| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/15/2001 | US6232158 Thin film transistor and a fabricating method thereof |
| 05/15/2001 | US6232157 Thin film transistors |
| 05/15/2001 | US6232156 Method of manufacturing a semiconductor device |
| 05/15/2001 | US6232155 Methods of fabricating semiconductor-on-insulator devices including alternating thin and thick film semiconductor regions on an insulating layer |
| 05/15/2001 | US6232154 Optimized decoupling capacitor using lithographic dummy filler |
| 05/15/2001 | US6232152 Method of manufacturing a plurality of semiconductor packages and the resulting semiconductor package structures |
| 05/15/2001 | US6232151 Power electronic module packaging |
| 05/15/2001 | US6232145 Method and apparatus for filling a gap between spaced layers of a semiconductor |
| 05/15/2001 | US6232142 Semiconductor device and method for making the same, electro-optical device using the same and method for making the electro-optical device, and electronic apparatus using the electro-optical device |
| 05/15/2001 | US6232141 Semiconductor light-receiving device and method of fabricating the same |
| 05/15/2001 | US6232138 Creating lattice-mismatched devices based on relaxed ingaas alloys. |
| 05/15/2001 | US6232137 Nitride compound layer containing indium stacked on a substrate |
| 05/15/2001 | US6232136 Method of transferring semiconductors |
| 05/15/2001 | US6232134 Method and apparatus for monitoring wafer characteristics and/or semiconductor processing consistency using wafer charge distribution measurements |
| 05/15/2001 | US6232133 Method for fabricating a capacitor of semiconductor memory device |
| 05/15/2001 | US6232131 Method for manufacturing semiconductor device with ferroelectric capacitors including multiple annealing steps |
| 05/15/2001 | US6232051 Patterning step which is capable of repressing the occurrence of particles and also improves the throughput and the yield during the treatment of exposure to light. |
| 05/15/2001 | US6232048 Ionic bombardment with ionized particles in a direction normal to the planar surface of a resistant substrate. the ionic bombardment causes formation of a hardened ?chemically less reactive? skin on the exposed op surface of the photoresist. |
| 05/15/2001 | US6232046 Irradiating dry photoresist with variable intensity radiation; development |
| 05/15/2001 | US6232043 Rule to determine CMP polish time |
| 05/15/2001 | US6232040 Method of electron beam exposure utilizing emitter with conductive mesh grid |
| 05/15/2001 | US6232032 Mixture of polybenzoxazole and polyamide |
| 05/15/2001 | US6232023 Contact exposure process and device |
| 05/15/2001 | US6232002 Photolithography |
| 05/15/2001 | US6231989 Method of forming coatings |
| 05/15/2001 | US6231974 Hot-melt adhesive sheet and semiconductor devices |
| 05/15/2001 | US6231933 Bellow disturbance and sonic disturbance in interior of reactor reducting thickness of gas boundary layer |
| 05/15/2001 | US6231918 Film on integrated circuits with oxide layers |
| 05/15/2001 | US6231777 Surface treatment method and system |
| 05/15/2001 | US6231775 Process for ashing organic materials from substrates |
| 05/15/2001 | US6231774 Plasma processing method |
| 05/15/2001 | US6231744 Process for fabricating an array of nanowires |
| 05/15/2001 | US6231743 Method for forming a semiconductor device |
| 05/15/2001 | US6231726 Plasma processing apparatus |
| 05/15/2001 | US6231717 Plastic molding unsealing apparatus |
| 05/15/2001 | US6231716 Processing chamber with rapid wafer exchange |
| 05/15/2001 | US6231707 Method of forming a multilayer ceramic substrate with max-punched vias |
| 05/15/2001 | US6231673 Manufacturing method of semiconductor wafer, semiconductor manufacturing apparatus, and semiconductor device |
| 05/15/2001 | US6231672 Apparatus for depositing thin films on semiconductor wafer by continuous gas injection |
| 05/15/2001 | US6231658 Chemical vapor deposition source for depositing lead zirconate titanate film |
| 05/15/2001 | US6231427 Linear polisher and method for semiconductor wafer planarization |
| 05/15/2001 | US6231425 Polishing apparatus and method |
| 05/15/2001 | US6231290 Processing method and processing unit for substrate |
| 05/15/2001 | US6231289 Dual plate gas assisted heater module |
| 05/15/2001 | US6231038 Two-piece clamp ring for holding semiconductor wafer or other workpiece |
| 05/15/2001 | US6230956 Soldering conveyor support |
| 05/15/2001 | US6230896 Universal shipping tray |
| 05/15/2001 | US6230895 Container for transporting refurbished semiconductor processing equipment |
| 05/15/2001 | US6230753 Wafer cleaning apparatus |
| 05/15/2001 | US6230722 Liquid feed nozzle, wet treatment, apparatus and wet treatment method |
| 05/15/2001 | US6230721 Processing apparatus and method, robot apparatus |
| 05/15/2001 | US6230720 Oxidizing surface carbon; immersion in alkaline and acidic cleaning agents |
| 05/15/2001 | US6230652 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| 05/15/2001 | US6230651 Gas injection system for plasma processing |
| 05/15/2001 | US6230400 Method for forming interconnects |
| 05/15/2001 | CA2198088C Microwave/millimeter wave circuit structure with discrete flip-chip mounted elements, and method of fabricating the same |
| 05/15/2001 | CA2101559C Complementary logic input parallel (clip) logic circuit family |
| 05/10/2001 | WO2001033925A1 Method fabricating a laminated printed circuit board |
| 05/10/2001 | WO2001033924A1 Substrate manufacturing plant having minimum footprint skinned lines |
| 05/10/2001 | WO2001033715A1 On-chip decoupling capacitor system with parallel fuse |
| 05/10/2001 | WO2001033649A1 Method of producing vertical interconnects between thin film microelectronic devices and products comprising such vertical interconnects |
| 05/10/2001 | WO2001033643A1 BAND GAP ENGINEERING OF AMORPHOUS Al-Ga-N ALLOYS |
| 05/10/2001 | WO2001033639A1 Formation of contacts on thin films |
| 05/10/2001 | WO2001033633A1 Semiconductor memory and method of driving semiconductor memory |
| 05/10/2001 | WO2001033631A1 Package for high-frequency device |
| 05/10/2001 | WO2001033630A2 Methods and compositions for detection and treatment of breast cancer, based on breast cancer-associated polypeptides |
| 05/10/2001 | WO2001033628A1 A method of forming dual gate oxide layers of varying thickness on a single substrate |
| 05/10/2001 | WO2001033627A1 Spacer process to eliminate isolation trench corner transistor device |
| 05/10/2001 | WO2001033626A1 Use of an insulating spacer to prevent threshold voltage roll-off in narrow devices |
| 05/10/2001 | WO2001033625A1 Electrostatic wafer clamp having electrostatic seal for retaining gas |
| 05/10/2001 | WO2001033624A1 Device for testing wafer-transporting robot |
| 05/10/2001 | WO2001033623A1 Semiconductor device and its manufacturing method |
| 05/10/2001 | WO2001033622A1 Solid-source doping for source/drain of flash memory |
| 05/10/2001 | WO2001033621A2 Methods for forming openings in a substrate and methods for creating assemblies |
| 05/10/2001 | WO2001033619A1 Gate dielectrics and method of making with binary non-crystaline analogs of silicon dioxide |
| 05/10/2001 | WO2001033618A1 Method for cleaning substrate and method for manufacturing semiconductor device |
| 05/10/2001 | WO2001033617A1 Semiconductor-manufacturing apparatus |
| 05/10/2001 | WO2001033616A1 Method and apparatus for thin film deposition |
| 05/10/2001 | WO2001033615A2 Method and apparatus for supercritical processing of multiple workpieces |
| 05/10/2001 | WO2001033613A2 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 05/10/2001 | WO2001033612A1 Load lock with vertically movable support |
| 05/10/2001 | WO2001033611A2 Machine for processing wafers |
| 05/10/2001 | WO2001033610A2 Unit for processing wafers |
| 05/10/2001 | WO2001033609A2 Apparatus for cleaning semiconductor wafers |
| 05/10/2001 | WO2001033604A1 Method and apparatus for ion implantation |
| 05/10/2001 | WO2001033571A1 Flash memory wordline tracking across whole chip |
| 05/10/2001 | WO2001033300A2 High precision orientation alignment and gap control stages for imprint lithography processes |
| 05/10/2001 | WO2001033240A2 High resolution skew detection apparatus and method |
| 05/10/2001 | WO2001033238A1 A scan test point observation system and method |
| 05/10/2001 | WO2001033232A2 Precision stage |
| 05/10/2001 | WO2001033078A1 Active electrostatic seal and electrostatic vacuum pump |
| 05/10/2001 | WO2001032958A2 Multilayer metal composite structures for semiconductor circuitry and method of manufacture |
| 05/10/2001 | WO2001032951A2 Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates |
| 05/10/2001 | WO2001032794A1 A ta barrier slurry containing an organic additive |
| 05/10/2001 | WO2001032793A2 Use of cesium hydroxide in a dielectric cmp slurry |
| 05/10/2001 | WO2001032555A1 Substrate with feedthrough and method for manufacturing the same |
| 05/10/2001 | WO2001032363A1 Method of determining performance characteristics of polishing pads |
| 05/10/2001 | WO2001032362A1 Method and apparatus for deposition on and polishing of a semiconductor surface |
| 05/10/2001 | WO2001032297A2 Modular chemical treatment system |
| 05/10/2001 | WO2001017019A3 Memory with a trench capacitor and a selection transistor and method for producing the same |