Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2002
07/09/2002US6417086 Method of manufacturing semiconductor device having nonvolatile memory and logic circuit using multi-layered, inorganic mask
07/09/2002US6417085 Forming sio2 layer on substrate, depositing ta2o5 layer and conductive grate region, patterns for transistors and conductive metal nitride
07/09/2002US6417084 T-gate formation using a modified conventional poly process
07/09/2002US6417083 Forming semiconductors, dielectric films, conductors, organic antireflection film, photoresists and etching
07/09/2002US6417082 Semiconductor structure
07/09/2002US6417081 Process for reduction of capacitance of a bitline for a non-volatile memory cell
07/09/2002US6417080 Method of processing residue of ion implanted photoresist, and method of producing semiconductor device
07/09/2002US6417079 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device
07/09/2002US6417078 Implantation process using sub-stoichiometric, oxygen doses at different energies
07/09/2002US6417077 Edge growth heteroepitaxy processes with reduced lattice mismatch strain between a deposited semiconductor material and a semiconductor substrate
07/09/2002US6417075 Method for producing thin substrate layers
07/09/2002US6417074 Method of manufacturing a structure for reducing leakage currents by providing isolation between adjacent regions of an integrated circuit
07/09/2002US6417073 Method for forming element isolating region
07/09/2002US6417072 Method of forming STI oxide regions and alignment marks in a semiconductor structure with one masking step
07/09/2002US6417071 Sub-atmospheric pressure thermal chemical vapor deposition (SACVD) trench isolation method with attenuated surface sensitivity
07/09/2002US6417070 Method for forming a liner in a trench
07/09/2002US6417069 Substrate processing method and manufacturing method, and anodizing apparatus
07/09/2002US6417067 Method for fabricating an electrode structure of capacitor for semiconductor device
07/09/2002US6417066 Method of forming a DRAM capacitor structure including increasing the surface area using a discrete silicon mask
07/09/2002US6417065 Method of fabricating a bottom electrode
07/09/2002US6417064 Method for treating the surface of a deep trench
07/09/2002US6417063 Folded deep trench capacitor and method
07/09/2002US6417062 Method of forming ruthenium oxide films
07/09/2002US6417059 Process for forming a silicon-germanium base of a heterojunction bipolar transistor
07/09/2002US6417058 SiGe/poly for low resistance extrinsic base npn transistor
07/09/2002US6417057 Method of forming a semiconductor device having a TFT utilizing optical annealing before a gate electrode is formed
07/09/2002US6417056 Method to form low-overlap-capacitance transistors by forming microtrench at the gate edge
07/09/2002US6417055 Method for forming gate electrode for a semiconductor device
07/09/2002US6417054 Method for fabricating a self aligned S/D CMOS device on insulated layer by forming a trench along the STI and fill with oxide
07/09/2002US6417053 Fabrication method for a silicon nitride read-only memory
07/09/2002US6417052 Fabrication process for semiconductor device
07/09/2002US6417051 Method of manufacturing memory device including insulated gate field effect transistors
07/09/2002US6417050 Semiconductor component and method of manufacture
07/09/2002US6417049 Split gate flash cell for multiple storage
07/09/2002US6417048 Method for fabricating flash memory with recessed floating gates
07/09/2002US6417047 Manufacturing method of a non-volatile semiconductor memory device having isolation regions
07/09/2002US6417046 Modified nitride spacer for solving charge retention issue in floating gate memory cell
07/09/2002US6417045 Method of manufacturing a semiconductor integrated circuit device including a DRAM having reduced parasitic bit line capacity
07/09/2002US6417044 Non-volatile memory and memory of manufacturing the same
07/09/2002US6417043 Memory cell configuration and fabrication method
07/09/2002US6417042 Method of manufacturing a capacitor in a semiconductor device
07/09/2002US6417041 Method for fabricating high permitivity dielectric stacks having low buffer oxide
07/09/2002US6417040 Method for forming memory array having a digit line buried in an isolation region
07/09/2002US6417039 Method of manufacturing a semiconductor device comprising a semiconductor body having a surface provided with a coil having a magnetic core
07/09/2002US6417038 Method of fabricating semiconductor device
07/09/2002US6417037 Method of dual gate process
07/09/2002US6417035 Method for manufacturing a field effect transistor
07/09/2002US6417033 Method of fabricating a silicon island
07/09/2002US6417032 Method of forming cross strapped Vss layout for full CMOS SRAM cell
07/09/2002US6417031 Method of manufacturing a semiconductor device
07/09/2002US6417029 Compliant package with conductive elastomeric posts
07/09/2002US6417022 Method for making long focal length micro-lens for color filters
07/09/2002US6417018 Asymmetrical molding method for multiple part matrixes
07/09/2002US6417016 Silicon substrates implanted with dope, anodizing, oxidation and removal of oxide coating
07/09/2002US6417015 Semiconductor processing methods and semiconductor defect detection methods
07/09/2002US6417014 Method and apparatus for reducing wafer to wafer deposition variation
07/09/2002US6417013 Morphed processing of semiconductor devices
07/09/2002US6417012 Method of forming ferroelectric capacitor in semiconductor device
07/09/2002US6416953 Hybridization of polynucleotides conjugated with chromo-phores and fluorophores to generate donor-to-donor energy transfer system
07/09/2002US6416933 Forming an etch mask withh pattern photoresists from polymer
07/09/2002US6416930 Copolymers of vinylimidazole with a water-soluble film-forming monmer other than vinylimidazole and a fluorine containing surfactant; a semiconductor device can be produced without clogging of waste fluids in a waste pipe
07/09/2002US6416927 Chemically amplified resist compositions
07/09/2002US6416913 Scanning mask and work-piece to transfer pattern and changing imaging characteristics to correct for changes caused by thermal properties; reduced magnification error and distortion
07/09/2002US6416889 Anti-corrosion ceramic member
07/09/2002US6416878 Abrasive dressing tool and method for manufacturing the tool
07/09/2002US6416849 Method and structure to reduce low force pin pull failures in ceramic substrates
07/09/2002US6416836 Thermally annealed, low defect density single crystal silicon
07/09/2002US6416823 Improvement includes a second process gas distributor having a second process gas exit spaced apart from the substrate support, and an oxygen-supplying gas distributor have a third exit spaced above the substrate support
07/09/2002US6416822 Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
07/09/2002US6416812 Electroless plating bath using source of cupric ions, reducing agent and complexing agent in basic solution
07/09/2002US6416685 Use of soft abrasive polymer particles in slurry can reduce mechanical abrasion
07/09/2002US6416647 Electro-chemical deposition cell for face-up processing of single semiconductor substrates
07/09/2002US6416640 Sputter station
07/09/2002US6416635 Changes in film uniformity due to changes in the geometry of the surface as the target erodes are avoided by changing the relative positions of a substrate holder and a target support on a cathode assembly
07/09/2002US6416619 System for making wallboard or backerboard sheets including aerated concrete
07/09/2002US6416618 Wafer processing apparatus
07/09/2002US6416617 Using a torque detector which detects the rotation torque of polishing platen or substrate holder and adaptively dressing the polishing pad if the rotation torque detected is equal to or smaller than a predetermined value
07/09/2002US6416615 Device for detecting abnormality in chemical-mechanical polishing operation
07/09/2002US6416586 Cleaning method
07/09/2002US6416584 Apparatus for forming a film on a substrate
07/09/2002US6416583 Film forming apparatus and film forming method
07/09/2002US6416579 Apparatus for treating silicon wafers
07/09/2002US6416576 Method for producing single crystal
07/09/2002US6416401 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives
07/09/2002US6416399 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416398 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416397 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416395 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416393 Polishing; hydrophobic surfaces using aqueous solution containing hydrogen fluoride
07/09/2002US6416388 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416387 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416386 Apparatus and methods for substantial planarization of solder bumps
07/09/2002US6416385 Method and apparatus for polishing semiconductor wafers
07/09/2002US6416384 Method and apparatus for polishing
07/09/2002US6416318 Process chamber assembly with reflective hot plate and pivoting lid
07/09/2002US6415977 Method and apparatus for marking and identifying a defective die site
07/09/2002US6415974 Structure of solder bumps with improved coplanarity and method of forming solder bumps with improved coplanarity
07/09/2002US6415859 Dehumidification/humidification air supply apparatus
07/09/2002US6415858 Temperature control system for a workpiece chuck
07/09/2002US6415843 Spatula for separation of thinned wafer from mounting carrier