Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2002
09/26/2002US20020135015 Method for forming self-aligned local-halo metal-oxide-semiconductor device
09/26/2002US20020135014 Charge compensation semiconductor configuration
09/26/2002US20020135013 Segmented bit line EEPROM page architecture
09/26/2002US20020135012 Semiconductor device and method for manufacturing the same
09/26/2002US20020135011 Capacitor structure
09/26/2002US20020135010 Memory-storage node and the method of fabricating the same
09/26/2002US20020135008 Vertical semiconductor component with source-down design and corresponding fabrication method
09/26/2002US20020135007 Semiconductor device and method of fabricating the same
09/26/2002US20020135006 Semiconductor device and method of manufacturing the same
09/26/2002US20020135005 Method of making EEPROM transistor for a DRAM
09/26/2002US20020135004 Method for fabricating a capacitor of a semiconductor device and a capacitor made thereby
09/26/2002US20020135003 Semiconductor device, memory system and electronic apparatus
09/26/2002US20020135002 Semiconductor device and its manufacturing method
09/26/2002US20020135001 Crosslinked resin and method for making oxides using same
09/26/2002US20020134999 Semiconductor device
09/26/2002US20020134998 Semiconductor devices and their peripheral termination
09/26/2002US20020134997 Semiconductor device
09/26/2002US20020134996 Information processing structures
09/26/2002US20020134995 Silica zeolite low-k dielectric thin films
09/26/2002US20020134987 Resonant-cavity light-emitting diode and optical transmission module using the light-emitting diode
09/26/2002US20020134983 Semiconductor device
09/26/2002US20020134982 Method to form thermally stable nickel germanosilicide on SiGe
09/26/2002US20020134981 Semiconductor device and manufacturing method of the same
09/26/2002US20020134979 Electronic device
09/26/2002US20020134963 For removal of residues from integrated circuits; comprises a choline compound, water and an organic solvent
09/26/2002US20020134950 Substrate positioning system
09/26/2002US20020134948 Methods and apparatus for scanned beam uniformity adjustment in ion implanters
09/26/2002US20020134947 Lithographic apparatus, device manufacturing method, and device manufactured thereby
09/26/2002US20020134936 Wafer inspection system and wafer inspection process using charged particle beam
09/26/2002US20020134819 Concave face wire bond capillary
09/26/2002US20020134784 Module cover assembly with door latch transmission mechanism for wafer transport module
09/26/2002US20020134776 Hot plate unit
09/26/2002US20020134775 Ceramic heater and method of controlling temperature of the ceramic heater
09/26/2002US20020134765 Laser irradiating apparatus
09/26/2002US20020134755 Selectively etching silicon using fluorine without plasma
09/26/2002US20020134754 Method for forming a shallow trench isolation
09/26/2002US20020134753 Vacuum processing method and vacuum processing apparatus
09/26/2002US20020134748 electrollyzing a molten-salt in a electrolytic bath containing tantalum pentachloride, alkylimidazolium chloride, and an alkali metal or alkali earth metal fluoride to form tantalum film
09/26/2002US20020134686 Method for the formation of copper wiring films
09/26/2002US20020134684 Seed layer processes
09/26/2002US20020134670 Sputtering method and sputtering apparatus
09/26/2002US20020134580 Configuration having an electronic device electrically connected to a printed circuit board
09/26/2002US20020134569 Method of injection molded flip chip encapsulation
09/26/2002US20020134514 Wafer chuck for producing an inert gas blanket and method for using
09/26/2002US20020134513 Novel thermal transfer apparatus
09/26/2002US20020134512 Substrate processing apparatus and substrate processing method
09/26/2002US20020134511 Substrate supporting table,method for producing same, and processing system
09/26/2002US20020134509 Apparatus and method for plasma etching
09/26/2002US20020134508 Matching unit and plasma processing system
09/26/2002US20020134507 Gas delivery metering tube
09/26/2002US20020134506 Transfer chamber with side wall port
09/26/2002US20020134505 Semiconductor substrate processing chamber having interchangeable lids actuating plural gas interlock levels
09/26/2002US20020134504 Sample separating apparatus and method, and substrate manufacturing method
09/26/2002US20020134503 Silicon wafers bonded to insulator substrates by low viscosity epoxy wicking
09/26/2002US20020134488 Method for producing multilayer ceramic substrate
09/26/2002US20020134439 Gas recirculation flow control method and apparatus for use in vacuum system
09/26/2002US20020134410 Semiconductor wafer cleaning apparatus
09/26/2002US20020134409 Removal of photoresist through the use of hot deionized water bath, water vapor and ozone gas
09/26/2002US20020134406 Apparatus and method for collecting metallic impurity on a semiconductor wafer
09/26/2002US20020134405 Reduction/oxidation material removal method
09/26/2002US20020134404 Protective barrier for cleaning chamber
09/26/2002US20020134403 Holding and rotating a chuck as pressure plasma jet rinses predetermined areas; another nozzle dries with nitrogen gas; integrated circuits; semiconductors
09/26/2002US20020134363 Ignition device for an internal combustion engine
09/26/2002US20020134310 Material handling system and method for a multi-workpiece plasma treatment system
09/26/2002US20020134308 Vacuum processing apparatus
09/26/2002US20020134307 Thin film deposition apparatus for semiconductor
09/26/2002US20020134304 Substrate coating unit and substrate coating method
09/26/2002US20020134244 Trap apparatus and method for condensable by-products of deposition reactions
09/26/2002US20020134233 Exhausting perfluoro compounds (PFC's) produced by etching and/or vapor deposition into a common stream then scrubbing
09/26/2002US20020134179 Substrate transportation apparatus
09/26/2002US20020134060 Air management system and method for chemical containment and contamination reduction in a semiconductor manufacturing facility
09/26/2002US20020134027 Pyrogenic preparation of alkali-doped silica particles for chemical mechanical polishing of semiconductor
09/26/2002US20020133971 Apparatus and method for pick and place handling
09/26/2002US20020133943 Method for manufacturing circuit device
09/26/2002US20020133941 Electrical connector
09/26/2002US20020133925 Method of producing plural device chips from a thin plate of a pyroelectric material
09/26/2002EP1145285A3 Hand tool for the assembly of small, notably electronic, components
09/26/2002DE10211690A1 Semiconductor component used for a MOSFET comprises trenches in a semiconductor substrate, a gate insulating film, electrical conductors, a gate electrode, and base and source zones
09/26/2002DE10207134A1 Spannungserhöhungsschaltkreis für eine negative Spannung Voltage boosting circuit for a negative voltage
09/26/2002DE10206661A1 Electronic component used in semiconductors comprises a semiconductor chip surrounded by a sawn edge having profile-sawn contours of semiconductor material and surrounded by a plastic composition forming a plastic edge
09/26/2002DE10159214A1 Simulationsschaltung für MOS-Transistor, Simulationsprüfverfahren, Netzliste einer Simulationsschaltung und Speichermedium zur Speicherung davon Simulation circuit for the MOS transistor, Simulation Test Procedure, net list of a simulation circuit, and storage medium for storing thereof
09/26/2002DE10133688A1 Production of the lower capacitor electrode of a trench capacitor comprises preparing a substrate with a trench and an ohmic contact, forming an electrical connection on the contact, and etching mesopores on an exposed substrate region
09/26/2002DE10113788A1 Beugungsoptische Komponente, Beleuchtungssystem und Belichtungssystem mit einer solchen beugungsoptischen Komponente und Belichtungsverfahren unter Verwendung eines solchen Belichtungssystems Diffraction optical component, illumination system and exposure system having such a diffraction optical component and exposure method using such an exposure system
09/26/2002DE10113169A1 Production of niobium or tantalum penta-alcoholate for use in chemical vapor deposition, comprises dissolution of the corresponding metal pentachloride at low temperature in alkanol containing excess ammonia
09/26/2002DE10110974A1 Verfahren zum Verbreitern aktiver Halbleitergebiete Method for widening active semiconductor regions
09/26/2002DE10107150A1 Process used in microelectronics for identifying offsets comprises etching a substrate coated with an epitaxial layer in a testing device to uncover oxide islands, and forming offset markers
09/26/2002DE10053742C2 Vorrichtung zum Sintern, Abtragen und/oder Beschriften mittels elektromagnetischer gebündelter Strahlung sowie Verfahren zum Betrieb der Vorrichtung Device for sintering, ablating and / or inscribing by means of electromagnetic focused radiation, and methods for operating the apparatus
09/26/2002CA2426648A1 Plating method of metal film on the surface of polymer
09/25/2002WO2003078701A1 Mbe-method for the production of a gallium manganese nitride ferromagnetic film
09/25/2002EP1244202A2 Semiconductor device
09/25/2002EP1244150A2 Vertical MOSFET having a trench gate electrode and method of making the same
09/25/2002EP1244148A2 Semiconductor memory
09/25/2002EP1244147A1 Memory architecture permitting selection of die size after fabrication of active circuitry
09/25/2002EP1244144A1 Nonvolatile memory and method of driving nonvolatile memory
09/25/2002EP1244143A2 Sheet to form a protective film for chips and process for producing semiconductor chips
09/25/2002EP1244142A1 Fabrication method of SOI semiconductor devices
09/25/2002EP1244141A1 Manufacturing method of a nitride semiconductor device
09/25/2002EP1244140A2 Method of manufacturing nitride semiconductor substrate
09/25/2002EP1244139A2 Manufacturing method of semiconductor film
09/25/2002EP1244138A2 Carbon thin film etching method and etching apparatus