Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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06/08/1999 | US5910453 Deep UV anti-reflection coating etch |
06/08/1999 | US5910452 Forming trenches at the root of sidewalls of the gate structure before the polysilicon layer has been completely consumed |
06/08/1999 | US5910394 Radiation sensitive cured coating which exhibits substantial flexibility and reduces line growth |
06/08/1999 | US5910392 Acrylate copolymers |
06/08/1999 | US5910342 Introducing separately a precursor or activated species formed in different decomposition spaces into the depsotion space where the film is formed on the substrate; quality uniform films for semiconductors, electrophotographic devices |
06/08/1999 | US5910341 Method of controlling the spread of an adhesive on a circuitized organic substrate |
06/08/1999 | US5910339 Fabrication of atomic step-free surfaces |
06/08/1999 | US5910338 Placing a conductive surface of a chuck on a rotating turntable, impacting with particles at a controlled angle to create grooves undercutting the conductive layer |
06/08/1999 | US5910334 Printing a thick cover layer of dielectric on the first circuit layer, over-lapping the porous dried but not fired feature definition print (fdp) which absorbs solvent, inhibiting spreading; good definition and thickness |
06/08/1999 | US5910257 Purifying, removing the radioactive impurities in phosphoric acid by dipping a semiconductor into the heated phosphoric acid, the radioactive deposit on semiconductor |
06/08/1999 | US5910255 Method of sequential laser processing to efficiently manufacture modules requiring large volumetric density material removal for micro-via formation |
06/08/1999 | US5910235 Etching and pipelined texturing of a substrate in a stationary vacuum deposition machine |
06/08/1999 | US5910221 Bonded silicon carbide parts in a plasma reactor |
06/08/1999 | US5910218 Process chamber, means for depositing dielectric film on substrate, means for annealing film |
06/08/1999 | US5910216 Crystal holding apparatus |
06/08/1999 | US5910022 Method and system for tungsten chemical mechanical polishing for unplanarized dielectric surfaces |
06/08/1999 | US5910021 Manufacture of semiconductor device with fine pattens |
06/08/1999 | US5910020 Method for fabricating a semiconductor device having a refractory metal pillar for electrical connection |
06/08/1999 | US5910019 Method of producing silicon layer having surface controlled to be uneven or even |
06/08/1999 | US5910018 Trench edge rounding method and structure for trench isolation |
06/08/1999 | US5910017 Increasing uniformity in a refill layer thickness for a semiconductor device |
06/08/1999 | US5910016 Scalable EPROM array |
06/08/1999 | US5910015 Thin film transistor and manufacturing method of the thin film transistor |
06/08/1999 | US5910014 Method of making compound semiconductor photodetector |
06/08/1999 | US5910013 Process for manufacturing a solid-state pick-up device |
06/08/1999 | US5910011 Method and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing system |
06/08/1999 | US5910010 Semiconductor integrated circuit device, and process and apparatus for manufacturing the same |
06/08/1999 | US5909995 Transport device for workpieces in a vacuum system |
06/08/1999 | US5909994 For loading wafers into a processing system |
06/08/1999 | US5909812 Container for storing and transporting leadframes |
06/08/1999 | US5909741 Chemical bath apparatus |
06/08/1999 | US5909706 Support table for supporting a module board and screen printing method using the same |
06/08/1999 | CA2085698C Energy sensitive materials and methods for their use |
06/03/1999 | WO1999027586A2 INxGa1-xP STOP-ETCH LAYER FOR SELECTIVE RECESS OF GALLIUM ARSENIDE-BASED EPTITAXIAL FIELD EFFECT TRANSISTORS AND PROCESS THEREFOR |
06/03/1999 | WO1999027584A1 Single electron devices |
06/03/1999 | WO1999027581A1 CHEMICAL MECHANICAL POLISHING OF FeRAM CAPACITORS |
06/03/1999 | WO1999027580A1 A novel hole-filling technique using cvd aluminum and pvd aluminum integration |
06/03/1999 | WO1999027579A1 Damage-free sculptured coating deposition |
06/03/1999 | WO1999027578A1 Ion implantation process to improve the gate oxide quality at the edge of a shallow trench isolation structure |
06/03/1999 | WO1999027577A1 Substrate transfer system for semiconductor processing equipment |
06/03/1999 | WO1999027576A2 Method of manufacturing a semiconductor device comprising a field effect transistor |
06/03/1999 | WO1999027575A1 Method of forming film by plasma |
06/03/1999 | WO1999027574A1 Method of plasma processing |
06/03/1999 | WO1999027573A1 High selectivity etching process for oxides |
06/03/1999 | WO1999027572A1 Method for delivery of hydrogen fluoride gas |
06/03/1999 | WO1999027571A1 Unlanded via structure and method for making same |
06/03/1999 | WO1999027566A1 Automatic modular wafer substrate handling device |
06/03/1999 | WO1999027565A1 Method and apparatus for enhanced cleaning of a workpiece with mechanical energy |
06/03/1999 | WO1999027564A1 Heating and pressurizing apparatus for use in mounting electronic components, and apparatus and method for mounting electronic components |
06/03/1999 | WO1999027563A1 Rapid thermal processing (rtp) system with gas driven rotating substrate |
06/03/1999 | WO1999027561A2 Stable hydride source compositions for manufacture of semiconductor devices and structures |
06/03/1999 | WO1999027420A1 Method of fine feature edge tuning with optically-halftoned mask |
06/03/1999 | WO1999027328A1 Liquid level pressure sensor and method |
06/03/1999 | WO1999027164A1 Charge for vertical boat growth process and use thereof |
06/03/1999 | WO1999027150A1 Sputtering target |
06/03/1999 | WO1999026873A1 Disk gripper |
06/03/1999 | WO1999026796A1 Plasma processing methods and apparatus |
06/03/1999 | WO1999026762A1 Wafer backing insert for free mount semiconductor polishing apparatus and process |
06/03/1999 | WO1999026761A1 Polishing apparatus |
06/03/1999 | WO1999026758A1 Electrochemical-control of abrasive polishing and machining rates |
06/03/1999 | WO1999026753A1 Method and device for thermally bonding connecting surfaces of two substrates |
06/03/1999 | WO1999026752A1 Method and device for assembling two structures with a weld bead |
06/03/1999 | WO1999014784A3 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
06/03/1999 | WO1999014575B1 Improved sample inspection system |
06/03/1999 | WO1999013498A3 Combined cmp and wafer cleaning apparatus and associated methods |
06/03/1999 | CA2311564A1 Inxga1-xp stop-etch layer for selective recess of gallium arsenide-based eptitaxial field effect transistors and process therefor |
06/02/1999 | EP0920135A2 D/A conversion circuit and semiconductor device |
06/02/1999 | EP0920061A2 Capacitor and corresponding memory device, and method of manufacturing the same |
06/02/1999 | EP0920060A2 SRAM cell array and fabrication process thereof |
06/02/1999 | EP0920059A2 Memory cell array and method of producing the same |
06/02/1999 | EP0920058A2 Circuit component built-in module and method for producing the same |
06/02/1999 | EP0920057A2 Secure integrated chip with conductive shield |
06/02/1999 | EP0920054A1 Semiconductor memory and method for manufacturing the same |
06/02/1999 | EP0920053A2 Device for exposing the peripheral area of a semiconductor wafer |
06/02/1999 | EP0920036A1 Integrated circuit transformer |
06/02/1999 | EP0919940A2 Computer simulation method of silicon oxidation |
06/02/1999 | EP0919938A2 Optimized emulation and prototyping architecture |
06/02/1999 | EP0919916A2 Embedded logic analyzer |
06/02/1999 | EP0919875A1 Mask blank and method of producing mask |
06/02/1999 | EP0919874A2 Photoresist composition effective for use as an ion etch barrier after patterning |
06/02/1999 | EP0919867A2 Chemically amplified resist for electron beam lithography |
06/02/1999 | EP0919823A2 System for verifying signal timing accuracy on a digital testing device |
06/02/1999 | EP0919822A2 System for verifying signal voltage level accuracy on a digital testing device |
06/02/1999 | EP0919817A2 Improved method and apparatus for direct probe sensing |
06/02/1999 | EP0919804A1 Inspection system for planar object |
06/02/1999 | EP0919643A2 Method of forming microcrystalline silicon film, photovoltaic element, and method of producing same |
06/02/1999 | EP0919602A1 Metal polishing agent and process for polishing metal using same |
06/02/1999 | EP0919336A2 Surface polishing pad |
06/02/1999 | EP0919330A1 Polishing pad cluster for polishing a semiconductor wafer |
06/02/1999 | EP0919015A1 Process and device for applying a photoresist lacquer on uneven base body surfaces |
06/02/1999 | EP0919014A1 Aqueous antireflective coatings for photoresist compositions |
06/02/1999 | EP0919013A1 Antireflective coatings for photoresist compositions |
06/02/1999 | EP0919012A1 Positive photoresist composition containing a 2,4-dinitro-1-naphthol |
06/02/1999 | EP0918887A1 Co-rotating edge ring extension for use in a semiconductor processing chamber |
06/02/1999 | EP0871565A4 Process for preparing an insulated multilayer structure |
06/02/1999 | EP0810910A4 Heat-sinking structures and electrical sockets for use therewith |
06/02/1999 | EP0808481B1 Photolithographic structure generation process |
06/02/1999 | EP0788657B1 High resolution active matrix lcd cell design |
06/02/1999 | EP0633823B1 Removal of surface contaminants by irradiation |
06/02/1999 | DE4433846C2 Verfahren zur Herstellung einer vertikalen integrierten Schaltungsstruktur A process for producing a vertical integrated circuit structure |