Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2003
07/31/2003WO2003063216A1 Method of forming a thin film using atomic layer deposition(ald)
07/31/2003WO2003063215A1 Nitride semiconductor device manufacturing method
07/31/2003WO2003063214A2 Process for preparation of separable semiconductor assemblies, particularly to form substrates for electronics, optoelectronics and optics
07/31/2003WO2003063213A2 Optimized method of transfer of a thin layer of silicon carbide to a receiving substrate
07/31/2003WO2003063211A1 Apparatus incorporating small-feature-size and large-feature-size components and method for making same
07/31/2003WO2003063210A2 Method for the production of a capacitor in a dielectric layer
07/31/2003WO2003063209A2 Copper interconnect doped with carbon and silicon
07/31/2003WO2003063206A2 METHOD FOR DOPING GALLIUM NITRIDE (GaN) SUBSTRATES AND THE RESULTING DOPED GaN SUBSTRATE
07/31/2003WO2003063205A2 Poly(organosiloxane) materials and methods for hybrid organic-inorganic dielectrics for integrated circuit applications
07/31/2003WO2003063204A2 Igbt having thick buffer region
07/31/2003WO2003063202A2 Field effect transistor having source and/or drain forming schottky or schottky-like contact with strained semiconductor substrate
07/31/2003WO2003063200A2 Method for improving the adhesion of a coating
07/31/2003WO2003063199A2 Apparatus and method for etching the edges of semiconductor wafers
07/31/2003WO2003063196A1 Process endpoint detection in processing chambers
07/31/2003WO2003063173A1 Mram without isolation devices
07/31/2003WO2003063172A2 Method for enhancing electrode surface area in dram cell capacitors
07/31/2003WO2003063167A2 System and method for programming ono dual bit memory cells
07/31/2003WO2003063044A2 Management system, method and apparatus for licensed delivery and accounting of electronic circuits
07/31/2003WO2003062926A2 Method for constructing an optical beam guide system
07/31/2003WO2003062922A2 Photomask and method for manufacturing the same
07/31/2003WO2003062836A1 Probe with trapezoidal contactor and device based on application thereof, and method of producing them
07/31/2003WO2003062835A2 Proximity sensor
07/31/2003WO2003062739A2 Method and apparatus for compensation of time-varying optical properties of gas in interferometry
07/31/2003WO2003062727A1 Resistance furnace
07/31/2003WO2003062507A2 Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material
07/31/2003WO2003062505A1 Anodization device and anodization method
07/31/2003WO2003062504A1 Liquid treating device, and liquid treating method
07/31/2003WO2003062490A2 Ald apparatus and method
07/31/2003WO2003062488A1 High-purity nickel or nickel alloy sputtering target, and its manufacturing method
07/31/2003WO2003062401A2 Compositions and methods for the detection, diagnosis and therapy of hematological malignancies
07/31/2003WO2003062338A1 Cmp systems and methods utilizing amine-containing polymers
07/31/2003WO2003062337A1 Tungsten polishing solution
07/31/2003WO2003062322A1 Apparatus and method for cleaning test probes
07/31/2003WO2003062139A2 Activation effect on carbon nanotubes
07/31/2003WO2003062137A2 Method of making a thick microstructural oxide layer and device utilizing same
07/31/2003WO2003062136A2 Method and system for locally connecting microstructures
07/31/2003WO2003062097A1 Wafer carrier door with form fitting mechanism cover
07/31/2003WO2003061907A1 Cutting device
07/31/2003WO2003061905A1 Process control in electro-chemical mechanical polishing
07/31/2003WO2003061904A1 Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface for slurry distribution
07/31/2003WO2003061860A1 Supercritical fluid processes with megasonics
07/31/2003WO2003041176A3 A scalable flash eeprom memory cell with floating gate spacer wrapped by control gate, and method of manufacturing the same
07/31/2003WO2003038896A3 Ball grid array with x-ray alignment mark
07/31/2003WO2003035927A3 Gas delivery apparatus for atomic layer deposition
07/31/2003WO2003034473A3 Substrate support
07/31/2003WO2003021639A3 Trench fet with self aligned source and contact
07/31/2003WO2003017557A3 Method of high pass filtering a data set
07/31/2003WO2003015481A3 Suspended gas distribution manifold for plasma chamber
07/31/2003WO2003015165A3 Electronic component with a plastic housing and method for production thereof
07/31/2003WO2003011714A8 Disk carrier
07/31/2003WO2003009379A3 Semiconductive device and method of formation
07/31/2003WO2003003444A3 Method for producing a substrate arrangement
07/31/2003WO2002103760A3 Method of selective removal of sige alloys
07/31/2003WO2002101791A3 Semiconductor wafer storage kiosk
07/31/2003WO2002095835A3 Vertical metal oxide semiconductor field-effect diodes
07/31/2003WO2002093201A9 Preferred crystal orientation optical elements from cubic materials
07/31/2003WO2002069354A3 Current-responsive resistive component
07/31/2003WO2002065542A3 Underfill compositions
07/31/2003WO2002027362A3 Electro-optic structure and process for fabricating same
07/31/2003WO2002025706A3 Apparatus and method for batch processing semiconductor substrates in making semiconductor lasers
07/31/2003WO2002021565A9 Apparatus for magnetically scanning and/or switching a charged-particle beam
07/31/2003WO2002011203A3 Plastic encapsulated semiconductor devices with improved corrosion resistance
07/31/2003WO2002009148A3 Integrated radiation emitting system and process for fabricating same
07/31/2003US20030145299 Finfet layout generation
07/31/2003US20030145293 Analytical simulator and analytical simulation method and program
07/31/2003US20030145292 System and method for product yield prediction
07/31/2003US20030145291 Specimen analyzing method
07/31/2003US20030145177 Computer readable storage medium and semiconductor integrated circuit device
07/31/2003US20030145149 External bus controller
07/31/2003US20030144828 Hub array system and method
07/31/2003US20030144810 Methods and apparatus for data analysis
07/31/2003US20030144762 Production control system and production controlling method
07/31/2003US20030144760 Personalized hardware
07/31/2003US20030144757 Method for wafer position data retrieval in semiconductor wafer manufacturing
07/31/2003US20030144567 A camphor derivative photoresist monomers, having norbornane ring; a homo- or copolycarbons/other/ polymers with acid labile groups; photolithography semiconductors
07/31/2003US20030144381 A curable blends comprising epoxy resin, acid anhydride, phenolic resin curing agent, and fine particles for use in liquid crystal displays, electroluminescence displays, plasma displays, charge coupled devices and semiconductors
07/31/2003US20030144163 For use in semiconductor devices, display devices; for efficiently removing contaminant particles (fine particles) present on a substrate
07/31/2003US20030143964 Signal transmission system
07/31/2003US20030143933 Apparatus for polishing a wafer
07/31/2003US20030143872 Ball grid array connection device
07/31/2003US20030143870 Semiconductor Processing Methods Utilizing Low Concentrations of Reactive Etching Componente
07/31/2003US20030143869 Semiconductor processing methods
07/31/2003US20030143867 Method for forming low dielectric constant interlayer insulation film
07/31/2003US20030143866 Method and system for drying semiconductor wafers in a spin coating process
07/31/2003US20030143865 Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
07/31/2003US20030143864 Fabrication process of a semiconductor integrated circuit device
07/31/2003US20030143863 Process for oxide fabrication using oxidation steps below and above a threshold temperature
07/31/2003US20030143862 Planarization using plasma oxidized amorphous silicon
07/31/2003US20030143861 Method of spin etching wafers with an alkali solution
07/31/2003US20030143860 Method of spiking mixed acid liquid in reactor
07/31/2003US20030143859 Patterning methods for fabricating semiconductor devices
07/31/2003US20030143858 Process for the plasma etching of materials not containing silicon
07/31/2003US20030143857 Post-planarization clean-up
07/31/2003US20030143856 Utilization of disappearing silicon hard mask for fabrication of semiconductor structures
07/31/2003US20030143855 Method of forming a bottle-shaped trench in a semiconductor substrate
07/31/2003US20030143854 Method of forming a shallow trench isolation in a semiconductor substrate
07/31/2003US20030143853 FeRAM capacitor stack etch
07/31/2003US20030143852 Method of forming a high aspect ratio shallow trench isolation
07/31/2003US20030143851 Abrasives for chemical mechanical polishing
07/31/2003US20030143850 Method for controlling and monitoring a chemical mechanical polishing process
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