| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/02/2002 | US6413459 Method for handling and processing microelectronic-device substrate assemblies |
| 07/02/2002 | US6413441 Magnetic polishing fluids |
| 07/02/2002 | US6413439 Electrode with layers of aluminum and aluminum alloyed with metal whose halide has a low vapor pressure; low pressure reactive ion etching with chlorine and helium; nondamaging to piezoelectric substrate; no aftercorrosion |
| 07/02/2002 | US6413438 Tetraethoxysilane layer over low-k dielectric modified organic spun on glass (sog) film; dry etching with trifluoromethane, difluoromethane and carbon monoxide; nonbowing; nonpeeling; corrosion resistance; semiconductor integrated circuits |
| 07/02/2002 | US6413437 Fine featured photo-resist artwork design for chemical milling |
| 07/02/2002 | US6413436 Selective treatment of the surface of a microelectronic workpiece |
| 07/02/2002 | US6413408 Method for the production of a porous layer |
| 07/02/2002 | US6413404 Method of forming bumps by electroplating |
| 07/02/2002 | US6413392 Sputtering device |
| 07/02/2002 | US6413390 Plating system with remote secondary anode for semiconductor manufacturing |
| 07/02/2002 | US6413383 Flowing a gas into a magnetron, generating a plasma, then depressuring and increasing the power; plasma gas vapor deposition of copper |
| 07/02/2002 | US6413356 Substrate loader for a semiconductor processing system |
| 07/02/2002 | US6413355 Apparatus for and method of cleaning objects to be processed |
| 07/02/2002 | US6413320 Integrated processing system having multiple reactors connected to a central chamber |
| 07/02/2002 | US6413317 Substrate processing method and substrate processing apparatus |
| 07/02/2002 | US6413312 P-type nitride iii-v, such as gallium nitride; metal organic chemical vapor deposition using an arylalkyl hydrazine nitrogen source which does not release hydrogen; high carrier concentration; no annealing; light emitting diodes; lasers |
| 07/02/2002 | US6413310 Czochralski method; slicing; heat treating; reduced grown-in defects; low haze and microroughness; semiconductor integrated circuits |
| 07/02/2002 | US6413288 CMP polishing slurry dewatering and reconstitution |
| 07/02/2002 | US6413202 Solvent systems for polymeric dielectric materials |
| 07/02/2002 | US6413156 Method and apparatus for polishing workpiece |
| 07/02/2002 | US6413154 Polishing apparatus |
| 07/02/2002 | US6413152 Apparatus for performing chemical-mechanical planarization with improved process window, process flexibility and cost |
| 07/02/2002 | US6413151 CMP slurry recycling apparatus and method for recycling CMP slurry |
| 07/02/2002 | US6413150 Dual dicing saw blade assembly and process for separating devices arrayed a substrate |
| 07/02/2002 | US6413149 For semiconductor wafers |
| 07/02/2002 | US6413147 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 07/02/2002 | US6413145 System for polishing and cleaning substrates |
| 07/02/2002 | US6413102 Center bond flip chip semiconductor carrier and a method of making and using it |
| 07/02/2002 | US6413037 Flexibly mounted contact cup |
| 07/02/2002 | US6412971 Light source including an array of light emitting semiconductor devices and control method |
| 07/02/2002 | US6412680 Dual-in-line BGA ball mounter |
| 07/02/2002 | US6412641 Packaging for encapsulated dice employing EMR-sensitive adhesives |
| 07/02/2002 | US6412622 Apparatus for the automated processing of workpieces |
| 07/02/2002 | US6412504 Rinsing tank with ultra clean liquid |
| 07/02/2002 | US6412503 Magnetically coupled substrate roller |
| 07/02/2002 | US6412502 Wafer container cleaning system |
| 07/02/2002 | US6412501 Drying apparatus and drying method |
| 07/02/2002 | US6412500 Device and method for cleaning semiconductor wafers |
| 07/02/2002 | US6412499 For thin disks, semiconductors; incline walls of enclosure |
| 07/02/2002 | US6412498 For semiconductors; process control |
| 07/02/2002 | US6412497 Reduction/oxidation material removal method |
| 07/02/2002 | US6412438 Downstream sapphire elbow joint for remote plasma generator |
| 07/02/2002 | US6412437 Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process |
| 07/02/2002 | US6412134 Cleaning device and substrate cleaning apparatus |
| 06/29/2002 | CA2329888A1 Metal composite articles and method of manufacture |
| 06/27/2002 | WO2002050922A1 Gate electrode with depletion suppression and tunable workfunction |
| 06/27/2002 | WO2002050917A1 Thin film transistors |
| 06/27/2002 | WO2002050914A2 A semiconductor device with bias contact |
| 06/27/2002 | WO2002050912A1 Production method for soi wafer and soi wafer |
| 06/27/2002 | WO2002050910A1 Semiconductor integrated circuit device identifying method, semiconductor integrated circuit device producing method, and semiconductor integrated circuit device |
| 06/27/2002 | WO2002050908A2 Gate length control for semiconductor chip design |
| 06/27/2002 | WO2002050905A1 Connection by cut-out insulation and plane-printed weld |
| 06/27/2002 | WO2002050904A1 Connection by printed-weld deformable member |
| 06/27/2002 | WO2002050903A1 Cut-out insulating member and contact-weld connection |
| 06/27/2002 | WO2002050900A1 Electronic circuit device |
| 06/27/2002 | WO2002050898A1 Semiconductor integrated circuit device |
| 06/27/2002 | WO2002050896A2 Method for fabricating vertical transistor rench capacitor dram cells |
| 06/27/2002 | WO2002050895A2 Controlled anneal conductors for integrated circuit interconnects |
| 06/27/2002 | WO2002050894A2 Structural reinforcement of highly porous low k dielectric films by cu diffusion barrier structures |
| 06/27/2002 | WO2002050893A2 Process for monitoring a process, planarizing a surface, and for quantifying the results of a planarization process |
| 06/27/2002 | WO2002050892A1 Sealing resin for flip-flop mounting |
| 06/27/2002 | WO2002050891A1 Method of manufacturing semiconductor device |
| 06/27/2002 | WO2002050890A2 Electroconductive connection between a chip and a coupling element in addition to a security element containing a connection of said type |
| 06/27/2002 | WO2002050889A2 Contact hump construction for the production of a connector construction for substrate connecting surfaces |
| 06/27/2002 | WO2002050888A2 Method for making electronic devices including silicon and ltcc |
| 06/27/2002 | WO2002050887A1 Electronic device and method of manufacturing the electronic device |
| 06/27/2002 | WO2002050886A1 Method for making an island of material confined between electrodes, and application to transistors |
| 06/27/2002 | WO2002050885A1 Etching method for insulating film |
| 06/27/2002 | WO2002050884A1 Cleaning and etching methods and their apparatuses |
| 06/27/2002 | WO2002050883A1 Cleaning method and etching method |
| 06/27/2002 | WO2002050882A2 Copper alloys for interconnections having improved electromigration characteristics and methods of making same |
| 06/27/2002 | WO2002050881A1 Semiconductor layer doping method, thin-film semiconductor device manufacturing method, and thin-film semiconductor device |
| 06/27/2002 | WO2002050880A1 Vapor growth method, semiconductor producing method, and production method for semiconductor device |
| 06/27/2002 | WO2002050879A1 Semiconductor structure including a monocrystalline film |
| 06/27/2002 | WO2002050878A1 Method for producing a solid body comprising a microstructure |
| 06/27/2002 | WO2002050877A1 Electron beam exposure system, correcting member, correcting method, and exposure method |
| 06/27/2002 | WO2002050876A1 System and method for improved throughput of semiconductor wafer processing |
| 06/27/2002 | WO2002050875A2 Heating configuration for use in thermal processing chambers |
| 06/27/2002 | WO2002050867A2 Centrifugal type contaminant collector trap for ion implanter |
| 06/27/2002 | WO2002050863A1 Sample carrier fixing mechanism |
| 06/27/2002 | WO2002050842A2 Method for reading out or in a status from or to a ferroelectrical transistor of a memory cell and memory matrix |
| 06/27/2002 | WO2002050614A2 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/27/2002 | WO2002050559A1 Ic handler |
| 06/27/2002 | WO2002050345A2 Semiconductor compliant substrate having a graded monocrystalline layer |
| 06/27/2002 | WO2002050336A2 Integrated mutli-step gap fill and all feature planarization for conductive materials |
| 06/27/2002 | WO2002050333A1 Hot wire chemical vapor deposition method and apparatus using graphite hot rods |
| 06/27/2002 | WO2002050204A1 Method for the chemical-mechanical polishing of isolation layers based on sti technology at elevated temperatures |
| 06/27/2002 | WO2002049806A1 Belt polishing device with double retainer ring |
| 06/27/2002 | WO2002049805A1 Polishing platen with pressurized membrane |
| 06/27/2002 | WO2002049755A1 Method and system for removal of gas, and plasma processing device |
| 06/27/2002 | WO2002049736A1 Apparatus and method for extracting biomass |
| 06/27/2002 | WO2002033735A3 Device for thermally treating substrates |
| 06/27/2002 | WO2002029874A3 Method of fabricating an oxide layer on a silicon carbide layer utilizing n2o |
| 06/27/2002 | WO2002029856A3 A testing device for semiconductor components and a method of using the same |
| 06/27/2002 | WO2002015237B1 Changing local compressibility of a wafer support member |
| 06/27/2002 | WO2002015233A3 Integrated transistor devices |
| 06/27/2002 | WO2002011199A3 Compensation circuit |
| 06/27/2002 | WO2002009167A3 High dielectric constant metal silicates formed by controlled metal-surface reactions |
| 06/27/2002 | WO2002009126A3 Spin valve structure |
| 06/27/2002 | WO2002007167A3 Method for selecting an optimal level of redundancy in the design of memories |