| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 06/26/2001 | US6253354 Method and apparatus for analyzing variations in source voltage of semiconductor device |
| 06/26/2001 | US6253342 Semiconductor integrated circuit |
| 06/26/2001 | US6253118 Substrate transport method and apparatus |
| 06/26/2001 | US6253117 Vacuum processing apparatus and semiconductor manufacturing line using the same |
| 06/26/2001 | US6253029 Vacuum processing apparatus |
| 06/26/2001 | US6253026 Optical disc, recording apparatus, and computer-readable recording medium |
| 06/26/2001 | US6252981 System and method for selection of a reference die |
| 06/26/2001 | US6252817 Read only memory with neighboring memory blocks sharing block selection lines |
| 06/26/2001 | US6252809 Semiconductor memory device capable of easily determining locations of defective memory cells by selectively isolating and testing redundancy memory cell block |
| 06/26/2001 | US6252799 Device with embedded flash and EEPROM memories |
| 06/26/2001 | US6252797 Masked ROM and manufacturing process therefor |
| 06/26/2001 | US6252796 Device comprising a first and a second ferromagnetic layer separated by a non-magnetic spacer layer |
| 06/26/2001 | US6252769 Device for increasing heat transfer |
| 06/26/2001 | US6252758 Method for reducing particles from an electrostatic chuck and an equipment for manufacturing a semiconductor |
| 06/26/2001 | US6252756 Low voltage modular room ionization system |
| 06/26/2001 | US6252705 Stage for charged particle microscopy system |
| 06/26/2001 | US6252651 Exposure method and exposure apparatus using it |
| 06/26/2001 | US6252650 Exposure apparatus, output control method for energy source, laser device using the control method, and method of producing microdevice |
| 06/26/2001 | US6252648 Exposure apparatus and method of cleaning optical element of the same |
| 06/26/2001 | US6252451 Switching circuit |
| 06/26/2001 | US6252447 Edge transition detection circuit with variable impedance delay elements |
| 06/26/2001 | US6252427 CMOS inverter and standard cell using the same |
| 06/26/2001 | US6252423 Voltage tolerant interface circuit |
| 06/26/2001 | US6252422 Overvoltage-tolerant interface for intergrated circuits |
| 06/26/2001 | US6252415 Pin block structure for mounting contact pins |
| 06/26/2001 | US6252412 Method of detecting defects in patterned substrates |
| 06/26/2001 | US6252392 Probe station having environment control chamber with bendably extensible and retractable lateral wall assembly |
| 06/26/2001 | US6252354 RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control |
| 06/26/2001 | US6252344 Electron gun used in an electron beam exposure apparatus |
| 06/26/2001 | US6252340 Field emission element with antireflection film |
| 06/26/2001 | US6252314 Linear motor and stage system, and scanning exposure apparatus using the same |
| 06/26/2001 | US6252309 Packaged semiconductor substrate |
| 06/26/2001 | US6252308 Packaged die PCB with heat sink encapsulant |
| 06/26/2001 | US6252307 Structure for preventing adhesive bleed onto surfaces |
| 06/26/2001 | US6252306 Method of producing semiconductor device and configuration thereof, and lead frame used in said method |
| 06/26/2001 | US6252304 Metallized vias with and method of fabrication |
| 06/26/2001 | US6252303 Intergration of low-K SiOF as inter-layer dielectric |
| 06/26/2001 | US6252301 Compliant semiconductor chip assemblies and methods of making same |
| 06/26/2001 | US6252300 Direct contact through hole type wafer structure |
| 06/26/2001 | US6252297 Array substrate, liquid crystal display device and their manufacturing method |
| 06/26/2001 | US6252296 Semiconductor device with silicon oxynitride gate insulating film |
| 06/26/2001 | US6252295 Adhesion of silicon carbide films |
| 06/26/2001 | US6252294 Semiconductor device and semiconductor storage device |
| 06/26/2001 | US6252293 Laser antifuse using gate capacitor |
| 06/26/2001 | US6252292 Vertical electrical cavity-fuse |
| 06/26/2001 | US6252291 Modifiable semiconductor circuit element |
| 06/26/2001 | US6252290 Method to form, and structure of, a dual damascene interconnect device |
| 06/26/2001 | US6252284 Planarized silicon fin device |
| 06/26/2001 | US6252283 CMOS transistor design for shared N+/P+ electrode with enhanced device performance |
| 06/26/2001 | US6252282 Semiconductor device with a bipolar transistor, and method of manufacturing such a device |
| 06/26/2001 | US6252281 Semiconductor device having an SOI substrate |
| 06/26/2001 | US6252280 Semiconductor device and manufacturing method thereof |
| 06/26/2001 | US6252277 Embedded polysilicon gate MOSFET |
| 06/26/2001 | US6252276 Non-volatile semiconductor memory device including assymetrically nitrogen doped gate oxide |
| 06/26/2001 | US6252275 Silicon-on-insulator non-volatile random access memory device |
| 06/26/2001 | US6252274 Process for making crosspoint memory devices with cells having a source channel which is autoaligned to the bit line and to the field oxide |
| 06/26/2001 | US6252273 Nonvolatile reprogrammable interconnect cell with FN tunneling device for programming and erase |
| 06/26/2001 | US6252272 Semiconductor device, and method of fabricating the same |
| 06/26/2001 | US6252271 Flash memory structure using sidewall floating gate and method for forming the same |
| 06/26/2001 | US6252270 Increased cycle specification for floating-gate and method of manufacture thereof |
| 06/26/2001 | US6252269 Semiconductor memory device |
| 06/26/2001 | US6252268 Method of forming transistors in a peripheral circuit of a semiconductor memory device |
| 06/26/2001 | US6252267 Five square folded-bitline DRAM cell |
| 06/26/2001 | US6252266 Field effect transistor with comb electrodes and via holes |
| 06/26/2001 | US6252265 Single-layer-electrode type two-phase charge coupled device having smooth charge transfer |
| 06/26/2001 | US6252263 Layout structure for dynamic random access memory |
| 06/26/2001 | US6252262 Metal passivating layer for III-V semiconductors, and improved gate contact for III-V-based metal-insulator-semiconductor (MIS) devices |
| 06/26/2001 | US6252261 GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor |
| 06/26/2001 | US6252259 Semiconductor switching device having different carrier lifetimes between a first portion serving as a main current path and the remaining portion of the device |
| 06/26/2001 | US6252257 Isolating wall between power components |
| 06/26/2001 | US6252256 Overvoltage protection circuit |
| 06/26/2001 | US6252255 Crystal growth method for nitride semiconductor, nitride light emitting device, and method for producing the same |
| 06/26/2001 | US6252249 Semiconductor device having crystalline silicon clusters |
| 06/26/2001 | US6252248 Thin film transistor and display |
| 06/26/2001 | US6252247 Thin film transistor, a method for producing the thin film transistor, and a liquid crystal display using a TFT array substrate |
| 06/26/2001 | US6252234 Reaction force isolation system for a planar motor |
| 06/26/2001 | US6252233 Instantaneous balance control scheme for ionizer |
| 06/26/2001 | US6252228 Method of analyzing morphology of bulk defect and surface defect on semiconductor wafer |
| 06/26/2001 | US6252222 Differential pulsed laser beam probing of integrated circuits |
| 06/26/2001 | US6252197 Method and apparatus for separating non-metallic substrates utilizing a supplemental mechanical force applicator |
| 06/26/2001 | US6252175 Electronic assembly comprising a substrate and a plurality of springable interconnection elements secured to terminals of the substrate |
| 06/26/2001 | US6252010 Siloxane-modified polyamideimide resin composition, adhesive film, adhesive sheet and semiconductor device |
| 06/26/2001 | US6251807 Method for improving thickness uniformity of deposited ozone-teos silicate glass layers |
| 06/26/2001 | US6251806 Method to improve the roughness of metal deposition on low-k material |
| 06/26/2001 | US6251805 Forming polysilsequioxane over substrate; heat treatment |
| 06/26/2001 | US6251804 Oxidation; forming hexamethyldisilazane |
| 06/26/2001 | US6251803 Method for forming a titanium dioxide layer |
| 06/26/2001 | US6251802 Reducing etch rate |
| 06/26/2001 | US6251801 Method and apparatus for manufacturing semiconductor device |
| 06/26/2001 | US6251800 Ultrathin deposited gate dielectric formation using low-power, low-pressure PECVD for improved semiconductor device performance |
| 06/26/2001 | US6251799 Method to provide low dielectric constant voids between adjacent conducting lines in a semiconductor device |
| 06/26/2001 | US6251798 Formation of air gap structures for inter-metal dielectric application |
| 06/26/2001 | US6251797 Method of fabricating semiconductor device |
| 06/26/2001 | US6251796 Etching a dielectric in semiconductor wafer using tantalum nitride barrier |
| 06/26/2001 | US6251795 Method for depositing high density plasma chemical vapor deposition oxide with improved topography |
| 06/26/2001 | US6251794 Method and apparatus with heat treatment for stripping photoresist to eliminate post-strip photoresist extrusion defects |
| 06/26/2001 | US6251793 Particle controlling method for a plasma processing chamber |
| 06/26/2001 | US6251792 Plasma etch processes |
| 06/26/2001 | US6251791 Eliminating etching microloading effect by in situ deposition and etching |
| 06/26/2001 | US6251790 Method for fabricating contacts in a semiconductor device |