H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2002
12/31/2002	US6500727 Silicon shallow trench etching with round top corner by photoresist-free process
12/31/2002	US6500726 Shallow trench isolation type semiconductor device and method of forming the same
12/31/2002	US6500725 Microelectronic fabrication method providing alignment mark and isolation trench of identical depth
12/31/2002	US6500724 Method of making semiconductor device having passive elements including forming capacitor electrode and resistor from same layer of material
12/31/2002	US6500723 Method for forming a well under isolation and structure thereof
12/31/2002	US6500722 Inductor recognition method, layout inspection method, computer readable recording medium in which a layout inspection program is recorded and process for a semiconductor device
12/31/2002	US6500721 Bipolar thin-film transistors and method for forming
12/31/2002	US6500720 Method of manufacturing semiconductor device
12/31/2002	US6500719 Method of manufacturing a MOSFET of an elevated source/drain structure with SEG in facet
12/31/2002	US6500718 Method for fabricating semiconductor device
12/31/2002	US6500717 Method for making an integrated circuit device with dielectrically isolated tubs and related circuit
12/31/2002	US6500716 Method for fabricating high voltage transistor
12/31/2002	US6500715 Method of forming a CMOS structure having gate insulation films of different thicknesses
12/31/2002	US6500714 Method and structure for manufacturing ROMs in a semiconductor process
12/31/2002	US6500713 Method for repairing damage to charge trapping dielectric layer from bit line implantation
12/31/2002	US6500712 Fabrication of dielectric in trenches formed in a semiconductor substrate for a nonvolatile memory
12/31/2002	US6500711 Fabrication method for an interpoly dielectric layer
12/31/2002	US6500710 Method of manufacturing a nonvolatile semiconductor memory device
12/31/2002	US6500709 Capacitor structures, DRAM cell structures, and integrated circuitry, and methods of forming capacitor structures, integrated circuitry and DRAM cell structures
12/31/2002	US6500708 Method for forming capacitor of semiconductor device
12/31/2002	US6500707 Method for manufacturing a trench capacitor of a memory cell of a semiconductor memory
12/31/2002	US6500706 Bit-line interconnection scheme for eliminating coupling noise in stack DRAM cell with capacitor under bit-line (CUB) in stand-alone or embedded DRAM
12/31/2002	US6500705 Semiconductor memory device and method of manufacturing the same
12/31/2002	US6500704 Semiconductor device, display device and method of fabricating the same
12/31/2002	US6500703 Insulated gate semiconductor device and process for fabricating the same
12/31/2002	US6500702 Method for manufacturing thin film transistor liquid crystal display
12/31/2002	US6500701 Method of manufacturing thin film transistor panel having protective film of channel region
12/31/2002	US6500700 Fabrication method of liquid crystal display
12/31/2002	US6500694 Three dimensional device integration method and integrated device
12/31/2002	US6500693 Electrode forming method and bump electrode formable base used therefor
12/31/2002	US6500691 Image sensor and method of manufacturing same
12/31/2002	US6500687 Distributed feedback semiconductor laser element and method for making the same
12/31/2002	US6500686 Hot plate and method of manufacturing semiconductor device
12/31/2002	US6500685 Method for evaluating molding material with dams formed on a semiconductor substrate to define slits for capturing fillers contained in the molding material
12/31/2002	US6500684 Method and apparatus of manufacturing semiconductor device
12/31/2002	US6500683 Method of measuring trench depth of semiconductor device
12/31/2002	US6500681 Run-to-run etch control by feeding forward measured metal thickness
12/31/2002	US6500678 Methods of preventing reduction of IrOx during PZT formation by metalorganic chemical vapor deposition or other processing
12/31/2002	US6500677 Method for fabricating a ferroelectric memory configuration
12/31/2002	US6500675 Manufacturing method of semiconductor device having capacitive element
12/31/2002	US6500605 Removal of photoresist and residue from substrate using supercritical carbon dioxide process
12/31/2002	US6500591 Forming plurality of latent images in resist on substrate which cover printing field of lens system of lithographic tool, each image having associated focus, determining scattered energy as function of associated focus, averaging
12/31/2002	US6500499 Chemical vapor deposition from metal precursors such as alkyls, alkoxides, halides, hydrides, amides, imides, azides, cyclopentadienyls, carbonyls, carboxylates, thiolates, nitrates, phosphates, diketonates and an oxygen source
12/31/2002	US6500496 Increasing throughput and uniformity of ion implantations in target wafers using pulsed plasma processing system
12/31/2002	US6500489 Chemical vapor deposition of bismuth oxide, strontium oxide and tantalum oxide from the metal alkoxides
12/31/2002	US6500483 Air tight packaging electronics; uniform application without coating other surfaces; disposing abuttment into liquid film formed on surface, pressing and separating to transfer sealant; nonfailing; noncontaminating
12/31/2002	US6500357 System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
12/31/2002	US6500356 Selectively etching silicon using fluorine without plasma
12/31/2002	US6500350 Formation of thin film resistors
12/31/2002	US6500325 Method of plating semiconductor wafer and plated semiconductor wafer
12/31/2002	US6500324 Process for depositing a layer of material on a substrate
12/31/2002	US6500315 Physical vapor deposition chamber with electrically isolated coil and shield; increasing power while preventing overheating
12/31/2002	US6500314 Precise control and increased density range of the plasma
12/31/2002	US6500274 Apparatus and method for wet cleaning wafers without ammonia vapor damage
12/31/2002	US6500273 Spin cleaning methods
12/31/2002	US6500270 For removing remaining resist layer film after etching without swelling the insulation film (acrylic or polyimide resin); semiconductors; liquid crystal displays
12/31/2002	US6500268 Dry cleaning method
12/31/2002	US6500266 Heater temperature uniformity qualification tool
12/31/2002	US6500265 Apparatus for electrostatically maintaining subtrate flatness
12/31/2002	US6500263 Semiconductor substrate processing chamber having interchangeable lids actuating plural gas interlock levels
12/31/2002	US6500261 Apparatus for preventing misplacement of a cassette pod onto a process machine
12/31/2002	US6500258 Method of growing a semiconductor layer
12/31/2002	US6500257 Epitaxial material grown laterally within a trench and method for producing same
12/31/2002	US6500256 Single crystal silicon layer, its epitaxial growth method and semiconductor device
12/31/2002	US6500058 Clogging-free drain system installed in a cutting apparatus
12/31/2002	US6500055 Oscillating orbital polisher and method
12/31/2002	US6500054 Chemical-mechanical polishing pad conditioner
12/31/2002	US6500053 Polishing pads and methods relating thereto
12/31/2002	US6500051 Polishing apparatus and method
12/31/2002	US6500047 Semiconductor wafer cutting machine
12/31/2002	US6499936 Transfer system
12/31/2002	US6499935 Photomask case, transporting apparatus, and transporting method
12/31/2002	US6499933 Elevating mechanism, carrier conveying apparatus and heat treatment installation
12/31/2002	US6499811 Integrated circuit having power supply voltage monitor
12/31/2002	US6499777 End-effector with integrated cooling mechanism
12/31/2002	US6499644 Rework and underfill nozzle for electronic components
12/31/2002	US6499602 Support device for a wafer shipping container
12/31/2002	US6499533 Cooling disk unit for use in a wafer chucking device
12/31/2002	US6499492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning
12/31/2002	US6499427 Plasma CVD apparatus
12/31/2002	US6499367 Device and method for detecting substrate
12/31/2002	US6499333 Calibration element for adjustment nozzle
12/31/2002	US6499229 Vacuum processing apparatus
12/31/2002	US6499213 Assembling a stacked die package
12/31/2002	CA2302304C Apparatus for measuring minority carrier lifetimes in semiconductor materials
12/31/2002	CA2102987C Formation of microstructures using a preformed photoresist sheet
12/27/2002	WO2002104091A1 Placing device and method for placing objects onto substrates
12/27/2002	WO2002104073A1 Ceramic heater
12/27/2002	WO2002103868A1 Multi-beam semiconductor laser element
12/27/2002	WO2002103812A1 Nitride semiconductor, production method therefor and nitride semiconductor element
12/27/2002	WO2002103807A1 Lateral junction type field effect transistor
12/27/2002	WO2002103806A1 Cmos type thin film transistor and production method therefor
12/27/2002	WO2002103805A1 A permanently-on transistor buried contact
12/27/2002	WO2002103804A1 Symmetric trench mosfet device and method of making same
12/27/2002	WO2002103800A2 Integration of two memory types
12/27/2002	WO2002103799A2 Method for producing a memory component
12/27/2002	WO2002103798A1 Magnetic memory and its drive method, and magnetic memory apparatus comprising it
12/27/2002	WO2002103797A2 High-voltage integrated cmos circuit
12/27/2002	WO2002103792A2 Method of manufacturing a semiconductor device and semiconductor device
12/27/2002	WO2002103791A2 Semiconductor structure implementing sacrificial material and methods for making and implementing the same

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