Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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05/11/1999 | USRE36210 Circuit and method for erasing EEPROM memory arrays to prevent over-erased cells |
05/11/1999 | USRE36208 Housing for containing a fragile element such as a logic circuit |
05/11/1999 | US5903711 Heat treatment apparatus and heat treatment method |
05/11/1999 | US5903580 Fault simulator of creating a signal pattern for use in a fault inspection of a semiconductor integrated circuit |
05/11/1999 | US5903510 Address decoder, semiconductor memory and semiconductor device |
05/11/1999 | US5903494 Electrically programmable memory cell |
05/11/1999 | US5903493 Metal to metal capacitor apparatus and method for making |
05/11/1999 | US5903492 Computer system |
05/11/1999 | US5903490 Customizable integrated circuit device |
05/11/1999 | US5903489 Semiconductor memory device having a monitoring pattern |
05/11/1999 | US5903488 Semiconductor memory with improved word line structure |
05/11/1999 | US5903471 Method for optimizing element sizes in a semiconductor device |
05/11/1999 | US5903463 Raising-and-lowering data setting method for magazine elevator device |
05/11/1999 | US5903437 Electronic integrated circuit package |
05/11/1999 | US5903430 Capacitor |
05/11/1999 | US5903428 Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same |
05/11/1999 | US5903424 Method for protecting an integrated circuit against electro-static discharges |
05/11/1999 | US5903422 Overcurrent sensing circuit for power MOS field effect transistor |
05/11/1999 | US5903400 Projection-optical system for use in a projection-exposure apparatus |
05/11/1999 | US5903380 Micro-electromechanical (MEM) optical resonator and method |
05/11/1999 | US5903351 Method and apparatus for selective spectroscopic analysis of a wafer surface and gas phase elements in a reaction chamber |
05/11/1999 | US5903343 In a wafer stack |
05/11/1999 | US5903165 Programmable logic array with a hierarchical routing resource |
05/11/1999 | US5903162 Probe adapter for electronic devices |
05/11/1999 | US5903161 Electrically conductive rod-shaped single crystal product and assembly for measuring electrical properties employing such product, as well as processes for their production |
05/11/1999 | US5903143 Probe apparatus with RC circuit connected between ground and a guard |
05/11/1999 | US5903106 Plasma generating apparatus having an electrostatic shield |
05/11/1999 | US5903059 Semiconductor structure |
05/11/1999 | US5903058 Semiconductor device |
05/11/1999 | US5903056 Electronic package |
05/11/1999 | US5903055 Aluminum, niobium, zirconium, tantalum; low electrical resistance |
05/11/1999 | US5903054 Integrated circuit with improved pre-metal planarization |
05/11/1999 | US5903053 Semiconductor device |
05/11/1999 | US5903048 Lead frame for semiconductor device |
05/11/1999 | US5903047 Low temperature-deposited passivation film over semiconductor device |
05/11/1999 | US5903046 Integrated circuit device having cyanate ester buffer coat |
05/11/1999 | US5903045 Semiconductor structure |
05/11/1999 | US5903044 Hermetic chip and method of manufacture |
05/11/1999 | US5903041 Integrated two-terminal fuse-antifuse and fuse and integrated two-terminal fuse-antifuse structures incorporating an air gap |
05/11/1999 | US5903040 Trench isolated integrated circuits including voids |
05/11/1999 | US5903037 GaAs-based MOSFET, and method of making same |
05/11/1999 | US5903036 Semiconductor device having MISFET SRAM cells in which active regions and gate electrodes are dimensioned for increasing storage node capacitances without increasing memory cell size |
05/11/1999 | US5903035 Outer buried contact region connecting drain region to inner buried contact region |
05/11/1999 | US5903033 Semiconductor device including resistance element with superior noise immunity |
05/11/1999 | US5903031 MIS device, method of manufacturing the same, and method of diagnosing the same |
05/11/1999 | US5903030 Semiconductor device provided with an ESD protection circuit |
05/11/1999 | US5903029 Insulated-gate field-effect transistor and method for producing the same |
05/11/1999 | US5903027 MOSFET with solid phase diffusion source |
05/11/1999 | US5903026 Isolation structure for semiconductor devices |
05/11/1999 | US5903025 Semiconductor memory device and method for manufacturing the same |
05/11/1999 | US5903024 Stacked and trench type DRAM capacitor |
05/11/1999 | US5903023 Semiconductor device, method of fabricating the same, and sputtering apparatus |
05/11/1999 | US5903022 Semiconductor memory device having improved word line arrangement in a memory cell array |
05/11/1999 | US5903020 Controlling current flow |
05/11/1999 | US5903019 Semiconductor device having a plurality of input/output cell areas with reduced pitches therebetween |
05/11/1999 | US5903018 Gallium aluminum indium arsenide; increasing concentration of indium from emitter base to base-collector |
05/11/1999 | US5903015 Field effect transistor using diamond |
05/11/1999 | US5903014 Semiconductor device for driving a substrate of an electro-optical device |
05/11/1999 | US5903013 Thin film transistor and method of manufacturing the same |
05/11/1999 | US5903011 Semiconductor device having monitor pattern formed therein |
05/11/1999 | US5902995 CCD image sensor with overflow barrier for discharging excess electrons at high speed |
05/11/1999 | US5902780 Comprising hydroxylamine, about 10-80% by weight of an alkanolamine which is miscible with said hydroxylamine, and water |
05/11/1999 | US5902752 Active layer mask with dummy pattern |
05/11/1999 | US5902717 Method of fabricating semiconductor device using half-tone phase shift mask |
05/11/1999 | US5902716 Exposure method and apparatus |
05/11/1999 | US5902713 Chemical-sensitization photoresist composition |
05/11/1999 | US5902712 Substrate having circuits disposed thereon, coated with ablatively photodecomposable polymer comprising acrylic polymer with bound photoabsorber |
05/11/1999 | US5902706 Frame having an opening therein, membrane film formed over frame, patterned interlayer formed on membrane film, patterned light shield formed on interlayer such that interlayer is formed between light shield and membrane film, support |
05/11/1999 | US5902704 Process for forming photoresist mask over integrated circuit structures with critical dimension control |
05/11/1999 | US5902702 Photolithography |
05/11/1999 | US5902701 Forming groove in transparent substrate |
05/11/1999 | US5902686 Solder structure for microelectronic substrate comprising under bump metallurgy layer on substrate, solder bump on under bump metallurgy layer wherein said solder bump includes oxide layer, intermediate layer between bump layer and solder bump |
05/11/1999 | US5902678 Applying to an article, stripping the adhesive or tape, bonding and fixing the particles to adhesive or tape, removing from the article |
05/11/1999 | US5902650 Depositing on substrate amorphous silicon based film having predetermined resistivity by chemical vapor deposition using gas mixture comprising silane, hydrogen, phosphine, nitrogen-containing gas with adjusted flow rate |
05/11/1999 | US5902504 Determining resistance-temperature relationship of substance located on semiconductor wafer, placing wafer in deposition device, heating to known temperature, measuring resistance of substance, determining resistance-temperature relationship |
05/11/1999 | US5902493 Method for forming micro patterns of semiconductor devices |
05/11/1999 | US5902452 Forming oxide layer on silicon substrate, depositing and patterning photoresist layer, removing oxide layer and predetermined thickness of silicon in single dry etching stepusing gas mixture of carbon tetrafluoride and oxygen |
05/11/1999 | US5902407 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
05/11/1999 | US5902404 Resonant chamber applicator for remote plasma source |
05/11/1999 | US5902403 Method and apparatus for cleaning a chamber |
05/11/1999 | US5902402 Device for chemical wet treatment |
05/11/1999 | US5902394 Oscillating crucible for stabilization of Czochralski (CZ) silicon melt |
05/11/1999 | US5902393 Method for growing p-type gallium nitride based compound semiconductors by vapor phase epitaxy |
05/11/1999 | US5902185 Magnetic transmission couplings |
05/11/1999 | US5902173 Polishing machine with efficient polishing and dressing |
05/11/1999 | US5902135 Method for removing crystal defects in silicon wafers |
05/11/1999 | US5902134 Preventing over-etching while ashing, removing the deposited fluorocarbon film in presence of oxygen gas and controlling the temperature |
05/11/1999 | US5902133 Method of forming a narrow polysilicon gate with i-line lithography |
05/11/1999 | US5902132 Method of manufacturing a semiconductor device including a process of forming a contact hole |
05/11/1999 | US5902131 Dual-level metalization method for integrated circuit ferroelectric devices |
05/11/1999 | US5902130 Thermal processing of oxide-compound semiconductor structures |
05/11/1999 | US5902129 Forming an uniform thickness high temperature cobalt silicide layer by depositing a capping titanium layer to prevent exposing to oxygen gas prior to the annealing step |
05/11/1999 | US5902128 Adding fluorine as a viscosity reducing agent in the substrate results in thicker field oxide isolation regions as the oxygen molecules can more readily diffuse through the center of isolation region |
05/11/1999 | US5902127 Methods for forming isolation trenches including doped silicon oxide |
05/11/1999 | US5902126 Methods for forming integrated circuit capacitor electrodes including surrounding insulating sidewalls and spacers |
05/11/1999 | US5902125 Method to form stacked-Si gate pMOSFETs with elevated and extended S/D junction |
05/11/1999 | US5902124 DRAM process |
05/11/1999 | US5902123 Method of fabricating a stacked capacitor of a dynamic random access memory |
05/11/1999 | US5902122 Dehydrating a vapor deposited dielectric layer with nitrogen or nitrogen oxide plasma |
05/11/1999 | US5902121 Semiconductor device and method for manufacturing semiconductor device |