Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2007
03/21/2007CN1934671A Method for forming carbonaceous material protrusion and carbonaceous material protrusion
03/21/2007CN1934605A Electroluminescent display devices
03/21/2007CN1934503A Electron beam lithography system
03/21/2007CN1934502A Pattern forming process and pattern
03/21/2007CN1934500A Antireflective film containing sulfur atom
03/21/2007CN1934499A Positively radiation-sensitive resin composition
03/21/2007CN1934497A Negative radiation-sensitive resin composition
03/21/2007CN1934454A Dual feedback control system for maintaining the temperature of an IC-chip near a set-point
03/21/2007CN1934411A Stage device
03/21/2007CN1934404A System for processing a treatment object
03/21/2007CN1934294A Method of solid-phase flux epitaxy growth
03/21/2007CN1934288A Plasma CVD equipment
03/21/2007CN1934285A Silicon film forming equipment
03/21/2007CN1934233A Cleaning solutions and etchants and methods for using same
03/21/2007CN1934221A Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
03/21/2007CN1934208A Cmp porous pad with component-filled pores
03/21/2007CN1934157A 环氧树脂组合物和半导体装置 Epoxy resin composition and a semiconductor device
03/21/2007CN1934153A Novel solvent for producing polyurethane dispersions
03/21/2007CN1933948A Process for producing ceramic sheet, ceramic substrate utilizing the same and use thereof
03/21/2007CN1933943A Vacuum suction unit
03/21/2007CN1933901A Substrate processing device
03/21/2007CN1933326A Etching method, etched product formed by the same, and piezoelectric vibration device, method for producing the same
03/21/2007CN1933205A Single-crystal nitride-based semiconductor substrate and method of manufacturing high-quality nitride-based light emitting device by using the same
03/21/2007CN1933204A Semiconductor light emitting device and device
03/21/2007CN1933203A Semiconductor light emitting device and device
03/21/2007CN1933197A Light emitting diode with at least two light emitting zones and method for manufacture
03/21/2007CN1933196A Light emitting devices and method for fabricating the same
03/21/2007CN1933191A Transparent conductive metal oxide film and solar energy battery forming method
03/21/2007CN1933188A Forming method for solar energy cell substrate suede structure
03/21/2007CN1933182A Thin film transistor and producing method thereof
03/21/2007CN1933181A Semiconductor device and method of fabricating semiconductor device
03/21/2007CN1933177A High-voltage metaloxide semiconductor transistor and producing method thereof
03/21/2007CN1933176A Strontium bismuth tantalate-strontium barium titanate heterogeneous dielectric material and synthesizing method and application thereof
03/21/2007CN1933175A Selective deposition of germanium spacers on nitride
03/21/2007CN1933173A Display unit and method for fabricating the same
03/21/2007CN1933172A Organic memory device having memory active region formed by embossing structure
03/21/2007CN1933169A Reduced crosstalk CMOS image sensors
03/21/2007CN1933168A Complementary metal oxide semiconductor image sensor and producing method thereof
03/21/2007CN1933167A Complementary metal oxide semiconductor image sensor and method for fabricating the same
03/21/2007CN1933166A Electro-optical device and manufacturing method thereof, electronic apparatus, and capacitor
03/21/2007CN1933163A Nonvolatile semiconductor memory devices and methods of forming the same
03/21/2007CN1933162A Programmable non-volatile memory device and its forming method
03/21/2007CN1933161A Semiconductor device and method for fabricating the same
03/21/2007CN1933160A Trench transistor dram cell array and method of making the same
03/21/2007CN1933159A Fast flash memory body and producing method thereof
03/21/2007CN1933158A Semiconductor device and method for fabricating the same
03/21/2007CN1933157A Semiconductor device and a method of manufacturing the same
03/21/2007CN1933154A Semicoductor circuit, inverter circuit, semiconductor apparatus
03/21/2007CN1933153A Mim capacitor integrated into the damascene structure and method of making thereof
03/21/2007CN1933152A Arranging method for cathode pattern in integrated gate pole changing thyratron transistor
03/21/2007CN1933151A White light light-emitting diode and producing method thereof
03/21/2007CN1933149A Backward integrated micro-lens infrared focal plane detector and micro-lens producing method
03/21/2007CN1933145A Fuse of semiconductor element
03/21/2007CN1933144A Test key for checking up intraconnection and method for checking intraconnection
03/21/2007CN1933143A Electroless plating liquid and semiconductor device
03/21/2007CN1933142A Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
03/21/2007CN1933141A Contact structure having silicide layers, semiconductor device employing the same, and methods of fabricating the contact structure and semiconductor device
03/21/2007CN1933139A Wiring board and method for manufacturing the same, and semiconductor device
03/21/2007CN1933129A Complex layer structure and producing method and double-mosaic and interconnector structure and capacitor
03/21/2007CN1933128A Thin film transistor structure and substrate producing method for liquid crystal display device
03/21/2007CN1933127A Manufacturing method for semiconductor structure
03/21/2007CN1933126A Non-volatile memory cell, producing method thereof and method for producing non-volatile memory body
03/21/2007CN1933125A Storing unit forming method, high coupling rate storing device and forming method thereof
03/21/2007CN1933124A Method of manufacturing semiconductor device
03/21/2007CN1933123A Dual-metal inserting structure and producing method thereof
03/21/2007CN1933122A Method for producing conducting layer
03/21/2007CN1933121A Adjustable tool holder
03/21/2007CN1933120A Centering and orientation apparatus
03/21/2007CN1933119A Contactor having contact electrodes formed by laser processing
03/21/2007CN1933118A Method for forming semiconductor package, and metal mold for forming the same
03/21/2007CN1933117A Producing process for chip packaging body without kernel dielectric layer
03/21/2007CN1933116A Wafter level vacuum packaging method
03/21/2007CN1933115A Method for manufacturing semiconductor device
03/21/2007CN1933114A Semiconductor device and a method for manufacturing the same
03/21/2007CN1933113A Integrated technology process for forming silicon germanium source-drain structure
03/21/2007CN1933112A Strain source-drain producing method utilizing new hard mask
03/21/2007CN1933111A Method for producing space wall, cleaning method after etching thereof and semiconductor element
03/21/2007CN1933110A Method for III family elements two-time spreading and raising large power transistor blocking current-voltage characteristics
03/21/2007CN1933109A Method of forming micro patterns in semiconductor devices
03/21/2007CN1933108A Method for planarizing semiconductor structures
03/21/2007CN1933107A Multi-step low-temperature space wall producing method
03/21/2007CN1933106A Method for producing surface more smooth golden convex points
03/21/2007CN1933105A Semiconductor device and method for manufacturing the same
03/21/2007CN1933104A Method of semiconductor thin film crystallization and semiconductor device fabrication
03/21/2007CN1933103A Semiconductor producing method for preventing crystal border film layer from stripping and interconnection wire producing method
03/21/2007CN1933102A Film forming method, device producing method, electro-optical device, and electronic device
03/21/2007CN1933101A Process for forming a film, process for manufacturing a device
03/21/2007CN1933100A Apparatus for and method of processing substrate subjected to exposure process
03/21/2007CN1933099A Method for manufacturing semiconductor device
03/21/2007CN1933098A Mask for continuous transverse crystallizing technology and method using the same mask
03/21/2007CN1933097A Dry device and dry method for semiconductor equipment
03/21/2007CN1933096A Low-temperature chip direct bonding method
03/21/2007CN1932653A Stack type alignment mark and photoetching process aligning method
03/21/2007CN1932652A Photoresist stripping method
03/21/2007CN1932651A Method and system for manufacturing semiconductor, base and recording medium used therefor
03/21/2007CN1932650A Lithographic apparatus and device manufacturing method
03/21/2007CN1932649A Device manufacturing method, mask and device
03/21/2007CN1932648A Apparatus and methods for immersion lithography
03/21/2007CN1932647A Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus
03/21/2007CN1932646A 曝光装置 Exposure device
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