Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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06/12/2001 | US6245580 Low temperature process for fabricating layered superlattice materials and making electronic devices including same |
06/12/2001 | US6245508 Hybridizing dna of first length to capture probes at site, hybridizing dna of second length to capture probes at another site, observing fluorescent signals as potential is reversed, detecting sites which dehybridize at a potential |
06/12/2001 | US6245493 Method for reducing surface reflectivity by increasing surface roughness |
06/12/2001 | US6245490 Method of manufacturing a circuit board having metal bumps and a semiconductor device package comprising the same |
06/12/2001 | US6245489 Fluorinated hard mask for micropatterning of polymers |
06/12/2001 | US6245488 Method for forming features using frequency doubling hybrid resist and device formed thereby |
06/12/2001 | US6245478 Resist composition |
06/12/2001 | US6245470 Exposure, masking, transparent substrates, micro patterns and focusing |
06/12/2001 | US6245466 Mask pattern design method and a photomask |
06/12/2001 | US6245451 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same |
06/12/2001 | US6245442 Aluminum-silicon carbide composite |
06/12/2001 | US6245396 CVD apparatus and method of using same |
06/12/2001 | US6245380 Multilayer; dielectrics, barriers, glue, metal; polishing |
06/12/2001 | US6245311 Method for heat treatment of silicon wafer and silicon wafer |
06/12/2001 | US6245250 Process vessel |
06/12/2001 | US6245202 Plasma treatment device |
06/12/2001 | US6245192 Gas distribution apparatus for semiconductor processing |
06/12/2001 | US6245191 Wet etch apparatus |
06/12/2001 | US6245190 Plasma processing system and plasma processing method |
06/12/2001 | US6245189 High Throughput plasma treatment system |
06/12/2001 | US6245186 Electronic package with compressible heatsink structure |
06/12/2001 | US6245185 Method of making a multilayer ceramic product with thin layers |
06/12/2001 | US6245171 Multi-thickness, multi-layer green sheet lamination and method thereof |
06/12/2001 | US6245161 Economical silicon-on-silicon hybrid wafer assembly |
06/12/2001 | US6245158 Wet processing methods for the manufacture of electronic components using liquids of varying temperature |
06/12/2001 | US6245156 Substrate transport method and apparatus, and substrate processing system |
06/12/2001 | US6245155 Method for removing photoresist and plasma etch residues |
06/12/2001 | US6245149 Inert barrier for high purity epitaxial deposition systems |
06/12/2001 | US6245148 SOG dispensing system and its controlling sequences |
06/12/2001 | US6245147 Thermal processing jig for use in manufacturing semiconductor devices and method of manufacturing the same |
06/12/2001 | US6244945 Polishing system including a hydrostatic fluid bearing support |
06/12/2001 | US6244935 Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet |
06/12/2001 | US6244932 Method for detecting the presence of a substrate in a carrier head |
06/12/2001 | US6244931 Buffer station on CMP system |
06/12/2001 | US6244929 Chemical-mechanical-polishing system with continuous filtration |
06/12/2001 | US6244812 Low profile automated pod door removal system |
06/12/2001 | US6244811 Atmospheric wafer transfer module with nest for wafer transport robot |
06/12/2001 | US6244717 Reduction objective for extreme ultraviolet lithography |
06/12/2001 | US6244641 Wafer transfer arm |
06/12/2001 | US6244634 Apparatus for actuating the retaining locks of a cassette |
06/12/2001 | US6244569 Controlled motion lift mechanism |
06/12/2001 | US6244499 Structure of a ball bump for wire bonding and the formation thereof |
06/12/2001 | US6244493 Die bonding apparatus |
06/12/2001 | US6244422 Apparatus for sensing and controlling tipping movement of a semiconductor boat |
06/12/2001 | US6244282 Substrate treatment device |
06/12/2001 | US6244281 Method and apparatus for drying substrate |
06/12/2001 | US6244280 Method and apparatus for immersion treatment of semiconductor and other devices |
06/12/2001 | US6244211 Plasma processing apparatus |
06/12/2001 | US6244192 XY table |
06/12/2001 | US6244121 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
06/12/2001 | US6243966 Air amplifier with uniform output flow pattern |
06/12/2001 | US6243945 Method for manufacturing electronic parts |
06/12/2001 | US6243944 Residue-free method of assembling and disassembling a pressed joint with low thermal resistance |
06/07/2001 | WO2001041518A1 Low species buffered rinsing fluids and methods |
06/07/2001 | WO2001041508A1 Ceramic heater |
06/07/2001 | WO2001041221A1 Method and apparatus for self-doping contacts to a semiconductor |
06/07/2001 | WO2001041218A1 Method for recycled separated wafer and recycled separated wafer |
06/07/2001 | WO2001041216A1 Method for producing monolithically integrated semiconductor components |
06/07/2001 | WO2001041212A2 Integrated circuit package |
06/07/2001 | WO2001041211A1 Semiconductor device |
06/07/2001 | WO2001041210A1 Bipolar transistor structure |
06/07/2001 | WO2001041209A1 Chip bonding device |
06/07/2001 | WO2001041208A1 Chip mounter |
06/07/2001 | WO2001041207A1 Packaging of integrated circuits and vertical integration |
06/07/2001 | WO2001041206A2 Manufacture of trench-gate semiconductor devices |
06/07/2001 | WO2001041205A1 Method for producing a bipolar transistor and method for producing an integrated circuit arrangement with such a bipolar transistor |
06/07/2001 | WO2001041204A1 Method and apparatus for forming thin film of metal |
06/07/2001 | WO2001041203A1 Improved flourine doped sio2 film |
06/07/2001 | WO2001041201A1 Process for fabricating a uniform gate oxide of a vertical transistor |
06/07/2001 | WO2001041200A1 Nitrided re-oxidised polysilicon gate to improve hot carrier performance |
06/07/2001 | WO2001041199A1 Integrated memory cell and method of fabrication |
06/07/2001 | WO2001041197A1 Wafer processing system |
06/07/2001 | WO2001041196A1 Resistively heated single wafer furnace |
06/07/2001 | WO2001041195A1 Single wafer annealing oven |
06/07/2001 | WO2001041194A2 Semiconductor circuit arrangement and a method for producing same |
06/07/2001 | WO2001041193A1 Device and method for aligning disc-shaped substrates |
06/07/2001 | WO2001041191A2 Method and apparatus for forming an oxidized structure on a microelectronic workpiece |
06/07/2001 | WO2001041190A2 A method for measuring stress induced leakage current and gate dielectric integrity using corona discharge |
06/07/2001 | WO2001041189A2 Cobalt silicide etch process and apparatus |
06/07/2001 | WO2001041188A2 Process chamber cooling |
06/07/2001 | WO2001041187A2 Semiconductor circuit arrangement and a method for producing same |
06/07/2001 | WO2001041183A1 Dose monitor for plasma doping system |
06/07/2001 | WO2001041182A1 Plasma processor, cluster tool, and method of controlling plasma |
06/07/2001 | WO2001041181A1 Gas cluster ion beam smoother apparatus |
06/07/2001 | WO2001041067A1 Method for extracting objective image |
06/07/2001 | WO2001040943A2 A system, method and apparatus pertaining to flexible selection scan test |
06/07/2001 | WO2001040884A2 Monitoring system for a conveying device that conveys flat articles, especially wafers |
06/07/2001 | WO2001040876A1 Method and apparatus for aligning a crystalline substrate |
06/07/2001 | WO2001040873A1 Positive type photosensitive polyimide resin composition |
06/07/2001 | WO2001040871A1 Mitigation of substrate defects in reticles using multilayer buffer layers |
06/07/2001 | WO2001040868A2 Alternating phase mask |
06/07/2001 | WO2001040864A1 Photoresist dispense method by compensation for substrate reflectivity |
06/07/2001 | WO2001040856A1 Active matrix substrate for liquid crystal display and method of manufacture for making the same |
06/07/2001 | WO2001040735A1 Analyzer/observer |
06/07/2001 | WO2001040692A1 Compact gate valve |
06/07/2001 | WO2001040552A1 Mini batch furnace |
06/07/2001 | WO2001040541A1 Atomic-layer-chemical-vapor-deposition of films that contain silicon dioxide |
06/07/2001 | WO2001040540A1 Improved reactor with heated and textured electrodes and surfaces |
06/07/2001 | WO2001040145A2 Power assisted automatic supervised classifier creation tool for semiconductor defects |
06/07/2001 | WO2001040138A1 Porous silicon carbide sintered compact and silicon carbide metal composite suitable for use in table for wafer polishing machine |