Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2000
07/04/2000US6083323 Controlling coolant flow proximate a reaction chamber within a cvd system such that the temperature of the walls is maintained at a predefined target temperature.
07/04/2000US6083321 Fluid delivery system and method
07/04/2000US6083320 Robot for and method of transporting semiconductor wafers
07/04/2000US6083274 Integrated structure layout and layout of interconnections for an integrated circuit chip
07/04/2000US6083273 Static timing analyzer and analyzing method for semiconductor integrated circuits
07/04/2000US6083272 Method of adjusting currents on a semiconductor device having transistors of varying density
07/04/2000US6083090 Polishing apparatus for semiconductor wafers
07/04/2000US6083089 Method and apparatus for chemical mechanical polishing
07/04/2000US6082951 Wafer cassette load station
07/04/2000US6082950 Front end wafer staging with wafer cassette turntables and on-the-fly wafer center finding
07/04/2000US6082949 Load port opener
07/04/2000US6082948 Controlled environment enclosure and mechanical interface
07/04/2000US6082798 Device for gripping magazines
07/04/2000US6082714 Vaporization apparatus and process
07/04/2000US6082629 Photoresist suck-back device in manufacturing system for semiconductor devices
07/04/2000US6082610 Method of forming interconnections on electronic modules
07/04/2000US6082605 Continuous mode solder jet apparatus
07/04/2000US6082547 Adapter jig
07/04/2000US6082540 Cushion system for wafer carriers
07/04/2000US6082497 Manual wafer lift
07/04/2000US6082381 Treatment apparatus
07/04/2000US6082379 Mechanism for cleaning an integrated circuit wafer hot plate while the hot plate is at operating temperature
07/04/2000US6082377 Vertical wafer cleaning and drying system
07/04/2000US6082374 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher
07/04/2000US6082373 Cleaning method
07/04/2000US6082297 Encapsulated thermofoil heater apparatus and associated methods
07/04/2000US6082295 Plasma etching chamber for manufacturing semiconductor devices
07/04/2000US6082294 Method and apparatus for depositing diamond film
07/04/2000US6082293 Plasma source
07/04/2000US6082179 Particle measuring device having funnel-shaped collector for semiconductor clean room applications
07/04/2000US6081997 System and method for packaging an integrated circuit using encapsulant injection
07/04/2000US6081978 Resin-encapsulated semiconductor device producing apparatus and method
07/04/2000CA2056299C Pellicle structure and process for preparation thereof
07/04/2000CA2014871C Package to board variable pitch tab
06/2000
06/29/2000WO2000038322A1 Overvoltage-protected i/o buffer
06/29/2000WO2000038247A1 Reduced diffusion of a mobile specie from a metal oxide ceramic
06/29/2000WO2000038245A1 Dual pocket, two sided program/erase non-volatile memory cell
06/29/2000WO2000038244A1 Field effect transistor arrangement with a trench gate electrode and an additional highly doped layer in the body region
06/29/2000WO2000038243A1 Peripheral structure for monolithic power device
06/29/2000WO2000038240A1 Floating gate memory cell structure with programming mechanism outside the read path
06/29/2000WO2000038239A1 Eeprom cell using p-well for tunneling across a channel
06/29/2000WO2000038238A1 Reduced diffusion of a mobile ion from a metal oxide ceramic into the substrate
06/29/2000WO2000038237A1 A method of manufacturing a semiconductor device
06/29/2000WO2000038236A1 Cmos high-to-low voltage buffer
06/29/2000WO2000038235A1 Circuit assembly with at least one nanoelectronic component and method for producing the same
06/29/2000WO2000038229A1 Method for producing cmos transistors and related devices
06/29/2000WO2000038227A1 Method of making a semiconductor device including an asymmetrical field-effect transistor
06/29/2000WO2000038226A1 Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom
06/29/2000WO2000038225A1 Improvement in adhesion of diffusion barrier and fluorinated silicon dioxide using hydrogen based preclean technology
06/29/2000WO2000038224A1 Semiconductor chip interconnect barrier material and fabrication method
06/29/2000WO2000038223A1 Combination cmp-etch method for forming a thin planar layer over the surface of a device
06/29/2000WO2000038222A1 Substrate carrier
06/29/2000WO2000038221A1 Device for processing substrates
06/29/2000WO2000038220A1 Device and method for processing substrates
06/29/2000WO2000038219A1 Device and method for processing substrates
06/29/2000WO2000038192A1 Magnetic random access memory with a reference memory array
06/29/2000WO2000038191A1 Method of fabricating a magnetic random access memory
06/29/2000WO2000038022A1 Method and apparatus for controlling a system using hierarchical state machines
06/29/2000WO2000038016A1 Novolac polymer planarization films with high temperature stability
06/29/2000WO2000038015A1 Method of imaging a mask pattern on a substrate by means of euv radiation, and apparatus and mask for performing the method
06/29/2000WO2000037716A1 Plating apparatus, plating system, method for plating using the same
06/29/2000WO2000037712A1 Liquid delivery mocvd process for deposition of high frequency dielectric materials
06/29/2000WO2000037710A1 Indium source reagent compositions
06/29/2000WO2000037578A1 Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry
06/29/2000WO2000037340A1 In/out load port transfer mechanism
06/29/2000WO2000037339A1 Integrated load port-conveyor transfer system
06/29/2000WO2000037338A1 Integrated intra-bay transfer, storage and delivery system
06/29/2000WO2000037217A1 Method for cleaning an abrasive surface
06/29/2000WO2000037209A1 Method and apparatus for removal of mold flash
06/29/2000WO2000024041B1 Carrier for cleaning silicon wafers
06/29/2000WO2000003420A3 Method for forming a copper film on a substrate
06/29/2000WO2000003416A3 A wafer carrier having a low tolerance build-up
06/29/2000WO2000002236A8 Radio frequency identification system and method for tracking silicon wafers
06/29/2000WO1999065078A3 Semiconductor device
06/29/2000DE19960236A1 Upward power supply circuit for integrated semiconducting circuit has cascade of rectifier and capacitor arrangements, driver outputting signal whose amplitude does not vary rapidly
06/29/2000DE19960151A1 Verfahren zur Herstellung von elektrisch isolierten aktiven Bereichen in einem Siliciumsubstrat Process for the preparation of electrically isolated active regions in a silicon substrate
06/29/2000DE19956982A1 Carrier handling device of module integrated circuit handler, has image pickup to detect correct movement of carrier from loading to unloading position
06/29/2000DE19956981A1 Swivel mechanism for handling device of tested integrated circuit components for changing direction of support contains swivel plate swivels about its axis at one side of a discharge closure at the testing position
06/29/2000DE19955145A1 Verfahren zum anisotropen plasmachemischen Trockenätzen von Silizimnitrid-Schichten mittels eines Fluor enthaltenden Gasgemisches A method for anisotropic plasma chemical dry etching of Silizimnitrid layers using a fluorine-containing gas mixture
06/29/2000DE19938481A1 Semiconductor component, especially a submicron or deep submicron DRAM cell, has a deep trench with upper and lower side wall regions separated at a certain depth by an abrupt width increase
06/29/2000DE19932959A1 Semiconducting device has IGBT with gate formed by gate insulator on n-conducting semiconducting layer formed on p-conducting layer, thyristor remote from IGBT
06/29/2000DE19927971A1 Verfahren zum Erzeugen einer mikromechanischen Struktur für ein mikro-elektromechanisches Element A method of producing a micromechanical structure for a micro-electromechanical element
06/29/2000DE19927970A1 Verfahren zum Erzeugen eines mikro-elektromechanischen Elements A method for producing a micro-electromechanical element
06/29/2000DE19922547A1 Solar cell production comprises etching tiny concave and convex surface patterns on a silicon substrate by immersion in an aqueous sodium carbonate solution
06/29/2000DE19916636A1 Semiconductor chip with ferromagnetic screen
06/29/2000DE19859634A1 Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie Optical system, in particular projection exposure system for microlithography
06/29/2000DE19859429A1 Verfahren zur Herstellung epitaktischer Silizium-Germaniumschichten Process for the preparation of epitaxial silicon-germanium layers
06/29/2000DE19859023A1 Layer or component separation from a support, e.g. nickel layer separation from titanium or photoresist layer or electroformed micro-component separation from a wafer, is carried out using targeted sonic vibration
06/29/2000DE19858357A1 Mikroelektronische Struktur sowie Verfahren zu deren Herstellung A microelectronic structure as well as processes for their preparation
06/29/2000DE19857038A1 FEMFET-Vorrichtung und Verfahren zu deren Herstellung FEMFET apparatus and process for their preparation
06/29/2000DE19850145C1 Isothermal gas phase treatment chamber, for surface metal or dopant trace analysis of semiconductor wafers, has a wafer space with horizontal individual wafer compartments open to a gas space
06/29/2000CA2355183A1 Integrated load port-conveyor transfer system
06/29/2000CA2355135A1 In/out load port transfer mechanism
06/29/2000CA2355093A1 Integrated intra-bay transfer, storage and delivery system
06/28/2000EP1014763A2 Compact helical resonator coil for ion implanter linear accelerator
06/28/2000EP1014457A2 Micro-fabrication method and sensor using the same
06/28/2000EP1014453A1 Semiconductor device and method for manufacturing the same
06/28/2000EP1014452A1 Method of detaching thin-film device, method of transferring thin-film device, thin-film device, active matrix substrate, and liquid crystal display
06/28/2000EP1014450A2 Trench MOSFET having improved breakdown and on-resistance characteristics and process for manufacturing the same
06/28/2000EP1014449A1 Semiconductor device and method of producing the same
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