| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 08/27/2002 | US6440289 Electroless deposition, followed by electrodeposition to form coating layers having uniformity and thickness; integrated circuits |
| 08/27/2002 | US6440282 Sputtering reactor and method of using an unbalanced magnetron |
| 08/27/2002 | US6440263 Indirect endpoint detection by chemical reaction and chemiluminescence |
| 08/27/2002 | US6440262 Resist mask having measurement marks for measuring the accuracy of overlay of a photomask disposed on semiconductor wafer |
| 08/27/2002 | US6440261 Dual buffer chamber cluster tool for semiconductor wafer processing |
| 08/27/2002 | US6440260 Plasma monitoring method and semiconductor production apparatus |
| 08/27/2002 | US6440258 Polycarbodiimide, epoxy resins and fillers, having heat resistance and flexibility |
| 08/27/2002 | US6440230 Electrodeposited on a substrate and converted, at least in part, to a layer comprising nitrogen and the electrodeposited material. chromium nitride and chromium oxynitride are examples of nitrogen-comprising material |
| 08/27/2002 | US6440221 Process chamber having improved temperature control |
| 08/27/2002 | US6440218 Coating solution applying method and apparatus |
| 08/27/2002 | US6440214 Method of growing a semiconductor layer |
| 08/27/2002 | US6440210 Method for producing self-polarized ferro-electric layers, especially PZT layers, with a rhombohedral crystal structure |
| 08/27/2002 | US6440186 Polishing composition and polishing method employing it |
| 08/27/2002 | US6440178 Methods for handling semiconductor workpiece therein. the semiconductor workpiece processing tool preferably includes an interface section comprising at least one interface module and a processing section comprising a plurality of processing |
| 08/27/2002 | US6439989 Polymeric polishing pad having continuously regenerated work surface |
| 08/27/2002 | US6439987 Tool and method for the abrasive machining of a substantially planar surface |
| 08/27/2002 | US6439971 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device |
| 08/27/2002 | US6439969 Apparatus and method of chamfering wafer |
| 08/27/2002 | US6439964 Method of controlling a polishing machine |
| 08/27/2002 | US6439962 Cleaning apparatus |
| 08/27/2002 | US6439898 Method and apparatus for interconnecting devices using an adhesive |
| 08/27/2002 | US6439824 Automated semiconductor immersion processing system |
| 08/27/2002 | US6439822 Substrate processing apparatus and substrate processing method |
| 08/27/2002 | US6439514 Semiconductor device with elements surrounded by trenches |
| 08/27/2002 | US6439496 Spool holder structure for a wire bonder |
| 08/27/2002 | US6439450 Concave face wire bond capillary |
| 08/27/2002 | US6439447 Bump joining judging device and method, and semiconductor component production device and method |
| 08/27/2002 | US6439253 System for and method of monitoring the flow of semiconductor process gases from a gas delivery system |
| 08/27/2002 | US6439247 Surface treatment of semiconductor substrates |
| 08/27/2002 | US6439245 Method for transferring wafers from a conveyor system to a wafer processing station |
| 08/27/2002 | US6439244 A sputter cleaning system and method are described which provide improved temperature control of the pedestal and thus of a substrate being sputter cleaning |
| 08/27/2002 | US6439155 Remote plasma generator with sliding short tuner |
| 08/27/2002 | US6439154 Plasma processing apparatus for semiconductors |
| 08/27/2002 | US6438826 Electronic component, method of sealing electronic component with resin, and apparatus therefor |
| 08/27/2002 | US6438781 Washer for cleaning substrates |
| 08/27/2002 | CA2275088C Gaas single crystal substrate and epitaxial wafer using the same |
| 08/27/2002 | CA2247603C Optical disc, recording apparatus, and computer-readable recording medium |
| 08/22/2002 | WO2002065588A1 Anisotropic conductive connector, its manufacture method and probe member |
| 08/22/2002 | WO2002065557A1 Organic field effect transistor with a photostructured gate dielectric, method for the production and use thereof in organic electronics |
| 08/22/2002 | WO2002065555A1 Radiation emitting semiconductor bodies and method for the production thereof |
| 08/22/2002 | WO2002065552A2 Semiconductor devices and their peripheral termination |
| 08/22/2002 | WO2002065550A1 Semiconductor device |
| 08/22/2002 | WO2002065548A2 Integrated circuit arrangement consisting of a flat substrate |
| 08/22/2002 | WO2002065547A2 METHOD OF OBTAINING LOW TEMPERATURE ALPHA-Ta THIN FILMS USING WAFER BIAS |
| 08/22/2002 | WO2002065546A1 Semiconductor device manufacturing method and semiconductor device |
| 08/22/2002 | WO2002065544A1 User interface of semiconductor evaluator |
| 08/22/2002 | WO2002065543A2 Bonded structure using reacted borosilicate mixture |
| 08/22/2002 | WO2002065542A2 Underfill compositions |
| 08/22/2002 | WO2002065541A2 Contacting microchips by means of pressure |
| 08/22/2002 | WO2002065540A1 A common ball-limiting metallurgy for i/o sites |
| 08/22/2002 | WO2002065539A1 Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures |
| 08/22/2002 | WO2002065538A2 Post chemical-mechanical planarization (cmp) cleaning composition |
| 08/22/2002 | WO2002065537A2 Formation of metal oxide gate dielectric |
| 08/22/2002 | WO2002065536A2 Rapid-temperature pulsing anneal method at low temperature for fabricating layered superlattice materials and making electronic devices including same |
| 08/22/2002 | WO2002065534A1 Ultra low-k dielectric materials |
| 08/22/2002 | WO2002065533A1 Plasma apparatus and production method thereof |
| 08/22/2002 | WO2002065532A1 Work treating method and treating device |
| 08/22/2002 | WO2002065531A1 Focus ring for semiconductor treatment and plasma treatment device |
| 08/22/2002 | WO2002065530A2 Use of hydrocarbon addition for the elimination of micromasking during etching of organic low-k dielectrics |
| 08/22/2002 | WO2002065529A2 Chemical-mechanical planarization using ozone |
| 08/22/2002 | WO2002065528A2 Use of ammonia for etching organic low-k dielectrics |
| 08/22/2002 | WO2002065525A1 Integration of high k gate dielectric |
| 08/22/2002 | WO2002065524A1 Silicide stop layer in a damascene gate semiconductor structure |
| 08/22/2002 | WO2002065523A1 Gate electrode silicidation layer |
| 08/22/2002 | WO2002065522A1 Flash memory with ultra thin vertical body transistors |
| 08/22/2002 | WO2002065521A1 Sheet-type treating device |
| 08/22/2002 | WO2002065519A1 Holding device, holding method, exposure device, and device manufacturing method |
| 08/22/2002 | WO2002065518A2 Method for producing ferroelectric capacitors and integrated semiconductor memory chips |
| 08/22/2002 | WO2002065517A2 Deposition method over mixed substrates using trisilane |
| 08/22/2002 | WO2002065516A2 Improved process for deposition of semiconductor films |
| 08/22/2002 | WO2002065515A2 Nanostructured devices for separation and analysis |
| 08/22/2002 | WO2002065514A1 Ultra fast rapid thermal processing chamber and method of use |
| 08/22/2002 | WO2002065513A2 Photoresist strip with 02 and nh3 for organosilicate glass applications |
| 08/22/2002 | WO2002065512A2 Process for etching organic low-k materials |
| 08/22/2002 | WO2002065511A2 Method and apparatus for controlling etch selectivity |
| 08/22/2002 | WO2002065510A1 Susceptor pocket profile to improve process performance |
| 08/22/2002 | WO2002065509A1 Measurement arrangement |
| 08/22/2002 | WO2002065508A2 Dopant precursors and processes |
| 08/22/2002 | WO2002065507A2 Dynamic memory based on single electron storage |
| 08/22/2002 | WO2002065492A2 Integrated transformer |
| 08/22/2002 | WO2002065482A2 Collector with an unused area for lighting systems having a wavelength of ≤ 193 nm |
| 08/22/2002 | WO2002065476A1 Programmable fuse and antifuse and method therefor |
| 08/22/2002 | WO2002065475A2 Self-aligned conductive line for cross-point magnetic memory integrated circuits |
| 08/22/2002 | WO2002065319A1 Customer support network |
| 08/22/2002 | WO2002065312A1 Data management method for reticle/mask writing |
| 08/22/2002 | WO2002065213A1 Refractive index regulation for maintaining optical imaging performance |
| 08/22/2002 | WO2002065109A2 Automated control of metal thickness during film deposition |
| 08/22/2002 | WO2002065108A2 Laser scanning wafer inspection using nonlinear optical phenomena |
| 08/22/2002 | WO2002064865A1 Semiconductor crystal growing method and semiconductor light-emitting device |
| 08/22/2002 | WO2002064864A1 Production method for semiconductor crystal and semiconductor luminous element |
| 08/22/2002 | WO2002064853A2 Thin films and methods of making them using trisilane |
| 08/22/2002 | WO2002064852A1 Apparatus for fabricating semiconductor structures |
| 08/22/2002 | WO2002064496A2 Method for forming microelectronic spring structures on a substrate |
| 08/22/2002 | WO2002064364A1 Wet etchable laminated body, insulation film, and electronic circuit part using the laminated body and the film |
| 08/22/2002 | WO2002064315A1 Polishing disk with end-point detection port |
| 08/22/2002 | WO2002064314A1 Method and apparatus for electrochemical planarization of a workpiece |
| 08/22/2002 | WO2002064287A2 Rejuvenation of refractory metal products |
| 08/22/2002 | WO2002047146A3 DAMASCENE NiSi METAL GATE HIGH-K TRANSISTOR |
| 08/22/2002 | WO2002047113A3 Layers in substrate wafers |
| 08/22/2002 | WO2002045176B1 Self-aligned non-volatile memory cell |