Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2000
09/26/2000US6124149 Method of making stackable semiconductor chips to build a stacked chip module
09/26/2000US6124148 Method of manufacturing semiconductor acceleration sensor
09/26/2000US6124147 Alternately forming a silicon carbide and an aluminum nitride epitaxial film on a substrate, using a single source gas of 1,3-disilanebutane in an nitrogen plasma assited metalorganic molecular beam epitaxiy system; applying heat treatment
09/26/2000US6124146 Resistless device fabrication method
09/26/2000US6124144 Metal electrode mask in a method of fault failure analysis and characterization of semiconductor devices
09/26/2000US6124142 Method for analyzing minute foreign substance elements
09/26/2000US6124141 Non-destructive method and device for measuring the depth of a buried interface
09/26/2000US6124140 Method for measuring features of a semiconductor device
09/26/2000US6124081 Prebaking the negative resist to chemical change a substance causing negative resist become slightly soluble or insoluble to the developer
09/26/2000US6124064 Light exposure controlling method
09/26/2000US6124063 Method of forming a semiconductor device utilizing lithographic mask and mask therefor
09/26/2000US6124041 Multilayer ceramic package comprising ceramic substrate and a copper based sintering paste for forming conductive vias or surface patterns, comprising copper powder, and powdered copper aluminate as copper sources, and organic materials
09/26/2000US6124003 Film depositing method and film depositing apparatus
09/26/2000US6123992 Method of forming aluminum interconnection layer
09/26/2000US6123865 Method for improving etch uniformity during a wet etching process
09/26/2000US6123864 Etch chamber
09/26/2000US6123862 Method of forming high aspect ratio apertures
09/26/2000US6123825 Electromigration-resistant copper microstructure and process of making
09/26/2000US6123814 Producing substrates with optical layers, sputtering targets, rotation
09/26/2000US6123805 Discharge electrode and process chamber of dry etching facility for manufacturing semiconductor devices
09/26/2000US6123804 Sectional clamp ring
09/26/2000US6123803 Laser processing chamber with cassette cell
09/26/2000US6123800 Method and apparatus for handling element on an adhesive film
09/26/2000US6123799 Thermally conductive pressure-sensitive adhesive, adhesive sheet containing the same, and method for fixing electronic part to heat-radiating member with the same
09/26/2000US6123791 Dielectric windows supported on walls, ceramics, pedestals. power sources and gas introducing assembly
09/26/2000US6123775 Reaction chamber component having improved temperature uniformity
09/26/2000US6123774 Apparatus and method of manufacturing semiconductor element
09/26/2000US6123773 Gas manifold
09/26/2000US6123769 Crystallization control method for organic compound and crystallization control solid-state component employed therefor
09/26/2000US6123768 Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films
09/26/2000US6123609 Polishing machine with improved polishing pad structure
09/26/2000US6123502 Substrate holder having vacuum holding and gravity holding
09/26/2000US6123494 Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process
09/26/2000US6123120 Clean storage equipment for substrates and method of storing substrates
09/26/2000US6123088 Cleaning the conductor layer with a mixture comprising a hydroxyl amine material, an ammonium fluoride material and a benzotriazole material
09/26/2000US6122975 CMOS compatible integrated pressure sensor
09/26/2000US6122837 Centrifugal wafer processor and method
09/26/2000US6122823 Apparatus to produce a multichip package module in which rough-pitch and fine-pitch chips are mounted on a board
09/26/2000US6122822 Method for balancing mold flow in encapsulating devices
09/26/2000CA2182247C Apparatus and method for treatment of substrate surface using plasma focused below orifice leading from chamber into substrate containing area
09/26/2000CA2182245C Process for depositing adherent diamond thin films
09/26/2000CA2097668C Movement actuator/sensor systems
09/25/2000CA2300592A1 Ohmic electrode, method of manufacturing the same and semiconductor device
09/23/2000CA2301988A1 Monolithic integrated circuit with a built-in inductive component and procedure for fabricating such an integrated circuit
09/21/2000WO2000056132A1 Low stress die attachment
09/21/2000WO2000055971A1 Methods and apparatus for bipolar elimination in silicon-on-insulator (soi) domino circuits
09/21/2000WO2000055920A1 Semiconductor element and semiconductor device
09/21/2000WO2000055918A1 Flash memory cell having a flexible element
09/21/2000WO2000055916A1 Methods and apparatus for fabricating a multiple modular assembly
09/21/2000WO2000055915A1 Web process interconnect in electronic assemblies
09/21/2000WO2000055913A1 Multi-layer substrates and fabrication processes
09/21/2000WO2000055912A1 Magnetic alignment system for bumps on an integrated circuit device
09/21/2000WO2000055910A1 Semiconductor device and semiconductor module
09/21/2000WO2000055906A1 Semiconductor device and method of manufacture thereof
09/21/2000WO2000055905A1 Method for producing a dram structure with buried bit lines or trench capacitors
09/21/2000WO2000055904A1 Dram cell arrangement and method for producing the same
09/21/2000WO2000055903A1 Methods for reducing semiconductor contact resistance
09/21/2000WO2000055902A1 Electron beam process during damascene processing
09/21/2000WO2000055901A1 Method for filling gaps on a semiconductor wafer
09/21/2000WO2000055899A1 Device and method for determining the lateral undercut of a structured surface layer
09/21/2000WO2000055898A1 Semiconductor device, method of manufacture thereof, circuit board, and electronic device
09/21/2000WO2000055897A1 Method of manufacturing a mis field-effect transistor
09/21/2000WO2000055896A1 Method of manufacturing a floating gate field-effect transistor
09/21/2000WO2000055895A1 Method of forming an aluminum oxide film
09/21/2000WO2000055894A1 Plasma processing apparatus and method of maintaining the same
09/21/2000WO2000055893A1 Semiconductor base and its manufacturing method, and semiconductor crystal manufacturing method
09/21/2000WO2000055889A1 Semiconductor device with transparent link area for silicide applications and fabrication thereof
09/21/2000WO2000055888A1 Device for treating substrates
09/21/2000WO2000055885A1 Contactless optical probe for use in semiconductor processing metrology
09/21/2000WO2000055799A1 System and method for selection of a reference die
09/21/2000WO2000055691A1 Method for producing a pattern suitable for forming sub-micron width metal lines
09/21/2000WO2000055690A2 A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography
09/21/2000WO2000055683A1 Method for manufacturing liquid crystal display
09/21/2000WO2000055652A1 Calibration of sensors
09/21/2000WO2000055648A1 Hydrophone assembly
09/21/2000WO2000055646A1 Accelerometer transducer used for seismic recording
09/21/2000WO2000055638A1 Sensor design and process
09/21/2000WO2000055608A2 Method and apparatus for the analysis of material composition
09/21/2000WO2000055593A2 Sensor
09/21/2000WO2000055587A1 Method for determining the temperature in a thermal processing chamber
09/21/2000WO2000055577A1 Integrated and multi-axis sensor assembly and packaging
09/21/2000WO2000055573A1 Systems and methods for characterizing and correcting cyclic errors in distance measuring and dispersion interferometry
09/21/2000WO2000055397A1 Production method for silicon wafer and silicon wafer
09/21/2000WO2000055387A1 Method and apparatus for formation of thin film
09/21/2000WO2000055342A1 Compositions and methods for helper-free production of recombinant adeno-associated viruses
09/21/2000WO2000055105A2 Explosive shear wave energy source
09/21/2000WO2000055100A1 Projection lithography photomask substrate and method of making
09/21/2000WO2000055074A1 Person-guided vehicle
09/21/2000WO2000054941A1 Wafer gripping fingers
09/21/2000WO2000054935A1 Method and apparatus for endpoint detection for chemical mechanical polishing
09/21/2000WO2000054933A2 Chemical mechanical polishing head having floating wafer retaining ring and wafer carrier with multi-zone polishing pressure control
09/21/2000WO2000054921A1 Filling device and method for filling balls in the apertures of a ball-receiving element
09/21/2000WO2000054899A1 A method for a repetitive ion beam processing with a by carbon containing ion beam
09/21/2000WO2000054893A1 Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
09/21/2000WO2000054565A2 Waste liquid collection system
09/21/2000WO2000025350A9 Apparatus for and method of manufacturing a semiconductor die carrier
09/21/2000WO2000022667A9 Apparatus and method for filling a ball grid array
09/21/2000WO2000022589A9 Wafer mapping system
09/21/2000DE19962663A1 Organisches, nicht reflektierendes Beschichtungsmaterial und dessen Herstellung Organic, non-reflective coating material and its preparation
09/21/2000DE19954021A1 Verfahren zur Bor-Dotierung von Wafern unter Einsatz eines Vertikalofensystems A method for boron doping wafers using a vertical furnace system
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