Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2003
12/30/2003US6670635 Semiconductor device and semiconductor display device
12/30/2003US6670632 Reticle and method of fabricating semiconductor device
12/30/2003US6670623 Thermal regulation of an ion implantation system
12/30/2003US6670622 Electron exposure device and method and electronic characteristics evaluation device using scanning probe
12/30/2003US6670621 Clean room arrangement for electron beam lithography
12/30/2003US6670620 Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus
12/30/2003US6670616 Ultraviolet-light irradiation apparatus
12/30/2003US6670612 Undercut measurement using SEM
12/30/2003US6670568 Installation for processing wafers
12/30/2003US6670556 Printed circuit board unit with detachment mechanism for electronic component
12/30/2003US6670551 Image sensing component package and manufacture method thereof
12/30/2003US6670543 Thin-film solar cells and method of making
12/30/2003US6670542 Semiconductor device and manufacturing method thereof
12/30/2003US6670430 Thermosetting resin compositions comprising epoxy resins, adhesion promoters, and curatives based on the combination of nitrogen compounds and transition metal complexes
12/30/2003US6670425 Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
12/30/2003US6670290 Manufacturing apparatus and manufacturing method for semiconductor device
12/30/2003US6670289 High-pressure anneal process for integrated circuits
12/30/2003US6670288 Methods of forming a layer of silicon nitride in a semiconductor fabrication process
12/30/2003US6670287 Coating method and coating apparatus
12/30/2003US6670285 Nitrogen-containing polymers as porogens in the preparation of highly porous, low dielectric constant materials
12/30/2003US6670284 Method of decontaminating process chambers, methods of reducing defects in anti-reflective coatings, and resulting semiconductor structures
12/30/2003US6670283 Backside protection films
12/30/2003US6670279 Method of forming shallow trench isolation with rounded corners and divot-free by using in-situ formed spacers
12/30/2003US6670278 Method of plasma etching of silicon carbide
12/30/2003US6670277 Method of manufacturing semiconductor device
12/30/2003US6670276 Plasma processing method
12/30/2003US6670275 Method of rounding a topcorner of trench
12/30/2003US6670274 Method of forming a copper damascene structure comprising a recessed copper-oxide-free initial copper structure
12/30/2003US6670272 Method for reducing dishing in chemical mechanical polishing
12/30/2003US6670271 Growing a dual damascene structure using a copper seed layer and a damascene resist structure
12/30/2003US6670270 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
12/30/2003US6670269 Method of forming through-hole or recess in silicon substrate
12/30/2003US6670268 Metal interconnection with low resistance in a semiconductor device and a method of forming the same
12/30/2003US6670267 Formation of tungstein-based interconnect using thin physically vapor deposited titanium nitride layer
12/30/2003US6670266 Multilayered diffusion barrier structure for improving adhesion property
12/30/2003US6670265 Low K dielectic etch in high density plasma etcher
12/30/2003US6670264 Method of making electrode-to-electrode bond structure and electrode-to-electrode bond structure made thereby
12/30/2003US6670263 Method of reducing polysilicon depletion in a polysilicon gate electrode by depositing polysilicon of varying grain size
12/30/2003US6670262 Method of manufacturing semiconductor device
12/30/2003US6670261 Production method for annealed wafer
12/30/2003US6670260 Transistor with local insulator structure
12/30/2003US6670259 Inert atom implantation method for SOI gettering
12/30/2003US6670258 Fabrication of low leakage-current backside illuminated photodiodes
12/30/2003US6670257 Method for forming horizontal buried channels or cavities in wafers of monocrystalline semiconductor material
12/30/2003US6670256 Metal oxynitride capacitor barrier layer
12/30/2003US6670254 Method of manufacturing semiconductor device with formation of a heavily doped region by implantation through an insulation layer
12/30/2003US6670253 Fabrication method for punch-through defect resistant semiconductor memory device
12/30/2003US6670252 Method of manufacturing semiconductor device
12/30/2003US6670251 Method of fabricating semiconductor device
12/30/2003US6670250 MOS transistor and method for forming the same
12/30/2003US6670249 Process for forming high temperature stable self-aligned metal silicide layer
12/30/2003US6670248 Triple gate oxide process with high-k gate dielectric
12/30/2003US6670247 Method of fabricating mask read only memory
12/30/2003US6670246 Method for forming a vertical nitride read-only memory
12/30/2003US6670245 Method for fabricating an ESD device
12/30/2003US6670244 Method for fabricating a body region for a vertical MOS transistor arrangement having a reduced on resistivity
12/30/2003US6670243 Method of making a flash memory device with an inverted tapered floating gate
12/30/2003US6670242 Method for making an integrated circuit device including a graded, grown, high quality gate oxide layer and a nitride layer
12/30/2003US6670241 Semiconductor memory with deuterated materials
12/30/2003US6670240 Twin NAND device structure, array operations and fabrication method
12/30/2003US6670239 Non-volatile memory cell having bilayered floating gate and fabricating method thereof
12/30/2003US6670238 Method and structure for reducing contact aspect ratios
12/30/2003US6670237 Method for an advanced MIM capacitor
12/30/2003US6670236 Semiconductor device having capacitance element and method of producing the same
12/30/2003US6670235 Process flow for two-step collar in DRAM preparation
12/30/2003US6670234 Method of integrating volatile and non-volatile memory cells on the same substrate and a semiconductor memory device thereof
12/30/2003US6670233 Methods of patterning a multi-layer film stack and forming a lower electrode of a capacitor
12/30/2003US6670232 Providing a conductive material in an opening
12/30/2003US6670231 Method of forming a dielectric layer in a semiconductor device
12/30/2003US6670230 CMOS process for double vertical channel thin film transistor
12/30/2003US6670229 Bipolar transistor produced using processes compatible with those employed in the manufacture of MOS device
12/30/2003US6670228 Method of fabricating a polysilicon capacitor utilizing FET and bipolar base polysilicon layers
12/30/2003US6670227 Method for fabricating devices in core and periphery semiconductor regions using dual spacers
12/30/2003US6670226 Planarizing method for fabricating gate electrodes
12/30/2003US6670225 Method of manufacturing a semiconductor device
12/30/2003US6670224 Method for manufacturing thin film transistors
12/30/2003US6670223 Coupled-cap flip chip BGA package with improved cap design for reduced interfacial stresses
12/30/2003US6670222 Texturing of a die pad surface for enhancing bonding strength in the surface attachment
12/30/2003US6670221 Semiconductor device having a built-in contact-type sensor and manufacturing method thereof
12/30/2003US6670220 Semiconductor device and manufacture method of that
12/30/2003US6670217 Methods for forming a die package
12/30/2003US6670215 Semiconductor device and manufacturing method thereof
12/30/2003US6670214 Insulated bonding wire for microelectronic packaging
12/30/2003US6670213 Method of preparing photoresponsive devices, and devices made thereby
12/30/2003US6670211 Semiconductor laser device
12/30/2003US6670209 Embedded metal scheme for liquid crystal display (LCD) application
12/30/2003US6670206 Method for fabricating surface acoustic wave filter packages
12/30/2003US6670205 Method of fabricating image sensor equipped with lens
12/30/2003US6670204 Semiconductor light emitting device and method for manufacturing the same
12/30/2003US6670201 Manufacturing method of semiconductor device
12/30/2003US6670200 Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same
12/30/2003US6670107 Method of reducing defects
12/30/2003US6670106 Formation method of pattern
12/30/2003US6670104 Pattern forming method and method of manufacturing thin film transistor
12/30/2003US6670103 Method for forming lightly doped diffusion regions
12/30/2003US6670093 Includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit
12/30/2003US6670081 Forming making; transferring lithography pattern; adjustment vertical, horizontal spacings
12/30/2003US6670022 Nanoporous dielectric films with graded density and process for making such films
12/30/2003US6669995 Directly exposing exposed antireflective coating to dosage of ultraviolet radiation sufficient to result in direct removal of at least portion of exposed coating
12/30/2003US6669982 Method for forming a liquid film on a substrate
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