| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/27/1993 | US5231440 Method of and apparatus for forming volume type phase hologram |
| 07/27/1993 | US5231291 Wafer table and exposure apparatus with the same |
| 07/27/1993 | US5231263 Liquid crystal mask type laser marking system |
| 07/27/1993 | US5230990 Method for producing an optical waveguide array using a resist master |
| 07/27/1993 | US5230989 Developer for ps plate requiring no dampening water |
| 07/27/1993 | US5230988 Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds |
| 07/27/1993 | US5230987 Having controlled glass transition temperature, dimensional stability, chemical resistance, for printing plates |
| 07/27/1993 | US5230986 Photosensitive compositions containing benzospiropyrans and uses thereof |
| 07/27/1993 | US5230985 Using 1-sulfonyloxy-2-pyridine which generates an acid under actinic radiation |
| 07/27/1993 | US5230984 Positive type photosensitive anionic electrodeposition coating resin composition |
| 07/27/1993 | US5230982 Heterocyclic disulfides for crosslinking |
| 07/27/1993 | US5230981 Image recording process using silver halide, reducing agent and photopolymerization initiator |
| 07/27/1993 | US5230972 Method of manufacturing a color filter |
| 07/27/1993 | US5230920 Coating and rolling under tension |
| 07/27/1993 | US5230772 Dry etching a photoresist with ammonia |
| 07/25/1993 | CA2087890A1 Photosensitive resin composition for flexographic printing plate |
| 07/22/1993 | WO1993014445A1 Improved mask for photolithography |
| 07/22/1993 | WO1993014444A1 Method and device for coating circuit boards |
| 07/22/1993 | WO1993014443A1 Photoimageable electrodepositable photoresist composition for producing non-tacky films |
| 07/22/1993 | DE4301446A1 New light-sensitive di:amino cpds. - for polyamic acid and ester resins used in light-sensitive compsns. |
| 07/22/1993 | CA2124077A1 Improved mask for photolithography |
| 07/22/1993 | CA2087635A1 Photopolymerisable components of radiation sensitive compositions |
| 07/22/1993 | CA2083545A1 Polyunsaturated diazonium compounds |
| 07/21/1993 | EP0552035A1 Method of forming color pattern |
| 07/21/1993 | EP0552003A1 Integrated light deflector |
| 07/21/1993 | EP0551697A1 Photoinitiator system and photopolymerizable composition using the same |
| 07/21/1993 | EP0551300A1 Printing plate protectant |
| 07/21/1993 | CN1021670C Illumination system |
| 07/20/1993 | US5229872 Exposure device including an electrically aligned electronic mask for micropatterning |
| 07/20/1993 | US5229811 Apparatus for exposing peripheral portion of substrate |
| 07/20/1993 | US5229616 Lamp for enveloping a single isotope of a metal element and exposure apparatus including the lamp |
| 07/20/1993 | US5229351 Development of latent images from microcapsules ruptured and containing dyes and rolling |
| 07/20/1993 | US5229258 High resolution resist structures |
| 07/20/1993 | US5229257 Process for forming multi-level coplanar conductor/insulator films employing photosensitive polymide polymer compositions |
| 07/20/1993 | US5229256 Process for generating positive-tone photoresist image |
| 07/20/1993 | US5229254 Positive-working radiation-sensitive mixtures, and radiation-sensitive recording materials produced with these mixtures |
| 07/20/1993 | US5229253 Mixture of polymeric binder, free-radical polymerizable compound, photoreducible dye and dicyclopentadienyl bis-(2,4,6-trifluorophenyl)titanium or zirconium |
| 07/20/1993 | US5229252 Photoimageable compositions |
| 07/20/1993 | US5229251 Dry developable photoresist containing an epoxide, organosilicon and onium salt |
| 07/20/1993 | US5229245 Comprising acrylic polymer with beta-dicarbonyl group and quinonediazosulfonyl compound |
| 07/20/1993 | US5229244 Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation |
| 07/20/1993 | US5229232 Masking and imagewise heating and electronic flashes for forming pixels |
| 07/20/1993 | US5229230 Improved accuracy in transferring patterns to photoresist, interaction of diffraction light to increase intensity |
| 07/20/1993 | US5229171 Coating semiconductor with photoresist and processing at subatmospheric pressure |
| 07/20/1993 | US5229167 Method of forming a film pattern on a substrate |
| 07/20/1993 | US5228920 Film coating unit |
| 07/20/1993 | CA1320610C Method for manufacturing polyamide resin |
| 07/20/1993 | CA1320388C Printing plate |
| 07/20/1993 | CA1320379C Fluorescent toners surface coated with polymeric quaternary ammonium compound and slip agent |
| 07/20/1993 | CA1320375C Optical reduction system |
| 07/20/1993 | CA1320374C Apparatus and method for reproducing a pattern in an annular area |
| 07/15/1993 | DE4300576A1 Imaging process using specified surfactant in alkaline developer soln. - used to reduce development time of light-sensitive resin and minimise pigment fog |
| 07/15/1993 | CA2087110A1 Method of forming color pattern |
| 07/14/1993 | EP0551119A1 Method for manufacturing of non-linear micro optical elements |
| 07/14/1993 | EP0551118A1 Method for manufacturing of non-linear micro optical elements |
| 07/14/1993 | EP0551105A2 Negative type composition for chemically amplified resist and process and apparatus of chemically amplified resist pattern |
| 07/14/1993 | EP0550914A1 Apparatus for piece-by-piece development corresponding to large scale substrates |
| 07/14/1993 | EP0550893A1 Light sensitive layer for positive-negative copying material |
| 07/14/1993 | EP0550734A1 Apparatus and method for focusing hard x-rays |
| 07/13/1993 | US5227839 Small field scanner |
| 07/13/1993 | US5227838 Exposure system |
| 07/13/1993 | US5227626 Lithography apparatus using scanning tunneling microscopy |
| 07/13/1993 | US5227607 Yag laser working machine for precision working of thin-film |
| 07/13/1993 | US5227473 Quinone diazide compound and light-sensitive composition containing same |
| 07/13/1993 | US5227341 Method of manufacturing a semiconductor device using an isopropyl alcohol ashing step |
| 07/13/1993 | US5227281 Process for producing negative copies |
| 07/13/1993 | US5227280 Resists with enhanced sensitivity and contrast |
| 07/13/1993 | US5227279 Polymer of N-/2-hydroxy-3-methacryloyloxypropyl/-N-phenyl-glycine |
| 07/13/1993 | US5227278 Gelatino fogged silver halide emulsion layer, layer of hydrophilic macromolecular polymer dispersion medium with dispersed phase of unsaturated monomer and free radical photoinitiator, abrasion layer of binder and tanning developer |
| 07/13/1993 | US5227277 Imaging process, and imaging medium for use therein |
| 07/13/1993 | US5227276 Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture |
| 07/13/1993 | US5227275 Light sensitive element for making lithographic printing plate material |
| 07/13/1993 | US5227274 Silver halide emulsion, reducing agent, ethylenically unsaturated polymerizable compound |
| 07/13/1993 | US5227269 Method for fabricating high density DRAM reticles |
| 07/13/1993 | US5227044 Without photolithographic process |
| 07/13/1993 | US5227008 Method for making flexible circuits |
| 07/13/1993 | US5226523 Conveying apparatus and method of controlling the same |
| 07/13/1993 | CA1320300C Photopatternable silicone polyamic acid, method of making and use |
| 07/08/1993 | WO1993013638A1 Lamination of a photopolymerizable solder mask layer to a substrate containing holes using an intermediate photopolymerizable liquid layer |
| 07/08/1993 | WO1993013459A1 Selected novolak resins and selected radiation-sensitive compositions |
| 07/08/1993 | WO1993013139A1 Energy ray-hardenable composition |
| 07/08/1993 | DE4200149A1 Circuit board varnishing - using poured curtain of degassed varnish on cooled circuit boards for controlled temp. varnish flow without bubbles |
| 07/07/1993 | EP0550338A1 Presensitized color-proofing sheet |
| 07/07/1993 | EP0550173A1 Integrated circuits |
| 07/07/1993 | EP0550119A1 A device for coating a photosensitive film on a plate roll |
| 07/07/1993 | EP0550009A1 Positive resist composition |
| 07/07/1993 | EP0549993A1 Stereolithographic apparatus and method of forming a model |
| 07/07/1993 | EP0549946A2 Radiation polymerisable mixture and process for the preparation of a solder stop mask |
| 07/07/1993 | EP0549831A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/07/1993 | EP0549830A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/07/1993 | EP0549610A1 Copolymerization process and optical copolymer produced therefrom. |
| 07/06/1993 | US5226056 Plasma ashing method and apparatus therefor |
| 07/06/1993 | US5225935 Optical device having a microlens and a process for making microlenses |
| 07/06/1993 | US5225867 Chromatic image recording apparatus |
| 07/06/1993 | US5225771 Making and testing an integrated circuit using high density probe points |
| 07/06/1993 | US5225525 Photochromic benzothioxanthone oxides, process for their preparation and the use thereof |
| 07/06/1993 | US5225318 Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns |
| 07/06/1993 | US5225316 A photoinitiator that generates acid on exposure to radiation and a polymer with an acid labile group |
| 07/06/1993 | US5225315 Printed circuit |
| 07/06/1993 | US5225314 Imaging process, and imaging medium for use therein |