Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2004
01/13/2004US6677655 Silicon wafer with embedded optoelectronic material for monolithic OEIC
01/13/2004US6677652 Metal layer deposited over gate dielectric layer in active area, oxygen ions implanted into metal layer in active area to form metal layer which is oxidized to form metal oxide layer, layers patterned to form metal and metal oxide gates
01/13/2004US6677651 Semiconductor device and method for manufacturing the same
01/13/2004US6677650 Silicon plugs and local interconnect for embedded memory and system-on-chip (SOC) applications
01/13/2004US6677649 SRAM cells with two P-well structure
01/13/2004US6677648 Device having a silicon oxide film containing krypton
01/13/2004US6677646 Method and structure of a disposable reversed spacer process for high performance recessed channel CMOS
01/13/2004US6677645 Body contact MOSFET
01/13/2004US6677644 Semiconductor integrated circuit having low voltage and high voltage transistors
01/13/2004US6677643 Super-junction semiconductor device
01/13/2004US6677642 Field effect transistor structure and method of manufacture
01/13/2004US6677641 Semiconductor structure with improved smaller forward voltage loss and higher blocking capability
01/13/2004US6677640 Memory cell with tight coupling
01/13/2004US6677639 Non-volatile memory device and method for fabricating the same
01/13/2004US6677638 Nonvolatile memory device and method for fabricating the same
01/13/2004US6677637 Intralevel decoupling capacitor, method of manufacture and testing circuit of the same
01/13/2004US6677636 Structure for reducing contact aspect ratios
01/13/2004US6677635 Stacked MIMCap between Cu dual damascene levels
01/13/2004US6677634 Method for fabricating semiconductor device
01/13/2004US6677633 Semiconductor device
01/13/2004US6677632 Method of forming a metal to polysilicon contact in oxygen environment
01/13/2004US6677631 MRAM memory elements and method for manufacture of MRAM memory elements
01/13/2004US6677630 Semiconductor device having ferroelectric film and manufacturing method thereof
01/13/2004US6677629 Electric or electronic component and application as non volatile memory and device with surface acoustic waves
01/13/2004US6677625 Bipolar transistor
01/13/2004US6677623 Bed structure underlying electrode pad of semiconductor device and method for manufacturing same
01/13/2004US6677622 Semiconductor device having insulated gate bipolar transistor with dielectric isolation structure
01/13/2004US6677616 Fabrication method of thin film transistor substrate for X-ray detector
01/13/2004US6677613 Semiconductor device and method of fabricating the same
01/13/2004US6677612 Method for fabricating a simplified CMOS polysilicon thin film transistor and resulting structure
01/13/2004US6677611 Thin film circuit
01/13/2004US6677609 Thin film transistor, manufacturing method thereof, and circuit and liquid crystal display device using the thin film transistor
01/13/2004US6677607 Organic semiconductor device having an oxide layer
01/13/2004US6677606 Dopa and dopamine modification of metal oxide semiconductors, method for attaching biological molecules to semiconductors
01/13/2004US6677600 EUV radiation source
01/13/2004US6677599 System and method for uniformly implanting a wafer with an ion beam
01/13/2004US6677598 Beam uniformity and angular distribution measurement system
01/13/2004US6677594 Scanning wheel for ion implantation process chamber
01/13/2004US6677586 Methods and apparatus for electron beam inspection of samples
01/13/2004US6677557 Ceramic heater
01/13/2004US6677553 Laser processing apparatus
01/13/2004US6677552 System and method for laser micro-machining
01/13/2004US6677549 Plasma processing apparatus having permeable window covered with light shielding film
01/13/2004US6677286 Water, solvent, dicarboxylic acid, base, and source of fluoride; cleaning compound for microelectronics
01/13/2004US6677255 Method for removing fences without reduction of ONO film thickness
01/13/2004US6677254 Processes for making a barrier between a dielectric and a conductor and products produced therefrom
01/13/2004US6677253 Carbon doped oxide deposition
01/13/2004US6677252 Exposed to radiation at a first wavelength to cure the planarization material and is exposed to radiation at a second wavelength to cause changes to the planarization material that facilitate separation
01/13/2004US6677251 Method for forming a hydrophilic surface on low-k dielectric insulating layers for improved adhesion
01/13/2004US6677250 CVD apparatuses and methods of forming a layer over a semiconductor substrate
01/13/2004US6677249 Method for manufacturing breakaway layers for detaching deposited layer systems
01/13/2004US6677248 Coaxial type signal line and manufacturing method thereof
01/13/2004US6677247 Method of increasing the etch selectivity of a contact sidewall to a preclean etchant
01/13/2004US6677246 Endpoint detection in the etching of dielectric layers
01/13/2004US6677245 Contact structure production method
01/13/2004US6677244 Specimen surface processing method
01/13/2004US6677242 Integrated shallow trench isolation approach
01/13/2004US6677240 Method for patterning dense and isolated features on semiconductor devices
01/13/2004US6677239 Methods and compositions for chemical mechanical polishing
01/13/2004US6677238 System and methods for fabrication of a thin film pattern
01/13/2004US6677237 Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them
01/13/2004US6677236 Semiconductor device fabrication method for interconnects that suppresses loss of interconnect metal
01/13/2004US6677235 Silicon die with metal feed through structure
01/13/2004US6677234 Method of selectively forming silicide
01/13/2004US6677233 Material deposition from a liquefied gas solution
01/13/2004US6677232 Method for fabricating metal conductors and multi-level interconnects in a semiconductor device
01/13/2004US6677231 Method for increasing adhesion ability of dielectric material in semiconductor
01/13/2004US6677230 Method of manufacturing semiconductor device
01/13/2004US6677229 Solder bump transfer sheet, method for producing the same, and methods for fabricating semiconductor device and printed board
01/13/2004US6677227 Metal contactor flanges; connecting circuits
01/13/2004US6677226 Method for forming an integrated circuit having a bonding pad and a fuse
01/13/2004US6677224 Method of forming stacked gate for flash memories
01/13/2004US6677223 Transistor with highly uniform threshold voltage
01/13/2004US6677222 Method of manufacturing semiconductor device with polysilicon film
01/13/2004US6677221 Semiconductor device and the fabricating method therefor
01/13/2004US6677220 Antifuse structure and method of making
01/13/2004US6677219 Method of forming a ball grid array package
01/13/2004US6677218 Method for filling trenches in integrated semiconductor circuits
01/13/2004US6677217 Methods for manufacturing integrated circuit metal-insulator-metal capacitors including hemispherical grain lumps
01/13/2004US6677216 Method of making IC capacitor
01/13/2004US6677215 Method of fabricating a diode protecting a gate electrode of a field effect transistor
01/13/2004US6677213 SONOS structure including a deuterated oxide-silicon interface and method for making the same
01/13/2004US6677212 Elevated source/drain field effect transistor and method for making the same
01/13/2004US6677211 Method for eliminating polysilicon residue
01/13/2004US6677210 High voltage transistors with graded extension
01/13/2004US6677209 Low dielectric constant STI with SOI devices
01/13/2004US6677208 Transistor with bottomwall/sidewall junction capacitance reduction region and method
01/13/2004US6677206 Non-volatile high-performance memory device and relative manufacturing process
01/13/2004US6677205 Depositing a first conductive material onto a gate oxide layer formed within trench and pad nitride; depositing a second conductive material; planarizing conductive materials; removing pad nitride; etching to form divot; forming spacer
01/13/2004US6677204 Multigate semiconductor device with vertical channel current and method of fabrication
01/13/2004US6677203 Method of manufacturing a semiconductor memory device which reduces the minimum area requirements of the device
01/13/2004US6677202 Power MOS device with increased channel width and process for forming same
01/13/2004US6677201 Method of fabricating thermal CVD oxynitride and BTBAS nitride sidewall spacer for metal oxide semiconductor transistors
01/13/2004US6677200 Method of forming non-volatile memory having floating trap type device
01/13/2004US6677199 Structure for preventing salicide bridging and method thereof
01/13/2004US6677198 Structure of a low-voltage channel write/erase flash memory cell and fabricating method thereof
01/13/2004US6677197 High aspect ratio PBL SiN barrier formation
01/13/2004US6677196 Semiconductor memory device and method of fabricating the same
01/13/2004US6677194 Method of manufacturing a semiconductor integrated circuit device
01/13/2004US6677193 Method of producing semiconductor device and its structure