Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/1997
11/11/1997US5686746 Semiconductor memory device and a method of making the same
11/11/1997US5686744 Complementary modulation-doped field-effect transistors
11/11/1997US5686743 Method of forming airbridged metallization for integrated circuit fabrication
11/11/1997US5686741 Compound semiconductor device on silicon substrate and method of manufacturing the same
11/11/1997US5686740 Field effect transistor with recessed gate
11/11/1997US5686739 Field effect transistors
11/11/1997US5686738 Highly insulating monocrystalline gallium nitride thin films
11/11/1997US5686737 Self-aligned field-effect transistor for high frequency applications
11/11/1997US5686736 SRAM cell having thin film transistors as loads
11/11/1997US5686735 Silicon-on-insulator (SOI) transistor
11/11/1997US5686728 Projection lithography system and method using all-reflective optical elements
11/11/1997US5686702 Polyimide multilayer wiring substrate
11/11/1997US5686521 Milled carbon fiber reinforced polymer composition
11/11/1997US5686364 Method for producing substrate to achieve semiconductor integrated circuits
11/11/1997US5686363 Controlled taper etching
11/11/1997US5686362 Method of manufacturing a semiconductor integrated circuit device
11/11/1997US5686361 Method for manufacturing a semiconductor device having a heat radiator
11/11/1997US5686359 Titanium silicide process
11/11/1997US5686358 Method for forming a plug in a semiconductor device
11/11/1997US5686357 Method for forming a contact during the formation of a semiconductor device
11/11/1997US5686356 Conductor reticulation for improved device planarity
11/11/1997US5686355 Vapor deposition, heating silane gas
11/11/1997US5686354 Dual damascene with a protective mask for via etching
11/11/1997US5686353 Semiconductor device and manufacturing method thereof
11/11/1997US5686352 Method for making a tab semiconductor device with self-aligning cavity and intrinsic standoff
11/11/1997US5686351 Semimetal-semiconductor heterostructures and multilayers
11/11/1997US5686350 Oxidation of algaas to al2o3
11/11/1997US5686349 Fabrication of a thin film transistor and production of a liquid crystal display apparatus
11/11/1997US5686348 Process for forming field isolation structure with minimized encroachment effect
11/11/1997US5686347 Self isolation manufacturing method
11/11/1997US5686346 Method for enhancing field oxide thickness at field oxide perimeters
11/11/1997US5686345 Trench mask for forming deep trenches in a semiconductor substrate, and method of using same
11/11/1997US5686344 Device isolation method for semiconductor device
11/11/1997US5686343 Process for isolating a semiconductor layer on an insulator
11/11/1997US5686342 Method for insulating semiconductor elements
11/11/1997US5686340 Manufacturing method of CMOS transistor
11/11/1997US5686339 Dram, single masking step
11/11/1997US5686338 Process for fabricating high-resistance load resistors using dummy polysilicon in four-transistor SRAM devices
11/11/1997US5686337 Method for fabricating stacked capacitors in a DRAM cell
11/11/1997US5686336 Method of manufacture of four transistor SRAM cell layout
11/11/1997US5686335 Method of making high-performance and reliable thin film transistor (TFT) using plasma hydrogenation with a metal shield on the TFT channel
11/11/1997US5686334 Method of making SRAM cell with thin film transistor using two polysilicon layers
11/11/1997US5686333 Floating gate electrode formed on a channel region disposed between the pair of source/drain diffusion layers; electrically rewritable
11/11/1997US5686332 Process for fabricating flash memory devices
11/11/1997US5686331 Fabrication method for semiconductor device
11/11/1997US5686330 Method of making a self-aligned static induction transistor
11/11/1997US5686329 Method for forming a metal oxide semiconductor field effect transistor (MOSFET) having improved hot carrier immunity
11/11/1997US5686328 Thin film transistors, capacitors, active matrix liquid crystal display devices
11/11/1997US5686327 Method for fabricating semiconductor device
11/11/1997US5686326 Method of making thin film transistor
11/11/1997US5686325 Method for forming MESFET having T-shaped gate electrode
11/11/1997US5686324 Process for forming LDD CMOS using large-tilt-angle ion implantation
11/11/1997US5686323 Method of manufacturing a semiconductor device having an out diffusion preventing film
11/11/1997US5686322 Process for doping two levels of a double poly bipolar transistor after formation of second poly layer
11/11/1997US5686321 Local punchthrough stop for ultra large scale integration devices
11/11/1997US5686320 Method for forming semiconductor layer of thin film transistor by using temperature difference
11/11/1997US5686319 Method for producing a diode
11/11/1997US5686317 Method for forming an interconnect having a penetration limited contact structure for establishing a temporary electrical connection with a semiconductor die
11/11/1997US5686230 Exposing senstive layer to collimated radiation through mask
11/11/1997US5686211 Removing photoresist layer from semiconductors
11/11/1997US5686206 Method for the repair of lithographic masks
11/11/1997US5686190 Controlled oxygen content copper clad laminate
11/11/1997US5686172 Metal-foil-clad composite ceramic board and process for the production thereof
11/11/1997US5686171 Integrated circuit scribe line structures and methods for making same
11/11/1997US5686151 Method of forming a metal oxide film
11/11/1997US5686143 Resist treating method
11/11/1997US5685969 Sensor arrangement
11/11/1997US5685963 In situ getter pump system and method
11/11/1997US5685960 Method for forming aluminum contacts
11/11/1997US5685951 Methods and etchants for etching oxides of silicon with low selectivity in a vapor phase system
11/11/1997US5685950 Dry etching method
11/11/1997US5685949 Plasma treatment apparatus and method
11/11/1997US5685947 Chemical-mechanical polishing with an embedded abrasive
11/11/1997US5685946 Method of producing buried porous silicon-geramanium layers in monocrystalline silicon lattices
11/11/1997US5685941 Inductively coupled plasma reactor with top electrode for enhancing plasma ignition
11/11/1997US5685939 Process for making a Z-axis adhesive and establishing electrical interconnection therewith
11/11/1997US5685916 Dry cleaning of semiconductor processing chambers
11/11/1997US5685914 Focus ring for semiconductor wafer processing in a plasma reactor
11/11/1997US5685913 Plasma processing apparatus and method
11/11/1997US5685905 Method of manufacturing a single crystal thin film
11/11/1997US5685898 Mixture of a palladium salt, a complexing agent, a water soluble polymer, an alkaline compound and a solvent
11/11/1997US5685885 Wafer-scale techniques for fabrication of semiconductor chip assemblies
11/11/1997US5685766 Polishing control method
11/11/1997US5685684 Vacuum processing system
11/11/1997US5685589 Lead frame suction holding device
11/11/1997US5685588 Wafer handler having a flexible pad
11/11/1997US5685477 Method for attaching and handling conductive spheres to a substrate
11/11/1997US5685476 Wire guiding apparatus, wire guiding method and a wire bonder equipped with said apparatus
11/11/1997US5685363 Substrate holding device and manufacturing method therefor
11/11/1997US5685358 Pressure, ir lenses
11/11/1997US5685327 For cleaning and drying a semiconductor wafer
11/11/1997US5685232 Positioning stage device exposure apparatus and device manufacturing method utilizing the same
11/11/1997US5685086 Method and apparatus for drying objects using aerosols
11/11/1997US5685071 Method of constructing a sealed chip-on-board electronic module
11/11/1997US5685040 Apparatus for cleaning and drying hard disk substrates
11/10/1997CA2204939A1 Fluid control device
11/06/1997WO1997041603A1 Current controlled oscillator with voltage independent capacitance
11/06/1997WO1997041602A2 Semiconductor device provided with a resistance element
11/06/1997WO1997041601A1 All-metal, giant magnetoresistive, solid-state component
11/06/1997WO1997041598A1 Apparatus and method for improved deposition of conformal liner films and plugs in high aspect ratio contacts