Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2003
03/06/2003WO2003019646A1 Cmp polishing of barrier film
03/06/2003WO2003019645A1 Method and apparatus for forming film
03/06/2003WO2003019644A1 Forming method and forming system for insulation film
03/06/2003WO2003019643A1 Semiconductor device having high-permittivity insulation film and production method therefor
03/06/2003WO2003019642A1 Etch process for dielectric materials comprising oxidized organo silane materials
03/06/2003WO2003019641A1 Dummy structures to reduce metal recess in electropolishing process
03/06/2003WO2003019640A2 Method of forming a thin layer and a contact outlet
03/06/2003WO2003019639A1 Treating device using treating gas, and method of operating the same
03/06/2003WO2003019638A1 Constant ph polish and scrub
03/06/2003WO2003019637A2 Method for thermal treatment of the surface layer of a semiconductor by means of a pulsed laser
03/06/2003WO2003019636A1 Production method and production device for semiconductor device
03/06/2003WO2003019635A1 Method and system for single ion implantation
03/06/2003WO2003019634A1 Purging method for semiconductor production device and production method for semiconductor device
03/06/2003WO2003019633A1 Method of surface-processing components of vacuum processing device
03/06/2003WO2003019632A1 Production method for semiconductor substrate and production method for field effect transistor and semiconductor substrate and field effect transistor
03/06/2003WO2003019631A1 Fabrication method for organic semiconductor transistor having organic polymeric gate insulating layer
03/06/2003WO2003019630A2 Unified frame for semiconductor material handling system
03/06/2003WO2003019629A2 Process for charged particle beam micro-machining of copper
03/06/2003WO2003019628A1 Wafer level underfill and interconnect process
03/06/2003WO2003019627A2 Cmp process involving frequency analysis-based monitoring
03/06/2003WO2003019626A2 Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
03/06/2003WO2003019625A2 Method for thermally treating a substrate that comprises several layers
03/06/2003WO2003019624A2 Dielectric barrier discharge process for depositing silicon nitride film on substrates
03/06/2003WO2003019623A2 Trench dmos transistor with embedded trench schottky rectifier
03/06/2003WO2003019622A2 System and method of fast ambient switching for rapid thermal processing
03/06/2003WO2003019619A2 A low-k pre-metal dielectric semiconductor structure
03/06/2003WO2003019618A2 Plasma treating apparatus and plasma treating method
03/06/2003WO2003019591A2 Housing for electrical components, in particular for capacitors
03/06/2003WO2003019586A1 Magnetoresistive device and electronic device
03/06/2003WO2003019579A1 Conductive paste and conductive film using it, plating method and production method for fine metal component
03/06/2003WO2003019573A1 Non-volatile semiconductor memory and method of operating the same
03/06/2003WO2003019568A2 Control device for reversing the direction of magnetisation without an external magnetic field
03/06/2003WO2003019567A1 Mram with midpoint generator reference
03/06/2003WO2003019564A2 Magnetoresistive level generator
03/06/2003WO2003019290A2 Patterning an integrated circuit using a reflective mask
03/06/2003WO2003019272A2 Exposure mask
03/06/2003WO2003019210A1 Sensor for inspection instrument and inspection instrument
03/06/2003WO2003019112A1 Optical interferometry
03/06/2003WO2003019111A1 Dynamic interferometric controlling direction of input beam
03/06/2003WO2003019109A1 Tilted interferometer
03/06/2003WO2003018882A1 Improved polycrystalline tft uniformity through microstructure mis-alignment
03/06/2003WO2003018868A1 Film forming method
03/06/2003WO2003018866A1 Protective shield and system for gas distribution
03/06/2003WO2003018864A1 Vacuum arc vapor deposition process
03/06/2003WO2003018860A2 Atmospheric pressure wafer processing reactor having an internal pressure control system and method
03/06/2003WO2003018714A1 Abrasive free formulations for chemical mechanical polishing of copper and assocated materials and method of using the same
03/06/2003WO2003018703A1 Adhesive sheet and semiconductor device and process for producing the same
03/06/2003WO2003018509A1 Enhanced ceramic layers for laminated ceramic devices
03/06/2003WO2003018465A1 Substituted donor atoms in silicon crystal for quantum computer
03/06/2003WO2003018434A1 Modular carrier for semiconductor wafer disks and similar inventory
03/06/2003WO2003018258A1 Short cmp polish method by maintaining a high ph at the wafer suface
03/06/2003WO2003018252A2 Metal polishing
03/06/2003WO2003017745A2 Architecture tool and methods of use
03/06/2003WO2003001588A3 Method for producing an electronic component, especially a memory chip
03/06/2003WO2002101795A3 Megasonic cleaner and dryer system
03/06/2003WO2002099871A3 Plastic housing comprising several semiconductor chips and a wiring modification plate, and method for producing the plastic housing in an injection-moulding mould
03/06/2003WO2002097165A3 Apparatus and methods for electrochemical processing of microelectronic workpieces
03/06/2003WO2002093595A3 Package level pre-applied underfills for thermo-mechanical reliability enhancements of electronic assemblies
03/06/2003WO2002080258A9 Integrated circuit structure
03/06/2003WO2002078044A3 Method of processing a surface of a workpiece
03/06/2003WO2002078042A3 Neutral particle beam processing apparatus
03/06/2003WO2002071483A3 Conductor track arrangement and method for producing a conductor track arrangement
03/06/2003WO2002071455A3 Lift pin alignment and operation methods and apparatus
03/06/2003WO2002069410A3 Gallium nitride material devices including backside vias and methods of fabrication
03/06/2003WO2002069345A3 Method for production of a memory capacitor
03/06/2003WO2002065536A3 Rapid-temperature pulsing anneal method at low temperature for fabricating layered superlattice materials and making electronic devices including same
03/06/2003WO2002065515A3 Nanostructured devices for separation and analysis
03/06/2003WO2002058163A8 Method for producing semiconductor components
03/06/2003WO2002058102A3 Adjustable conductance limiting aperture for ion implanters
03/06/2003WO2002056350A3 Apparatus and methods for manipulating semiconductor wafers
03/06/2003WO2002052643A3 Semiconductor wafer manufacturing process
03/06/2003WO2002047118B1 Wafer carrier with stacking adaptor plate
03/06/2003WO2002036846A3 Sputtering target assemblies
03/06/2003WO2002023625A3 Semiconductor device and fabrication method therefor
03/06/2003WO2002021580A9 Portable enclosure for semiconductor processing
03/06/2003WO2002019432A3 Trench mosfet with structure having low gate charge
03/06/2003WO2002012928A3 Diffraction spectral filter for use in extreme-uv lithography condenser
03/06/2003WO2002010721A3 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
03/06/2003US20030046650 Automatic placement and routing apparatus
03/06/2003US20030046647 Wiring designing method
03/06/2003US20030046646 Integrated circuit design apparatus, method and program
03/06/2003US20030046623 Bandwidth matching for scan architectures in an integrated circuit
03/06/2003US20030046603 Flash EEprom system
03/06/2003US20030046321 Method of high pass filtering a data set
03/06/2003US20030046034 Substrate processing system managing apparatus information of substrate processing apparatus
03/06/2003US20030046023 Load storage apparatus
03/06/2003US20030046015 Test circuit and semiconductor integrated circuit effectively carrying out verification of connection of nodes
03/06/2003US20030045961 Method for manufacturing semiconductor device
03/06/2003US20030045960 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus
03/06/2003US20030045959 Substrate carrier management system and program
03/06/2003US20030045226 Fan filter unit control system and clean room provided with same
03/06/2003US20030045219 Pedestal of a load-cup which supports wafers loaded/unloaded onto/from a chemical mechanical polishing apparatus
03/06/2003US20030045218 Wafer holder protecting wafer against electrostatic breakdown
03/06/2003US20030045205 Method and apparatus for sensing a wafer in a carrier
03/06/2003US20030045131 Method and apparatus for processing a wafer
03/06/2003US20030045130 Methods of treating dielectric materials
03/06/2003US20030045129 Methods of forming capacitor constructions
03/06/2003US20030045128 Wafer transfer method performed with vapor thin film growth system and wafer support member used for this method
03/06/2003US20030045125 Nitrogen containing plasma annealing method for forming a nitrogenated silicon carbide layer
03/06/2003US20030045124 Method for protecting sidewalls of etched openings to prevent via poisoning
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