Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2002
07/16/2002US6420191 Method of manufacturing semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium
07/16/2002US6420190 Method of manufacturing ferroelectric memory device
07/16/2002US6420104 Method of reducing contact size by spacer filling
07/16/2002US6420101 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure
07/16/2002US6420099 Tungsten layer is exposed to etch having a substantially higher etch rate of the aluminum-containing layer than of the tungsten-containing layer to remove the exposed portion of the aluminum-containing layer
07/16/2002US6420097 Hardmask trim process
07/16/2002US6420096 Less metal is required compared to other thin film methods; metallic base layer, photoresist layer, electroconductive layer on exposed regions; photoresist is removed and the metallic base layer is etched
07/16/2002US6420092 Low dielectric constant nanotube
07/16/2002US6420086 Adhered particles mask over a substrate to protect portions of it
07/16/2002US6420085 Resist compositions and patterning process
07/16/2002US6420076 Ensure detection of gel foreign substances which are present inside a photoresist film or between resist patterns; laser
07/16/2002US6420075 Mask for manufacturing semiconductor device and method of manufacture thereof
07/16/2002US6419985 Method for producing insulator film
07/16/2002US6419846 Determining endpoint in etching processes using principal components analysis of optical emission spectra
07/16/2002US6419805 Apparatus for plating wafers, substrates and other articles
07/16/2002US6419785 Polishing semiconductors
07/16/2002US6419754 Wet stripping; continuous analyzing eluent; colorimetric analysis
07/16/2002US6419752 Structuring device for processing a substrate
07/16/2002US6419751 Substrate processing method and substrate processing apparatus
07/16/2002US6419567 Retaining ring for chemical-mechanical polishing (CMP) head, polishing apparatus, slurry cycle system, and method
07/16/2002US6419558 Apparatus, backing plate, backing film and method for chemical mechanical polishing
07/16/2002US6419557 Polishing method and polisher used in the method
07/16/2002US6419554 Removal of titanium nitride using etching or oxidation solutions
07/16/2002US6419550 Apparatus and methods for substantial planarization of solder bumps
07/16/2002US6419482 Opening and closing apparatus of an opening and closing lid of a box accommodating an object to be processed and a processing system of an object to be processed
07/16/2002US6419439 Indexer for magazine shelves of a magazine and wafer-shaped objects contained therein
07/16/2002US6419438 FIMS interface without alignment pins
07/16/2002US6419408 Developing process and developing unit
07/16/2002US6419170 Adjustable nozzle assembly for semiconductor wafer backside rinsing
07/16/2002US6419149 Vapor deposition of copper foil under vacuum; pressure welding
07/16/2002US6419148 System for forming bumps on wafers
07/16/2002US6419145 Lead penetrating clamping system
07/16/2002US6418999 Sample separating apparatus and method, and substrate manufacturing method
07/16/2002US6418979 Method and apparatus for processing tool interface in a manufacturing environment
07/16/2002US6418954 System and method for dividing flow
07/16/2002US6418945 Dual cassette centrifugal processor
07/16/2002US6418941 Method of and apparatus for plasma cleaning of chip-mounted board
07/16/2002US6418922 Method and tools for cutting semiconductor products
07/16/2002US6418875 Method of improving adhesion of cap oxide to nanoporous silica for integrated circuit fabrication
07/16/2002US6418874 Toroidal plasma source for plasma processing
07/16/2002US6418640 Drying apparatus for a substrate and drying method thereof
07/16/2002US6418584 Apparatus and process for cleaning a work piece
07/11/2002WO2002054842A1 Method for producing bond pads on a printed circuit
07/11/2002WO2002054594A1 Architecture for field programmable gate array
07/11/2002WO2002054549A1 Semiconductor luminous element and method for manufacture thereof, and semiconductor device and method for manufacture thereof
07/11/2002WO2002054505A2 System and method for electrically induced breakdown of nanostructures
07/11/2002WO2002054498A1 Optical semiconductor device with transparent support
07/11/2002WO2002054495A2 Metal oxynitrides on monocrystalline substrates
07/11/2002WO2002054494A2 Integrated semiconductor memory arrangement and a method for producing the same
07/11/2002WO2002054491A2 Cu-pad/bonded/cu-wire with self-passivating cu-alloys
07/11/2002WO2002054488A2 Ic package pressure release apparatus and method
07/11/2002WO2002054486A2 Self-passivating cu laser fuse
07/11/2002WO2002054485A1 Semiconductor integrated circuit
07/11/2002WO2002054484A2 Metal ion diffusion barrier layers
07/11/2002WO2002054483A2 A dual damascene integration scheme using a bilayer interlevel dielectric
07/11/2002WO2002054481A2 Use of endpoint system to match individual processing stations within a tool
07/11/2002WO2002054480A1 Lighting system used in apparatus for inspecting surface mounted chip
07/11/2002WO2002054479A1 Chip sorting unit used for apparatus for inspecting surface mounted chip
07/11/2002WO2002054478A1 Apparatus for inspecting surface mounted chip
07/11/2002WO2002054476A1 Method of mounting chip
07/11/2002WO2002054474A1 Dielectric film and method of forming it, semiconductor device, nonvolatile semiconductor memory device, and production method for semiconductor device
07/11/2002WO2002054473A1 Semiconductor device and its manufacturing method
07/11/2002WO2002054472A1 Apparatus for cleaning semiconductor wafer
07/11/2002WO2002054471A1 Apparatus and method for abrading semiconductor wafer
07/11/2002WO2002054470A2 Method for contacting a doping area on a semiconductor element
07/11/2002WO2002054469A1 Substrate heating device and method of purging the device
07/11/2002WO2002054468A2 Iii-v nitride devices having a compliant substrate
07/11/2002WO2002054467A2 Semiconductor structure including a monocrystalline conducting layer
07/11/2002WO2002054466A1 Method for producing a stacked structure
07/11/2002WO2002054465A1 Electron beam exposure system and electron beam shaping member
07/11/2002WO2002054462A1 Stage device, exposure device, method of adjusting multipoint position detection system, exposure method, and device manufacturing method
07/11/2002WO2002054461A1 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device
07/11/2002WO2002054459A1 Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
07/11/2002WO2002054458A2 Method for the manufacture of micro structures
07/11/2002WO2002054457A2 Multi-layer pt electrode for dram and fram with high k dielectric materials
07/11/2002WO2002054456A2 A rinsing solution and rinsing and drying methods for the prevention of watermark formation on a surface
07/11/2002WO2002054455A2 Variable surface hot plate for improved bake uniformity of substrates
07/11/2002WO2002054454A2 Diamond coatings on reactor wall and method of manufacturing thereof
07/11/2002WO2002054453A1 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
07/11/2002WO2002054452A1 Heating device, heat treatment apparatus having the heating device and method for controlling heat treatment
07/11/2002WO2002054449A2 Silicon carbide and related wide-bandgap transistors on semi-insulating epitaxy for high-speed, high-power applications
07/11/2002WO2002054447A2 System and method for prototyping and fabricating complex microwave circuits
07/11/2002WO2002054446A2 Barbed vias for electrical and mechanical connection between conductive layers in semiconductor devices
07/11/2002WO2002054444A1 Electrode for plasma processes and method for manufacture and use thereof
07/11/2002WO2002054443A2 Ion accelaration method and apparatus in an ion implantation system
07/11/2002WO2002054441A1 Method and device for separating ion mass, and ion doping device
07/11/2002WO2002054413A1 Device for x-ray lithography
07/11/2002WO2002054408A1 Ferroelectric memory device and its driving method
07/11/2002WO2002054407A2 Mram write apparatus and method
07/11/2002WO2002054166A1 Arrangement for temperature monitoring and regulation
07/11/2002WO2002054156A1 Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer
07/11/2002WO2002054155A1 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer
07/11/2002WO2002054153A1 Illumination system with vacuum chamber wall having transparent structure
07/11/2002WO2002054115A2 A self-cleaning optic for extreme ultraviolet lithography
07/11/2002WO2002053813A1 Silicon carbide single crystal, and method and apparatus for producing the same
07/11/2002WO2002053812A1 Silicon single crystal wafer and method for producing silicon single crystal
07/11/2002WO2002053811A1 Method and apparatus for growing single crystal
07/11/2002WO2002053800A2 Windows used in thermal processing chambers
07/11/2002WO2002053799A1 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof
07/11/2002WO2002053797A1 Fullerene coated component of semiconductor processing equipment