H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/1997
11/25/1997	US5691252 Method of making low profile shallow trench double polysilicon capacitor
11/25/1997	US5691250 Method of forming a metal contact to a novel polysilicon contact extension
11/25/1997	US5691249 Method for fabricating polycrystalline silicon having micro roughness on the surface
11/25/1997	US5691248 Methods for precise definition of integrated circuit chip edges
11/25/1997	US5691247 Method for depositing a flow fill layer on an integrated circuit wafer
11/25/1997	US5691246 In situ etch process for insulating and conductive materials
11/25/1997	US5691245 Methods of forming two-sided HDMI interconnect structures
11/25/1997	US5691243 Process for manufacturing composite semiconductor device
11/25/1997	US5691241 Method for making plurality of leadframes having grooves containing island and inner leads
11/25/1997	US5691240 Method for forming blanket planarization of the multilevel interconnection
11/25/1997	US5691239 Method for fabricating an electrical connect above an integrated circuit
11/25/1997	US5691238 Integrated circuits
11/25/1997	US5691237 Method for fabricating semiconductor device
11/25/1997	US5691236 Method and apparatus for performing chemical vapor deposition
11/25/1997	US5691235 Method of depositing tungsten nitride using a source gas comprising silicon
11/25/1997	US5691233 Process of forming channel stopper exactly nested in area assigned to thick field oxide layer
11/25/1997	US5691232 Planarized trench and field oxide isolation scheme
11/25/1997	US5691231 Method of manufacturing silicon on insulating substrate
11/25/1997	US5691230 Technique for producing small islands of silicon on insulator
11/25/1997	US5691229 Process of fabricating dynamic random access memory cell having inter-level insulating structure without silicon nitride layer between access transistor and storage node
11/25/1997	US5691228 Semiconductor processing method of making a hemispherical grain (HSG) polysilicon layer
11/25/1997	US5691227 Method for forming charge storage electrodes of semiconductor device
11/25/1997	US5691226 Method of manufacturing BICMOS integrated circuits
11/25/1997	US5691225 Method for fabricating semiconductor device having CMOS structure
11/25/1997	US5691224 Method of making BiCMOS circuit
11/25/1997	US5691223 Method of fabricating a capacitor over a bit line DRAM process
11/25/1997	US5691222 Method of manufacturing semiconductor integrated circuit device having a capacitor electrode
11/25/1997	US5691221 Method for manufacturing semiconductor memory device having a stacked capacitor
11/25/1997	US5691220 Process of fabricating semiconductor device having capacitor electrode implanted with boron difluoride
11/25/1997	US5691219 Method of manufacturing a semiconductor memory device
11/25/1997	US5691218 Method of fabricating a programmable polysilicon gate array base cell structure
11/25/1997	US5691217 Semiconductor processing method of forming a pair of field effect transistors having different thickness gate dielectric layers
11/25/1997	US5691216 Integrated circuit self-aligning process and apparatus
11/25/1997	US5691215 Method for fabricating a sub-half micron MOSFET device with insulator filled shallow trenches planarized via use of negative photoresist and de-focus exposure
11/25/1997	US5691214 Method of manufacturing semiconductor devices
11/25/1997	US5691212 Silicides
11/25/1997	US5691211 Method for gettering noble metals from mineral acid solution
11/25/1997	US5691210 Method for fabrication of probe structure and circuit substrate therefor
11/25/1997	US5691117 Using a hydrogen conveyor furnace
11/25/1997	US5691111 Sulfonium salt, acrylate ester polymer
11/25/1997	US5691110 Process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
11/25/1997	US5691090 Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
11/25/1997	US5691088 Dustproofing; frame, transparent polymeric film, skicky adhesive film
11/25/1997	US5690877 Method of processing a semiconductor chip package
11/25/1997	US5690841 Method of producing cavity structures
11/25/1997	US5690795 Screwless shield assembly for vacuum processing chambers
11/25/1997	US5690785 Lithography control on uneven surface
11/25/1997	US5690781 Plasma processing apparatus for manufacture of semiconductor devices
11/25/1997	US5690766 Method and apparatus for decreasing the time needed to die bond microelectronic chips
11/25/1997	US5690749 Improving integrated circuit yield
11/25/1997	US5690744 Wafer orientation alignment system
11/25/1997	US5690743 Liquid material supply apparatus and method
11/25/1997	US5690742 Susceptor for an epitaxial growth apparatus
11/25/1997	US5690736 Method of forming crystal
11/25/1997	US5690727 Thin films of ABO3 with excess B-site modifiers and method of fabricating integrated circuits with same
11/25/1997	US5690544 Wafer polishing apparatus having physical cleaning means to remove particles from polishing pad
11/25/1997	US5690050 Plasma treating apparatus and plasma treating method
11/25/1997	CA2048339C Semiconductor member and process for preparing semiconductor member
11/20/1997	WO1997043823A1 Three-terminal power mosfet switch for use as synchronous rectifier or voltage clamp
11/20/1997	WO1997043787A1 Microelectronics package
11/20/1997	WO1997043786A1 High frequency microelectronics package
11/20/1997	WO1997043785A1 Wafer aligning method
11/20/1997	WO1997043784A1 Wafer cassette mounting device and wafer inspection device equipped with the same
11/20/1997	WO1997043783A1 A method and an apparatus for manufacturing heat-sink devices
11/20/1997	WO1997043782A1 Method of patterning a substrate using spin-on glass as a hard mask
11/20/1997	WO1997043740A1 Radio frequency data communications device
11/20/1997	WO1997043694A2 Method of producing a stencil mask
11/20/1997	WO1997043689A1 Thin film device having coating film, liquid crystal panel, electronic apparatus and method of manufacturing the thin film device
11/20/1997	WO1997043658A1 Reusable die carrier for burn-in and burn-in process
11/20/1997	WO1997043656A2 Wafer-level burn-in and test
11/20/1997	WO1997043654A1 Microelectronic spring contact elements
11/20/1997	WO1997043653A1 Contact tip structures for microelectronic interconnection elements and methods of making same
11/20/1997	WO1997043461A1 Method for making a thin film of solid material, and uses thereof
11/20/1997	WO1997043087A1 Chemical mechanical polishing slurry for metal layers and films
11/20/1997	WO1997036316A3 A field controlled semiconductor device of sic and a method for production thereof
11/20/1997	WO1997036314A3 A field effect transistor of sic and a method for production thereof
11/20/1997	WO1997036313A3 A field controlled semiconductor device of sic and a method for production thereof
11/20/1997	DE19720228A1 Electron beam exposure device with scanning electron microscope
11/20/1997	DE19719983A1 Ball grid array for semiconductor component
11/20/1997	DE19716668A1 Small outline, stacking J-lead package for semiconductor chip encapsulation
11/20/1997	DE19715684A1 CCD manufacturing method
11/20/1997	DE19713501A1 Conductive layer in Semiconductor component coupling method
11/20/1997	DE19704149A1 Metal wiring with self-aligned via corners
11/20/1997	DE19701003A1 DRAM cell with two FETs for computer
11/20/1997	DE19700868A1 Internal connection in semiconductor component formation method
11/20/1997	DE19645567A1 Integrated low pass filter and high pass filter circuits
11/20/1997	DE19644504A1 Semiconductor device, e.g. trench-formed IGBT, for high voltage inverter
11/20/1997	DE19620113A1 Verfahren und Vorrichtung zur Befestigung von Bonddrähten auf Bondlands einer Hybridschaltung Method and apparatus for attaching bond wires to bond lands of a hybrid circuit
11/20/1997	DE19619287A1 NANO-structure on substrate formation method for microelectronics
11/20/1997	DE19618447A1 Lithographisches Verfahren zur Erzeugung von Nanostrukturen auf Oberflächen A lithographic method for the generation of nanostructures on surfaces
11/20/1997	DE19612692C1 Two=stage dry and wet thermal oxidation of silicon carbide surface
11/19/1997	EP0807977A2 Semiconductor device including protection means
11/19/1997	EP0807974A1 Multilayer interconnections having a low lateral parasitic capacitance
11/19/1997	EP0807973A2 Plastic molded type semiconductor device and method of manufacturing the same
11/19/1997	EP0807971A2 Ultrahigh-frequency electronic component and method of manufacturing the same
11/19/1997	EP0807970A1 Method of manufacturing a thin semiconductor layer
11/19/1997	EP0807969A1 Semiconductor integrated circuit
11/19/1997	EP0807968A2 Etching a metal silicide with HC1 and chlorine
11/19/1997	EP0807967A2 Diffused titanium resistor and method for fabricating same
11/19/1997	EP0807966A1 Heat treatment method for semiconductor substrate

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