Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2003
12/30/2003US6669920 Fluoride crystal with a 157 nm transmission > 85% and a refractive index wavelength dispersion dn/d lambda < -0.003
12/30/2003US6669869 Capable of firmly adhering to an electronic component and a circuit board and achieving good electrical continuity by thermal compression bonding at low temperature at which the circuit board is not eteriorated
12/30/2003US6669858 Integrated low k dielectrics and etch stops
12/30/2003US6669857 Etching solution containing from fluoride source, nitric acid, water is contacted with substrate having bismuth-oxide containing film so as to etch oxide film; removing etching solution from substrate
12/30/2003US6669825 Modifying dielectric overcoating on substrate
12/30/2003US6669812 Apparatus and method for fabricating semiconductor device
12/30/2003US6669811 Linear drive system for use in a plasma processing system
12/30/2003US6669810 Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
12/30/2003US6669809 Apparatus for removing a coating film
12/30/2003US6669808 Substrate processing apparatus and substrate processing method
12/30/2003US6669801 Device transfer method
12/30/2003US6669787 Oxidizing ferromagnetic material of sense layer, depositing aluminium on oxidized ferromagnetic material of sense layer, whereafter this aluminium oxidizes to an aluminium oxide film using oxygen from oxidized ferromagnetic material
12/30/2003US6669785 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide
12/30/2003US6669784 Gas processing apparatus for object to be processed
12/30/2003US6669783 High temperature electrostatic chuck
12/30/2003US6669779 Yield and line width performance for liquid polymers and other materials
12/30/2003US6669778 Preparation of crystals
12/30/2003US6669748 Dispersion liquid of silica particles for polishing, method of producing the same, and polishing agent
12/30/2003US6669537 Resin diamond blade and optical waveguide manufacturing method using the blade
12/30/2003US6669535 Platform table for cleaning parts
12/30/2003US6669489 Interposer, socket and assembly for socketing an electronic component and method of making and using same
12/30/2003US6669434 Double arm substrate transport unit
12/30/2003US6669253 Wafer boat and boat holder
12/30/2003US6669185 Wafer loading system positioning method and device
12/30/2003US6669079 Conductive paste and semiconductor component having conductive bumps made from the conductive paste
12/30/2003US6669077 High-strength solder joint
12/30/2003US6669076 Wire bonding device
12/30/2003US6669074 Resonator for ultrasonic wire bonding
12/30/2003US6669030 Holding stand for fragile plates
12/30/2003US6668912 Heat exchanger cast in metal matrix composite and method of making the same
12/30/2003US6668844 Systems and methods for processing workpieces
12/30/2003CA2345570C Programmable circuit with preview function
12/30/2003CA2091647C Method for the surface treatment of a metal by atmospheric pressure plasma
12/25/2003WO2003107427A1 Interlayer dielectric and pre-applied die attach adhesive materials
12/25/2003WO2003107409A1 Oxide film forming method and oxide film forming apparatus
12/25/2003WO2003107399A2 Method for improving nitrogen profile in plasma nitrided gate dielectric layers
12/25/2003WO2003107395A2 Protected dual-voltage microcircuit power arrangement
12/25/2003WO2003107382A2 Plasma method and apparatus for processing a substrate
12/25/2003WO2003107094A1 Multi-tiered lithographic template
12/25/2003WO2003107093A2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
12/25/2003WO2003106916A2 Optical metrology of single features
12/25/2003WO2003106743A1 N-type semiconductor diamond producing method and semiconductor diamond
12/25/2003US20030237071 PLD architecture for flexible placement of IP function blocks
12/25/2003US20030237070 Semiconductor circuit designing method, semiconductor circuit designing apparatus, program, and semiconductor device
12/25/2003US20030237066 Electronic circuit design method, simulation apparatus and computer-readable storage medium
12/25/2003US20030237065 Method and apparatus for verifying logical equivalency between logic circuits
12/25/2003US20030237064 Characterization and verification for integrated circuit designs
12/25/2003US20030237033 System for testing a group of functionally independent memories and for replacing failing memory words
12/25/2003US20030237032 Method for electronically testing memory modules
12/25/2003US20030237011 Memory integrated circuit
12/25/2003US20030236759 Neural network for determining the endpoint in a process
12/25/2003US20030236738 Replicated derivatives having demand-based, adjustable returns, and trading exchange therefor
12/25/2003US20030236653 Simulation method and system for design of aperture in exposure apparatus and recording medium in which the simulation method is recorded
12/25/2003US20030236646 Method and program for calculating ion distribution
12/25/2003US20030236642 System and process for calibrating pyrometers in thermal processing chambers
12/25/2003US20030236587 Control device for emergency stop in semiconductor manufacturing system
12/25/2003US20030236586 Method for failure analysis and system for failure analysis
12/25/2003US20030236057 Polishing apparatus and method, and wafer evacuation program
12/25/2003US20030236056 Polishing station of a chemical mechanical polishing apparatus
12/25/2003US20030236055 Polishing pad for endpoint detection and related methods
12/25/2003US20030236004 Dechucking with N2/O2 plasma
12/25/2003US20030236003 Method of forming barrier layer of semiconductor device
12/25/2003US20030236002 Capacitor dielectric structure of a dram cell and method for forming thereof
12/25/2003US20030236001 Fabrication process of a semiconductor device
12/25/2003US20030236000 Method of making nanotube permeable base transistor
12/25/2003US20030235999 Method for fabricating capacitor in semiconductor device
12/25/2003US20030235997 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching layer etching process based on near infrared spectrometer
12/25/2003US20030235996 Non-corrosive cleaning compositions for removing etch residues
12/25/2003US20030235995 Method of increasing selectivity to mask when etching tungsten or tungsten nitride
12/25/2003US20030235994 Method of avoiding plasma arcing during RIE etching
12/25/2003US20030235993 Selective etching of low-k dielectrics
12/25/2003US20030235991 Substrate etch method and device
12/25/2003US20030235990 Method of forming a nanometer-gate mosfet device
12/25/2003US20030235989 Process for CMP assisted liftoff
12/25/2003US20030235988 Method of chemically altering a silicon surface and associated electrical devices
12/25/2003US20030235987 Method for fabricating semiconductor device
12/25/2003US20030235986 Silicon oxide etching compositions with reduced water content
12/25/2003US20030235985 Method for etching high-k films in solutions comprising dilute fluoride species
12/25/2003US20030235984 Method and device using silicide contacts for semiconductor processing
12/25/2003US20030235983 Temperature control sequence of electroless plating baths
12/25/2003US20030235982 Method of plugging through-holes in silicon substrate
12/25/2003US20030235981 Method and device using silicide contacts for semiconductor processing
12/25/2003US20030235980 Silicon-rich oxide for copper damascene interconnect incorporating low dielectric constant dielectrics
12/25/2003US20030235979 Electric device and method for fabricating the same
12/25/2003US20030235978 Method of forming contact
12/25/2003US20030235977 Method of forming multilayered conductive layers for semiconductor device
12/25/2003US20030235976 Method for producing a substrate arrangement
12/25/2003US20030235975 Semiconductor constructions, and methods of forming semiconductor constructions
12/25/2003US20030235974 Advanced RF enhancement-mode FETs with improved gate properties
12/25/2003US20030235973 Nickel SALICIDE process technology for CMOS devices
12/25/2003US20030235972 Thermal processing method and thermal processing apparatus for substrated employing photoirradiation
12/25/2003US20030235971 Manufacturing method for a semiconductor device
12/25/2003US20030235970 Method for growing layers of group iii - nitride semiconductor having electrically passivated threading defects
12/25/2003US20030235969 Semiconductor device manufacturing method
12/25/2003US20030235968 Capacitor with oxidation barrier layer and method for manufacturing the same
12/25/2003US20030235967 Multi-bit memory unit and fabrication method thereof
12/25/2003US20030235966 Method for fabricating semiconductor device including gate spacer
12/25/2003US20030235965 Method for manufacturing a MOS transistor
12/25/2003US20030235964 Reduction of field edge thinning in peripheral devices
12/25/2003US20030235963 Methods of forming an array of flash field effect transistors and circuitry peripheral to such array
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