Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2002
06/27/2002US20020081807 Dual trench isolation for a phase-change memory cell and method of making same
06/27/2002US20020081806 NAND-type flash memory devices and methods of fabricating the same
06/27/2002US20020081805 Method and structure for an improved floating gate memory cell
06/27/2002US20020081803 Method of fabricating dram capacitor
06/27/2002US20020081802 Interconnect to plate contact/via arrangement for random access memory
06/27/2002US20020081801 Process for producing a microroughness on a surface
06/27/2002US20020081800 Electrode, semiconductor device and methods for making them
06/27/2002US20020081799 Contact fabrication method for semiconductor device
06/27/2002US20020081798 Method for fabricating oxide layers with different thicknesses
06/27/2002US20020081797 Elimination of narrow device width effects in complementary metal oxide semiconductor (CMOS) devices
06/27/2002US20020081796 Method for fabricating a non-volatile memory device
06/27/2002US20020081795 Method for manufacturing trench-gate type power semiconductor device
06/27/2002US20020081794 Enhanced deposition control in fabricating devices in a semiconductor wafer
06/27/2002US20020081793 Method for fabricating a semiconductor device
06/27/2002US20020081792 Method for constructing a metal oxide semiconductor field effect transistor
06/27/2002US20020081791 Double gate MOSFET transistor and method for the production thereof
06/27/2002US20020081790 Process for producing a capacitor configuration
06/27/2002US20020081787 By decomposing into gaseous products a sacrificial material selected from polycarbonate polymers, polyester polymers, polyether polymers, (meth)acrylate polymers, or blends
06/27/2002US20020081786 Process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction
06/27/2002US20020081785 Process for producing an MOS field effect transistor with a recombination zone
06/27/2002US20020081784 Semiconductor device
06/27/2002US20020081782 Contact and via structure and method of fabrication
06/27/2002US20020081780 Methods and apparatus for making integrated circuit package including opening exposing portion of the IC
06/27/2002US20020081779 Device comprising an electrical circuit carried by a carrier element and method for the manufacture of such a device
06/27/2002US20020081777 Methods of making microelectronic assemblies having conductive elastomeric posts
06/27/2002US20020081776 Of aluminum metallization layer; installing a dicing blade having a sacrificial anode, flooding the work surface with cooling high purity water solution, dicing the wafer
06/27/2002US20020081773 Light-emitting element, semiconductor light-emitting device, and manufacturing methods therefor
06/27/2002US20020081772 Method and system for manufacturing ball grid array ("BGA") packages
06/27/2002US20020081771 Flip chip process
06/27/2002US20020081769 Method of fabricating semiconductor device
06/27/2002US20020081768 Semiconductor device and method of fabricating semiconductor device
06/27/2002US20020081766 Semiconductor device, production method thereof, and electronic device
06/27/2002US20020081764 Layers comprising beryllium are deposited between layers of initially undoped indium phosphide (InP); beryllium diffuses from the layers comprising beryllium into the layers of initially undoped InP
06/27/2002US20020081763 Forming a first semiconductor layer made of a group 3 nitride in contact with a second semiconductor layer made of a different group 3 nitride so the density of a p-type dopant increases near the heterojunction interface
06/27/2002US20020081762 By sintering a first electrode layer, an electrolyte layer, a second electrode layer; cermets; solid oxide fuel cells
06/27/2002US20020081761 Method of manufacturing a display unit of a flat display panel having a wide viewing angle
06/27/2002US20020081759 Method and apparatus for reducing fixed charges in a semiconductor device
06/27/2002US20020081758 Method of manufacturing semiconductor integrated circuit device
06/27/2002US20020081757 System for providing information on quality and reliability of optical semiconductor device by using communication network
06/27/2002US20020081756 Inspection analyzing apparatus and semiconductor device
06/27/2002US20020081755 Method of testing and constructing monolithic multi-chip modules
06/27/2002US20020081754 Method of manufacturing semiconductor device and system for manufacturing the same
06/27/2002US20020081753 Formation of arrays of microelectronic elements
06/27/2002US20020081752 Method for fabricating a capacitor in a semiconductor device
06/27/2002US20020081534 Method of reworking photoresist layer
06/27/2002US20020081533 Photolithography; stabilizing resist image (of high aspect ratio) via overcasting then removing a stabilizing layer, removal of carbon dioxide removes the topcoat and dries the resist image without distortion; semiconductors
06/27/2002US20020081532 Methodology to introduce metal and via openings
06/27/2002US20020081531 Methodology to introduce metal and via openings
06/27/2002US20020081528 Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
06/27/2002US20020081524 Excellent in transmittance for the wavelength of fluorine excimer light, suitable for fine processing of semiconductors
06/27/2002US20020081507 Method for forming a vertical edge submicron through-hole and a thin film sample with this kind of through-hole
06/27/2002US20020081506 Method for producing a semiconductor device
06/27/2002US20020081504 Coating the photoresist resin containing a thermal acid generator, on a substrate to form photoresist film, exposing and developing the exposed photoresist film to obtain a pattern and heating the photoresist pattern
06/27/2002US20020081502 Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device
06/27/2002US20020081501 A photomask having a pattern formed with a resist on at least one face of a transparent plate, and the resist is not provided on the face atleast at a contact point with a photomask equipment
06/27/2002US20020081500 First mask and the second mask define a transistor gate
06/27/2002US20020081499 Novel polymers and photoresist compositions for short wavelength imaging
06/27/2002US20020081463 Aluminum-including III nitride film which is suitable for a light-emitting diode or a high speed integrated circuit chip
06/27/2002US20020081445 Composite material manufacturing method thereof, substrate processing apparatus and manufacturing method thereof, substrate mouting stage and manufacturing method thereof, and substrate processing method
06/27/2002US20020081440 Characterized in that laser scattering tomography defect occurrence region accounts for 80% of wafer surface area, that laser scattering tomography defects have mean size of 0.1 mu m; semiconductor, low surface defect density
06/27/2002US20020081417 Semiconductor wafer, method for producing the same, and wafer chuck
06/27/2002US20020081394 Depositing aluminum using plasma deposition with organoaluminum as source, repeating to form an aluminum thin film, and further oxidizing using oxygen plasma to form aluminum oxide film thus obtaining aluminum oxide of high
06/27/2002US20020081374 Method of epitaxy on a silicon substrate comprising areas heavily doped with arsenic
06/27/2002US20020081237 On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
06/27/2002US20020081181 Substrate processing apparatus and substrate processing method
06/27/2002US20020081177 Valve/sensor assemblies
06/27/2002US20020081175 Vacuum processing apparatus and a vacuum processing system
06/27/2002US20020081174 Vacuum processing apparatus and a vacuum processing system
06/27/2002US20020081173 Apparatus for loading a substrate onto a processing surface in a thin-film processing chamber
06/27/2002US20020081118 Substrate processing apparatus and processing method by use of the apparatus
06/27/2002US20020081108 Heat treatment apparatus and method
06/27/2002US20020081018 Inspection method for master disk for magnetic recording media
06/27/2002US20020081016 Method of detecting measurement error in measurement system
06/27/2002US20020080837 Semiconductor laser and method of producing the same
06/27/2002US20020080834 Light source device
06/27/2002US20020080669 Semiconductor integrated circuit device
06/27/2002US20020080668 Current controlled multi-state parallel test for semiconductor device
06/27/2002US20020080659 Highly integrated non-volatile memory cell array having a high program speed
06/27/2002US20020080646 Thin film magnetic memory device including memory cells having a magnetic tunnel junction
06/27/2002US20020080645 Passivated magneto-resistive bit structure and passivation method therefor
06/27/2002US20020080644 Magnetic random access memory
06/27/2002US20020080643 Magnetic random access memory
06/27/2002US20020080641 Semiconductor memory device
06/27/2002US20020080640 Dynamic RAM-and semiconductor device
06/27/2002US20020080639 256 Meg dynamic random access memory
06/27/2002US20020080637 Triodic rectifier switch
06/27/2002US20020080588 Probe card assembly and kit, and methods of making same
06/27/2002US20020080551 Temperature compensating thin-film capacitor
06/27/2002US20020080498 Projection optical system
06/27/2002US20020080491 Diffractive optical element, method of fabricating the element, illumination device provided with the element, projection exposure apparatus, exposure method, optical homogenizer, and method of fabricating the optical homogenizer
06/27/2002US20020080365 Method of measuring alignment of a substrate with respect to a reference alignment mark
06/27/2002US20020080364 Method of measuring overlay
06/27/2002US20020080363 Measurement of surface defects
06/27/2002US20020080348 Method of and apparatus for article inspection including speckle reduction
06/27/2002US20020080346 Sample inspection system
06/27/2002US20020080337 Spindle sleeve for coater/developer
06/27/2002US20020080318 Liquid crystal display
06/27/2002US20020080295 TFT active matrix liquid crystal display devices
06/27/2002US20020080291 Interback-type substrate processing device
06/27/2002US20020080104 Semiconductor device
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