| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/13/2004 | US20040089859 Integrated circuit device installed structure and installation method |
| 05/13/2004 | US20040089854 Dielectric material compositions |
| 05/13/2004 | US20040089853 Dielectric material compositions with high dielectric constant and low dielectric loss |
| 05/13/2004 | US20040089840 Fluorinated surfactants for buffered acid etch solutions |
| 05/13/2004 | US20040089836 Gate valve assembly |
| 05/13/2004 | US20040089824 Hardware configuration for parallel data processing without cross communication |
| 05/13/2004 | US20040089823 Method and apparatus for securing microelectronic workpiece containers |
| 05/13/2004 | US20040089822 Charged-particle beam writer |
| 05/13/2004 | US20040089819 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/13/2004 | US20040089818 Multi-foil optic |
| 05/13/2004 | US20040089697 Bump ball crimping apparatus |
| 05/13/2004 | US20040089651 Heating device, method for evaluating heating device and pattern forming method |
| 05/13/2004 | US20040089649 Device for thermally treating substrates |
| 05/13/2004 | US20040089644 Laser machining method and laser machining apparatus |
| 05/13/2004 | US20040089634 Compositions for oxide CMP |
| 05/13/2004 | US20040089632 Method for etching an object using a plasma and an object etched by a plasma |
| 05/13/2004 | US20040089630 Surface modification method |
| 05/13/2004 | US20040089557 Process for electrolytic copper plating |
| 05/13/2004 | US20040089555 Continuous metal plating and supplemental processing in one housing; substrate stage between cassette stage and pre-treatment unit; cleaning with pure water; drying |
| 05/13/2004 | US20040089552 Electrochemical treating substrate by irradiating with light; lamp, stage, cathode, frame and seal |
| 05/13/2004 | US20040089542 Design of hardware features to facilitate arc-spray coating applications and functions |
| 05/13/2004 | US20040089515 Method and apparatus for picking up a semiconductor chip, method and apparatus for removing a semiconductor chip from a dicing tape, and a method of forming a perforated dicing tape |
| 05/13/2004 | US20040089464 Semiconductor device having packaging structure |
| 05/13/2004 | US20040089421 Distributed control system for semiconductor manufacturing equipment |
| 05/13/2004 | US20040089419 Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
| 05/13/2004 | US20040089408 Method for connecting microchips to an antenna arranged on a support strip for producing a transponder |
| 05/13/2004 | US20040089406 Method for producing an etching mask |
| 05/13/2004 | US20040089331 Rinsing lid for wet bench |
| 05/13/2004 | US20040089328 Substrate cleaning apparatus |
| 05/13/2004 | US20040089326 Method for post chemical-mechanical planarization cleaning of semiconductor wafers |
| 05/13/2004 | US20040089325 Method of and apparatus for cleaning semiconductor wafers |
| 05/13/2004 | US20040089282 Method for sawing wafers employing multiple indexing techniques for multiple die dimensions and dicing apparatus |
| 05/13/2004 | US20040089239 Method for dechucking a substrate |
| 05/13/2004 | US20040089238 Vacuum/gas phase reactor for dehydroxylation and alkylation of porous silica |
| 05/13/2004 | US20040089236 Semiconductor wafer treatment member |
| 05/13/2004 | US20040089235 Mixer, and device and method for manufacturing thin-film |
| 05/13/2004 | US20040089233 Deposition methods utilizing microwave excitation |
| 05/13/2004 | US20040089229 Deposition method, deposition apparatus, and pressure-reduction drying apparatus |
| 05/13/2004 | US20040089228 Dispensing system and method |
| 05/13/2004 | US20040089227 Dual chamber vacuum processing system |
| 05/13/2004 | US20040089224 Process for producing low defect density silicon |
| 05/13/2004 | US20040089223 Preparation of crystals |
| 05/13/2004 | US20040089222 GaN single crystal substrate and method of making the same |
| 05/13/2004 | US20040089065 Wind tunnel and collector configuration therefor |
| 05/13/2004 | US20040089059 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope |
| 05/13/2004 | US20040088880 Substrate drying system |
| 05/13/2004 | US20040088855 Substrate having a coefficient of thermal expansion the same as that of the semiconductor of the chip-scale package and including apertures formed at locations corresponding to bond pads of the semiconductor device |
| 05/13/2004 | DE69907930T2 Integrierte Schaltung mit Kalibriermitteln zur Kalibrierung eines elektronischen Moduls und Verfahren zum Kalibrieren eines elektronischen Moduls in einer Integrierten Schaltung An integrated circuit comprising calibration means for calibrating an electronic module and method for calibrating an electronic module in an integrated circuit |
| 05/13/2004 | DE19808246B4 Verfahren zur Herstellung eines mikroelektronischen Halbleiterbauelements mittels Ionenimplatation A process for producing a microelectronic semiconductor component by means of ion implantation |
| 05/13/2004 | DE10349747A1 Verfahren zum Herstellen von dünnen Schichten wie etwa zum Einsatz bei integrierten Schaltungen A method of manufacturing of thin layers such as used in integrated circuits |
| 05/13/2004 | DE10349694A1 Semiconductor wafer aligment device has reception plane of alignment table lying within periphery of semiconductor wafer for preventing damage by contact with table edge |
| 05/13/2004 | DE10349188A1 Verfahren zur Herstellung einer vergrabenen Verdrahtungsstruktur A process for producing a buried wiring structure |
| 05/13/2004 | DE10345368A1 Production of a column-like structure in a substrate surface used as a photonic crystal or semiconductor component, e.g. in optical communication systems, involves determining the final properties of the columns after a first etching step |
| 05/13/2004 | DE10344827A1 Power semiconductor device e.g. insulated gate bipolar transistor substrate, has P-type isolation region partially formed by diffusing P-type impurity on substrate, where region surrounds N region which is part of substrate |
| 05/13/2004 | DE10344570A1 Schaltkreis-Simulator mit diffusionslängenabhängigen Transistoren und Verfahren zum Erzeugen eines Transistor-Modells Circuit simulator with length-dependent diffusion transistors and method for generating a transistor model |
| 05/13/2004 | DE10340750A1 Trockenätzvorrichtung und Trockenätzverfahren sowie in Trockenätzvorrichtung verwendetes Reinigungsverfahren Dry etching and dry etching and cleaning method used in dry etching |
| 05/13/2004 | DE10340004A1 Semiconductor element coating method using electrophoresis process for selective material deposition e.g. for light-emitting diode manufacture |
| 05/13/2004 | DE10334539A1 Elektronisches Bauelement und Verfahren zum Herstellen desselben The same electronic device and methods for making |
| 05/13/2004 | DE10334422A1 Verfahren zur Herstellung eines Materials mit geringer Ausdehnung sowie das Material mit geringer Ausdehnung verwendende Halbleitervorrichtung A method for producing a material with low expansion and the low expansion material semiconductor device using |
| 05/13/2004 | DE10333129A1 Verfahren zur Bildung einer Siliziumnitridschicht A method of forming a silicon nitride layer |
| 05/13/2004 | DE10330599A1 Verfahren zur Herstellung von Mikroelektronik-Strukturelementen durch Ausbilden von Durchmischungsschichten aus wasserlöslichen Harzen und Resistmaterialien A process for the production of microelectronic structure elements by forming mixing layers of water-soluble resins and resist materials |
| 05/13/2004 | DE10251379A1 Magnetisch positionierte Präzisionshalterung für Optikbauteile Magnetically positioned precision mount for optics components |
| 05/13/2004 | DE10250204A1 Verfahren zur Herstellung einer Transistorstruktur A process for producing a transistor structure |
| 05/13/2004 | DE10249897A1 Selbstjustierender Transistor und Verfahren zur Herstellung The self aligned transistor and methods for making |
| 05/13/2004 | DE10249650A1 Manufacturing semiconducting structure with gate stacks for corresponding FETs involves compensating FET starting voltage variation caused by width variation about desired width with dose variation |
| 05/13/2004 | DE10249649A1 Production of a shallow trench isolation comprises partially filling a recess in a substrate with a filler using a flow-fill process followed by plasma treatment |
| 05/13/2004 | DE10239775B3 Production of a silicon wafer used in the production of a semiconductor component comprises treating the cleaned wafer with an aqueous ozone solution, coating with polycrystalline silicon, finely grinding, and epitaxially growing the wafer |
| 05/13/2004 | DE10228998B4 Vorrichtung und Verfahren zum elektrochemischen Behandeln eines Substrats bei reduzierter Metallkorrosion An apparatus and method for electrochemically treating a substrate with reduced metal corrosion |
| 05/13/2004 | DE10217362B4 Gezielte Abscheidung von Nanoröhren Selective deposition of nanotubes |
| 05/13/2004 | DE10064456B4 Verfahren zur maskenlosen Formation von Metall-Nanostrukturen in dünnen dielektrischen Schichten mittels Bestrahlung mit ultrakurzen Laserimpulsen Method for maskless formation of metal oxide nanostructures in thin dielectric films by irradiation with ultra-short laser pulses |
| 05/13/2004 | DE10026030B4 Ätzverfahren, seine Anwendung und Ätzmittel Etching method, its application and abrasives |
| 05/12/2004 | EP1418796A2 Erosion reduction for EUV laser produced plasma target sources |
| 05/12/2004 | EP1418631A2 Semiconductor optical device having current-confined structure |
| 05/12/2004 | EP1418625A1 Method to store a binary data in a memory cell in a memory integrated circuit, corresponding integrated circuit and fabrication process |
| 05/12/2004 | EP1418623A2 Nonvolatile variable resistor, memory device, and scaling method of nonvolatile variable resistor |
| 05/12/2004 | EP1418622A1 Encapsulation of multiple integrated circuits |
| 05/12/2004 | EP1418620A2 MRAM and methods for manufacturing and driving the same |
| 05/12/2004 | EP1418619A1 Semiconductor device and production method therefor, and plating solution |
| 05/12/2004 | EP1418618A2 Method of forming cavites between multilayered wirings |
| 05/12/2004 | EP1418617A2 Semiconductor device and method of manufacturing the same |
| 05/12/2004 | EP1418616A1 Electronic parts packaging structure and method of manufacturing the same |
| 05/12/2004 | EP1418615A1 Fabrication of self-aligned bipolar transistor |
| 05/12/2004 | EP1418614A1 Wafer holding ring for chemical and mechanical polisher |
| 05/12/2004 | EP1418613A1 Etching method for manufacturing a semiconductor device |
| 05/12/2004 | EP1418468A2 Projection optical system and exposure apparatus |
| 05/12/2004 | EP1418467A2 Projection optical system, exposure apparatus, and device manufacturing method |
| 05/12/2004 | EP1418436A2 Electrical contactor, especially wafer level contactor, using fluid pressure |
| 05/12/2004 | EP1418251A1 Plating method |
| 05/12/2004 | EP1418161A2 Method for the production of an aluminium nitride substrate |
| 05/12/2004 | EP1418160A1 CERAMIC CONNECTION BODY, METHOD OF CONNECTING THE CERAMIC BODIES, AND CERAMIC STRUCTURAL BODY |
| 05/12/2004 | EP1418154A2 Method and apparatus for vacuum-mounting a micro electro mechanical system on a substrate |
| 05/12/2004 | EP1418022A1 Vertically adjustable chemical mechanical polishing head having a pivot mechanism and method for use thereof |
| 05/12/2004 | EP1418021A1 Polishing pad |
| 05/12/2004 | EP1418017A2 Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method |
| 05/12/2004 | EP1417758A2 Esd protection devices for a differential pair of transistors |
| 05/12/2004 | EP1417722A2 Flip chip bonding of light emitting devices and light emitting devices suitable for flip-chip bonding |
| 05/12/2004 | EP1417721A2 Power mosfet with deep implanted junctions |
| 05/12/2004 | EP1417718A1 Transistor having high dielectric constant gate insulating layer and source and drain forming schottky contact with substrate |
| 05/12/2004 | EP1417717A2 Mis device having a trench gate electrode and method of making the same |
| 05/12/2004 | EP1417716A1 Trench bipolar transistor |