/2002CN1367937A Misfet
09/04/2002CN1367636A Mask, its making method, method for making organic electroluminescent device and organic electroluminescent device thereof
09/04/2002CN1367537A 半导体器件以及显示装置 A semiconductor device and a display device
09/04/2002CN1367535A Complete depletion type collector silicon insulator bipolar transistor
09/04/2002CN1367532A Press-contacting type semiconductor device
09/04/2002CN1367528A Improvement method for changing working parameters to making power rectifier device and obtained device
09/04/2002CN1367490A Utilization of block voltage to help double MONOS unit to implement writing-in and erasing program
09/04/2002CN1367478A Plate display high voltage device structure for driving chip and its preparing method
09/04/2002CN1367476A Active matrix display equipment
09/04/2002CN1090383C Semiconductor device and method for fabricating same
09/04/2002CN1090382C Group III-V compound semiconductor wafer
09/04/2002CN1090335C Quantum trap infra-red infra-focus planar chip without discrete image element optical read-out
09/04/2002CN1090334C Foldable portable spectacles
09/03/2002US6445622 Voltage level shifter circuit and nonvolatile semiconductor storage device using the circuit
09/03/2002US6445617 Non-volatile semiconductor memory and methods of driving, operating, and manufacturing this memory
09/03/2002US6445428 Thin film transistor for a liquid crystal display device and a fabrication process thereof
09/03/2002US6445059 Semiconductor device
09/03/2002US6445058 Bipolar junction transistor incorporating integral field plate
09/03/2002US6445057 Semiconductor device having a trimming circuit for suppressing leakage current
09/03/2002US6445054 Semiconductor device
09/03/2002US6445053 Micro-machined absolute pressure sensor
09/03/2002US6445052 Power lateral diffused MOS transistor
09/03/2002US6445050 Symmetric device with contacts self aligned to gate
09/03/2002US6445048 Semiconductor configuration having trenches for isolating doped regions
09/03/2002US6445047 Semiconductor device and method for fabricating the same
09/03/2002US6445046 Memory cell arrangement and process for manufacturing the same
09/03/2002US6445042 Method and apparatus for making MOSFETs with elevated source/drain extensions
09/03/2002US6445040 Lateral bipolar type input/output protection device
09/03/2002US6445038 Silicon on insulator high-voltage switch
09/03/2002US6445037 Trench DMOS transistor having lightly doped source structure
09/03/2002US6445036 Semiconductor device having trench-structured rectangular unit cells
09/03/2002US6445035 Power MOS device with buried gate and groove
09/03/2002US6445034 MOS transistor having first and second channel segments with different widths and lengths
09/03/2002US6445033 Gate-insulating film including oxide film
09/03/2002US6445032 Floating back gate electrically erasable programmable read-only memory(EEPROM)
09/03/2002US6445030 Flash memory erase speed by fluorine implant or fluorination
09/03/2002US6445029 NVRAM array device with enhanced write and erase
09/03/2002US6445019 Lateral semiconductor device for withstanding high reverse biasing voltages
09/03/2002US6445016 Silicon-on-insulator (SOI) transistor having partial hetero source/drain junctions fabricated with high energy germanium implantation
09/03/2002US6445015 Metal sulfide semiconductor transistor devices
09/03/2002US6445013 Gate commutated turn-off semiconductor device
09/03/2002US6445012 Semiconductor device and manufacturing method thereof
09/03/2002US6445004 Composition for a wiring, a wiring using the composition, manufacturing method thereof, a display using the wiring and a manufacturing method thereof
09/03/2002US6445003 Thin film transistor (TFT) type optical detecting sensor
09/03/2002US6445000 Photodetecting device
09/03/2002US6444999 Quantum circuit
09/03/2002US6444896 Quantum dot thermoelectric materials and devices
09/03/2002US6444555 Establishing oxide base film having specified thickness on semiconductor substrate, annealing film in ammonia environment to form nitrided oxide film as ultra-thin insulator, forming polysilicon-based field effect transistor on film
09/03/2002US6444554 Variation in threshold level of selective transistors is reduced when a shallow structure buried with an insulating film for element isolation is used
09/03/2002US6444550 Laser tailoring retrograde channel profile in surfaces
09/03/2002US6444548 Bitline diffusion with halo for improved array threshold voltage control
09/03/2002US6444546 Single electron device using ultra-thin metal film and method for fabricating the same
09/03/2002US6444545 Including plurality of nanoclusters in trapping layer of traditional silicon-oxide-nitride-oxide-silicon structure improves charge retention, reliability characteristics and write/erase times
09/03/2002US6444543 Forming semiconductor chips surrounded by peripheral grooves for separating into individual pieces on substrate surface, pasting protecting sheet on surface so sheet is bent along and adheres to bottom walls of grooves, dicing along grooves
09/03/2002US6444535 Method to reduce emitter to base capacitance and related structure
09/03/2002US6444534 SOI semiconductor device opening implantation gettering method
09/03/2002US6444533 Semiconductor devices and methods for same
09/03/2002US6444532 Process for fabricating MOS semiconductor transistor
09/03/2002US6444529 Methods of forming integrated circuitry and methods of forming elevated source/drain regions of a field effect transistor
09/03/2002US6444528 Selective oxide deposition in the bottom of a trench
09/03/2002US6444527 Method of operation of punch-through field effect transistor
09/03/2002US6444525 Vertical, has two trenches to minimize size
09/03/2002US6444522 Forming photoresist pattern exposing portion of semiconductor substrate in which well region will be formed, doping to form well, removing pattern, forming second pattern, doping to form antidiffusion region and second well, thermally activating
09/03/2002US6444521 Replacing silicon nitride of nitride read only memory floating gate with silicon oxynitride improves endurance and reliability of device and extends data retention times
09/03/2002US6444516 Semiconductor having gate structure employing gate conductor that has relatively low resistivity yet remains thermally stable at processing temperatures, thus exhibiting low gate propagation delay
09/03/2002US6444514 Semiconductor integrated circuit device and manufacturing method thereof
09/03/2002US6444513 Forming first metal layer on gate oxide on substrate, increasing etch selectivity in surface region of metal layer, forming second metal layer, etching to form metal gate, with etching stopping on surface region of first metal layer
09/03/2002US6444512 Dual metal gate transistors for CMOS process
09/03/2002US6444509 High performance poly-si1−xgex thin film transistor and a method of fabricating such a thin film transistor
09/03/2002US6444507 Fabrication process for thin film transistors in a display or electronic device
09/03/2002US6444506 It with a laser beam in a hydrogen-inclusive atmosphere. further, the above laser annealing step and a step of forming an insulating film to become a gate insulating film are performed consecutively. as a result, hydrogen is effectively
09/03/2002US6444505 Thin film transistor (TFT) structure with planarized gate electrode
09/03/2002US6444504 Protects against electrostatic discharges, over-current, and voltage surges overcoming the aforementioned drawbacks is provided.
09/03/2002US6444487 Flexible substrate supporting the strain sensing element. the strain sensing element is made of single crystal or polycrystalline semiconducting material.
09/03/2002US6444390 Under the conditions in that a germanium film is formed on an amorphous silicon film, a first heat treatment (crystallization step) no defect in its crystal grain.
09/03/2002US6444296 Electrical resistance, electrodes
09/03/2002US6444277 Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates
09/03/2002US6443720 Apparatus for filling a gap between spaced layers of a semiconductor
09/03/2002CA2067578C Epitaxially grown compound-semiconductor crystal
08/2002
08/29/2002WO2002067426A1 Semiconductor devices
08/29/2002WO2002067336A1 Memory film, method of manufacturing the memory film, memory element, semiconductor storage device, semiconductor integrated circuit, and portable electronic equipment
08/29/2002WO2002067335A1 Thin-film transistor structure, method for manufacturing the thin-film transistor structure, and display device using the thin-film transistor structure
08/29/2002WO2002067334A1 Multiple quantum well broad spectrum gain medium and method for forming same
08/29/2002WO2002067333A1 Semiconductor device and method of manufacturing the same
08/29/2002WO2002067332A2 Semiconductor devices having field shaping regions
08/29/2002WO2002067331A1 Thyristor switch for microwave signals
08/29/2002WO2002067329A1 Flexible display device
08/29/2002WO2002067328A2 Organic light emitting diode display having shield electrodes