Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2000
01/05/2000EP0968527A1 Method for producing a vertical mos-transistor
01/05/2000EP0968526A2 Method of forming etched structures comprising implantation steps
01/05/2000EP0968525A1 Uv/halogen metals removal process
01/05/2000EP0968524A1 Atmospheric-pressure plasma jet
01/05/2000EP0968523A1 Method for forming a structured metallization on a semiconductor wafer
01/05/2000EP0968522A1 Method of checking for the presence of connection balls
01/05/2000EP0968458A1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars
01/05/2000EP0968142A1 Reactive ion etching of silica structures
01/05/2000EP0968081A1 Flattening process for bonded semiconductor substrates
01/05/2000EP0958595A4 A new non-thermal process for annealing crystalline materials
01/05/2000EP0761015B1 Semiconductor device of the type sealed in glass comprising a semiconductor body connected to slugs by means of a silver-aluminium bonding layer
01/05/2000EP0752159B1 Semiconductor device provided with a microcomponent having a fixed and a movable electrode
01/05/2000DE19929656A1 Non-volatile ferromagnetic memory achieves high access speed without danger of damaging a reference cell
01/05/2000DE19929239A1 MOSFET integrated circuit manufacture lithography masking technique
01/05/2000DE19918932A1 Dynamic RAM (DRAM) type semiconductor memory with numerous memory cells
01/05/2000DE19912628A1 Elektrisch leitfähige, thermoplastische und hitzeaktivierbare Klebstoffolie Electrically conductive, thermoplastic and heat-activatable adhesive film
01/05/2000DE19831216A1 Verfahren und Vorrichtung zur Bestimmung der Abhängigkeit einer ersten Meßgröße von einer zweiten Meßgröße Method and device for determining the function of a first measured quantity of a second measured variable
01/05/2000DE19829612A1 Beleuchtungssystem der Mikrolithographie mit Depolarisator Lighting system for microlithography with depolarizer
01/05/2000DE19828970A1 Verfahren zur Herstellung und Vereinzelung von Halbleiter-Lichtemissionsdioden Process for the preparation and separation of semiconductor light emitting diodes
01/05/2000DE19828664A1 Semiconductor arrangement e.g. power semiconductor based on chip-on-chip (COC) technology
01/05/2000DE19826971A1 Mechanical and electric coupling integrated circuits
01/05/2000CN2357414Y Improved semiconductor element lead wire frame
01/05/2000CN1240537A Patterns of electrically conducting polymers and their application as electrodes or electrical contacts
01/05/2000CN1240536A Memory cell arrangement and process for manufacturing the same
01/05/2000CN1240535A Chip module and manufacture of same
01/05/2000CN1240470A Die attach adhesive compositions
01/05/2000CN1240465A Thermally reworkable binders for flip-chip devices
01/05/2000CN1240464A Thermosetting encapsulants for electronics packaging
01/05/2000CN1240304A GaN monocrystal substrate and making method thereof
01/05/2000CN1240303A Channel capacitor with insulating axle ring
01/05/2000CN1240302A Method for producing semiconductor film and the method for producing solar energy cell using said film
01/05/2000CN1240236A Dry method preparing copperous sulfide film
01/05/2000CN1240223A Polishing composition and surface treating composition
01/05/2000CN1048127C Architecture and interconnect scheme for programmable logic circuit
01/05/2000CN1048118C Method of rough polishing semiconductor wafes to reduce surface roughness
01/05/2000CN1048044C Improved method for growing silicon crystal
01/04/2000US6011914 Method for simulating diffusion of impurity materials in semiconductor devices
01/04/2000US6011912 Automatic routing method with net ordering for facilitated collision evasion
01/04/2000US6011746 Word line driver for semiconductor memories
01/04/2000US6011725 Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping
01/04/2000US6011723 Nonvolatile semiconductor memory device including a circuit for providing a boosted potential
01/04/2000US6011714 Semiconductor circuit capable of storing a plurality of analog or multi-valued data
01/04/2000US6011713 Static random access memory including potential control means for writing data in memory cell and write method for memory cell
01/04/2000US6011712 Interconnection structures for integrated circuits including recessed conductive layers
01/04/2000US6011627 Universal mapping tool
01/04/2000US6011622 Particle monitoring system
01/04/2000US6011612 Processing apparatus using a laser light source
01/04/2000US6011611 Method of measuring aberration of projection optics
01/04/2000US6011426 Substrate voltage generation circuit for semiconductor device
01/04/2000US6011404 System and method for determining near--surface lifetimes and the tunneling field of a dielectric in a semiconductor
01/04/2000US6011315 Semiconductor device and film carrier tape and respective manufacturing methods thereof
01/04/2000US6011313 Flip chip interconnections on electronic modules
01/04/2000US6011312 Flip-chip semiconductor package
01/04/2000US6011310 Film carrier and semiconductor device using the same
01/04/2000US6011309 Wiring structure of thin film transistor array and method of manufacturing the same
01/04/2000US6011308 Semiconductor device having a barrier film formed to prevent the entry of moisture and method of manufacturing the same
01/04/2000US6011307 Anisotropic conductive interconnect material for electronic devices, method of use and resulting product
01/04/2000US6011306 Semiconductor device and method for fabricating same
01/04/2000US6011305 Semiconductor device having metal alloy for electrodes
01/04/2000US6011301 Stress reduction for flip chip package
01/04/2000US6011300 Semiconductor integrated circuit device
01/04/2000US6011298 High voltage termination with buried field-shaping region
01/04/2000US6011293 Semiconductor device having a structure for detecting a boosted potential
01/04/2000US6011292 Semiconductor device having an alignment mark
01/04/2000US6011290 Short channel length MOSFET transistor
01/04/2000US6011289 Metal oxide stack for flash memory application
01/04/2000US6011288 Flash memory cell with vertical channels, and source/drain bus lines
01/04/2000US6011286 Double stair-like capacitor structure for a DRAM cell
01/04/2000US6011285 C-axis oriented thin film ferroelectric transistor memory cell and method of making the same
01/04/2000US6011284 Comprising oxides of noble metal selected from platinum, iridium, ruthenium, rhodium, palladium, and transition metal selected from hafnium, tantalum, zirconium, niobium, vanadium, molybdenum, tungsten
01/04/2000US6011282 Charge coupled device with a buried channel two-phase driven two-layer electrode structure
01/04/2000US6011281 Semiconductor device having an ohmic contact and a Schottky contact, with a barrier layer interposed between the ohmic contact and the Schottky contact
01/04/2000US6011279 Silicon carbide field controlled bipolar switch
01/04/2000US6011278 Lateral silicon carbide semiconductor device having a drift region with a varying doping level
01/04/2000US6011277 Gate insulated field effect transistors and method of manufacturing the same
01/04/2000US6011276 Thin film transistor and fabrication method thereof
01/04/2000US6011275 Semiconductor device and method of manufacturing the same
01/04/2000US6011272 Silicided shallow junction formation and structure with high and low breakdown voltages
01/04/2000US6011271 Semiconductor device and method of fabricating the same
01/04/2000US6011269 Shaped shadow projection for an electron beam column
01/04/2000US6011268 Demagnifying projection-optical system for electron beam lithography with aberration control
01/04/2000US6011261 Probe formed of mono-crystalline SI, the manufacturing method thereof, and an information processing device using the probe
01/04/2000US6011123 Organosilane compound; polyamic acids having a hydrolyzable silyl group or carboxylic acid anhydride group, or both, and polyimides having a hydrolyzable silyl group or carboxylic acid anhydride group, or both.
01/04/2000US6010969 Method of depositing films on semiconductor devices by using carboxylate complexes
01/04/2000US6010968 Method for forming a contact opening with multilevel etching
01/04/2000US6010967 Plasma etching methods
01/04/2000US6010966 Hydrocarbon gases for anisotropic etching of metal-containing layers
01/04/2000US6010965 Method of forming high integrity vias
01/04/2000US6010964 Wafer surface treatment methods and systems using electrocapillarity
01/04/2000US6010963 Global planarization using SOG and CMP
01/04/2000US6010962 Copper chemical-mechanical-polishing (CMP) dishing
01/04/2000US6010961 Methods of establishing electrical communication with substrate node locations, semiconductor processing methods of forming dynamic random access memory (DRAM) circuitry, and semiconductor assemblies
01/04/2000US6010960 Method and system for providing an interconnect having reduced failure rates due to voids
01/04/2000US6010958 Method for improving the planarization of dielectric layer in the fabrication of metallic interconnects
01/04/2000US6010957 Semiconductor device having tapered conductive lines and fabrication thereof
01/04/2000US6010955 Electrical connection forming process for semiconductor devices
01/04/2000US6010954 Cmos gate architecture for integration of salicide process in sub 0.1 . .muM devices
01/04/2000US6010953 Method for forming a semiconductor buried contact with a removable spacer
01/04/2000US6010952 Process for forming metal silicide contacts using amorphization of exposed silicon while minimizing device degradation
01/04/2000US6010951 Dual side fabricated semiconductor wafer