Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2002
09/26/2002US20020137249 Semiconductor device and semiconductor substrate, and method for fabricating the same
09/26/2002US20020137248 Manufacturing method of semiconductor film
09/26/2002US20020137246 Circuit-incorporating light receiving device and method of fabricating the same
09/26/2002US20020137244 Method for forming a semiconductor device having a metal substrate
09/26/2002US20020137243 Method for forming a semiconductor device having a metallic substrate
09/26/2002US20020137242 Method of making field emitters using porous silicon
09/26/2002US20020137239 Method of appraising a dielectric film, method of calibrating temperature of a heat treatment device, and method of fabricating a semiconductor memory device
09/26/2002US20020137236 AIN coated heterojunction field effect transistor and method of forming an AIN coating
09/26/2002US20020137235 Electronic devices comprising thin-film transistors, and their manufacture
09/26/2002US20020137078 Masking silicon substrates; blasting; oxidation; Dna immobilization substrate
09/26/2002US20020136990 Includes steps of depositing diamond like carbon (DLC) layer on a silicon rich etch barrier, placing photoresist on the etch barrier DLC followed by oxygen and fluorine reactive ion etching
09/26/2002US20020136989 That reduces word line resistance and increases process window
09/26/2002US20020136982 Photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups such as norbornenecarboxylic acid, tert-butyl ester copolymer with the corresponding linear alkyl ester
09/26/2002US20020136980 Acid generator, a resin whose leaving group includes a residue of a compound having a smaller ionization potential value than p-ethylphenol, and a solvent
09/26/2002US20020136967 Reactive ion etching using a mixed gas including an oxygen containing gas and a halogen containing gas, and a reducing gas for dry etching a metal film; high precision pattern-etched product; dry etching apparatus
09/26/2002US20020136966 Photomask blank, photomask and method of manufacture
09/26/2002US20020136963 Alternating phase shifting masks
09/26/2002US20020136874 Compliant pre-form interconnect
09/26/2002US20020136872 Lead frame laminate and method for manufacturing semiconductor parts
09/26/2002US20020136834 Organic anti-reflective polymer and method for manufacturing therof
09/26/2002US20020136831 Oxygen and hydrogen containing gases react to form water vapor that oxidizes the substrate
09/26/2002US20020136829 Film forming apparatus and film forming method
09/26/2002US20020136828 Method and apparatus for spin coating
09/26/2002US20020136676 Reactor for generating moisture
09/26/2002US20020136671 Production apparatus for producing gallium nitride film semiconductor and cleaning apparatus for exhaust gas
09/26/2002US20020136629 Method for aligning conveying position of object processing system, and object processing system
09/26/2002US20020136351 Illumination system with variable adjustment of the illumination
09/26/2002US20020136246 Laser apparatus
09/26/2002US20020136064 Semiconductor device having scan test circuit that switches clock signal between shift mode and capture mode, and method of testing the semiconductor device
09/26/2002US20020136060 Semiconductor memory
09/26/2002US20020136058 Channel write/erase flash memory cell and its manufacturing method
09/26/2002US20020136053 Non-volatile memory device
09/26/2002US20020136048 Cells array of mask read only memory
09/26/2002US20020136046 Memory architecture permitting selection of storage density after fabrication of active circuitry
09/26/2002US20020135986 Electronic device and a method of manufacturing the same
09/26/2002US20020135970 Voltage-dependent thin-film capacitor
09/26/2002US20020135969 Electrostatic chuck having composite dielectric layer and method of manufacture
09/26/2002US20020135968 Wafer chuck system
09/26/2002US20020135967 Chuck equipment
09/26/2002US20020135966 Substrate transport container
09/26/2002US20020135955 Giant magneto-resistive effect element, magneto-resistive effect type head, thin-film magnetic memory and thin-film magnetic sensor
09/26/2002US20020135948 Magnetoresistive effect element, its Manufacturing method, magnetic head, magnetic reproducing apparatus, and magnetic memory
09/26/2002US20020135875 Grating test patterns and methods for overlay metrology
09/26/2002US20020135785 Device for manufacturing semiconductor device and method of manufacturing the same
09/26/2002US20020135761 Method and device utilizing plasma source for real-time gas sampling
09/26/2002US20020135746 Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus
09/26/2002US20020135744 Exposure apparatus
09/26/2002US20020135710 Liquid crystal display device with double metal layer source and drain electrodes and fabricating method thereof
09/26/2002US20020135670 Laser marking techniques
09/26/2002US20020135423 Power amplifier module
09/26/2002US20020135391 Systems and methods for facilitating testing of pad receivers of integrated circuits
09/26/2002US20020135388 Membrane probing system with local contact scrub
09/26/2002US20020135387 Probing device and manufacturing method thereof, as well as testing apparatus and manufacturing method of semiconductor with use thereof
09/26/2002US20020135378 Broadband design of a probe analysis system
09/26/2002US20020135191 Floating seal pick and place system and unit therefor
09/26/2002US20020135101 Insert-molding method and and device therefor
09/26/2002US20020135080 Semiconductor device and method for fabricating same
09/26/2002US20020135079 Chip-scale package
09/26/2002US20020135078 Chip module with bond-wire connections with small loop height
09/26/2002US20020135077 Semiconductor copper bond pad surface protection
09/26/2002US20020135076 Heat sink with collapse structure and semiconductor package with heat sink
09/26/2002US20020135075 Three dimensional structure integrated circuit
09/26/2002US20020135074 Method of manufacturing a semiconductor device
09/26/2002US20020135073 Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device
09/26/2002US20020135072 Semiconductor memory device for reducing parasitic bit line capacitance and method of fabricating the same
09/26/2002US20020135071 Integrated circuit device contact plugs having a liner layer that exerts compressive stress thereon and methods of manufacturing same
09/26/2002US20020135070 Integrated circuits having plugs in conductive layers therein and related methods
09/26/2002US20020135069 Electroplating methods for fabricating microelectronic interconnects
09/26/2002US20020135068 Ferroelectric memory
09/26/2002US20020135067 Composite iridium barrier structure with oxidized refractory metal companion barrier and method for same
09/26/2002US20020135064 Transfer apparatus for arraying small conductive bumps on substrate and/ or chip
09/26/2002US20020135063 Apparatus to reduce thermal fatigue stress on flip chip solder connections
09/26/2002US20020135056 Semiconductor device and method of manufacturing the same
09/26/2002US20020135055 Semiconductor device having a fuse connected to a pad and fabrication method thereof
09/26/2002US20020135054 Fixing device and method for the same
09/26/2002US20020135053 Integrated circuit package with a capacitor
09/26/2002US20020135051 Semiconductor device and lead frame therefor
09/26/2002US20020135050 Semiconductor device
09/26/2002US20020135048 Doped aluminum oxide dielectrics
09/26/2002US20020135047 Integrated adjustable capacitor
09/26/2002US20020135045 High-frequency integrated circuit device that includes differential amplification circuit
09/26/2002US20020135042 Reduced RC delay between adjacent substrate wiring lines
09/26/2002US20020135041 Semiconductor integrated circuit and semiconductor device
09/26/2002US20020135040 Integrated circuit structure having low dielectric constant material and having silicon oxynitride caps over closely spaced apart metal lines
09/26/2002US20020135032 Semiconductor device for esd protection
09/26/2002US20020135031 Method for forming a dielectric layer and semiconductor device incorporating the same
09/26/2002US20020135030 Semiconductor device and manufacturing method thereof
09/26/2002US20020135029 Method for forming raised structures by controlled selective epitaxial growth of facet using spacer
09/26/2002US20020135028 Semiconductor integrated circuit device and method of manufacturing the same
09/26/2002US20020135027 Semiconductor device, memory system and electronic apparatus
09/26/2002US20020135026 Semiconductor device, memory system and electronic apparatus
09/26/2002US20020135025 Semiconductor device having a trench isolation structure and method for fabricating the same
09/26/2002US20020135024 Method and structure to reduce CMOS inter-well leakage
09/26/2002US20020135023 Dual metal gate transistors for CMOS process
09/26/2002US20020135022 A semiconductor device with a well wherein a scaling down of the layout is achieved
09/26/2002US20020135021 Semiconductor device, memory system and electronic apparatus
09/26/2002US20020135020 Process for manufacturing an isolated-gate transistor with an architecture of the substrate-on-insulator type, and corresponding transistor
09/26/2002US20020135018 Thin film magnetic memory device writing data of a plurality of bits in parallel
09/26/2002US20020135017 Recessed silicon oxidation for devices such as a cmos soi ics
09/26/2002US20020135016 Field effect transistor structure and method of manufacture