Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2004
01/21/2004CN1469459A Processing method of nano level saphire substrate and its special polishing liquid
01/21/2004CN1469458A Method of preparing high-quality semiconductor crystal film on insulating substrate
01/21/2004CN1469457A Method for producing semiconductor device
01/21/2004CN1469456A Manufacture of integrated circuit array structure
01/21/2004CN1469455A Double metal/polycrystalline oxide nitride oxide silicon memory unit for wide programing
01/21/2004CN1469454A Method for producing contact plug of semiconductor device
01/21/2004CN1469453A Electronic device and its producing method
01/21/2004CN1469452A Method for constituting graph on intermetallic dielectric layer
01/21/2004CN1469451A Signal transmission method between chips in integrated circuit
01/21/2004CN1469450A Manufacture of shallow-channel isolation region
01/21/2004CN1469449A Mark position detecting apparatus and mark position detecting method
01/21/2004CN1469448A Welding table and welding head for resin joining
01/21/2004CN1469447A Method for producing semiconductor
01/21/2004CN1469446A Semiconductor device and producing method thereof
01/21/2004CN1469445A Method for producing semiconductor and heat-resisting pressure-sensitive adhesive tape
01/21/2004CN1469443A Low-cost method for semiconductor device with high channel density
01/21/2004CN1469442A Method for forming high voltage junction in semiconductor device
01/21/2004CN1469441A Method for producing semiconductor
01/21/2004CN1469440A Method for producing semiconductor
01/21/2004CN1469439A Deposition method for dielectric layer
01/21/2004CN1469438A Method for forming stack mulberry pattern
01/21/2004CN1469437A Method of reducing particles produced during etching
01/21/2004CN1469436A Method for processing silicon wafer by machine
01/21/2004CN1469435A Making process of raised source and drain of semiconductor device
01/21/2004CN1469434A Contact hole forming process
01/21/2004CN1469433A Method for producing Si Ge film on silicon substrate
01/21/2004CN1469432A Method for forming fine pattern
01/21/2004CN1469431A Method for producing alternating phase-shift mask
01/21/2004CN1469430A Coating film forming agent for pattern minuteness and method for forming minute pattern with the same forming agent
01/21/2004CN1469429A Method for producing thin film semiconductor and method for forming resist pattern thereof
01/21/2004CN1469428A Method for producing semi-conductor
01/21/2004CN1469427A Method for selecting mask manufacturer for producing optical mask
01/21/2004CN1469426A Making process of double-layered photoresist for semiconductor manufacture
01/21/2004CN1469425A Thin plate shape protective film
01/21/2004CN1469396A Memory independent on testing group function and system for replacing fault stored word
01/21/2004CN1469387A Magnetic random access storage device
01/21/2004CN1469385A Relayed electric pulse used in magnetic resistor
01/21/2004CN1469384A Magnetic memory element for controlling nucleation position in data layer
01/21/2004CN1469290A Product management method, program for executing products management and recorded program medium
01/21/2004CN1469200A Electronic photoetching equipment with pattern emitter
01/21/2004CN1469199A Positive photoresist composition and method for forming etch resistant pattern
01/21/2004CN1469198A Positve photosensitive painting composition, method for producing positive photosensitive resin and forming method of pattern
01/21/2004CN1469197A Positive photoresist composition and method for forming resist pattern
01/21/2004CN1469196A Organis antireflective coating composition and method for forming photoresist pattern with the same composition
01/21/2004CN1469193A Objective table apparatus and exposure apparatus
01/21/2004CN1469154A Method for centralized producing device chip with shared substrate
01/21/2004CN1468977A Residual polymer eliminating method
01/21/2004CN1468975A Atomic layer sedimentation reaction equipment
01/21/2004CN1468892A Dielectric coated pole, plasma discharge processing apparatus and thin-film forming method
01/21/2004CN1468839A Dielectric substance with block effect preventing copper diffusion
01/21/2004CN1468798A Making process of micro suspension structure
01/21/2004CN1468712A Manufacture of grain spray hole sheet for ink jetting printing head
01/21/2004CN1468685A Method for processing disc-shaped workpieces
01/21/2004CN1468667A Substrate processing apparatus and substrate processing method
01/21/2004CN1468646A Purifying agent and purifying method for fluoride gas containing nitrogen
01/21/2004CN1135910C Method and apparatus for trigger-igniting CVD plasma
01/21/2004CN1135905C Furnace sidewall temperature control system
01/21/2004CN1135636C Method for producing electrooptical elements
01/21/2004CN1135635C Plasma deposition technology for enhancing optical and electric characteristic of electrooptical devices and electronic devices
01/21/2004CN1135634C High speed/high performance metallic oxide semiconductor transistor and producing method thereof
01/21/2004CN1135633C Diode with first diode contacting with secondry diode
01/21/2004CN1135632C Linked-grid transistor
01/21/2004CN1135631C Method for driving solid image sensor
01/21/2004CN1135630C Semiconductor device with high-voltage CMOS structure and method of fabricating the same
01/21/2004CN1135629C Semiconductor device
01/21/2004CN1135628C Non-volatile storage cell
01/21/2004CN1135627C Capacitor with high-dielectric-constant dielectric and thick electrode and fabrication method thereof
01/21/2004CN1135626C Semiconductor device and its producing method
01/21/2004CN1135625C Nonvolatile semiconductor device and producing method thereof
01/21/2004CN1135624C Semiconductor device and producing method thereof
01/21/2004CN1135623C Semiconductor dvice having N and P field effect transistor on the same substrate
01/21/2004CN1135622C Semiconductor device
01/21/2004CN1135621C Method of linear arrangement of metallic fuse section used on chip
01/21/2004CN1135620C Protecting circuit for semiconductor circuit
01/21/2004CN1135619C Semiconductor device with electrostatic discharge structure
01/21/2004CN1135618C Semiconductor device and producing method thereof
01/21/2004CN1135617C Lead wire frame
01/21/2004CN1135615C Method for producing semiconductor device
01/21/2004CN1135614C Semiconductor device structure and method for forming the same structure
01/21/2004CN1135613C Method for producing semiconductor device
01/21/2004CN1135612C Hand-held connecting/disconnecting machine
01/21/2004CN1135611C Method for packaging semiconductor device using anisotropic conductive adhesive
01/21/2004CN1135610C Anisotropic conductive film and packaging method of semiconductor chip and semiconductor device
01/21/2004CN1135609C Semiconductor device and method of fabricating the same
01/21/2004CN1135608C Semiconductor device mfg. method
01/21/2004CN1135607C Producing method of semiconductor device
01/21/2004CN1135606C Dry etching method
01/21/2004CN1135605C Substrate cleaning method and apparatus
01/21/2004CN1135604C Semiconductor device cleaning apparatus and method for cleaning semiconductor device
01/21/2004CN1135603C Charged particle beam photoetching device and photoetching process of charged particle beam
01/21/2004CN1135602C Method for producing mask
01/21/2004CN1135601C Producing method of semiconductor substrate
01/21/2004CN1135564C Bus central point holding circuit for high-speed memory read operation
01/21/2004CN1135563C Semiconductor memory with space-efficient layout
01/21/2004CN1135560C Ferroelectric memory device
01/21/2004CN1135493C Semiconductor device with deactive film
01/21/2004CN1135491C Integrated management method of semiconductor processing data
01/21/2004CN1135438C Three-dimensional etching process
01/21/2004CN1135437C Thermal treatment method of positive photoetching gel composition
01/21/2004CN1135331C Purification room