Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2003
11/27/2003US20030219991 Conductive material patterning methods
11/27/2003US20030219990 Dual trench alternating phase shift mask fabrication
11/27/2003US20030219989 Semiconductor device producing method and semiconductor device producing apparatus
11/27/2003US20030219988 Ashable layers for reducing critical dimensions of integrated circuit features
11/27/2003US20030219987 Method of protecting a passivation layer during solder bump formation
11/27/2003US20030219986 Substrate carrier for processing substrates
11/27/2003US20030219985 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device
11/27/2003US20030219983 Method of forming a MIM capacitor structure
11/27/2003US20030219982 CMP (chemical mechanical polishing) polishing liquid for metal and polishing method
11/27/2003US20030219981 Process and apparatus for epitaxially coating a semiconductor wafer and epitaxially coated semiconductor wafer
11/27/2003US20030219980 Pattern forming method, method of making microdevice, method of making thin-film magnetic head, method of making magnetic head slider, method of making magnetic head apparatus, and method of making magnetic recording and reproducing apparatus
11/27/2003US20030219979 Methods and apparatus for forming a metal layer on an integrated circuit device using a tantalum precursor
11/27/2003US20030219978 Method and apparatus for liquid phase deposition
11/27/2003US20030219977 Reduced cross-contamination between chambers in a semiconductor processing tool
11/27/2003US20030219976 Using stabilizers in electroless solutions to inhibit plating of fuses
11/27/2003US20030219975 Planarized semiconductor interconnect topography and method for polishing a metal layer to form wide interconnect structures
11/27/2003US20030219974 Method for manufacturing semiconductor device
11/27/2003US20030219973 Tri-layer masking architecture for patterning dual damascene interconnects
11/27/2003US20030219972 Fabrication process for a semiconductor device having a metal oxide dielectric material with a high dielectric constant, annealed with a buffered anneal process
11/27/2003US20030219971 Method and structure for ultra-low contact resistance CMOS formed by vertically self-alligned CoSi2 on raised source drain Si/SiGe device
11/27/2003US20030219970 Selective filling of electrically conductive vias for three dimensional device structures
11/27/2003US20030219969 Semiconductor device and manufacturing method thereof
11/27/2003US20030219968 Sacrificial inlay process for improved integration of porous interlevel dielectrics
11/27/2003US20030219967 Semiconductor device with elongated interconnecting member and fabrication method thereof
11/27/2003US20030219966 Small pitch torch bump for mounting high-performance flip-chip
11/27/2003US20030219965 Method and structure for ultra-low contact resistance cmos formed by vertically self-aligned cosi2 on raised source drain si/sige device
11/27/2003US20030219964 Vertical power component manufacturing method
11/27/2003US20030219963 Self-aligned method for fabricating epitaxial base bipolar transistor device
11/27/2003US20030219962 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies
11/27/2003US20030219961 Method to reduce reflectivity of polysilicon layer
11/27/2003US20030219960 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film
11/27/2003US20030219959 Methods for fabricating final substrates
11/27/2003US20030219958 Method for forming isolation layer of semiconductor device
11/27/2003US20030219957 High quality and yield; does not generate particles even when heat treated
11/27/2003US20030219955 Method for manufacturing capacitor structure, and method for manufacturing capacitor element
11/27/2003US20030219954 Manufacturing method of semiconductor substrate
11/27/2003US20030219953 Method for fabricating semiconductor devices
11/27/2003US20030219952 Semiconductor device and method of manufacturing same
11/27/2003US20030219951 Semiconductor constructions, and methods of forming semiconductor constructions
11/27/2003US20030219950 Deuterium treatment of semiconductor device
11/27/2003US20030219949 Method of manufacturing and structure of semiconductor device with floating ring structure
11/27/2003US20030219948 Method of manufacturing a semiconductor device
11/27/2003US20030219947 Memory device and fabrication method thereof
11/27/2003US20030219946 Comprises mask read only memory cell array (memory cell transistors) on substrate, stacked dielectric layers, and bit layer
11/27/2003US20030219945 Vertical double diffused MOSFET and method of fabricating the same
11/27/2003US20030219944 Method for manufacturing a nonvolatile memory device
11/27/2003US20030219943 Method of fabricating a floating gate for split gate flash memory
11/27/2003US20030219942 Methods of forming capacitors and integrated circuit devices including tantalum nitride
11/27/2003US20030219941 Dielectric cure for reducing oxygen vacancies
11/27/2003US20030219940 Method for manufacturing semiconductor device
11/27/2003US20030219939 Self aligned compact bipolar junction transistor layout and method of making same
11/27/2003US20030219938 CMOS gate electrode using selective growth and a fabrication method thereof
11/27/2003US20030219937 Method for co-fabricating strained and relaxed crystalline and poly-crystalline structures
11/27/2003US20030219936 Mask for crystallizing and method of crystallizing amorphous silicon using the same
11/27/2003US20030219935 Method of fabricating semiconductor device
11/27/2003US20030219934 Method of manufacturing device, device, electro-optical device, and electronic apparatus
11/27/2003US20030219933 Semiconductor device having epitaxially-filled trench and method for manufacturing semiconductor device having epitaxially-filled trench
11/27/2003US20030219932 Method of manufacturing a semiconductor device
11/27/2003US20030219931 Array substrate for liquid crystal display device and the fabrication method of the same
11/27/2003US20030219930 Fabrication method for mask read only memory device
11/27/2003US20030219928 Substrate identification circuit and semiconductor device
11/27/2003US20030219927 Solder balls and conductive wires for a semiconductor package, and an improved manufacturing method, and evaporation method therefor
11/27/2003US20030219926 Semiconductor device and method of manufacturing the same, and electronic instrument
11/27/2003US20030219922 Method of preventing seal damage in LCD panel manufacturing
11/27/2003US20030219920 Fabrication method of liquid crystal display device
11/27/2003US20030219917 System and method using migration enhanced epitaxy for flattening active layers and the mechanical stabilization of quantum wells associated with vertical cavity surface emitting lasers
11/27/2003US20030219916 Abnormal photoresist line/space profile detection through signal processing of metrology waveform
11/27/2003US20030219912 Method for removal of metallic residue after plasma etching of a metal layer
11/27/2003US20030219683 Exposing pattern to low pressure, high density, inductively coupled plasma which generates ultraviolet radiation while the substrate cools, simultaneously hardening as etching takes place; for production of integrated circuits/semiconductors
11/27/2003US20030219682 Comprises (meth)acrylate monomers and perfluoroalkylcarboxylic acid compound; for semiconductors/integrated circuits
11/27/2003US20030219680 Radiation-sensitive resin composition
11/27/2003US20030219679 For use in microlithography; improved photosensitivity and contrast; for integrated circuits
11/27/2003US20030219676 Processes for producing silane monomers and polymers and photoresist compositions comprising same
11/27/2003US20030219675 For manufacturing reticles and microelectromechanical systems (MEMS) processing
11/27/2003US20030219660 Pattern forming method
11/27/2003US20030219658 Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
11/27/2003US20030219655 Photomask having a focus monitor pattern
11/27/2003US20030219634 Aluminum, gallium or indium nitride undercoatings on surfaces of sapphire single crystal substrates, used in semiconductors having light emitting diodes or high speed integrated circuit chips
11/27/2003US20030219619 Thermosetting resin composition and semiconductor device obtained with the same
11/27/2003US20030219603 Photoresist compositions
11/27/2003US20030219541 Comprises vapor phase polymerization of 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene; integrated circuits; microelectronics, optoelectronics
11/27/2003US20030219540 Pre-polycoating of glass substrates
11/27/2003US20030219536 Residual gases are purged out by air flow including water to remove fumes; semiconductors; integrated circuits
11/27/2003US20030219535 Comprises graft polymers of acrylic acid, styrene, N-2-(hydroxypropyl)methacrylamide, and N-isopropyl acrylamide on silicon wafters; photolithography
11/27/2003US20030219534 Preparation of LCPMO thin films which have reversible resistance change properties
11/27/2003US20030219361 Apparatus and method for pretreating effluent gases in a wet environment
11/27/2003US20030219333 Semiconductor support mechanism for sample stage
11/27/2003US20030219153 System and method for process variation monitor
11/27/2003US20030219096 Apparatus and system for improving phase shift mask imaging performance and associated methods
11/27/2003US20030219095 X-ray mask and semiconductor device manufatured through x-ray exposure method
11/27/2003US20030218932 Semiconductor device
11/27/2003US20030218926 MRAM configuration having selection transistors with a large channel width
11/27/2003US20030218920 Highly compact Eprom and flash EEprom devices
11/27/2003US20030218915 Semiconductor device adapted for power shutdown and power resumption
11/27/2003US20030218913 Stepped pre-erase voltages for mirrorbit erase
11/27/2003US20030218912 Flash memory cell erase scheme using both source and channel regions
11/27/2003US20030218910 Semiconductor memory device capable of accurately writing data
11/27/2003US20030218906 Memory cell isolation
11/27/2003US20030218905 Equi-potential sensing magnetic random access memory (MRAM) with series diodes
11/27/2003US20030218902 Triple sample sensing for magnetic random access memory (MRAM) with series diodes
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