| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/04/2000 | US6010950 Method of manufacturing semiconductor bonded substrate |
| 01/04/2000 | US6010949 Method for removing silicon nitride in the fabrication of semiconductor devices |
| 01/04/2000 | US6010948 Shallow trench isolation process employing a BPSG trench fill |
| 01/04/2000 | US6010947 Semiconductor device and method for manufacturing |
| 01/04/2000 | US6010946 Semiconductor device with isolation insulating film tapered and method of manufacturing the same |
| 01/04/2000 | US6010945 Method for preventing alignment marks from disappearing after chemical mechanical polishing |
| 01/04/2000 | US6010944 Method for increasing capacity of a capacitor |
| 01/04/2000 | US6010943 Method of fabricating a cylindrical capacitor |
| 01/04/2000 | US6010942 Post chemical mechanical polishing, clean procedure, used for fabrication of a crown shaped capacitor structure |
| 01/04/2000 | US6010941 Method of forming a capacitor |
| 01/04/2000 | US6010940 Methods for fabricating CVD TiN barrier layers for capacitor structures |
| 01/04/2000 | US6010939 Methods for making shallow trench capacitive structures |
| 01/04/2000 | US6010938 Method for making a load resistor on a semiconductor chip |
| 01/04/2000 | US6010937 Reduction of dislocations in a heteroepitaxial semiconductor structure |
| 01/04/2000 | US6010936 Semiconductor device fabrication method |
| 01/04/2000 | US6010935 Self aligned contacts |
| 01/04/2000 | US6010934 Method of making nanometer Si islands for single electron transistors |
| 01/04/2000 | US6010933 Method for making a planarized capacitor-over-bit-line structure for dynamic random access memory (DRAM) devices |
| 01/04/2000 | US6010932 Fork-like memory structure for ULSI DRAM and method of fabrication |
| 01/04/2000 | US6010931 Planarization technique for DRAM cell capacitor electrode |
| 01/04/2000 | US6010930 Vertically oriented structure with sloped opening and method for etching |
| 01/04/2000 | US6010929 Method for forming high voltage and low voltage transistors on the same substrate |
| 01/04/2000 | US6010928 High density transistor component and its manufacturing method |
| 01/04/2000 | US6010927 Method for making a ferroelectric device having a tantalum nitride barrier layer |
| 01/04/2000 | US6010926 Method for forming multiple or modulated wells of semiconductor device |
| 01/04/2000 | US6010925 Method of making dual-gate CMOSFET |
| 01/04/2000 | US6010924 Process for fabricating a thin film transistor |
| 01/04/2000 | US6010923 Manufacturing method of semiconductor device utilizing annealed semiconductor layer as channel region |
| 01/04/2000 | US6010922 Semiconductor device with increased distance between channel edges and a gate electrode |
| 01/04/2000 | US6010921 Method of fabricating a field-effect transistor utilizing an SOI substrate |
| 01/04/2000 | US6010919 Method for manufacturing semiconductor devices by use of dry etching |
| 01/04/2000 | US6010917 Electrically isolated interconnects and conductive layers in semiconductor device manufacturing |
| 01/04/2000 | US6010916 Method for improving semiconductor wafer processing |
| 01/04/2000 | US6010914 Method for manufacturing a semiconductor device |
| 01/04/2000 | US6010831 Ultra-fine microfabrication method using an energy beam |
| 01/04/2000 | US6010829 Polysilicon linewidth reduction using a BARC-poly etch process |
| 01/04/2000 | US6010827 Electron beam exposure utilizing pre-processed mask pattern |
| 01/04/2000 | US6010782 Pressure sensitive adhesive |
| 01/04/2000 | US6010769 Multilayer wiring board and method for forming the same |
| 01/04/2000 | US6010755 Method and apparatus for forming thin films using dual ECR plasma generators |
| 01/04/2000 | US6010744 Dielectric of a capacitor |
| 01/04/2000 | US6010637 Method and apparatus for preparing a sample for optical analysis and method of controlling the apparatus |
| 01/04/2000 | US6010603 Using ions |
| 01/04/2000 | US6010591 Method for the releasable bonding and subsequent separation of reversibly bonded and polished wafers and also a wafer structure and wafer |
| 01/04/2000 | US6010579 Reusable substrate for thin film separation |
| 01/04/2000 | US6010570 Apparatus for forming coating film for semiconductor processing |
| 01/04/2000 | US6010399 Use of a sensor to control the fan filter unit of a standard mechanical inter face |
| 01/04/2000 | US6010396 Blade cover in a cutting apparatus |
| 01/04/2000 | US6010395 Chemical-mechanical polishing apparatus |
| 01/04/2000 | US6010133 Chamber interfacing O-rings and method for implementing same |
| 01/04/2000 | US6010057 Method for making a wire connections of predetermined shape |
| 01/04/2000 | US6010009 Shipping and transport cassette with kinematic coupling |
| 01/04/2000 | US6010008 Transport module |
| 01/04/2000 | US6009938 Extruded, tiered high fin density heat sinks and method of manufacture |
| 01/04/2000 | US6009890 Substrate transporting and processing system |
| 01/04/2000 | US6009888 Peroxidisulfate and hcl oxidizer |
| 01/04/2000 | US6009831 Apparatus for low pressure chemical vapor deposition |
| 01/04/2000 | US6009830 Independent gas feeds in a plasma reactor |
| 01/04/2000 | US6009827 Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films |
| 01/04/2000 | US6009667 Hinge mechanism for supporting the open-close cover of a vacuum-process apparatus |
| 12/30/1999 | DE19930234A1 Electrostatic deflector used as a subsidiary deflector for an electron beam illumination unit useful for forming fine structure patterns in high density integrated circuits |
| 12/30/1999 | DE19929684A1 Trench isolation formation for minimizing the narrow channel effect of a transistor especially in a DRAM chip |
| 12/30/1999 | DE19928570A1 Semiconductor device, especially a multilayer circuit structure, production process |
| 12/30/1999 | DE19928524A1 Integrated circuit test unit for testing one or more semiconductor structural elements |
| 12/30/1999 | DE19928291A1 Sensor structure with physically isolated, electrically connected structures, e.g. acceleration sensor |
| 12/30/1999 | DE19927036A1 Four-pole electron gun for an electron beam exposure apparatus used for drawing patterns on a material to be exposed, particularly a wafer |
| 12/30/1999 | DE19926250A1 Encapsulation of automobile electromagnetic velocity sensor |
| 12/30/1999 | DE19912980A1 Solar cell device e.g. for satellite, wrist watch, pocket calculator, portable computer, or mobile telephone |
| 12/30/1999 | DE19907719A1 Semiconductor device with DPSA structure |
| 12/30/1999 | DE19836736C1 Combination type precharging and equalising-circuit for semiconductor memory device |
| 12/30/1999 | DE19828969A1 Manufacturing integrated semiconductor components |
| 12/30/1999 | DE19828574A1 Metallization of surface regions of small ceramic bodies, e.g. substrates of electronic circuits, resistors, capacitors and coils, to produce contact faces for soldered connections |
| 12/30/1999 | DE19820758C1 Herstellverfahren für mikromechanische Bauelemente Production process for micromechanical devices |
| 12/29/1999 | WO1999067825A2 Methods of fabricating silicon carbide power devices by controlled annealing |
| 12/29/1999 | WO1999067823A1 Integrated circuit having a level of metallization of variable thickness |
| 12/29/1999 | WO1999067821A1 Plastic integrated circuit package and method and leadframe for making the package |
| 12/29/1999 | WO1999067820A1 Method for producing thin substrate layers |
| 12/29/1999 | WO1999067819A1 Thermocompression bonding device and bonding head thereof |
| 12/29/1999 | WO1999067818A1 Device and method for forming a device having a cavity with controlled atmosphere |
| 12/29/1999 | WO1999067817A1 Silicon trench etching using silicon-containing precursors to reduce or avoid mask erosion |
| 12/29/1999 | WO1999067816A1 Dry-etching device and method of producing semiconductor devices |
| 12/29/1999 | WO1999067815A1 Crystallographic wet chemical etching of iii-nitride material |
| 12/29/1999 | WO1999067814A1 Anisotropic etching method and apparatus |
| 12/29/1999 | WO1999067813A1 Electrostatic printing of a metallic toner to produce a polycrystalline semiconductor from an amorphous semiconductor |
| 12/29/1999 | WO1999067812A1 Chuck table for semiconductor wafer |
| 12/29/1999 | WO1999067808A1 High sputter, etch resistant window for plasma processing chambers |
| 12/29/1999 | WO1999067683A2 Optical system, especially a projection light facility for microlithography |
| 12/29/1999 | WO1999067443A1 Methods for etching an aluminum-containing layer |
| 12/29/1999 | WO1999067440A2 Substrate support member with a purge gas channel and pumping system |
| 12/29/1999 | WO1999067186A1 Method for producing dielectric porcelain composition for electronic device |
| 12/29/1999 | WO1999067158A2 Integrated roller transport pod and asynchronous conveyor |
| 12/29/1999 | WO1999067087A1 Method of making an adhesive preform lid for electronic devices |
| 12/29/1999 | WO1999067068A1 Wire cutting pliers |
| 12/29/1999 | WO1999067056A1 Composition for the chemical mechanical polishing of metal layers |
| 12/29/1999 | WO1999067054A1 Wafer edge polishing method and apparatus |
| 12/29/1999 | WO1999060448A8 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 12/29/1999 | WO1999056057B1 Fluid storage and dispensing system |
| 12/29/1999 | WO1999034412A3 Workpiece chuck |
| 12/29/1999 | EP0967721A2 Semiconductor protection device and power converting system |
| 12/29/1999 | EP0967664A1 Gallium nitride single crystal substrate and method of producing the same |