| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 06/20/2000 | US6077741 Method of fabricating DRAM capacitor |
| 06/20/2000 | US6077740 Method for forming a semiconductor device contact structure comprising a contour |
| 06/20/2000 | US6077739 Methods for manufacturing DRAM capacitors |
| 06/20/2000 | US6077738 Inter-level dielectric planarization approach for a DRAM crown capacitor process |
| 06/20/2000 | US6077737 Method for forming a DRAM having improved capacitor dielectric layers |
| 06/20/2000 | US6077736 Method of fabricating a semiconductor device |
| 06/20/2000 | US6077735 Method of manufacturing semiconductor device |
| 06/20/2000 | US6077734 Method of fabricating semiconductor device with extremely shallow junction |
| 06/20/2000 | US6077733 Method of manufacturing self-aligned T-shaped gate through dual damascene |
| 06/20/2000 | US6077732 Method of forming a thin film transistor |
| 06/20/2000 | US6077731 Semiconductor device and method for fabricating the same |
| 06/20/2000 | US6077730 Method of fabricating thin film transistors |
| 06/20/2000 | US6077729 Memory array having a multi-state element and method for forming such array or cellis thereof |
| 06/20/2000 | US6077728 Method of producing a ceramic package main body |
| 06/20/2000 | US6077727 Method for manufacturing lead frame |
| 06/20/2000 | US6077725 High density contact pads on silicon substrate |
| 06/20/2000 | US6077723 Method for fabricating a multi chip module with alignment member |
| 06/20/2000 | US6077722 Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts |
| 06/20/2000 | US6077721 Containing aluminosilicate glass |
| 06/20/2000 | US6077720 Method for fabricating semiconductor laser facets using combined cleave and polish technique |
| 06/20/2000 | US6077719 Semiconductor device evaluation method, method of controlling the semiconductor device production processes and recording medium |
| 06/20/2000 | US6077716 Matrix type multiple numeration system ferroelectric random access memory using leakage current |
| 06/20/2000 | US6077715 Method for forming ferroelectric dielectric for integrated circuit applications at microwave frequencies |
| 06/20/2000 | US6077643 Polymers and photoresist compositions |
| 06/20/2000 | US6077633 Mask and method of forming a mask for avoiding side lobe problems in forming contact holes |
| 06/20/2000 | US6077632 Mask and device for managing the same |
| 06/20/2000 | US6077631 Photomask and scanning exposure apparatus and device manufacturing method using same |
| 06/20/2000 | US6077619 Polycrystalline silicon carbide ceramic wafer and substrate |
| 06/20/2000 | US6077574 Plasma CVD process for forming a fluorine-doped SiO2 dielectric film |
| 06/20/2000 | US6077573 Doping, patterning; improving uniformity and memory cell capacitance in integrated circuits |
| 06/20/2000 | US6077571 Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation |
| 06/20/2000 | US6077564 Firing paste of pulverulent glass with manganese oxide, alumina and silica components in moist, reducing atmosphere; plating |
| 06/20/2000 | US6077562 Method for depositing barium strontium titanate |
| 06/20/2000 | US6077560 Method for continuous and maskless patterning of structured substrates |
| 06/20/2000 | US6077452 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 06/20/2000 | US6077451 Method and apparatus for etching of silicon materials |
| 06/20/2000 | US6077450 Method for etching platinum |
| 06/20/2000 | US6077437 Polishing agent recovery and reuse method and device for the same removes large impurities by a filtration device, concentrates by an ultrafiltration device, and continuously recovers polishing agent; used for semiconductor polishing |
| 06/20/2000 | US6077412 Processing chamber for depositing and/or removing material onto/from a semiconductor wafer |
| 06/20/2000 | US6077406 Sputtering system |
| 06/20/2000 | US6077404 Method and apparatus for reflowing a material layer; by layering various materials (i.e., films) on a wafer in a prescribed pattern, a solid state electronic device is formed |
| 06/20/2000 | US6077403 Sputtering device used in the fabrication of various types of semiconductor articles |
| 06/20/2000 | US6077402 Method and apparatus for generating a plasma to sputter deposit a layer of material in the fabrication of semiconductor devices |
| 06/20/2000 | US6077387 Plasma emission detection for process control via fluorescent relay |
| 06/20/2000 | US6077384 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| 06/20/2000 | US6077383 Device for separating wafers and process for using said device |
| 06/20/2000 | US6077382 Mounting method of semiconductor chip |
| 06/20/2000 | US6077380 Method of forming an adhesive connection |
| 06/20/2000 | US6077360 Cleaning composition for mold for molding semiconductor device and method of cleaning mold using the same |
| 06/20/2000 | US6077357 Orientless wafer processing on an electrostatic chuck |
| 06/20/2000 | US6077355 Apparatus and method for depositing a film on a substrate by chemical vapor deposition |
| 06/20/2000 | US6077353 Pedestal insulator for a pre-clean chamber |
| 06/20/2000 | US6077348 Single crystal pulling apparatus, single crystal support mechanism, and single crystal pulling method |
| 06/20/2000 | US6077347 Single crystal pulling apparatus and droppage preventing device |
| 06/20/2000 | US6077346 Semiconductor single crystal growing apparatus and crystal growing method |
| 06/20/2000 | US6077337 Acidic slurry comprising abrasive and ferrocenium salt(s) reduced during use to ferrocene; polishing tungsten surface of integrated circuit structure |
| 06/20/2000 | US6077321 Comprising buffer chamber located between a transfer chamber and cleaning/drying chamber; semiconductor wafers, liquid crystal glass substrates |
| 06/20/2000 | US6077310 Optical proximity correction system |
| 06/20/2000 | US6077157 Process chamber exhaust system |
| 06/20/2000 | US6077155 Polishing device and correcting method therefor |
| 06/20/2000 | US6077149 Method and apparatus for surface-grinding of workpiece |
| 06/20/2000 | US6077027 Semiconductor manufacturing apparatus for transferring articles with a bearing-less joint and method for manufacturing semiconductor device |
| 06/20/2000 | US6077026 Programmable substrate support for a substrate positioning system |
| 06/20/2000 | US6076979 Method of and apparatus for supplying developing solution onto substrate |
| 06/20/2000 | US6076723 Metal jet deposition system |
| 06/20/2000 | US6076686 Support structure for use during package removal from a multi-layer integrated circuit device |
| 06/20/2000 | US6076617 Auger apparatus |
| 06/20/2000 | US6076585 Method of manufacturing a semiconductor device and apparatus therefor |
| 06/20/2000 | US6076483 Plasma processing apparatus using a partition panel |
| 06/20/2000 | US6076359 System and method for controlled delivery of liquified gases |
| 06/20/2000 | US6076217 Brush alignment platform |
| 06/20/2000 | CA2204086C Production of diamond film |
| 06/15/2000 | WO2000035260A1 Method of manufacturing ceramic substrate |
| 06/15/2000 | WO2000035258A1 Multilayered switching plate |
| 06/15/2000 | WO2000035020A1 Lateral high-voltage semiconductor component with reduced specific closing resistor |
| 06/15/2000 | WO2000035019A1 Femfet device and method for producing same |
| 06/15/2000 | WO2000035017A1 Analogue switch |
| 06/15/2000 | WO2000035013A1 An integrated circuit device |
| 06/15/2000 | WO2000035009A1 Substrate for ic crystals |
| 06/15/2000 | WO2000035007A1 Method for vertically integrating active circuit planes and vertically integrated circuit produced using said method |
| 06/15/2000 | WO2000035006A1 Dram cell having an annular signal transfer region |
| 06/15/2000 | WO2000035005A1 Semiconductor process flow for nand flash memory products |
| 06/15/2000 | WO2000035004A1 Integrated circuit |
| 06/15/2000 | WO2000035003A1 Apparatus and method for actively controlling surface potential of an electrostatic chuck |
| 06/15/2000 | WO2000035002A1 Method and device for optically monitoring processes for manufacturing microstructured surfaces in the production of semiconductors |
| 06/15/2000 | WO2000035001A1 Method for housing electronic components |
| 06/15/2000 | WO2000035000A1 Ultra high-speed semiconductor integrated circuit interconnect structure and fabrication method using free-space dielectric |
| 06/15/2000 | WO2000034999A2 An epitaxial silicon wafer with intrinsic gettering and a method for the preparation thereof |
| 06/15/2000 | WO2000034998A1 Process and system for rinsing of semiconductor substrates |
| 06/15/2000 | WO2000034997A1 Plasma preclean with argon, helium, and hydrogen gases |
| 06/15/2000 | WO2000034996A1 Stripping agent against resist residues |
| 06/15/2000 | WO2000034995A1 Method for machining/cleaning by hydroxide ion in ultrapure water |
| 06/15/2000 | WO2000034994A1 Polishing platen rinse for controlled passivation of silicon/polysilicon surfaces |
| 06/15/2000 | WO2000034993A1 A means for wet anisotropic etching of mono-crystalline semiconductor material and a device implementing this means |
| 06/15/2000 | WO2000034992A1 Method and apparatus for processing wafer |
| 06/15/2000 | WO2000034991A2 Method of producing a metal oxide film or a structured metal oxide film |
| 06/15/2000 | WO2000034990A1 Production of multilayer semiconductor structures by changing the carrier gas |
| 06/15/2000 | WO2000034989A1 Method for producing high quality heteroepitaxial growth using stress engineering and innovative substrates |
| 06/15/2000 | WO2000034988A1 Microelectronic structure |
| 06/15/2000 | WO2000034987A2 Apparatus and methods for handling a substrate |