Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2001
05/22/2001US6235597 Semiconductor structure having reduced silicide resistance between closely spaced gates and method of fabrication
05/22/2001US6235595 Method of fabricating metal oxide semiconductor
05/22/2001US6235594 Methods of fabricating an integrated circuit device with composite oxide dielectric
05/22/2001US6235593 Self aligned contact using spacers on the ILD layer sidewalls
05/22/2001US6235592 Type of high density vertical Mask ROM cell
05/22/2001US6235591 Method to form gate oxides of different thicknesses on a silicon substrate
05/22/2001US6235590 Fabrication of differential gate oxide thicknesses on a single integrated circuit chip
05/22/2001US6235589 Method of making non-volatile memory with polysilicon spacers
05/22/2001US6235588 Method of manufacturing a memory point in BICMOS technology
05/22/2001US6235587 Method of manufacturing a semiconductor device with reduced arc loss in peripheral circuitry region
05/22/2001US6235586 Thin floating gate and conductive select gate in situ doped amorphous silicon material for NAND type flash memory device applications
05/22/2001US6235585 Method for fabricating flash memory device and peripheral area
05/22/2001US6235584 Method and system for reducing short channel effects in a memory device
05/22/2001US6235583 Non-volatile semiconductor memory and fabricating method therefor
05/22/2001US6235582 Method for forming flash memory cell
05/22/2001US6235580 Process for forming a crown shaped capacitor structure for a DRAM device
05/22/2001US6235579 Method for manufacturing stacked capacitor
05/22/2001US6235578 Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks
05/22/2001US6235577 Method for fabricating electrode structure of capacitor for semiconductor memory device
05/22/2001US6235576 Method for manufacturing a cylindrical capacitor
05/22/2001US6235575 Semiconductor device and method for manufacturing same
05/22/2001US6235574 High performance DRAM and method of manufacture
05/22/2001US6235573 Methods of forming ferroelectric random access memory devices having shared capacitor electrodes
05/22/2001US6235572 Method of making a memory cell having two layered tantalum oxide films
05/22/2001US6235571 Uniform dielectric layer and method to form same
05/22/2001US6235570 Method for fabricating a semiconductor device
05/22/2001US6235568 Semiconductor device having deposited silicon regions and a method of fabrication
05/22/2001US6235567 Silicon-germanium bicmos on soi
05/22/2001US6235566 Two-step silicidation process for fabricating a semiconductor device
05/22/2001US6235565 Simplified process flow for CMOS fabrication
05/22/2001US6235564 Method of manufacturing MISFET
05/22/2001US6235563 Semiconductor device and method of manufacturing the same
05/22/2001US6235562 Method of making field effect transistors
05/22/2001US6235561 Method of manufacturing thin-film transistors
05/22/2001US6235560 Silicon-germanium transistor and associated methods
05/22/2001US6235559 Thin film transistor with carbonaceous gate dielectric
05/22/2001US6235558 Method for fabricating semiconductor device
05/22/2001US6235555 Reel-deployed printed circuit board and method for manufacturing chip-on-board packages
05/22/2001US6235552 Chip scale package and method for manufacturing the same using a redistribution substrate
05/22/2001US6235551 Semiconductor device including edge bond pads and methods
05/22/2001US6235548 Method of fabricating nitride semiconductor laser
05/22/2001US6235547 Semiconductor device and method of fabricating the same
05/22/2001US6235546 Method of forming an active matrix electro-optic display device with storage capacitors
05/22/2001US6235544 Seed metal delete process for thin film repair solutions using direct UV laser
05/22/2001US6235543 Method of evaluating a semiconductor wafer
05/22/2001US6235542 Ferroelectric memory device and method for fabricating the same
05/22/2001US6235453 Low-k photoresist removal process
05/22/2001US6235446 Radiation sensitive resin composition
05/22/2001US6235440 Method to control gate CD
05/22/2001US6235434 Method for mask repair using defect compensation
05/22/2001US6235412 Multilayer electroplated metal film
05/22/2001US6235406 Copper film including laminated impurities
05/22/2001US6235387 Nonpressure sensitive adhesive crosslinked copolymer
05/22/2001US6235366 Adhesive sheet
05/22/2001US6235354 Multilayer semiconductor with silicon dioxide and silicon nitride, cleaning and deposition
05/22/2001US6235353 Low dielectric constant films with high glass transition temperatures made by electron beam curing
05/22/2001US6235214 Etching with increased silicon etch rate while enhancing photoresist mask selectivity
05/22/2001US6235213 Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers
05/22/2001US6235171 Vacuum film forming/processing apparatus and method
05/22/2001US6235163 Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance
05/22/2001US6235147 Wet-etching facility for manufacturing semiconductor devices
05/22/2001US6235146 Vacuum treatment system and its stage
05/22/2001US6235145 Containing hydrofluoric acid and etch reducing component of tetraalkylammonium hydroxide
05/22/2001US6235144 Resist removing apparatus and method
05/22/2001US6235126 Cleaner for spheres, rolls, inlets for semiconductors, separators for separation
05/22/2001US6235125 Industrial cleaning sponge
05/22/2001US6235122 Manufacture of semiconductor with film on insulating surface, wet cleaning film, rinsing, drying and crystallizing with laser
05/22/2001US6235121 Vertical thermal treatment apparatus
05/22/2001US6235119 End point window assembly in an etching apparatus for fabricating semiconductor devices
05/22/2001US6235116 Method and apparatus for growing layer on one surface of wafer
05/22/2001US6235113 Apparatus and method for dispensing a liquid on electrical devices
05/22/2001US6235112 Apparatus and method for forming thin film
05/22/2001US6235110 Method of producing recrystallized-material-member, and apparatus and heating method therefor
05/22/2001US6235101 Composition for film formation and film
05/22/2001US6235071 Chemical mechanical polishing method for highly accurate in-plane uniformity in polishing rate over position
05/22/2001US6234884 Semiconductor wafer polishing device for removing a surface unevenness of a semiconductor substrate
05/22/2001US6234879 Method and apparatus for wafer chamfer polishing
05/22/2001US6234877 Method of chemical mechanical polishing
05/22/2001US6234875 Method of modifying a surface
05/22/2001US6234873 Semiconductor mirror-polished surface wafers and method for manufacturing the same
05/22/2001US6234788 Disk furnace for thermal processing
05/22/2001US6234738 Thin substrate transferring apparatus
05/22/2001US6234692 Semiconductor device fabricating apparatus with a cover over the wafer surface
05/22/2001US6234382 Method and device for bonding solder balls to a substrate
05/22/2001US6234379 No-flow flux and underfill dispensing methods
05/22/2001US6234374 Rapid and selective heating method in integrated circuit package assembly by means of tungsten halogen light source
05/22/2001US6234373 Electrically conductive elevation shaping tool
05/22/2001US6234321 Automatic semiconductor part handler
05/22/2001US6234316 Wafer protective container
05/22/2001US6234296 System for positioning a carrier relative to a travel path
05/22/2001US6234219 Liner for use in processing chamber
05/22/2001US6234107 Auxiliary vacuum chamber and vacuum processing unit using same
05/22/2001US6234077 Method and apparatus for screen printing
05/22/2001US6233818 Method and device for bonding a wire conductor
05/22/2001CA2233376C Organometallic single source precursors for inorganic films coatings and powders
05/17/2001WO2001035500A2 Field effect transistor (fet) and fet circuitry
05/17/2001WO2001035499A1 Unlimited rotation vacuum isolation wire feedthrough
05/17/2001WO2001035466A2 Field effect transistor with a body zone
05/17/2001WO2001035465A1 Semiconductor device having a field effect transistor and a method of manufacturing such a device
05/17/2001WO2001035462A1 Metal redistribution layer having solderable pads and wire bondable pads