| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/18/2004 | US6736307 Method for mounting leadframes |
| 05/18/2004 | US6736306 Semiconductor chip package comprising enhanced pads |
| 05/18/2004 | US6736268 Transport module |
| 05/18/2004 | US6736206 Thermal processor |
| 05/18/2004 | US6736154 Pressure vessel systems and methods for dispensing liquid chemical compositions |
| 05/18/2004 | US6736150 Fluid heating system for processing semiconductor materials |
| 05/18/2004 | US6736149 Method and apparatus for supercritical processing of multiple workpieces |
| 05/18/2004 | US6736148 Utilizing robot which carries semiconductor wafers to processing bays; clean rooms; compact |
| 05/18/2004 | US6736147 Semiconductor-processing device provided with a remote plasma source for self-cleaning |
| 05/18/2004 | US6735927 Position sensing system for inspection handling system |
| 05/18/2004 | US6735859 Method of manufacturing chip scale package |
| 05/18/2004 | US6735855 Methods for electrical connector |
| 05/18/2004 | CA2233707C Integrated magnetic levitation and rotation system |
| 05/13/2004 | WO2004040950A1 Method for constraining the spread of solder during reflow for preplated high wettability lead frame flip chip assembly |
| 05/13/2004 | WO2004040667A1 Non-volatile memory cell, memory cell arrangement and method for production of a non-volatile memory cell |
| 05/13/2004 | WO2004040666A1 Vertical integrated component, component arrangement and method for production of a vertical integrated component |
| 05/13/2004 | WO2004040665A2 Etch-stop material for improved manufacture of magnetic devices |
| 05/13/2004 | WO2004040662A1 Zn SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING SAME |
| 05/13/2004 | WO2004040660A1 Optical sensor package |
| 05/13/2004 | WO2004040658A1 Floating gate transistors |
| 05/13/2004 | WO2004040657A1 Organic semiconductor device |
| 05/13/2004 | WO2004040655A2 Semiconductor component and method of manufacture |
| 05/13/2004 | WO2004040653A1 Thin film transistors and methods of manufacture thereof |
| 05/13/2004 | WO2004040652A1 Bipolar transistor having a base region with a constant bandgap layer and a graded bandgap layer |
| 05/13/2004 | WO2004040651A1 Magnetic random access memory, and production method therefor |
| 05/13/2004 | WO2004040650A1 Soi wafer and method for manufacturing soi wafer |
| 05/13/2004 | WO2004040649A1 Semiconductor device and method for manufacturing semiconductor device |
| 05/13/2004 | WO2004040648A1 Semiconductor device and method for manufacturing semiconductor device |
| 05/13/2004 | WO2004040647A1 Ferroelectric memory cell |
| 05/13/2004 | WO2004040644A2 Memory cell, memory cell arrangement, structuring arrangement and method for production of a memory cell |
| 05/13/2004 | WO2004040643A1 Method for producing a transistor structure |
| 05/13/2004 | WO2004040642A1 Oxygen bridge structures and methods |
| 05/13/2004 | WO2004040641A1 Clean tunnel for carrier |
| 05/13/2004 | WO2004040640A1 Electronic component with cavity fillers made from thermoplast and method for production thereof |
| 05/13/2004 | WO2004040638A1 Gallium indium nitride arsenide hetero-field-effect transistor, its manufacturing method, and transmitter/receiver using same |
| 05/13/2004 | WO2004040637A1 Semiconductor component and method of manufacture |
| 05/13/2004 | WO2004040636A1 Heater module of rapid thermal processing apparatus |
| 05/13/2004 | WO2004040635A1 Method of forming low-dielectric-constant amorphous silica coating and low-dielectric-constant amorphous silica coating obtained by the method |
| 05/13/2004 | WO2004040634A1 Process monitor and system for producing semiconductor |
| 05/13/2004 | WO2004040633A1 Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
| 05/13/2004 | WO2004040632A1 Heat treating system and heat treating method |
| 05/13/2004 | WO2004040631A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 05/13/2004 | WO2004040628A1 Process for producing polycrystalline film using laser and polycrystalline film |
| 05/13/2004 | WO2004040627A2 Electronic components |
| 05/13/2004 | WO2004040625A1 Exposure apparatus control method and device |
| 05/13/2004 | WO2004040624A2 Method and apparatus for controlling a manufacturing process |
| 05/13/2004 | WO2004040623A2 An improved barrier layer for a copper metallization layer including a low k dielectric |
| 05/13/2004 | WO2004040622A2 Nickel silicide with reduced interface roughness |
| 05/13/2004 | WO2004040621A2 Method and apparatus for planarizing a semiconductor wafer |
| 05/13/2004 | WO2004040620A2 Method and apparatus for implementing measurement or instrumentation on production equipment |
| 05/13/2004 | WO2004040619A2 Semiconductor device with tensile strain silicon introduced by compressive material in a buried oxide layer |
| 05/13/2004 | WO2004040618A2 Feedthrough design and method for a hermetically sealed microdevice |
| 05/13/2004 | WO2004040616A2 Field effect transistor and method for production thereof |
| 05/13/2004 | WO2004040596A1 Solid state inducting device |
| 05/13/2004 | WO2004040583A1 Flash memory cell arrays having dual control gates per memory cell charge storage element |
| 05/13/2004 | WO2004040580A1 Magnetic tunnel junction memory cell architecture |
| 05/13/2004 | WO2004040476A1 Manufacturing process of detachable substrates |
| 05/13/2004 | WO2004040377A1 Chemical-amplification positive-working photoresist composition |
| 05/13/2004 | WO2004040373A1 Multi-image reticles |
| 05/13/2004 | WO2004040372A1 Multi-image reticles |
| 05/13/2004 | WO2004040369A2 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 05/13/2004 | WO2004040326A1 Defect analyzing device for semiconductor integrated circuits, system therefor, and detection method |
| 05/13/2004 | WO2004040321A1 Probe card |
| 05/13/2004 | WO2004040045A1 Method for producing silicon wafer |
| 05/13/2004 | WO2004040034A2 Method of preparing a solution and application of this solution to prepare functional oxide layers |
| 05/13/2004 | WO2004039905A1 Composition for polishing metal, polishing method for metal layer, and production method for wafer |
| 05/13/2004 | WO2004039903A1 Coating liquid for forming amorphous silica coating film of low dielectric constant and process for producing the coating liquid |
| 05/13/2004 | WO2004039886A2 Flip-chip system and method of making same |
| 05/13/2004 | WO2004039546A1 Coating liquid for forming semiconductor film |
| 05/13/2004 | WO2004034475A8 Plasma oscillation switching device |
| 05/13/2004 | WO2004028999A3 Thin films of oxidic materials having a high dielectric constant |
| 05/13/2004 | WO2004025714A3 Method for production of a semiconductor structure |
| 05/13/2004 | WO2004023529A3 Device and method for thermally treating semiconductor wafers |
| 05/13/2004 | WO2004019609A3 A cmos aps with stacked avalanche multiplication layer and low voltage readout electronics |
| 05/13/2004 | WO2004019387A9 Substrate processing system |
| 05/13/2004 | WO2004019368A3 Reduced volume plasma reactor |
| 05/13/2004 | WO2004017381A3 Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions |
| 05/13/2004 | WO2004016672A3 Surface modification of cvd polymer films |
| 05/13/2004 | WO2004012246A3 Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication |
| 05/13/2004 | WO2004012243A3 Selective placement of dislocation arrays |
| 05/13/2004 | WO2004010471A3 In-situ formation of metal insulator metal capacitors |
| 05/13/2004 | WO2004010464A3 Methods of electrochemically treating semiconductor substrates, and methods of forming capacitor constructions |
| 05/13/2004 | WO2004008052A3 System and method for cooling a thermal processing apparatus |
| 05/13/2004 | WO2004006298A3 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 05/13/2004 | WO2004003969A3 Method and system for predicting process performance using material processing tool and sensor data |
| 05/13/2004 | WO2004001809A8 Method for energy-assisted atomic layer deposition and removal |
| 05/13/2004 | WO2004001480A3 Catadioptric reduction objective |
| 05/13/2004 | WO2003103004A3 A cathode pedestal for a plasma etch reactor |
| 05/13/2004 | WO2003102962A3 Method and apparatus for erasing flash memory |
| 05/13/2004 | WO2003100844B1 Method for forming silicon dioxide film on silicon substrate, method for forming oxide film on semiconductor substrate, and method for producing semiconductor device |
| 05/13/2004 | WO2003079754A3 Method for stacking chips within a multichip module package |
| 05/13/2004 | WO2003079437A3 Semiconductor device having a bond pad and method therefor |
| 05/13/2004 | WO2003067183A3 Wireless substrate-like sensor |
| 05/13/2004 | WO2003058701A3 Uv-enhanced oxy-nitridation of semiconductor substrates |
| 05/13/2004 | WO2003041127B1 Process for forming metallized contacts to periphery transistors |
| 05/13/2004 | WO2003031679B1 Method for depositing metal layers employing sequential deposition techniques |
| 05/13/2004 | WO2002093253A9 Backside alignment system and method |
| 05/13/2004 | WO2002091471A3 Integrated circuit |
| 05/13/2004 | WO2002091468A9 Method for thin film lift-off processes using lateral extended etching masks and device |
| 05/13/2004 | WO2002091422A3 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field |