Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/1999
03/09/1999US5879999 Method of manufacturing an insulated gate semiconductor device having a spacer extension
03/09/1999US5879998 Adaptively controlled, self-aligned, short channel device and method for manufacturing same
03/09/1999US5879997 Method for forming self aligned polysilicon contact
03/09/1999US5879996 Implanting germanium (ge) layer under existing gate oxide and growing the silicide in a low temperature furnace; efficient manufacture of complementary metal oxide semiconductor (cmos) with stable gate oxide over a silicon-ge transistor channel
03/09/1999US5879995 High-voltage transistor and manufacturing method therefor
03/09/1999US5879994 Self-aligned method of fabricating terrace gate DMOS transistor
03/09/1999US5879993 Nitride spacer technology for flash EPROM
03/09/1999US5879992 Method of fabricating step poly to improve program speed in split gate flash
03/09/1999US5879991 Trench free polysilicon gate definition process for a non-volatile memory device
03/09/1999US5879990 Semiconductor device having an embedded non-volatile memory and method of manufacturing such a semicondutor device
03/09/1999US5879989 Method for fabricating nonvolatile memory device using disposable layer
03/09/1999US5879988 Capacitor of a DRAM cell and method of making same
03/09/1999US5879987 Method of fabricating dynamic random access memory having a stacked capacitor
03/09/1999US5879986 Dynamic random access memory (dram); self-alignment by opening contact holes between the polycide gates and tungsten bit lines, and coating with silicon nitride spacers, filling with polysilicon plugs, which contact the substrate
03/09/1999US5879985 Forming a contact hole in dielectric material, forming a trough at the contact hole to form crown shaped region, depositing bottom electrode, patterning the electrode by chemical mechanical polishing, depositing node dielectric
03/09/1999US5879984 Forming conductive layer, masking, etching, enlarging aperture in masking layer to expose surface, masking, patterning, removing first masking layer, etching
03/09/1999US5879983 Semiconductor device and method for manufacturing the same
03/09/1999US5879982 Methods of forming integrated circuit memory devices having improved electrical interconnects therein
03/09/1999US5879981 Method of fabricating a semiconductor memory device
03/09/1999US5879980 Method of making static random access memory cell having a trench field plate for increased capacitance
03/09/1999US5879979 Method of manufacturing a semiconductor device containing CMOS elements
03/09/1999US5879978 Semiconductor device and method of fabricating the same
03/09/1999US5879977 Deposition of metal catalyst promotes crystallization of amorphous silicon film
03/09/1999US5879976 Thin film transistor and method for producing the same
03/09/1999US5879975 Heat treating nitrogen implanted gate electrode layer for improved gate electrode etch profile
03/09/1999US5879974 Using a metal which promotes crystallization of silicon and an amorphous silicon film
03/09/1999US5879973 Method for fabricating thin-film transistor
03/09/1999US5879972 SRAM device and method of manufacturing the same
03/09/1999US5879971 Trench random access memory cell and method of formation
03/09/1999US5879970 Process of growing polycrystalline silicon-germanium alloy having large silicon content
03/09/1999US5879969 Anodic oxidation of electrode pattern by feeding an electric field through wiring on substrate
03/09/1999US5879968 Process for manufacture of a P-channel MOS gated device with base implant through the contact window
03/09/1999US5879967 Methods forming power semiconductor devices having latch-up inhibiting regions
03/09/1999US5879965 Plastic lead frames for semiconductor devices, packages including same, and methods of fabrication
03/09/1999US5879962 Using molecular beam epitaxy
03/09/1999US5879960 Manufacturing method of thin film diode for liquid crystal display device
03/09/1999US5879958 Method of producing an electro-optical device
03/09/1999US5879957 Method for manufacturing a capacitor
03/09/1999US5879956 Forming insulation film having contact hole, forming electrodes including perovskite structures, etching, forming spacers
03/09/1999US5879954 Radiation-hard isoplanar cryo-CMOS process suitable for sub-micron devices
03/09/1999US5879863 Pattern forming method
03/09/1999US5879862 Forming layer having protuberances on nonplanar layer, applying seed layer, forming photoresist layer, patterning to expose top of seed layer, forming conductive layer thereon, removing residues including seed layer
03/09/1999US5879860 Method of writing a pattern by an electron beam
03/09/1999US5879857 Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
03/09/1999US5879856 Chemically amplified positive photoresists
03/09/1999US5879852 Positive-working radiation-sensitive mixture
03/09/1999US5879851 Method for forming resist patterns by using an ammonium or morpholine compound as a developer
03/09/1999US5879845 Projection exposure method utilizing correction for change in optical characteristic
03/09/1999US5879844 Optical proximity correction method
03/09/1999US5879843 Method of reducing registration error in exposure step of semiconductor device
03/09/1999US5879842 Pattern projection method with charged particle beam utilizing continuous movement of mask and substrate
03/09/1999US5879840 Film-forming method for X-ray mask
03/09/1999US5879839 Prevents light from being transmitted in undesired areas, and thus capable of obtaining desired fine patterns
03/09/1999US5879838 Preventing lifting of photoresist film
03/09/1999US5879787 Method and apparatus for improving wireability in chip modules
03/09/1999US5879761 Method for forming electrically conductive polymer interconnects on electrical substrates
03/09/1999US5879756 Curing polymer layers on semiconductor substrates using variable frequency microwave energy
03/09/1999US5879739 Batch process for forming metal plugs in a dielectric layer of a semiconductor wafer
03/09/1999US5879577 Coating substrate with layer of unexposed, undeveloped photoresist, spinning, directing vertical jet of photoresist solvent, etching substrate, masking, exposing to actinic radiation, developing
03/09/1999US5879576 Method and apparatus for processing substrates
03/09/1999US5879575 Self-cleaning plasma processing reactor
03/09/1999US5879574 Apparatus for fabricating an intergrated circuit device where a cleaning gas reacts with unwanted residue to produce clean gas reactants
03/09/1999US5879573 Method for optimizing a gap for plasma processing
03/09/1999US5879572 Method of protecting silicon wafers during wet chemical etching
03/09/1999US5879530 Annealing a multilayer film comprising metal and polymer layers
03/09/1999US5879523 Ceramic coated metallic insulator particularly useful in a plasma sputter reactor
03/09/1999US5879464 Method and device for wet-processing substrates in a vessel
03/09/1999US5879461 Metered gas control in a substrate processing apparatus
03/09/1999US5879459 Vertically-stacked process reactor and cluster tool system for atomic layer deposition
03/09/1999US5879458 Molecular contamination control system
03/09/1999US5879457 Rotating cup coating device
03/09/1999US5879451 Apparatus for measuring weight of crystal being pulled
03/09/1999US5879447 Semiconductor device and its fabricating method
03/09/1999US5879415 Detecting by an oxygen densitometer to control an inert gas flow rate and an oxygen flow rate
03/09/1999US5879225 Polishing machine
03/09/1999US5879222 Abrasive polishing pad with covalently bonded abrasive particles
03/09/1999US5879139 Vacuum pump with gas heating
03/09/1999US5879134 In situ getter pump system and method
03/09/1999US5879128 Lift pin and support pin apparatus for a processing chamber
03/09/1999US5879127 Robot assembly
03/09/1999US5878957 Method and system for precise discharge determination
03/09/1999US5878943 Method of fabricating an electronic circuit device and apparatus for performing the method
03/09/1999US5878942 Soldering method and soldering apparatus
03/09/1999US5878918 Photoresist supplying system for used in a semiconductor fabrication
03/09/1999US5878889 Semiconductor wafer carrier featuring effective reduction of airborne particles become attached to wafers
03/09/1999US5878811 Apparatus and method for the controlled cooling of chemical tanks
03/09/1999US5878789 Mechanical press machine for forming semiconductor packages
03/09/1999US5878760 Ultra-low particle semiconductor cleaner
03/09/1999US5878486 Method of burning-in semiconductor devices
03/09/1999US5878485 Method for fabricating a carrier for testing unpackaged semiconductor dice
03/09/1999CA2093750C Apparatus to clean solid surfaces using a cryogenic aerosol
03/04/1999WO1999011103A1 Method for controlling plasma processor
03/04/1999WO1999010970A1 Positioning device, driving unit, and aligner equipped with the device
03/04/1999WO1999010930A1 Process of forming stacked capacitor dram
03/04/1999WO1999010929A2 A method of providing a vertical interconnect between thin film microelectronic devices
03/04/1999WO1999010928A1 Semiconductor device and method of fabricating the same
03/04/1999WO1999010927A1 In situ plasma wafer bonding method
03/04/1999WO1999010926A1 Method for producing electrically conductive cross connections between two layers of wiring on a substrate
03/04/1999WO1999010925A1 Vertical interconnect process for silicon segments with thermally conductive epoxy preform
03/04/1999WO1999010924A1 Reduction of charge loss in nonvolatile memory cells by phosphorous implantation into pecvd nitride/oxynitride films
1 ... 5708 5709 5710 5711 5712 5713 5714 5715 5716 5717 5718 5719 5720 5721 5722 5723 5724 5725 5726 5727 5728 ... 6590