Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/1999
06/15/1999US5912046 By placing the liquid having solids in suspension in a centrifuge and spinning it about an axis so that liquid is forced against the surface of component
06/15/1999US5912044 Method for forming thin film capacitors
06/15/1999US5912043 Wafer spin coating system with photoresist pumping unit check function
06/15/1999US5912024 Sproutless pre-packaged molding for component encapsulation
06/15/1999US5911896 Substrate heating apparatus with glass-ceramic panels and thin film ribbon heater element
06/15/1999US5911889 Pretreated with an aqueous solution containing hydrogen fluoride, etched, exposed to ultrasound and containing alkali metal hydroxide
06/15/1999US5911887 Method of etching a bond pad
06/15/1999US5911864 Method of fabricating a semiconductor structure
06/15/1999US5911861 Coating station
06/15/1999US5911857 Method for forming metal wiring of semiconductor devices
06/15/1999US5911852 Plasma processing apparatus
06/15/1999US5911850 Separation of diced wafers
06/15/1999US5911837 Process for treatment of semiconductor wafers in a fluid
06/15/1999US5911836 Multilayer conductive metal on wafer with photoresists film
06/15/1999US5911835 Treatment of substrates with oxyamines, hydrazines, alkanolamines and water
06/15/1999US5911834 Gas delivery system
06/15/1999US5911833 Method of in-situ cleaning of a chuck within a plasma chamber
06/15/1999US5911832 Plasma immersion implantation with pulsed anode
06/15/1999US5911826 Method for pulling crystal
06/15/1999US5911822 Method of manufacturing silicon monocrystal, and seed crystal used in the method
06/15/1999US5911785 Test fixture and method of testing a spin rinse dryer and components thereof
06/15/1999US5911619 Apparatus for electrochemical mechanical planarization
06/15/1999US5911560 Getter pump module and system
06/15/1999US5911461 Carrier for a semiconductor wafer and use of the carrier
06/15/1999US5911326 Tray for visual inspection of semiconductor wafer
06/15/1999US5911257 Device for removing objects adhered to a plate for bonding a semiconductor wafer
06/15/1999US5911232 Ultrasonic cleaning device
06/15/1999CA2255471A1 Semiconductor device
06/15/1999CA2159560C Tray for a component and an apparatus for accurately placing a component within the tray
06/15/1999CA2114790C Symmetrical multi-layer metal logic array with continuous substrate taps
06/10/1999WO1999029146A1 Method and apparatus for monitoring and adjusting chamber impedance
06/10/1999WO1999029030A1 Improved ceramic electrostatic chuck and method of fabricating same
06/10/1999WO1999029001A2 Electrostatic chuck capable of rapidly dechucking a substrate
06/10/1999WO1999028995A1 Manually operated top loading socket for ball grid arrays
06/10/1999WO1999028975A1 Field effect transistor
06/10/1999WO1999028974A1 Pn-transition with increased breakdown voltage
06/10/1999WO1999028973A1 Power/ground metallization routing in a semiconductor device
06/10/1999WO1999028972A1 Semiconductor device with ferroelectric capacitor dielectric and method for making
06/10/1999WO1999028970A1 Semiconductor device and method for manufacturing the same
06/10/1999WO1999028968A1 Method of maintaining cleanliness of substrates and box for accommodating substrates
06/10/1999WO1999028967A1 Box for transferring semiconductor wafer
06/10/1999WO1999028966A1 Box for transferring semiconductor wafer
06/10/1999WO1999028965A1 Container and loader for substrate
06/10/1999WO1999028964A1 Method for producing electronic device and foreign matter analyser therefor
06/10/1999WO1999028963A1 Method of forming insulating film
06/10/1999WO1999028962A1 Method for forming plasma films
06/10/1999WO1999028961A1 Process for producing insulating film
06/10/1999WO1999028960A1 Method and device for activating semiconductor impurities
06/10/1999WO1999028959A1 Fine protuberance structure and method of production thereof
06/10/1999WO1999028958A1 RELAXED InxGA(1-x)As GRADED BUFFERS
06/10/1999WO1999028957A1 Substrate retaining apparatus and exposure apparatus using the same
06/10/1999WO1999028955A2 Chemical vapor deposition of titanium on a wafer comprising an in-situ precleaning step
06/10/1999WO1999028954A1 Method for applying a protecting lacquer on a wafer
06/10/1999WO1999028953A2 LONG RANGE ORDERED AND EPITAXIAL OXIDES INCLUDING SiO2, ON Si, SixGe1-x, GaAs AND OTHER SEMICONDUCTORS, MATERIAL SYNTHESIS, AND APPLICATIONS THEREOF
06/10/1999WO1999028952A2 Wafer-mapping load port interface
06/10/1999WO1999028951A2 Systems and methods for low contamination, high throughput handling of workpieces for vacuum processing
06/10/1999WO1999028945A1 A processing chamber and method for confining plasma
06/10/1999WO1999028914A2 Programmable sub-surface aggregating metallization structure and method of making same
06/10/1999WO1999028833A1 Method and system for improving a transistor model
06/10/1999WO1999028790A1 Interferometer system and lithographic apparatus comprising such a system
06/10/1999WO1999028789A1 Uv optical system with reduced ageing
06/10/1999WO1999028533A1 Mixed frequency cvd process and apparatus
06/10/1999WO1999028531A1 Chemical vapor deposition hardware and process
06/10/1999WO1999028528A1 High rate deposition of amorphous silicon films
06/10/1999WO1999028527A1 Method and apparatus for forming a metal layer
06/10/1999WO1999028526A1 Low resistivity w using b2h6 nucleation step
06/10/1999WO1999028525A1 Substrate processing chamber with tunable impedance
06/10/1999WO1999028524A1 Use of an asymmetric waveform to control ion bombardment during substrate processing
06/10/1999WO1999028222A1 Apparatus and method for transporting substrates
06/10/1999WO1999028220A1 Substrate transferring device and method
06/10/1999WO1999028219A1 Substrate-holding device, substrate-holding method and exposure device
06/10/1999WO1999028213A1 Clean box
06/10/1999WO1999028084A1 Method and apparatus for conditioning polishing pads utilizing brazed diamond technology and titanium nitride
06/10/1999WO1999028039A1 Device for enriching a gas with a liquid
06/10/1999WO1999016110A3 Plasma process for selectively etching oxide using fluoropropane or fluoropropylene
06/10/1999WO1999012191A3 Tilt and go load port interface alignment system
06/10/1999WO1999010929A3 A method of providing a vertical interconnect between thin film microelectronic devices
06/10/1999WO1999000834A3 Method and apparatus for injection molded flip chip encapsulation
06/10/1999DE19856393A1 Automatic semiconductor wafer applicator to annular frame over adhesive foil
06/10/1999DE19854198A1 Substrate plasma processor with processing chamber for the substrate
06/10/1999DE19842419A1 Peeling layer removing method in semiconductor device manufacture
06/10/1999DE19833949A1 Semiconductor device, especially an all-CMOS SRAM cell, has a via interconnect structure
06/10/1999DE19813193A1 Electronic module separation method e.g. for semiconductor module
06/10/1999DE19804248A1 Tetra-state mask read only memory
06/10/1999DE19754513A1 Producing a microstructure for chemical sensors etc.
06/10/1999DE19754458A1 Chips are produced using heat resistant plastic strips for guiding molten resin to dies on a chip carrier
06/10/1999DE19753782A1 Wafer planarization involves developing for almost complete photoresist layer removal above highest peaks
06/10/1999DE19753596A1 Application of thin film of lacquer to substrate
06/10/1999DE19752942A1 Vorrichtung zum Anreichern eines Gases mit einer Flüssigkeit Device for enrichment of a gas with a liquid
06/10/1999DE19752926A1 Verfahren zum Aufbringen eines Schutzlacks auf einen Wafer Method for applying a protective resist to a wafer
06/10/1999CA2318330A1 Method and system for improving a transistor model
06/10/1999CA2311787A1 Relaxed inxga(1-x)as graded buffers
06/10/1999CA2311766A1 Long range ordered and epitaxial oxides including sio2, on si, sixge1-x, gaas and other semiconductors, material synthesis, and applications thereof
06/10/1999CA2279182A1 Power/ground metallization routing in a semiconductor device
06/10/1999CA2278578A1 Method and device for activating semiconductor impurities
06/09/1999EP0921714A1 Rfq accelerator and ion implanter
06/09/1999EP0921619A2 A power source circuit of a semiconductor integrated circuit
06/09/1999EP0921577A1 Light emitting element, semiconductor light emitting device, and method for manufacturing them
06/09/1999EP0921576A2 Thin film transistor with a LDD structure and method of producing the same
06/09/1999EP0921575A2 Semiconductor device comprising a heterostructure MIS field-effect transistor having a strained channel layer
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