| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/06/1993 | US5225312 Mixture of coumarin dye, quinone diazide sensitizer, and novolak resin; reflective notching reduction |
| 07/06/1993 | US5225311 Positive photoresist composition |
| 07/06/1993 | US5225310 Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound |
| 07/06/1993 | US5225309 Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer |
| 07/06/1993 | US5225299 Multilayer element with dye precursor, photoconductor and microcapsules |
| 07/01/1993 | DE4237427A1 Lithographic printing plate prodn. - by silver complex diffusion transfer in presence of N-heterocyclic mercaptan and organic thioether for high ink affinity |
| 07/01/1993 | CA2086157A1 Stereolithographic apparatus and method of use |
| 07/01/1993 | CA2083186A1 Presensitized color-proofing sheet |
| 06/30/1993 | EP0549393A1 Method and device for removing protective films from insulated boards of printed circuits |
| 06/30/1993 | EP0549339A1 Photosensitive composition |
| 06/30/1993 | EP0549228A2 Photocurable resin composition |
| 06/30/1993 | EP0548870A1 Color filter |
| 06/30/1993 | EP0548839A1 Flame retarded methyl methacrylates |
| 06/30/1993 | EP0548312A1 Pressure relieving pellicle |
| 06/30/1993 | CN1073776A Preparation method of ferric oxide board |
| 06/30/1993 | CN1021448C Photopolymerizable composition having superior adhesion |
| 06/29/1993 | US5224200 Coherence delay augmented laser beam homogenizer |
| 06/29/1993 | US5224139 X-ray mask and semiconductor device manufacturing method using the same |
| 06/29/1993 | US5223914 Follow-up system for etch process monitoring |
| 06/29/1993 | US5223881 Apparatus for controlling developing solution |
| 06/29/1993 | US5223693 Optical machining apparatus |
| 06/29/1993 | US5223591 Sulfonium compound |
| 06/29/1993 | US5223377 Interrupted developing process for a photoresist image |
| 06/29/1993 | US5223376 High contrast; spin coating, bleaching, developing positive photoresist |
| 06/29/1993 | US5223374 Multilayer; sheet shaped temporary support, thermal transferrable layer containing colorant, and radiation sensitive layer |
| 06/29/1993 | US5223373 Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom |
| 06/29/1993 | US5223372 Chemical mat film and a photosensitive film comprising an o-naphthoquinine diazide compound and a binder coated over the chemical mat film |
| 06/29/1993 | US5223371 Thermal developing type photosensitive pressure sensitive image recording medium |
| 06/29/1993 | US5223356 Holography |
| 06/29/1993 | US5223041 Apparatus and process for processing printing plates |
| 06/29/1993 | CA1319776C Process for the production of images |
| 06/28/1993 | CA2085962A1 Positive resist composition |
| 06/28/1993 | CA2085405A1 Resist composition and process for producing the same |
| 06/26/1993 | CA2085868A1 Photosensitive composition |
| 06/24/1993 | WO1993012469A1 Aqueous-processable tonable imaging element |
| 06/24/1993 | WO1993012468A1 Polyphosphazene binder resins for photoresists |
| 06/24/1993 | WO1993012152A1 Metal ion reduction in novolak resins |
| 06/24/1993 | WO1993012055A2 Photocurable cyclobutarene compositions |
| 06/24/1993 | WO1993011861A1 Microstructured membranes and methods for making same |
| 06/24/1993 | DE4142576A1 Laminated photopolymerisable recording medium prodn. - by mixing components common to all layers in same extruder and adding additives to sepd. streams |
| 06/24/1993 | CA2125567A1 Photocurable cyclobutarene compositions |
| 06/24/1993 | CA2125555A1 Aqueous-processable tonable imaging element |
| 06/24/1993 | CA2124084A1 Microstructured membranes and methods for making same |
| 06/23/1993 | EP0547662A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 06/23/1993 | EP0547660A1 A method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 06/23/1993 | EP0547578A1 Light-sensitive composition |
| 06/23/1993 | EP0547555A2 Photocrosslinkable polyimide ammonia salts |
| 06/23/1993 | EP0547543A1 Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems |
| 06/23/1993 | EP0547488A1 Stripping method for photopolymerised resist patterns |
| 06/23/1993 | EP0547419A1 Process for making microstructures |
| 06/23/1993 | EP0547371A1 Process for producing stepped moulds, stepped moulds and stepped body having a microstructure moulded therewith |
| 06/23/1993 | EP0301101B1 Positive photosensitive resin composition |
| 06/23/1993 | CN2136735Y Press photo frame movable device for continous sunning machine |
| 06/23/1993 | CN1021378C Water containing soda type developing optical imaging slushing compound |
| 06/22/1993 | US5222112 X-ray pattern masking by a reflective reduction projection optical system |
| 06/22/1993 | US5221596 Method of forming a retrograde photoresist profile |
| 06/22/1993 | US5221595 Printing plates, photoresist; high photosensitivity, acid resistance |
| 06/22/1993 | US5221594 Ps plates requiring no dampening water |
| 06/22/1993 | US5221592 High contrast, good resolution and thermal stability, clean development and low unexposed film loss |
| 06/22/1993 | US5221589 Photosensitive resin composition |
| 06/22/1993 | US5221429 Method of manufacturing phase-shifted diffraction grating |
| 06/22/1993 | US5221424 Method for removal of photoresist over metal which also removes or inactivates corosion-forming materials remaining from previous metal etch |
| 06/22/1993 | US5221422 Lithographic technique using laser scanning for fabrication of electronic components and the like |
| 06/22/1993 | US5221416 Plasma surface treating method |
| 06/22/1993 | US5221347 Apparatus for coating both sides of plate-like substrates |
| 06/22/1993 | CA1319340C Method and apparatus for production of three-dimensional objects by photosolidification |
| 06/17/1993 | DE4241911A1 Cooling system for plasma discharge lamp stimulated by microwaves - uses jets to provide cooling air stream directed onto lamp flask during simultaneous rotation |
| 06/17/1993 | DE4241717A1 Positive light-sensitive compsn. for mfr. of printing plates etc. - comprising long chain alkoxy-substd. diazonium salt and alkali-soluble (cresol-novolak) polymer |
| 06/17/1993 | DE4130170A1 Light-sensitive element for printing plate or photoresist mfr. - with thin oil film between imaging mask and positive- or negative-working layer to prevent dust deposition and give smooth plates |
| 06/17/1993 | CA2081731A1 Photocrosslinkable polyimide ammonia salts |
| 06/16/1993 | EP0546997A1 Radiation-sensitive polymer |
| 06/16/1993 | EP0546856A2 Dyes for color filters, photosensitive resist resin compositions containing the same, and color filters |
| 06/16/1993 | EP0546814A1 A polyimide photosensitive cover coating agent |
| 06/16/1993 | EP0546768A1 Water-borne photoimageable compositions |
| 06/16/1993 | EP0546703A1 Lithographic material and processes involved in their use |
| 06/16/1993 | EP0546696A1 Process for lithography on piezoelectric films |
| 06/16/1993 | EP0546598A1 Image receiving layer for use in a silver salt diffusion transfer process |
| 06/16/1993 | EP0546360A1 Photosensitive composition |
| 06/16/1993 | EP0546196A1 Synthetic quartz glass optical member for excimer laser and production thereof |
| 06/16/1993 | EP0546190A1 Image formation apparatus |
| 06/16/1993 | CN1073294A Shadow mask manufacture method |
| 06/15/1993 | US5220590 X-ray projection lithography camera |
| 06/15/1993 | US5220454 Cata-dioptric reduction projection optical system |
| 06/15/1993 | US5220377 Image recording apparatus |
| 06/15/1993 | US5220171 Wafer holding device in an exposure apparatus |
| 06/15/1993 | US5220073 Selected trihydroxybenzophenone compounds |
| 06/15/1993 | US5220037 Sulfonium salts and use thereof |
| 06/15/1993 | US5219788 Bilayer metallization cap for photolithography |
| 06/15/1993 | US5219714 Having at least four naphthoquinone diazide sulfonyl groups; developing to positive image pattern |
| 06/15/1993 | US5219713 Multi-layer photoresist air bridge fabrication method |
| 06/15/1993 | US5219711 Alpha alkoxyalkyl carboxylic acid ester polymer, resolution, sensitivity |
| 06/15/1993 | US5219709 Photopolymerizable composition |
| 06/15/1993 | US5219704 Adding nitrate, sulfate or chloride metal to a water to form metal hydroxide |
| 06/15/1993 | US5219702 Applying prolonged tack toner to latent image, heating to activate, contacting with receptor, separating to transfer, applying colorless, fusible, finely divided particles, heating |
| 06/15/1993 | US5219701 Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizer |
| 06/15/1993 | US5219700 Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye |
| 06/15/1993 | US5219699 Diazo resin, binder of a vinyl alcohol polymer acetalized with three different aldehydes |
| 06/15/1993 | US5219664 Hydrophilic copolymers and their use in reprography |
| 06/15/1993 | US5219654 Thin film of uniform thickness bonded to substrate |
| 06/15/1993 | US5219615 Method and apparatus for forming a coating of a viscous liquid on an object |