Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2004
05/06/2004US20040087123 Method for forming a gate electrode in a semiconductor device
05/06/2004US20040087122 Adhesion enhancement between CVD dielectric and spin-on low-k silicate films
05/06/2004US20040087121 Method of forming a nickel silicide region in a doped silicon-containing semiconductor area
05/06/2004US20040087120 Semiconductor device having improved doping profiles and method of improving the doping profiles of a semiconductor device
05/06/2004US20040087119 Method of forming relaxed SiGe layer
05/06/2004US20040087118 Method of manufacturing semiconductor device
05/06/2004US20040087117 Measuring reflection of sample; illumination of zones; forming model; test structure of optical monitoring; layer of alternating patterned dielectrics with layer of flat reflecting material; multilayer three-dimensional layout
05/06/2004US20040087116 Semiconductor devices and methods of manufacture thereof
05/06/2004US20040087115 Production method of III nitride compound semiconductor, and III nitride compound semiconductor element based on it
05/06/2004US20040087114 Semiconductor device having a thick strained silicon layer and method of its formation
05/06/2004US20040087113 Method of forming a semiconductor laser chip having a marker
05/06/2004US20040087112 Method and apparatus for cutting devices from conductive substrates secured during cutting by vacuum pressure
05/06/2004US20040087111 Method for manufacturing a semiconductor film
05/06/2004US20040087110 Peeling method
05/06/2004US20040087109 Method for direct bonding two silicon wafers for minimising interfacial oxide and stresses at the bond interface, and an SOI structure
05/06/2004US20040087108 Semiconductor on insulator device architecture and method of construction
05/06/2004US20040087107 Method of semiconductor device fabrication
05/06/2004US20040087106 Method for forming isolation film in silicon substrate
05/06/2004US20040087105 Method of forming an isolation film in a semiconductor device
05/06/2004US20040087104 Method of forming shallow trench isolation structure in a semiconductor device
05/06/2004US20040087103 Semiconductor device fabrication method using oxygen ion implantation
05/06/2004US20040087102 Capacitor and production method therefor
05/06/2004US20040087101 High K artificial lattices for capacitor applications to use in CU or AL BEOL
05/06/2004US20040087100 High-dielectric constant insulators for feol capacitors
05/06/2004US20040087098 Mim and metal resistor formation at cu beol using only one extra mask
05/06/2004US20040087097 Method of ultra thin base fabrication for Si/SiGe hetro bipolar transister
05/06/2004US20040087096 Non-volatile memory compatible with logic devices and fabrication method thereof
05/06/2004US20040087095 Method for fabricating semiconductor device
05/06/2004US20040087094 Semiconductor component and method of manufacture
05/06/2004US20040087093 Semiconductor device manufacturing method
05/06/2004US20040087092 Novel approach to improve line end shortening
05/06/2004US20040087091 ULSI MOS with high dielectric constant gate insulator
05/06/2004US20040087090 Semiconductor fabrication process using transistor spacers of differing widths
05/06/2004US20040087089 Semiconductor device and method of manufacturing the same
05/06/2004US20040087088 Nonvolatile memory structures and fabrication methods
05/06/2004US20040087087 Twin NAND device structure, array operations and fabrication method
05/06/2004US20040087086 Non-volatile memory device to protect floating gate from charge loss and method for fabricating the same
05/06/2004US20040087085 Methods for manufacturing semiconductor memory devices
05/06/2004US20040087084 Self-aligned structure with unique erasing gate in split gate flash
05/06/2004US20040087083 Method of forming a capacitor in a semiconductor device
05/06/2004US20040087082 Mim capacitor and manufacturing method thereor
05/06/2004US20040087081 Capacitor fabrication methods and capacitor structures including niobium oxide
05/06/2004US20040087080 Methods for producing thin layers, such as for use in integrated circuits
05/06/2004US20040087079 Method of forming a nitride gate dielectric layer for advanced cmos devices
05/06/2004US20040087078 Edge seal for a semiconductor device
05/06/2004US20040087075 Process for integration of a high dielectric constant gate insulator layer in a CMOS device
05/06/2004US20040087073 Method for fabricating semiconductor device
05/06/2004US20040087071 Method for manufacturing semiconductor device
05/06/2004US20040087070 Method for manufacturing a semiconductor device
05/06/2004US20040087069 Laser annealing method
05/06/2004US20040087068 Method for forming thin-film, apparatus for forming thin-film, method for manufacturing semiconductor device, electro-optical unit, and electronic apparatus
05/06/2004US20040087067 Thin film transistor and active matrix type display unit production methods therefor
05/06/2004US20040087066 Flexible metal foil substrate display and method for forming same
05/06/2004US20040087065 Semiconductor device and method of forming a semiconductor device
05/06/2004US20040087064 Method of forming polysilicon thin film transistor
05/06/2004US20040087062 Semiconductor device and method of manufacturing the same
05/06/2004US20040087060 Romoving sacrificial material by thermal decomposition
05/06/2004US20040087059 Die singulation using deep silicon etching
05/06/2004US20040087058 Substrate for carrying a semiconductor chip and a manufacturing method thereof
05/06/2004US20040087057 Method for fabricating a flip chip package with pillar bump and no flow underfill
05/06/2004US20040087056 Thin-film opto-electronic device and a method of making it
05/06/2004US20040087055 Semiconductor device and method of making same
05/06/2004US20040087053 Low cost fabrication and assembly of lid for semiconductor devices
05/06/2004US20040087051 Method of fabricating nitride based semiconductor substrate and method of fabricating nitride based semiconductor device
05/06/2004US20040087047 Control of nichrome resistor temperature coefficient using RF plasma sputter etch
05/06/2004US20040087046 Method for testing chips on flat solder bumps
05/06/2004US20040087045 Etching method and etching signal layer for processing semiconductor wafers
05/06/2004US20040087044 Method of manufacturing semiconductor device
05/06/2004US20040087043 Package structure and method for making the same
05/06/2004US20040087042 Method and apparatus for adjusting the thickness of a layer of semiconductor material
05/06/2004US20040087040 Method and apparatus for etch processing with end point detection thereof
05/06/2004US20040087037 Etch-stop material for improved manufacture of magnetic devices
05/06/2004US20040086917 Methods for electronic fluorescent perturbation for analysis and electronic perturbation catalysis for synthesis
05/06/2004US20040086807 Method of fabricating thin film transistor
05/06/2004US20040086804 Forming a resist pattern on a microelectronic substrate; forming a coating layer comprising a water-soluble resin on resist pattern, hardening intermixed layer; and removing the non-intermixed coating layer from hardened intermixed layer
05/06/2004US20040086793 High resolution overlay alignment systems for imprint lithography
05/06/2004US20040086791 Reference data is created from corrected photomask design data that is corrected on the basis of an exposure transfer pattern, and sensor data is created by measuring shape of the photomask based on the corrected photomask design data
05/06/2004US20040086790 Mask, method of producing mask, and method of producing semiconductor device
05/06/2004US20040086789 Manufacturing method of photomask and photomask
05/06/2004US20040086739 Film carrier tape for mounting electronic part
05/06/2004US20040086719 Organic acid containing compositions and methods for use thereof
05/06/2004US20040086642 Method and apparatus for feeding gas phase reactant into a reaction chamber
05/06/2004US20040086640 Placing a substrate in a deposition chamber; forming silicon comprising film above substrate wherein one of reactant species for forming film includes a hexachlorodisilane (HCD) source gas and wherein chamber is pressurized
05/06/2004US20040086452 Method of producing ferroelectric metal oxide crystalline particle
05/06/2004US20040086434 Down-stream radical generation by employing a source of electromagnetic excitation such as plasma source (RF or microwave) that can be pulsed to generate radicals from plasma
05/06/2004US20040086430 Residual oxygen reduction system
05/06/2004US20040086172 Alignment mark for e-beam inspection of a semiconductor wafer
05/06/2004US20040086171 Apparatus and method for inspecting a substrate
05/06/2004US20040086170 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof
05/06/2004US20040086168 Pattern inspection method and inspection apparatus
05/06/2004US20040086167 Method and apparatus for analyzing a sample employing fast fourier transformation
05/06/2004US20040086080 Erosion reduction for EUV laser produced plasma target sources
05/06/2004US20040086013 Selectively etchable heterogeneous composite distributed bragg reflector
05/06/2004US20040086011 Planar and wafer level packaging of semiconductor lasers and photo detectors for transmitter optical sub-assemblies
05/06/2004US20040085846 Integrated circuit having nonvolatile data storage circuit
05/06/2004US20040085844 Semiconductor memory device with high-speed sense amplifier
05/06/2004US20040085830 Flash memory cell process using a hardmask
05/06/2004US20040085827 Nonvolatile solid-state magnetic memory, method for controlling coercive force of nonvolatile solid-state magnetic memory, and method for recording in nonvolatile solid-state magnetic memory
05/06/2004US20040085811 Method for recording in a nonvolatile solid-state magnetic memory
05/06/2004US20040085810 Magnetic tunnel junction memory cell architecture