| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/10/2001 | US6256873 Method for making smart cards using isotropic thermoset adhesive materials |
| 07/10/2001 | US6256825 Removal of particulate contamination in loadlocks |
| 07/10/2001 | CA2203489C Circuit in cmos technology for high speed driving of optical sources |
| 07/06/2001 | CA2328266A1 Corrosion and erosion resistant thin film diamond coating and applications therefor |
| 07/05/2001 | WO2001049087A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001049086A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001049085A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001048870A2 Interconnect for microelectronic structures with enhanced spring characteristics |
| 07/05/2001 | WO2001048829A1 Bipolar transistor with upper heterojunction collector and method for making same |
| 07/05/2001 | WO2001048825A1 Method for manufacturing bonded wafer |
| 07/05/2001 | WO2001048824A1 High-voltage capacitor voltage divider circuit having a high-voltage silicon-on-insulator (soi) capacitor |
| 07/05/2001 | WO2001048823A1 An integrated circuit with metal programmable logic having enhanced reliability |
| 07/05/2001 | WO2001048822A2 Thin-film transistor circuitry |
| 07/05/2001 | WO2001048819A2 Interconnect structure and method of fabrication therefor |
| 07/05/2001 | WO2001048816A1 Heat sink material and method of manufacturing the heat sink material |
| 07/05/2001 | WO2001048815A1 Stress isolated integrated circuit and manufacturing method thereof |
| 07/05/2001 | WO2001048814A1 Method of manufacturing a semiconductor device comprising semiconductor elements formed in a top layer of a silicon wafer situated on a buried insulating layer |
| 07/05/2001 | WO2001048813A1 Method and device for preventing oxidation on substrate surface |
| 07/05/2001 | WO2001048812A2 Method and system for efficiently computing a number of integrated circuit dies |
| 07/05/2001 | WO2001048811A2 A method for efficiently computing a number of integrated circuit dies |
| 07/05/2001 | WO2001048810A1 Inspecting device for crystal defect of silicon wafer and method for detecting crystal defect of the same |
| 07/05/2001 | WO2001048809A1 Junction field-effect transistor and method of manufacture thereof |
| 07/05/2001 | WO2001048808A1 An insitu post etch process to remove remaining photoresist and residual sidewall passivation |
| 07/05/2001 | WO2001048807A1 Abrasives for chemical mechanical polishing |
| 07/05/2001 | WO2001048806A1 Method of forming low-dielectric-constant film, and semiconductor substrate with low-dielectric-constant film |
| 07/05/2001 | WO2001048805A1 Method for curing spin-on dielectric films utilizing electron beam radiation |
| 07/05/2001 | WO2001048804A1 In situ post-etch photoresist and polymer stripping and dielectric etch chamber cleaning |
| 07/05/2001 | WO2001048803A1 Etching solution, etching method, and semiconductor silicon wafer |
| 07/05/2001 | WO2001048801A1 Method and apparatus for monitoring polishing state, polishing device, process wafer, semiconductor device, and method of manufacturing semiconductor device |
| 07/05/2001 | WO2001048800A1 Semiconductor wafer processing apparatus and processing method |
| 07/05/2001 | WO2001048799A1 Method for producing group iii nitride compound semiconductor and group iii nitride compound semiconductor device |
| 07/05/2001 | WO2001048798A1 Method for producing group iii nitride compound semiconductor and group iii nitride compound semiconductor device |
| 07/05/2001 | WO2001048797A1 Production method for semiconductor device |
| 07/05/2001 | WO2001048796A1 Semiconductor device and method for manufacturing a passivation layer on a semiconductor device |
| 07/05/2001 | WO2001048795A2 Fluorine based plasma etch method for anisotropic etching of high open area silicon structures |
| 07/05/2001 | WO2001048794A2 Enhanced etching/smoothing of dielectric surfaces |
| 07/05/2001 | WO2001048793A2 Method for converting features in an integrated circuit design and apparatus for doing the same |
| 07/05/2001 | WO2001048787A1 Multi-electron -beam lithography apparatus with mutually different beam limiting apertures |
| 07/05/2001 | WO2001048555A1 Thinner for rinsing photoresist and method of treating photoresist layer |
| 07/05/2001 | WO2001048553A1 A method for maximizing integrated circuit die production |
| 07/05/2001 | WO2001048547A1 Tft array substrate, method of manufacture thereof, and lcd with tft array substrate |
| 07/05/2001 | WO2001048493A2 Low power scan flipflop |
| 07/05/2001 | WO2001048416A1 Light curtain system for establishing a protective light curtain, tool and system for processing objects and method for loading/unloading a tool |
| 07/05/2001 | WO2001048275A1 Plating device and plating method |
| 07/05/2001 | WO2001048274A1 Apparatus for plating substrate, method for plating substrate, electrolytic processing method, and apparatus thereof |
| 07/05/2001 | WO2001048076A2 A method to fabricate thin insulating films |
| 07/05/2001 | WO2001047831A1 Carbon-containing aluminum nitride sintered compact, and ceramic substrate for use in apparatus for manufacturing and inspecting semiconductor |
| 07/05/2001 | WO2001047720A1 Thermal mass transfer donor element with light-to-heat conversion layer |
| 07/05/2001 | WO2001047664A1 Wafer polishing method and wafer polishing device |
| 07/05/2001 | WO2001047660A1 Hardening flux, soldering resist, semiconductor package reinforced by hardening flux, semiconductor device and method of producing semiconductor package and semiconductor device |
| 07/05/2001 | WO2001047659A1 Energy-efficient, laser-based method and system for processing target material |
| 07/05/2001 | WO2001040864A8 Photoresist dispense method by compensation for substrate reflectivity |
| 07/05/2001 | WO2001020252A8 Method and apparatus for performing optical measurements of layers and surface properties |
| 07/05/2001 | WO2001011673A3 Method for etching oxide films containing bismuth |
| 07/05/2001 | WO2001009930A3 Thin film capacitors on silicon germanium substrate and process for making the same |
| 07/05/2001 | WO2001006545B1 ENHANCED n TYPE SILICON MATERIAL FOR EPITAXIAL WAFER SUBSTRATE AND METHOD OF MAKING SAME |
| 07/05/2001 | WO2001004377A8 Seal means and its application in deposition reactor |
| 07/05/2001 | WO2001001449A3 Semiconductor device manufacturing using low energy high tilt angle ion implantation |
| 07/05/2001 | WO2000079581A3 Improving mosfet performance by employing an improved method for forming halo implants |
| 07/05/2001 | WO2000077831A3 Methods for regulating surface sensitivity of insulating films in semiconductor devices |
| 07/05/2001 | WO2000075967A3 Method for fabrication of a low resistivity mosfet gate with thick metal silicide on polysilicon |
| 07/05/2001 | WO2000067301A3 Method of making shallow junction semiconductor devices |
| 07/05/2001 | WO2000067291A3 Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography |
| 07/05/2001 | WO2000054312A8 Ic-compatible parylene mems technology and its application in integrated sensors |
| 07/05/2001 | WO2000004579A9 Process for mapping metal contaminant concentration on a silicon wafer surface |
| 07/05/2001 | WO2000003169A3 Manifold system of removable components for distribution of fluids |
| 07/05/2001 | US20010007145 Electronic parts placement method and a computer readable medium having an electronic parts placement program |
| 07/05/2001 | US20010007144 Hold violation improvement method, semiconductor integrated circuit, and program for executing hold violation improvement method by computer |
| 07/05/2001 | US20010007143 Circuit simulation device for predicting the dispersion of circuit characteristics and the electric characteristics |
| 07/05/2001 | US20010007092 Method in an integrated circuit (IC) manufacturing process for indentifying and redirecting IC's mis-processed during their manufacture |
| 07/05/2001 | US20010007091 Integrated circuit provided with means for calibrating an electronic module and method for calibrating an electronic module of an integrated circuit |
| 07/05/2001 | US20010007085 Method and system for supervising reference wafers on semiconductor device production line and recording medium |
| 07/05/2001 | US20010007084 Automatic wire bonder and method for implementing thereof |
| 07/05/2001 | US20010006936 Removing photoresist residue; does not corrode or attack titanium or other metallurgy, oxide or nitride layers on the substrate |
| 07/05/2001 | US20010006874 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006873 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006872 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006871 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006870 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| 07/05/2001 | US20010006853 Thin uniform oxide film |
| 07/05/2001 | US20010006852 Integrated circuit |
| 07/05/2001 | US20010006850 Forming photoresist pattern; etching |
| 07/05/2001 | US20010006849 Methods and apparatus for producing semiconductor devices |
| 07/05/2001 | US20010006848 Integrated circuit |
| 07/05/2001 | US20010006847 Connectors in flash memory |
| 07/05/2001 | US20010006846 Method and structure for bonding layers in a semiconductor device |
| 07/05/2001 | US20010006845 Method and apparatus for producing group-III nitrides |
| 07/05/2001 | US20010006844 Method for fabricating single electron transistor |
| 07/05/2001 | US20010006843 Method for forming a gate insulating film for semiconductor devices |
| 07/05/2001 | US20010006841 Process for forming a metal interconnect |
| 07/05/2001 | US20010006840 Method for growing a compound semiconductor, quantum well structure using the same, and compound semiconductor device including the same |
| 07/05/2001 | US20010006839 Forming a trench mask pattern on semiconductor; etching; overcoating with dielectric |
| 07/05/2001 | US20010006838 Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby |
| 07/05/2001 | US20010006837 Forming carbon over active matrix; patterning |
| 07/05/2001 | US20010006836 Cycles of oxidation, etching |
| 07/05/2001 | US20010006835 Method for manufacturing aluminum oxide film for use in a semiconductor device |
| 07/05/2001 | US20010006834 Semiconductor device with high- and low-density regions of transistor elements on single semiconductor substrate, and method of manufacturing such semiconductor device |
| 07/05/2001 | US20010006833 Forming tantalum, titanium mixed oxide |
| 07/05/2001 | US20010006832 Method for fabricating polycide dual gate in semiconductor device |
| 07/05/2001 | US20010006831 Manufacture of semiconductor material and devices using that materia |