| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/14/2002 | CA2071496C Direct thermocompression bonding for thin electronic power chips |
| 05/10/2002 | WO2002037911A1 Method and arrangement relating to providing a substrate with cavities |
| 05/10/2002 | WO2002037905A2 Mechanism for prevention of neutron radiation in ion implanter beamline |
| 05/10/2002 | WO2002037574A1 Method of patterning thin film and tft array substrate using it and production method therefor |
| 05/10/2002 | WO2002037573A1 Semiconductor device and its manufacturing method |
| 05/10/2002 | WO2002037570A2 Semiconductor device and method of making same |
| 05/10/2002 | WO2002037569A2 Trench gate mos semiconductor device |
| 05/10/2002 | WO2002037567A1 Capacitor element and production method therefor |
| 05/10/2002 | WO2002037566A2 Silicon controlled rectifier electrostatic discharge protection device with external on-chip triggering and compact internal dimensions for fast triggering |
| 05/10/2002 | WO2002037564A2 Film material comprising metal spikes and method for the production thereof |
| 05/10/2002 | WO2002037561A2 Dual gate oxide process for uniform oxide thickness |
| 05/10/2002 | WO2002037560A1 Method for simultaneously making a pair of transistors with insulated grids having respectively a fine oxide and a thick oxide, and corresponding integrated circuit comprising such a pair of transistors |
| 05/10/2002 | WO2002037559A2 Low temperature hillock suppression method in integrated circuit interconnects |
| 05/10/2002 | WO2002037558A1 Semiconductor device and its manufacturing method |
| 05/10/2002 | WO2002037557A2 Method for producing an integrated circuit, at least partially transforming an oxide layer into a conductive layer |
| 05/10/2002 | WO2002037556A1 Method for making a stacked structure comprising a thin film adhering to a target substrate |
| 05/10/2002 | WO2002037555A1 Wafer prealignment apparatus, its method for judging wafer presence, method for sensing wafer edge position, computer-readable record medium with recorded program for executing this position sensing method, apparatus for sensing wafer edge position, and prealignment sensor |
| 05/10/2002 | WO2002037554A1 Method for assembling planar workpieces |
| 05/10/2002 | WO2002037553A1 Integrated circuit connection by conductive deposition through a perforated film |
| 05/10/2002 | WO2002037552A2 Doping for flash memory cell |
| 05/10/2002 | WO2002037551A1 Non-volatile memory with source side boron implantation |
| 05/10/2002 | WO2002037550A1 Non-volatile memory with source side boron implantation |
| 05/10/2002 | WO2002037549A2 Method for structuring a silicon oxide layer |
| 05/10/2002 | WO2002037548A1 Method and apparatus for forming multicomponent metal oxide thin film |
| 05/10/2002 | WO2002037547A1 Integration of high voltage self-aligned mos components |
| 05/10/2002 | WO2002037546A1 Method for producing a schottky diode in silicon carbide |
| 05/10/2002 | WO2002037544A1 Electron beam exposure apparatus and electron beam exposure method |
| 05/10/2002 | WO2002037542A2 Method for trench capacitor dram cell without floating-well effects |
| 05/10/2002 | WO2002037541A2 Etch chamber for etching dielectric layer with expanded process window |
| 05/10/2002 | WO2002037540A1 Wafer processing equipment and method for processing wafers |
| 05/10/2002 | WO2002037539A1 Device for guiding a linearly displaceable tool |
| 05/10/2002 | WO2002037538A2 Amorphous carbon layer for improved adhesion of photoresist |
| 05/10/2002 | WO2002037524A2 Bi mode ion implantation with non-parallel ion beams |
| 05/10/2002 | WO2002037343A1 Method and apparatus for physical budgeting during rtl floorplanning |
| 05/10/2002 | WO2002037200A1 Voltage supply circuit |
| 05/10/2002 | WO2002037186A1 Process control for micro-lithography |
| 05/10/2002 | WO2002037185A1 Photosensitive resin composition |
| 05/10/2002 | WO2002037184A1 Positive photosensitive resin composition, process for its preparation, and semiconductor devices |
| 05/10/2002 | WO2002037183A2 Inverse resist coating process |
| 05/10/2002 | WO2002037144A1 Optical lithography and a method of inducing transmission in optical lithography preforms |
| 05/10/2002 | WO2002037130A2 Method for testing integrated circuits |
| 05/10/2002 | WO2002037034A1 Pulling room |
| 05/10/2002 | WO2002036849A1 Work table with a table top |
| 05/10/2002 | WO2002036847A2 Sputtering target |
| 05/10/2002 | WO2002036846A2 Sputtering target assemblies |
| 05/10/2002 | WO2002036646A1 High-molecular compounds for photoresists, monomeric compounds, photosensitive resin compositions, method for forming patterns with the compositions, and process for production of electronic components |
| 05/10/2002 | WO2002036331A2 Device for sintering, removing material and/or labeling by means of electromagnetically bundled radiation and method for operating the device |
| 05/10/2002 | WO2002036301A2 Installation docking pedestal for_wafer fabrication equipment |
| 05/10/2002 | WO2002022469A3 Loadlock with integrated pre-clean chamber |
| 05/10/2002 | WO2002019378A3 System and method for removing particles entrained in an ion beam |
| 05/10/2002 | WO2002019377A3 Electrostatic trap for particles entrained in an ion beam |
| 05/10/2002 | WO2002019376A3 System and method for removing contaminant particles relative to an ion beam |
| 05/10/2002 | WO2002015273A3 Methods for producing passive components on a semiconductor substrate |
| 05/10/2002 | WO2002013270A3 Semiconductor component and a method for identifying a semiconductor component |
| 05/10/2002 | WO2002012972A3 Direct temperature control for a component of a substrate processing chamber |
| 05/10/2002 | WO2002011185A3 Method of polishing a semiconductor wafer |
| 05/10/2002 | WO2002009187A3 Heterojunction tunneling diodes and process for fabricating same |
| 05/10/2002 | WO2002009176A3 Method for applying adjusting marks on a semiconductor disk |
| 05/10/2002 | WO2002007216A3 Fabrication of electronic circuit elements |
| 05/10/2002 | WO2002005332A3 Loadlock chamber |
| 05/10/2002 | WO2002001602A3 Method of manufacturing a charge-coupled image sensor |
| 05/10/2002 | WO2001086314A3 Method and circuit for testing dc parameters of circuit input and output nodes |
| 05/10/2002 | WO2001086034B1 Modified susceptor for use in chemical vapor deposition process |
| 05/10/2002 | WO2001075983A3 Multilayer capacitor structure having an array of concentric ring-shaped plates for deep sub-micron cmos |
| 05/10/2002 | WO2001072472A3 Carrier head with a flexible membrane having parts made with different elastomers |
| 05/10/2002 | WO2001059845A3 Bipolar transistor |
| 05/10/2002 | WO2001048793A3 Method for converting features in an integrated circuit design and apparatus for doing the same |
| 05/10/2002 | WO2001048076A3 A method to fabricate thin insulating films |
| 05/10/2002 | WO2001046989A3 Decoupling capacitors for thin gate oxides |
| 05/10/2002 | WO2001045501A3 GROWTH OF ULTRATHIN NITRIDE ON Si(100) BY RAPID THERMAL N2 TREATMENT |
| 05/10/2002 | WO2001045141A3 Method and apparatus for smoothing thin conductive films by gas cluster ion beam |
| 05/10/2002 | WO2001043183A3 Electrostatic chuck, susceptor and method for fabrication |
| 05/10/2002 | WO2001043179A3 Method for producing a crystallized ceramic layer by means of laser annealing |
| 05/10/2002 | WO2001042820A3 Method of making optoelectronic devices using sacrificial devices |
| 05/10/2002 | WO2001035500A3 Field effect transistor (fet) and fet circuitry |
| 05/10/2002 | WO2001028950A9 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 05/10/2002 | WO2001028097A9 Heterogeneous interconnection architecture for programmable logic devices |
| 05/10/2002 | WO1999053527A3 Method and system for fabricating and testing assemblies containing wire bonded semiconductor dice |
| 05/09/2002 | US20020056083 System and method for picture-in-browser scaling |
| 05/09/2002 | US20020056073 Wiring resistance correcting method |
| 05/09/2002 | US20020056070 Method and apparatus for extracting parasitic element of semiconductor circuit |
| 05/09/2002 | US20020055925 Automatic quality control method for production line and apparatus therefor as well as automatic quality control program |
| 05/09/2002 | US20020055802 System and method for controlling semiconductor device manufacturing flow |
| 05/09/2002 | US20020055801 Fault detection and virtual sensor methods for tool fault monitoring |
| 05/09/2002 | US20020055799 Apparatus, method and medium for enhancing the throughput of a wafer processing facility using a multi-slot cool down chamber and a priority transfer scheme |
| 05/09/2002 | US20020055550 Containing units from 4,4'-(9H-fluoren-9-ylidene) bis((2-propenyl) phenol) |
| 05/09/2002 | US20020055447 Etching liquid composition |
| 05/09/2002 | US20020055325 Polishing apparatus |
| 05/09/2002 | US20020055324 Process for polishing silicon wafers |
| 05/09/2002 | US20020055323 Methods, apparatus and slurries for chemical mechanical planarization |
| 05/09/2002 | US20020055276 Equipment for fabricating a semiconductor product |
| 05/09/2002 | US20020055275 Dielectric layer for a semiconductor device and method of producing the same |
| 05/09/2002 | US20020055274 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device |
| 05/09/2002 | US20020055273 Semiconductor device having single silicon oxide nitride gas insulating layer |
| 05/09/2002 | US20020055272 Method and apparatus for controlling material removal from a semiconductor substrate using induced current endpointing |
| 05/09/2002 | US20020055271 Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method |
| 05/09/2002 | US20020055270 Passivating dielectric layer with activated nitrogen atoms, then forming metal nitride film on the nitrogen passivated dielectric layer |
| 05/09/2002 | US20020055269 Method for fabricating a barrier layer |
| 05/09/2002 | US20020055268 Multiple stage deposition process for filling trenches |
| 05/09/2002 | US20020055267 Method of preventing motion of wafer in a wafer holder |