Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2002
10/03/2002US20020140037 Integrated circuit with silicided ESD protection transistors
10/03/2002US20020140036 Dual metal gate CMOS devices and method for making the same
10/03/2002US20020140035 Semiconductor device and method of manufacturing the same
10/03/2002US20020140034 Thin-film transistor and method of making same
10/03/2002US20020140033 SOI type semiconductor device and method of forming the same
10/03/2002US20020140031 Strained silicon on insulator structures
10/03/2002US20020140030 SOI devices with integrated gettering structure
10/03/2002US20020140029 Method for frabricating semiconductor device
10/03/2002US20020140028 Double diffused field effect transistor having reduced on-resistance
10/03/2002US20020140027 Field effect transistor and method of its manufacture
10/03/2002US20020140026 Semiconductor device and method for manufacturing semiconductor device
10/03/2002US20020140025 High voltage power MOSFET having low on-resistance
10/03/2002US20020140024 Semiconductor device having divided active regions with comb-teeth electrodes thereon
10/03/2002US20020140023 Semiconductor storage element
10/03/2002US20020140021 Method of making floating gate non-volatile memory cell with low erasing voltage having double layer gate dielectric
10/03/2002US20020140020 Capacitor structure
10/03/2002US20020140019 Semiconductor device and method of fabricating the same
10/03/2002US20020140018 Method of manufacturing semiconductor device having storage electrode of capacitor
10/03/2002US20020140017 Semiconductor integrated circuit
10/03/2002US20020140016 Magnetic random access memory having a transistor of vertical structure and the method thereof
10/03/2002US20020140014 Semiconductor device and fabrication method thereof
10/03/2002US20020140013 Structure and method for fabricating semiconductor structures and devices utilizing a stable template
10/03/2002US20020140012 Semiconductor structures and devices for detecting far-infrared light and methods for fabricating same
10/03/2002US20020140011 Method of using titanium doped aluminum oxide for passivation of ferroelectric materials and devices including the same
10/03/2002US20020140009 CMOS image sensor and a fabrication method for the same
10/03/2002US20020140008 Semiconductor device and its manufacture
10/03/2002US20020140007 Semiconductor device and method for fabricating the same
10/03/2002US20020140006 High frequency semiconductor device
10/03/2002US20020140005 Semiconductor capacitors having tantalum oxide layers and methods for manufacturing the same
10/03/2002US20020140003 Solid-state imaging device
10/03/2002US20020140002 Semiconductor integrated circuit configured to supply sufficient internal current
10/03/2002US20020140001 Fundamental cell, semiconductor integrated circuit device, wiring method and wiring apparatus
10/03/2002US20020140000 Magnetic random access memory
10/03/2002US20020139997 Compound semiconductor device having heterojunction bipolar transistor reduced in collector contact resistance by delta-doped region and process for fabrication thereof
10/03/2002US20020139996 Method for fabricating heterojunction bipolar transistors
10/03/2002US20020139995 Semiconductor device
10/03/2002US20020139994 Field-effect transistor using a group III-V compound semiconductor
10/03/2002US20020139993 High frequency semiconductor device
10/03/2002US20020139991 Semiconductor device
10/03/2002US20020139988 Vibration isolator, device manufacturing apparatus and method, semiconductor manufacturing plant and method of maintaining device manufacturing apparatus
10/03/2002US20020139987 Monolithic series/parallel led arrays formed on highly resistive substrates
10/03/2002US20020139983 Fabricating method of an array substrate having polysilicon thin film transistor
10/03/2002US20020139980 Semiconductor device
10/03/2002US20020139979 Method of crystallizing a silicon layer and method of fabricating a semiconductor device using the same
10/03/2002US20020139978 Semiconductor device and manufacturing method thereof
10/03/2002US20020139977 SOI-type semiconductor device and method of forming the same
10/03/2002US20020139976 Method for fabricating semiconductor components
10/03/2002US20020139975 Electrical passivation of silicon-containing surfaces using organic layers
10/03/2002US20020139973 Controllable conduction device
10/03/2002US20020139972 Active matrix substrate and method of fabricating the same
10/03/2002US20020139971 Semiconductor device and method for fabricating same
10/03/2002US20020139969 High frequency semiconductor device
10/03/2002US20020139968 Semiconductor light emitting element and method for producing the same
10/03/2002US20020139955 Method of the synthesis and control of PGO spin-coating precursor solutions
10/03/2002US20020139933 Infrared sensor device and manufacturing method thereof
10/03/2002US20020139874 Developer nozzle for supplying developer to a surface of a semiconductor process wafer
10/03/2002US20020139791 Apparatus for and method of heating semiconductor devices
10/03/2002US20020139790 Sensor for measuring a substrate temperature
10/03/2002US20020139775 Method and apparatus for in-situ descum/hot bake/dry etch photoresist/polyimide layer
10/03/2002US20020139774 Plasma heating of a substrate with subsequent high temperature etching
10/03/2002US20020139773 Selective photoresist hardening to facilitate lateral trimming
10/03/2002US20020139772 Adaptive GCIB for smoothing surfaces
10/03/2002US20020139771 Gas switching during an etch process to modulate the characteristics of the etch
10/03/2002US20020139770 Methods for fabricating segmented reticle blanks having uniformly machined grillage, and reticle blanks and reticles formed thereby
10/03/2002US20020139768 Automatic decapsulation system utilizing an integrated spacer/protection plate and a method of use
10/03/2002US20020139684 Pump for supplying plating fluid from the reservoir tank to the closed plating cup cyclically changes the pressure or flow rate of the plating fluid to prevent air bubbles in the blind holes of the plating member
10/03/2002US20020139682 Applying a reverse bias that will cause removal of, or reduction in the size of, conductive particles on the work-piece-surface-influencing device; brushes rotating in a different direction during electrodeposition; wafers/circuits
10/03/2002US20020139665 Plasma etch reactor and method
10/03/2002US20020139663 Chemical treatment system
10/03/2002US20020139661 Method for forming thin films
10/03/2002US20020139658 Using electron-free ion-ion plasmas, wherein the substrate bias waveform is synched to a pulsed RF drive where there's a delay between the drive pulse and bias pulse to let the electron count drop to zero; microstructue circuitry
10/03/2002US20020139577 In-street integrated circuit wafer via
10/03/2002US20020139572 Semiconductor devices and methods for manufacturing the same
10/03/2002US20020139567 Chip on film (COF) package having test pad for testing electrical function of chip and method for manufacturing same
10/03/2002US20020139563 Joined structures of metal terminals and ceramic members, joined structures of metal members and ceramic members, and adhesive materials
10/03/2002US20020139556 Method and apparatus for providing hermetic electrical feedthrough
10/03/2002US20020139523 Thermal processor
10/03/2002US20020139482 Wafer table for local dry etching apparatus
10/03/2002US20020139479 Twist-N-Lock wafer area pressure ring and assembly
10/03/2002US20020139478 Under high pressure, in the presence of a polymer of hydroxyacrylic acid or acid salt or lactone and of potassium hydroxide, sodium hydroxide, or alkali metal or alkaline-earth metal carbonate
10/03/2002US20020139476 Dry-etching a metal thin film with an etching gas, a mixed gas including of a reactive ion etching gas which contains oxygen and halogen containing gases, and a reducing gas
10/03/2002US20020139475 Apparatus and method for etching glass panels
10/03/2002US20020139473 Electrostatic chuck having bonded structure and method of manufacturing the same
10/03/2002US20020139446 Method of achieving high adhesion of CVD copper thin films on TaN substrates
10/03/2002US20020139418 System and method of operation of a digital mass flow controller
10/03/2002US20020139415 Photovoltaic device and process for the production thereof
10/03/2002US20020139401 Wet process station with water spray of wafer reverse side
10/03/2002US20020139400 Vertical process reactor
10/03/2002US20020139390 Cleaning substrate arranged at predetermined angle in cleaning tank by generating ultrasonic vibration from bottom of tank filled with cleaning liquid
10/03/2002US20020139389 Includes enclosure which contains wafer engaging rollers oriented at angle and designed to spin wafer at angle during preparation; for cleaning, drying of semiconductor substrate using space and process efficient spin, rinse, dry modules
10/03/2002US20020139388 Methods for reducing contamination of semiconductor substrates
10/03/2002US20020139387 Compositions for dissolution of low-k dielectric films, and methods of use
10/03/2002US20020139307 Cooling gas delivery system for a rotatable semiconductor substrate support assembly
10/03/2002US20020139304 Semiconductor manufacturing apparatus
10/03/2002US20020139302 Substrate processing method and substrate processing apparatus
10/03/2002US20020139298 production device for high-quality silicon single crystals
10/03/2002US20020139296 Method for growing single crystal of compound semiconductor and substrate cut out therefrom
10/03/2002US20020139294 Low defect density regions of self-interstitial dominated silicon
10/03/2002US20020139257 Method and stencil for extruding material on a substrate
10/03/2002US20020139250 High-purity standard particles production apparatus and the same particles
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