Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2003
11/25/2003US6652363 Method and apparatus for uniformly planarizing a microelectronic substrate
11/25/2003US6652362 Apparatus for polishing a semiconductor wafer and method therefor
11/25/2003US6652357 Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishing
11/25/2003US6652355 Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers
11/25/2003US6652354 Polishing apparatus and method with constant polishing pressure
11/25/2003US6652219 Semiconductor wafer processing apparatus having improved wafer input/output handling system
11/25/2003US6652216 Method and device for changing a semiconductor wafer position
11/25/2003US6652212 Cylinder, load port using it, and production system
11/25/2003US6651969 Table positioning device
11/25/2003US6651868 Workpiece retainer for a bonding apparatus
11/25/2003US6651866 Precision bond head for mounting semiconductor chips
11/25/2003US6651865 Position-, speed- and force-controllable chip accessing apparatus
11/25/2003US6651864 Dissipative ceramic bonding tool tip
11/25/2003US6651817 Test tray insert of test handler
11/25/2003US6651704 Stationary and pivotable trays for semiconductor wafer transfer
11/25/2003US6651680 Washing apparatus with UV exposure and first and second ultrasonic cleaning vessels
11/25/2003US6651678 Preventing tapering of the shape of a gate electrode edge portion during overetching process by using a mixed gas of a halogen such as hydrobromide and an additive gas such as oxygen and/or nitrogen
11/25/2003US6651582 Method and device for irradiating an ion beam, and related method and device thereof
11/25/2003US6651321 Microelectronic joining processes
11/25/2003US6651320 Connection reliability and connection strength in bonding of the semiconductor element and circuit board are enhance and connection resistance value is stabilized low
11/25/2003US6651302 Method for dismantling a guide ring
11/25/2003US6651287 Substrate cleaning apparatus and cleaning member
11/25/2003US6651285 Wafer cleaning apparatus
11/25/2003US6651284 Scrubbing assembly for wafer-cleaning device
11/20/2003WO2003096769A1 High frequency reaction processing system
11/20/2003WO2003096765A2 Apparatus and methods for minimizing arcing in a plasma processing chamber
11/20/2003WO2003096764A1 Method and arrangement for producing radiation
11/20/2003WO2003096492A2 Automatic gas control system for a gas discharge laser
11/20/2003WO2003096439A1 Integrated circuit with internal impedance matching circuit
11/20/2003WO2003096433A1 'A Planar Schottky Diode and Manufacturing Method'
11/20/2003WO2003096431A1 Floating gate memory cells with increased coupling ratio
11/20/2003WO2003096428A1 Trench dmos transistor structure
11/20/2003WO2003096426A1 Semiconductor substrate manufacturing method and semiconductor device manufacturing method, and semiconductor substrate and semiconductor device manufactured by the methods
11/20/2003WO2003096425A1 Flash memory cell and production method
11/20/2003WO2003096424A1 Non-volatile flash semiconductor memory and production method
11/20/2003WO2003096423A1 Semiconductor storage device and production method therefor
11/20/2003WO2003096422A1 Semiconductor storage device
11/20/2003WO2003096421A1 Semiconductor device and its manufacturing method, and electronic device
11/20/2003WO2003096420A1 Circuit comprising a capacitor and at least one semiconductor component, and method for designing same
11/20/2003WO2003096418A1 Improving the triggering of an esd nmos through the use of an n-type buried layer
11/20/2003WO2003096416A2 Reactive solder material
11/20/2003WO2003096413A1 Method of manufacturing a semiconductor non-volatiel memory
11/20/2003WO2003096412A2 Method for the production of an integrated circuit and integrated circuit with a bipolar transistor and a hetero bipolar transistor
11/20/2003WO2003096411A1 A method for forming conformal nitrified tantalum silicide films by thermal cvd followed by nitridation
11/20/2003WO2003096410A1 Substrate processing device
11/20/2003WO2003096409A1 Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having the semiconductor probe
11/20/2003WO2003096408A1 Method for encapsulating an electronic component using a foil layer
11/20/2003WO2003096407A1 Method for forming a nickel silicide layer on a silicon substrate
11/20/2003WO2003096406A1 A surface geometry for mos-gated device
11/20/2003WO2003096405A1 Ultra small thin windows in floating gate transistors defined by lost nitride spacers
11/20/2003WO2003096404A1 A method of forming base regions and emitter windows in silicon bipolar transistors
11/20/2003WO2003096403A1 Method of treating substrate
11/20/2003WO2003096402A2 Methods of controlling oxygen partial pressure during annealing of a perovskite dielectric layer, and structures fabricated thereby
11/20/2003WO2003096401A1 Method for electrochemical oxidation
11/20/2003WO2003096400A1 Plasma processing equipment and plasma processing method
11/20/2003WO2003096399A1 Method for producing a semiconductor component, and semiconductor component produced by the same
11/20/2003WO2003096398A1 Methods and systems for dopant profiling
11/20/2003WO2003096397A1 Methods and systems for dopant profiling
11/20/2003WO2003096396A1 Process and system for heating semiconductor substrates in a processing chamber containing a susceptor
11/20/2003WO2003096395A1 Semiconductor manufacturing apparatus of minienvironment system
11/20/2003WO2003096394A2 A multi-layer inductor formed in a semiconductor substrate and having a core of ferromagnetic material
11/20/2003WO2003096393A2 Data archive recovery
11/20/2003WO2003096392A2 Method of etching a trench in a silicon-on-insulator (soi) structure
11/20/2003WO2003096391A2 System and method for controlling wafer temperature
11/20/2003WO2003096390A1 High-k dielectric for thermodynamically-stable substrate-type materials
11/20/2003WO2003096389A2 Metal object to be at least partially coated with a substance
11/20/2003WO2003096387A2 High efficiency solid-state light source and methods of use and manufacture
11/20/2003WO2003096386A2 Methods for forming low resistivity, ultrashallow junctions with low damage
11/20/2003WO2003096385A2 Silicon-on-insulator structures and methods
11/20/2003WO2003096378A2 Display driver ic, display module and electrical device incorporating a graphics engine
11/20/2003WO2003096357A2 Electrically resistant diamond-based component
11/20/2003WO2003096356A2 Reflective x-ray microscope and inspection system for examining objects with wavelengths of≤ 100nm
11/20/2003WO2003096352A2 Ferroelectric memory
11/20/2003WO2003096351A2 Memories and memory circuits
11/20/2003WO2003096276A2 Graphics engine converting individual commands to spatial image information, and electrical device and memory incorporating the graphics engine
11/20/2003WO2003096275A2 Graphics engine with edge draw unit, and electrical device and memory incorporating the graphics engine
11/20/2003WO2003096234A2 Optimization of die placement on wafers
11/20/2003WO2003096130A1 Semiconductor run-to-run control system with state and model parameter estimation
11/20/2003WO2003096124A1 Lens consisting of a crystalline material
11/20/2003WO2003096123A1 Reversal imprint technique
11/20/2003WO2003096122A2 Method for producing a unit comprising three-dimensional surface structuring and use of said method
11/20/2003WO2003096121A2 Photolithography mask comprising absorber/phase-shifter elements
11/20/2003WO2003096114A1 Multi-domain liquid crystal display and a thin film transistor substrate of the same
11/20/2003WO2003096113A1 A vertically aligned mode liquid crystal display
11/20/2003WO2003096110A1 Method for providing transparent substrate having protection layer on crystalized polysilicon layer, method for forming polysilicon active layer thereof and method for manufacturing polysilicon tft using the same
11/20/2003WO2003096035A1 Probe card for testing integrated circuits
11/20/2003WO2003095997A2 Method and apparatus for separating primary and secondary charged particle beams
11/20/2003WO2003095940A2 Compensation for geometric effects of beam misalignments in plane mirror interferometers
11/20/2003WO2003095716A1 Silicon single crystal wafer and epitaxial wafer, and method for producing silicon single crystal
11/20/2003WO2003095715A1 Methods and apparatus for monitoring deposition quality during conformable contact mask plasting operations
11/20/2003WO2003095713A1 Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate
11/20/2003WO2003095712A2 Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry
11/20/2003WO2003095710A2 Methods of and apparatus for electrochemically fabricating structures
11/20/2003WO2003095702A2 Method for curing low dielectric constant film by electron beam
11/20/2003WO2003095701A1 Volatile copper(ii) complexes for deposition of copper films by atomic layer deposition
11/20/2003WO2003095700A1 Method for high purity purification of high functional material and method for deposition of high functional material by mass separation method
11/20/2003WO2003095518A1 Method of producing polishing pad-use polyurethane foam and polyurethane foam
11/20/2003WO2003095341A1 Conveying device
11/20/2003WO2003095239A1 In-situ thermal chamber cleaning
11/20/2003WO2003095140A1 Finishing machine using laser beam
1 ... 4495 4496 4497 4498 4499 4500 4501 4502 4503 4504 4505 4506 4507 4508 4509 4510 4511 4512 4513 4514 4515 ... 6590